TW200745785A - Recycling method for resist stripper scrapped and recycling device for the same - Google Patents

Recycling method for resist stripper scrapped and recycling device for the same

Info

Publication number
TW200745785A
TW200745785A TW096107177A TW96107177A TW200745785A TW 200745785 A TW200745785 A TW 200745785A TW 096107177 A TW096107177 A TW 096107177A TW 96107177 A TW96107177 A TW 96107177A TW 200745785 A TW200745785 A TW 200745785A
Authority
TW
Taiwan
Prior art keywords
waste liquid
amine
stripping
resist
recycling
Prior art date
Application number
TW096107177A
Other languages
Chinese (zh)
Other versions
TWI418958B (en
Inventor
Ki-Beom Lee
Byung-Uk Kim
Mi-Sun Park
Jin-Sup Hong
Yoon-Gil Yim
Suk-Il Yoon
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200745785A publication Critical patent/TW200745785A/en
Application granted granted Critical
Publication of TWI418958B publication Critical patent/TWI418958B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Extraction Or Liquid Replacement (AREA)

Abstract

To provide a regeneration method and a regeneration apparatus for a resist stripping waste liquid, particularly suitable for economically regenerating a resist stripping waste liquid produced in a stripping step where a stripping liquid containing various specified amine compounds and in an occasion where various kinds of resists and stripping liquids are used. The regeneration method for a resist stripping waste liquid containing water, a resist, an amine compound and an organic solvent includes steps of: (a) adding an acid which reacts with the amine compound in the resist stripping waste liquid to precipitate the amine compound as an amine-acid compound from the waste liquid; (b) filtering out the amine-acid compound precipitated in the step (a) from the waste liquid; and (c) distilling into fractions the stripping waste liquid removed of the amine in the step (b) so as to recover only the organic solvent.
TW096107177A 2006-03-03 2007-03-02 Recycling method for resist stripper scrapped and recycling device for the same TWI418958B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060020449A KR101266897B1 (en) 2006-03-03 2006-03-03 A recycling method for resist stripper scrapped and a recycling device for same

Publications (2)

Publication Number Publication Date
TW200745785A true TW200745785A (en) 2007-12-16
TWI418958B TWI418958B (en) 2013-12-11

Family

ID=38586819

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107177A TWI418958B (en) 2006-03-03 2007-03-02 Recycling method for resist stripper scrapped and recycling device for the same

Country Status (4)

Country Link
JP (1) JP4833113B2 (en)
KR (1) KR101266897B1 (en)
CN (1) CN101030046B (en)
TW (1) TWI418958B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101007418B1 (en) * 2008-05-28 2011-01-12 순천향대학교 산학협력단 Method for recovering amine from amine-containing waste water
JP5256881B2 (en) 2008-06-25 2013-08-07 いすゞ自動車株式会社 Exhaust gas purification device
JP6045283B2 (en) * 2012-10-11 2016-12-14 日本リファイン株式会社 Method and apparatus for regenerating resist stripping solution
JP6028973B2 (en) * 2012-11-08 2016-11-24 パナソニックＩｐマネジメント株式会社 Photoresist concentration measuring apparatus and measuring method
CN102951761A (en) * 2012-11-14 2013-03-06 杭州格林达化学有限公司 Method for recovering waste photoresist stripper
CN103308654B (en) * 2013-06-13 2016-08-10 深圳市华星光电技术有限公司 For testing the method for moisture in photoresistance stripper
CN104230086B (en) * 2014-09-25 2016-04-27 成都源永科技发展有限公司 A kind of method that water-borne coatings clean-out system spent solution regeneration utilizes
KR20170002929A (en) 2015-06-30 2017-01-09 동우 화인켐 주식회사 Recycling process of waste stripper
KR20170002930A (en) 2015-06-30 2017-01-09 동우 화인켐 주식회사 Recycling process of waste stripper
JP6681066B2 (en) * 2016-03-14 2020-04-15 株式会社平間理化研究所 Aqueous resist stripper preparation device and non-aqueous resist stripper preparation device
CN107664928A (en) * 2016-07-29 2018-02-06 罗文烽 Useless photoresist reclaiming System and method for
CN109081496A (en) * 2018-10-23 2018-12-25 华北水利水电大学 A kind of sewage disposal device based on recycling
CN110015707B (en) * 2019-03-05 2020-11-27 厦门顺米可微电子科技有限公司 Useless stripper recovery unit of photoresist
CN116003228A (en) * 2022-12-26 2023-04-25 南京长江江宇环保科技股份有限公司 Method for comprehensively utilizing photoresist-removing waste liquid

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW256929B (en) * 1993-12-29 1995-09-11 Hirama Rika Kenkyusho Kk
US6106722A (en) * 1997-08-12 2000-08-22 Kinetico Incorporated Filtering photoresist-containing liquid
CN1196032C (en) * 1998-08-11 2005-04-06 东进世美肯株式会社 Stripping agent, stripping method, stripping agent circulation equipment and stripping agent controller
JP3409005B2 (en) * 1999-01-29 2003-05-19 松下環境空調エンジニアリング株式会社 Method and apparatus for regenerating stripper
JP2002131932A (en) 2000-10-24 2002-05-09 Kimura Chem Plants Co Ltd Method for regenerating and recovering resist removing liquid, and device for regenerating and recovering the same
KR100390567B1 (en) * 2000-12-30 2003-07-07 주식회사 동진쎄미켐 method of controlling photoresist stripping process and method of regenerating photoresist stripping composition using near infrared spectrometer
JP2003057852A (en) 2001-08-21 2003-02-28 Asahi Kasei Corp Method and system for treatment of stripped piece of resist
JP2003167358A (en) * 2001-11-29 2003-06-13 Nagase & Co Ltd Equipment for regenerating used resist peeling solution and method therefor
JP2004066085A (en) * 2002-08-05 2004-03-04 Kimura Chem Plants Co Ltd Solvent recovery system
JP4080449B2 (en) * 2004-03-31 2008-04-23 日本リファイン株式会社 Solvent recovery device and solvent recovery method
KR101266883B1 (en) * 2006-03-03 2013-05-23 주식회사 동진쎄미켐 A recycling method for resist stripper scrapped and a recycling device for same

Also Published As

Publication number Publication date
KR101266897B1 (en) 2013-05-23
CN101030046A (en) 2007-09-05
CN101030046B (en) 2011-08-24
JP4833113B2 (en) 2011-12-07
TWI418958B (en) 2013-12-11
JP2007241277A (en) 2007-09-20
KR20070090573A (en) 2007-09-06

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