CN203433266U - Device for recycling photoresist resin in developing solution - Google Patents
Device for recycling photoresist resin in developing solution Download PDFInfo
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- CN203433266U CN203433266U CN201320478076.6U CN201320478076U CN203433266U CN 203433266 U CN203433266 U CN 203433266U CN 201320478076 U CN201320478076 U CN 201320478076U CN 203433266 U CN203433266 U CN 203433266U
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Abstract
The utility model provides a device for recycling photoresist resin in a developing solution. The device comprises a waste solution tank, a first filter device, a dissolving tank, a second filter device, a nanofiltration device and a concentration device, wherein the waste solution tank comprises a precipitating agent inlet and a waste developing solution inlet; an outlet of the waste solution tank is connected with an inlet of the first filter device by a connecting pipe; an outlet in the upper part of the first filter device is communicated with a first inlet of the dissolving tank; an outlet in the lower part of the first filter device is a TMAH (tetramethylammonium hydroxide) waste solution outlet; a second inlet of the dissolving tank is a solvent inlet; an outlet of the dissolving tank is communicated with an inlet of the second filter device; an outlet in the upper part of the second filter device is a residue outlet; an outlet in the lower part of the second filter device is communicated with an inlet of the nanofiltration device; a first outlet of the nanofiltration device is a resin outlet; a second outlet of the nanofiltration device is an impurity outlet; the first outlet of the nanofiltration device is communicated with an inlet of the concentration device; the concentration device comprises a photoresist resin outlet and a solvent outlet. The device reduces the cost and has the good environment friendliness.
Description
Technical field
The utility model relates to a kind of photoresist resin recycling device.
Background technology
Photoetching process is the Core Production Technology that panel (FDP) and semi-conductor chip production etc. need electron trade.In photoetching process, photoresist is again core material wherein.Photoresist is generally by base resin, the compositions such as emulsion, the key of the qualified photoresist of production of base resin wherein, the accuracy that is related to photoengraving pattern, require molecular resin amount to distribute little, mean molecular weight is controlled, because therefore also require purity high for high-accuracy electronics production industry, single metal content and anion-content are low simultaneously.Therefore to account for photoresist total cost over half for the cost of resin.
In photoetching process, general step is even glue-dry-front baking--exposure-development-rear baking-etching-peel off.Therefore photoresist is dissolved in waste liquid in developing process greatly.There are at present many patent reports to carry out recycling to developer solution waste liquid, it in these patents, is mainly the method that proposes to reclaim Tetramethylammonium hydroxide, also there is not at present recycling resin in report process developer solution, conventionally according to solid waste thing, process, so processing cost is high, also has the possibility of secondary pollution.
Summary of the invention
In order to overcome the deficiency that cost is high, the feature of environmental protection is poor of existing photoresist plastic resin treatment mode, photoresist resin recycling device in the developer solution that the utility model provides a kind of and reduced costs, the feature of environmental protection is good.
The utility model solves the technical scheme that its technical matters adopts:
Photoresist resin recycling device in a kind of developer solution, comprise waste liquid tank, the first filtration unit, dissolving tank, the second filtration unit, nanofiltration device and enrichment facility, described waste liquid tank comprises precipitation agent import and the import of developer solution waste liquid, the outlet of described waste liquid tank is connected with the import of the first filtration unit by connecting pipe, the top outlet of described the first filtration unit is communicated with the first import of described dissolving tank, the lower part outlet of described the first filtration unit is TMAH waste liquid outlet, the second import of described dissolving tank is solvent inlet, the outlet of described dissolving tank is communicated with the import of described the second filtration unit, the top outlet of described the second filtration unit is residue outlet, the lower part outlet of described the second filtration unit is communicated with the entrance of described nanofiltration device, the first outlet of described nanofiltration device is resin outlet, the second outlet of described nanofiltration device is impurity outlet, the first outlet of described nanofiltration device is communicated with the entrance of described enrichment facility, described enrichment facility comprises the outlet of photoresist resin and solvent outlet.
Further, the solvent outlet of described enrichment facility is communicated with described solvent storage tank, and described solvent storage tank is communicated with the second import of described dissolving tank.
Further, installation pump on described connecting pipe.
The beneficial effects of the utility model are mainly manifested in: when reclaiming Tetramethylammonium hydroxide, can reclaim photoresist resin again.And simple in structure, can produce continuously, energy consumption is low, cost-saving, lowers water consumption, is easy to promote practical.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of photoresist resin recycling device in developer solution.
Embodiment
Below in conjunction with accompanying drawing, the utility model is further described.
With reference to Fig. 1, photoresist resin recycling device in a kind of developer solution, described recycling device comprises waste liquid tank 1, the first filtration unit 2, dissolving tank 3, the second filtration unit 5, nanofiltration device 6 and enrichment facility 7, described waste liquid tank 1 comprises precipitation agent import and the import of developer solution waste liquid, the outlet of described waste liquid tank 1 is connected with the import of the first filtration unit 2 by connecting pipe, the top outlet of described the first filtration unit 2 is communicated with the first import of described dissolving tank 3, the lower part outlet of described the first filtration unit 2 is TMAH waste liquid outlet, the second import of described dissolving tank 3 is solvent inlet, the outlet of described dissolving tank 3 is communicated with the import of described the second filtration unit 5, the top outlet of described the second filtration unit 5 is residue outlet, the lower part outlet of described the second filtration unit 5 is communicated with the entrance of described nanofiltration device 6, the first outlet of described nanofiltration device 6 is resin outlet, the second outlet of described nanofiltration device 6 is impurity outlet, the first outlet of described nanofiltration device 6 is communicated with the entrance of described enrichment facility 7, described enrichment facility 7 comprises the outlet of photoresist resin and solvent outlet.
Further, the solvent outlet of described enrichment facility 7 is communicated with described solvent storage tank 4, and described solvent storage tank 4 is communicated with the second import of described dissolving tank 3.
Further, installation pump 9 on described connecting pipe.
In the present embodiment, waste liquid tank 1, for storing waste liquid, adds precipitation agent precipitation, and precipitation agent can select all kinds of acid as sulfuric acid, and hydrochloric acid also can be selected carbon dioxide.
The first filtration unit 2, by the solution Separation of Solid and Liquid in reservoir, liquid part can be carried out Tetramethylammonium hydroxide recovery, and gained solid is photoresist resin head product, with high purity water, rinses and removes metallic ion.
Dissolving tank 3, by gained photoresist resin head product dissolution with solvents.
The second filtration unit 5, removes undissolved solid.
Nanofiltration device 6: by nanofiltration device, small molecular weight impurity can pass through NF membrane by the solution filtering, and photoresist resin is not by obtaining purifying.
Enrichment facility 7: photoresist resin concentrate evaporation in nanofiltration device is reclaimed to solvent, obtain photoresist resin simultaneously.
In described the first filtration unit 2 and the second filtration unit 5, filter core is positioned at the middle part of filtration unit, and the top outlet of filtration unit is solid outlet, and the lower part outlet of filtration unit is liquid outlet.
As shown in Figure 1, waste liquid tank 1 receives storage Tetramethylammonium hydroxide waste liquid, wherein add the precipitation agents such as acid to make photoresist resin precipitated, by filtration unit 2, realize Separation of Solid and Liquid, gained solution can carry out Tetramethylammonium hydroxide recovery, solid is photoresist resin head product, with high purity water, rinses and removes metallic ion.Head product by adding the solvent in solvent storage tank 4, dissolves in dissolving tank 3.Solution is removed insolubless by the second filtration unit 5, and filtrate enters nanofiltration device 6, small organic molecule, metallic impurity etc. by NF membrane resin not by therefore realizing the purifying of resin.Last resin concentrated solution enters enrichment facility, reclaims solvent, is stored in solvent storage tank 4, obtains pure photoresist resin simultaneously.
Claims (3)
1. photoresist resin recycling device in a developer solution, it is characterized in that: described recycling device comprises waste liquid tank, the first filtration unit, dissolving tank, the second filtration unit, nanofiltration device and enrichment facility, described waste liquid tank comprises precipitation agent import and the import of developer solution waste liquid, the outlet of described waste liquid tank is connected with the import of the first filtration unit by connecting pipe, the top outlet of described the first filtration unit is communicated with the first import of described dissolving tank, the lower part outlet of described the first filtration unit is TMAH waste liquid outlet, the second import of described dissolving tank is solvent inlet, the outlet of described dissolving tank is communicated with the import of described the second filtration unit, the top outlet of described the second filtration unit is residue outlet, the lower part outlet of described the second filtration unit is communicated with the entrance of described nanofiltration device, the first outlet of described nanofiltration device is resin outlet, the second outlet of described nanofiltration device is impurity outlet, the first outlet of described nanofiltration device is communicated with the entrance of described enrichment facility, described enrichment facility comprises the outlet of photoresist resin and solvent outlet.
2. photoresist resin recycling device in developer solution as claimed in claim 1, is characterized in that: the solvent outlet of described enrichment facility is communicated with described solvent storage tank, and described solvent storage tank is communicated with the second import of described dissolving tank.
3. photoresist resin recycling device in developer solution as claimed in claim 1 or 2, is characterized in that: installation pump on described connecting pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320478076.6U CN203433266U (en) | 2013-08-06 | 2013-08-06 | Device for recycling photoresist resin in developing solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320478076.6U CN203433266U (en) | 2013-08-06 | 2013-08-06 | Device for recycling photoresist resin in developing solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203433266U true CN203433266U (en) | 2014-02-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201320478076.6U Expired - Lifetime CN203433266U (en) | 2013-08-06 | 2013-08-06 | Device for recycling photoresist resin in developing solution |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105314770A (en) * | 2015-12-01 | 2016-02-10 | 杭州格林达化学有限公司 | Regeneration system and method of tetramethyl ammonium hydroxide developing waste liquid |
| WO2019036936A1 (en) * | 2017-08-23 | 2019-02-28 | 深圳市柔宇科技有限公司 | Developing solution recovery system |
| CN110577290A (en) * | 2018-06-11 | 2019-12-17 | 江苏久吾高科技股份有限公司 | method and device for recycling development waste liquid |
| CN113003745A (en) * | 2021-02-24 | 2021-06-22 | 绵阳艾萨斯电子材料有限公司 | Purification and regeneration method of waste organic alkali |
| CN113009792A (en) * | 2021-03-05 | 2021-06-22 | 苏州晶洲装备科技有限公司 | Developing solution recovery device |
-
2013
- 2013-08-06 CN CN201320478076.6U patent/CN203433266U/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105314770A (en) * | 2015-12-01 | 2016-02-10 | 杭州格林达化学有限公司 | Regeneration system and method of tetramethyl ammonium hydroxide developing waste liquid |
| CN105314770B (en) * | 2015-12-01 | 2018-04-20 | 杭州格林达电子材料股份有限公司 | Tetramethylammonium hydroxide development waste liquid regenerative system and renovation process |
| WO2019036936A1 (en) * | 2017-08-23 | 2019-02-28 | 深圳市柔宇科技有限公司 | Developing solution recovery system |
| CN109791374A (en) * | 2017-08-23 | 2019-05-21 | 深圳市柔宇科技有限公司 | Developer solution recovery system |
| CN109791374B (en) * | 2017-08-23 | 2022-05-17 | 深圳市柔宇科技股份有限公司 | Developing solution recovery system |
| CN110577290A (en) * | 2018-06-11 | 2019-12-17 | 江苏久吾高科技股份有限公司 | method and device for recycling development waste liquid |
| CN113003745A (en) * | 2021-02-24 | 2021-06-22 | 绵阳艾萨斯电子材料有限公司 | Purification and regeneration method of waste organic alkali |
| CN113009792A (en) * | 2021-03-05 | 2021-06-22 | 苏州晶洲装备科技有限公司 | Developing solution recovery device |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: Hangzhou Xiaoshan Linjiang Industrial Park Red fifteen road Xiaoshan District Hangzhou 310000 Zhejiang province No. 9936 Patentee after: GREENDA CHEMICAL Co.,Ltd. Address before: 310051 Hangzhou City, Zhejiang province Xiaoshan District Linjiang Industrial Park Red fifteen East Hangzhou electrification group east gate Patentee before: HANGZHOU GREENDA CHEMICAL Co.,Ltd. |
|
| CP03 | Change of name, title or address | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140212 |
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| CX01 | Expiry of patent term |