TW200739281A - Cleaning liquid for photolithography and method of recycling use thereof - Google Patents

Cleaning liquid for photolithography and method of recycling use thereof

Info

Publication number
TW200739281A
TW200739281A TW095149255A TW95149255A TW200739281A TW 200739281 A TW200739281 A TW 200739281A TW 095149255 A TW095149255 A TW 095149255A TW 95149255 A TW95149255 A TW 95149255A TW 200739281 A TW200739281 A TW 200739281A
Authority
TW
Taiwan
Prior art keywords
cleaning liquid
photolithography
mass
member selected
recycling use
Prior art date
Application number
TW095149255A
Other languages
Chinese (zh)
Other versions
TWI338200B (en
Inventor
Jun Koshiyama
Takao Nakajima
Satoru Yoshida
Yasumitsu Taira
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200739281A publication Critical patent/TW200739281A/en
Application granted granted Critical
Publication of TWI338200B publication Critical patent/TWI338200B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/264—Aldehydes; Ketones; Acetals or ketals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/20—Industrial or commercial equipment, e.g. reactors, tubes or engines

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

To provide a cleaning liquid for photolithography which is widely applicable to various kinds of photoresists including ones for I-line, KrF, and ArF and has excellent cleaning ability and which after use can be recovered/regenerated in a high yield and circulated/used as a recycled cleaning liquid. The cleaning liquid for photolithography comprises (a) at least one member selected among lower alkyl esters of acetic acid or propionic acid and (b) at least one member selected among C5-7 cyclic or acyclic ketones in an (a)/(b) proportion of from 4/6 to 7/3 (by mass) and contains (c) 0.01-1 mass%, excluding 1 mass%, organic solvent for use in photoresists.
TW095149255A 2005-12-27 2006-12-27 Cleaning liquid for photolithography and method of recycling use thereof TWI338200B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005375267A JP4475664B2 (en) 2005-12-27 2005-12-27 Cleaning liquid for photolithography and method for circulating the same

Publications (2)

Publication Number Publication Date
TW200739281A true TW200739281A (en) 2007-10-16
TWI338200B TWI338200B (en) 2011-03-01

Family

ID=38218084

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095149255A TWI338200B (en) 2005-12-27 2006-12-27 Cleaning liquid for photolithography and method of recycling use thereof

Country Status (3)

Country Link
JP (1) JP4475664B2 (en)
TW (1) TWI338200B (en)
WO (1) WO2007074862A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI552809B (en) * 2009-03-31 2016-10-11 Tokyo Ohka Kogyo Co Ltd Method of manufacturing regenerative photoresist and regenerative photoresist
TWI815959B (en) * 2018-08-31 2023-09-21 南韓商易案愛富科技有限公司 Thinner composition, and method of processing substrate and method of manufacturing semiconductor device using the same

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5658941B2 (en) * 2010-08-05 2015-01-28 東京応化工業株式会社 Resist pattern forming method
JP5767919B2 (en) * 2010-09-17 2015-08-26 富士フイルム株式会社 Pattern formation method
KR101886750B1 (en) * 2011-09-22 2018-08-13 삼성전자 주식회사 Thinner composition for RRC process, apparatus for supplying the same, and thinner composition for EBR process
WO2014002151A1 (en) 2012-06-26 2014-01-03 野村マイクロ・サイエンス株式会社 Resist stripping agent
CN106660914B (en) * 2014-07-30 2019-06-04 昭和电工株式会社 The recycling method of reuse method and anti-corrosion agent composition treatment fluid that separation and recovery method, the anti-corrosion agent composition of alkylene glycol monoalky lether dispose waste liquid
KR20170132283A (en) * 2015-05-13 2017-12-01 후지필름 가부시키가이샤 A pre-rinsing liquid, a method of treating a pre-rinsing, and a method of forming a pattern
WO2018092763A1 (en) 2016-11-18 2018-05-24 富士フイルム株式会社 Chemical liquid, pattern forming method and kit
JP6876717B2 (en) * 2016-11-18 2021-05-26 富士フイルム株式会社 Chemical solution, pattern formation method, and kit
KR102195007B1 (en) * 2018-10-11 2020-12-29 세메스 주식회사 Substrate cleaning compositions, substrate cleaning method and substrate treating apparatus
KR102653114B1 (en) * 2020-03-27 2024-04-01 후지필름 가부시키가이샤 Pattern formation method, manufacturing method of electronic device
KR20230037605A (en) * 2020-08-11 2023-03-16 쇼와 덴코 가부시키가이샤 solvent composition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04130715A (en) * 1990-09-21 1992-05-01 Tokyo Ohka Kogyo Co Ltd Solvent for resist cleaning and removal, and manufacture of base material for electronic-component manufacture using said solvent
JP3978255B2 (en) * 1997-06-24 2007-09-19 Ａｚエレクトロニックマテリアルズ株式会社 Lithographic cleaning agent
JP2001188360A (en) * 1999-12-28 2001-07-10 Mitsubishi Gas Chem Co Inc Edge bead remover
JP2003114538A (en) * 2001-07-31 2003-04-18 Toray Ind Inc Rinsing liquid, washing method using the same and photosensitive resin precursor composition to be washed off
JP2003167358A (en) * 2001-11-29 2003-06-13 Nagase & Co Ltd Equipment for regenerating used resist peeling solution and method therefor
JP2005286208A (en) * 2004-03-30 2005-10-13 Shin Etsu Chem Co Ltd Stripper and thin film removing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI552809B (en) * 2009-03-31 2016-10-11 Tokyo Ohka Kogyo Co Ltd Method of manufacturing regenerative photoresist and regenerative photoresist
TWI815959B (en) * 2018-08-31 2023-09-21 南韓商易案愛富科技有限公司 Thinner composition, and method of processing substrate and method of manufacturing semiconductor device using the same

Also Published As

Publication number Publication date
TWI338200B (en) 2011-03-01
JP4475664B2 (en) 2010-06-09
WO2007074862A1 (en) 2007-07-05
JP2007178589A (en) 2007-07-12

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