TW200742853A - Analysis of a reactive gas such as silane for particle generating impurities - Google Patents

Analysis of a reactive gas such as silane for particle generating impurities

Info

Publication number
TW200742853A
TW200742853A TW096115769A TW96115769A TW200742853A TW 200742853 A TW200742853 A TW 200742853A TW 096115769 A TW096115769 A TW 096115769A TW 96115769 A TW96115769 A TW 96115769A TW 200742853 A TW200742853 A TW 200742853A
Authority
TW
Taiwan
Prior art keywords
gas
particle counter
particle
silane
analysis
Prior art date
Application number
TW096115769A
Other languages
English (en)
Inventor
Peter James Maroulis
Suhas Narayan Ketkar
Wayne Thomas Mcdermott
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of TW200742853A publication Critical patent/TW200742853A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/02—Devices for withdrawing samples
    • G01N1/22—Devices for withdrawing samples in the gaseous state
    • G01N1/2202—Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling
    • G01N1/2205—Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling with filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/02—Devices for withdrawing samples
    • G01N1/10—Devices for withdrawing samples in the liquid or fluent state
    • G01N2001/1031—Sampling from special places
    • G01N2001/105—Sampling from special places from high-pressure reactors or lines

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Molecular Biology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Biomedical Technology (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Chemical Vapour Deposition (AREA)
TW096115769A 2006-05-09 2007-05-03 Analysis of a reactive gas such as silane for particle generating impurities TW200742853A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/430,614 US20070261559A1 (en) 2006-05-09 2006-05-09 Analysis of a reactive gas such as silane for particle generating impurities

Publications (1)

Publication Number Publication Date
TW200742853A true TW200742853A (en) 2007-11-16

Family

ID=38426066

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096115769A TW200742853A (en) 2006-05-09 2007-05-03 Analysis of a reactive gas such as silane for particle generating impurities

Country Status (6)

Country Link
US (1) US20070261559A1 (zh)
EP (1) EP1854906A3 (zh)
JP (1) JP2007318122A (zh)
KR (2) KR20070109849A (zh)
CN (1) CN101071097A (zh)
TW (1) TW200742853A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8452547B2 (en) * 2010-12-29 2013-05-28 Memc Electronic Materials, Inc. Systems and methods for particle size determination and control in a fluidized bed reactor
US20120244685A1 (en) * 2011-03-24 2012-09-27 Nuflare Technology, Inc. Manufacturing Apparatus and Method for Semiconductor Device
US8414688B1 (en) * 2011-06-15 2013-04-09 Kla-Tencor Corporation Recirculation high purity system for protecting optical modules or inspection system during storage, transport and shipping
WO2016193246A1 (en) * 2015-06-05 2016-12-08 Koninklijke Philips N.V. Particle sensor and sensing method
CN107034447B (zh) * 2017-05-05 2023-09-15 宁波工程学院 一种化学气相沉积镀制金刚石膜的设备
KR200489281Y1 (ko) * 2018-03-28 2019-08-28 주식회사 인토 공정가스라인용 오염감지기
CN108562449B (zh) * 2018-04-03 2020-07-17 同济大学 一种方腔流颗粒物发生装置
CN115135982A (zh) * 2020-02-27 2022-09-30 松下知识产权经营株式会社 气体检测系统和气体检测系统的控制方法
CN112033923B (zh) * 2020-09-30 2024-06-18 佛山绿色发展创新研究院 一种氢气检测系统及其检测方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4994107A (en) * 1986-07-09 1991-02-19 California Institute Of Technology Aerosol reactor production of uniform submicron powders
JPH03241823A (ja) * 1990-02-20 1991-10-29 Fujitsu Ltd 気相反応装置
JPH0784984B2 (ja) * 1991-03-18 1995-09-13 大陽東洋酸素株式会社 フィルタを用いた低温液化ガスのパーティクル低減方法
US5395042A (en) * 1994-02-17 1995-03-07 Smart Systems International Apparatus and method for automatic climate control
KR0176152B1 (ko) * 1995-05-29 1999-04-15 김광호 반도체 장치의 제조과정에서 발생하는 오염입자의 측정장치, 측정방법 및 그 분석 방법
US5798137A (en) * 1995-06-07 1998-08-25 Advanced Silicon Materials, Inc. Method for silicon deposition
JP4667704B2 (ja) * 2002-03-27 2011-04-13 株式会社堀場製作所 薄膜堆積方法とその装置および薄膜堆積方法に用いる混合ガス供給装置
GB2415967B (en) * 2002-09-11 2006-08-02 Planar Systems Inc Precursor material delivery system for atomic layer deposition
US6936086B2 (en) * 2002-09-11 2005-08-30 Planar Systems, Inc. High conductivity particle filter
EP1688731A1 (en) * 2005-02-03 2006-08-09 Air Products and Chemicals, Inc. System and method for measurement and/or analysis of particles in gas stream

Also Published As

Publication number Publication date
EP1854906A3 (en) 2008-08-06
US20070261559A1 (en) 2007-11-15
KR20070109849A (ko) 2007-11-15
CN101071097A (zh) 2007-11-14
JP2007318122A (ja) 2007-12-06
EP1854906A2 (en) 2007-11-14
KR20100019400A (ko) 2010-02-18

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