TW200745746A - Black photosensitive composition, light shielding film produced from the same and EL device - Google Patents

Black photosensitive composition, light shielding film produced from the same and EL device

Info

Publication number
TW200745746A
TW200745746A TW096104848A TW96104848A TW200745746A TW 200745746 A TW200745746 A TW 200745746A TW 096104848 A TW096104848 A TW 096104848A TW 96104848 A TW96104848 A TW 96104848A TW 200745746 A TW200745746 A TW 200745746A
Authority
TW
Taiwan
Prior art keywords
light shielding
shielding film
photosensitive composition
black photosensitive
same
Prior art date
Application number
TW096104848A
Other languages
English (en)
Chinese (zh)
Other versions
TWI377441B (enrdf_load_stackoverflow
Inventor
Hiroyuki Ohnishi
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200745746A publication Critical patent/TW200745746A/zh
Application granted granted Critical
Publication of TWI377441B publication Critical patent/TWI377441B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Filters (AREA)
TW096104848A 2006-03-17 2007-02-09 Black photosensitive composition, light shielding film produced from the same and EL device TW200745746A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006075272A JP4745092B2 (ja) 2006-03-17 2006-03-17 黒色感光性組成物、この黒色感光性組成物より製造された遮光膜及びｅｌ素子

Publications (2)

Publication Number Publication Date
TW200745746A true TW200745746A (en) 2007-12-16
TWI377441B TWI377441B (enrdf_load_stackoverflow) 2012-11-21

Family

ID=38593380

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104848A TW200745746A (en) 2006-03-17 2007-02-09 Black photosensitive composition, light shielding film produced from the same and EL device

Country Status (4)

Country Link
JP (1) JP4745092B2 (enrdf_load_stackoverflow)
KR (1) KR20070094459A (enrdf_load_stackoverflow)
CN (1) CN101038437A (enrdf_load_stackoverflow)
TW (1) TW200745746A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4745093B2 (ja) * 2006-03-17 2011-08-10 東京応化工業株式会社 黒色感光性組成物
KR100937201B1 (ko) * 2007-11-30 2010-01-19 제일모직주식회사 흑색 감광성 수지 조성물
TWI459051B (zh) * 2012-03-01 2014-11-01 Chi Mei Corp 感光性樹脂組成物、黑色矩陣、彩色濾光片及其液晶顯示元件
KR101858766B1 (ko) * 2013-07-31 2018-05-16 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
CN106547168B (zh) * 2016-10-28 2020-09-01 深圳市华星光电技术有限公司 一种黑色矩阵材料组合物及应用
CN115466543B (zh) * 2022-10-19 2024-02-27 福斯特(安吉)新材料有限公司 光固化黑色喷墨用封装组合物、封装结构和其应用
CN116107164B (zh) * 2022-12-30 2024-02-20 浙江鑫柔科技有限公司 光刻胶组合物、金属导电图案、其制备方法及触控屏

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07100764B2 (ja) * 1990-07-03 1995-11-01 宇部興産株式会社 黒色光硬化性ポリマー組成物及び黒色の光硬化膜の形成方法
JP3346647B2 (ja) * 1993-05-12 2002-11-18 富士写真フイルム株式会社 遮光性感光性樹脂組成物および遮光性画像の形成方法
JP4302075B2 (ja) * 1997-02-28 2009-07-22 三菱化学株式会社 ブラックマトリックス形成用ブラックレジスト組成物
JP4595374B2 (ja) * 2003-04-24 2010-12-08 住友化学株式会社 黒色感光性樹脂組成物

Also Published As

Publication number Publication date
CN101038437A (zh) 2007-09-19
JP2007249045A (ja) 2007-09-27
KR20070094459A (ko) 2007-09-20
TWI377441B (enrdf_load_stackoverflow) 2012-11-21
JP4745092B2 (ja) 2011-08-10

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