TW200741378A - Exposure device and exposure method - Google Patents

Exposure device and exposure method

Info

Publication number
TW200741378A
TW200741378A TW096102060A TW96102060A TW200741378A TW 200741378 A TW200741378 A TW 200741378A TW 096102060 A TW096102060 A TW 096102060A TW 96102060 A TW96102060 A TW 96102060A TW 200741378 A TW200741378 A TW 200741378A
Authority
TW
Taiwan
Prior art keywords
exposure
tape
center
region
exposure stage
Prior art date
Application number
TW096102060A
Other languages
English (en)
Chinese (zh)
Other versions
TWI354188B (enrdf_load_stackoverflow
Inventor
Hitoshi Sato
Akira Nakazawa
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200741378A publication Critical patent/TW200741378A/zh
Application granted granted Critical
Publication of TWI354188B publication Critical patent/TWI354188B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW096102060A 2006-04-26 2007-01-19 Exposure device and exposure method TW200741378A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006122195 2006-04-26
JP2007002038A JP5117052B2 (ja) 2006-04-26 2007-01-10 露光装置および露光方法

Publications (2)

Publication Number Publication Date
TW200741378A true TW200741378A (en) 2007-11-01
TWI354188B TWI354188B (enrdf_load_stackoverflow) 2011-12-11

Family

ID=38850459

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102060A TW200741378A (en) 2006-04-26 2007-01-19 Exposure device and exposure method

Country Status (2)

Country Link
JP (1) JP5117052B2 (enrdf_load_stackoverflow)
TW (1) TW200741378A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5362259B2 (ja) * 2008-05-14 2013-12-11 大日本スクリーン製造株式会社 画像記録装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5853724U (ja) * 1981-10-01 1983-04-12 森田特殊機工株式会社 被処理物の吸入収納装置
JPH03282473A (ja) * 1990-03-30 1991-12-12 Ushio Inc フィルム露光装置
JP2798158B2 (ja) * 1990-10-19 1998-09-17 ウシオ電機機株式会社 フィルム露光装置
JPH09274520A (ja) * 1996-04-04 1997-10-21 Ushio Inc 帯状ワークの搬送・位置決め方法および装置
JP2001313246A (ja) * 2000-04-28 2001-11-09 Nikon Corp 露光方法及び露光装置並びにデバイスの製造方法及びデバイス
JP2003045946A (ja) * 2001-07-31 2003-02-14 Matsushita Electric Ind Co Ltd 液晶表示素子基板の吸着方法及び液晶表示素子基板の吸着装置
JP4080401B2 (ja) * 2003-09-05 2008-04-23 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP4407333B2 (ja) * 2004-03-23 2010-02-03 ウシオ電機株式会社 帯状ワークの露光装置

Also Published As

Publication number Publication date
TWI354188B (enrdf_load_stackoverflow) 2011-12-11
JP5117052B2 (ja) 2013-01-09
JP2007316588A (ja) 2007-12-06

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