TW200741328A - Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method - Google Patents
Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing methodInfo
- Publication number
- TW200741328A TW200741328A TW096112420A TW96112420A TW200741328A TW 200741328 A TW200741328 A TW 200741328A TW 096112420 A TW096112420 A TW 096112420A TW 96112420 A TW96112420 A TW 96112420A TW 200741328 A TW200741328 A TW 200741328A
- Authority
- TW
- Taiwan
- Prior art keywords
- projection
- optical system
- exposure light
- reticle
- device manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006110342A JP4784746B2 (ja) | 2006-04-12 | 2006-04-12 | 照明光学装置、投影露光装置、投影光学系、及びデバイス製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200741328A true TW200741328A (en) | 2007-11-01 |
Family
ID=38158055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096112420A TW200741328A (en) | 2006-04-12 | 2007-04-10 | Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2005253A1 (ko) |
JP (1) | JP4784746B2 (ko) |
KR (1) | KR20090019782A (ko) |
TW (1) | TW200741328A (ko) |
WO (1) | WO2007119839A1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI651602B (zh) * | 2017-01-18 | 2019-02-21 | 日商佳能股份有限公司 | 評價方法、物品製造方法及評價程式 |
TWI736303B (zh) * | 2019-06-05 | 2021-08-11 | 美商應用材料股份有限公司 | 用於平坦光學裝置的孔 |
CN113805439A (zh) * | 2021-09-23 | 2021-12-17 | 上海度宁科技有限公司 | 一种投影光刻机、照明系统、控制系统及方法 |
US11982824B2 (en) | 2020-07-20 | 2024-05-14 | Applied Materials, Inc. | Integrated conductive apertures for optical devices |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090033165A (ko) * | 2006-07-12 | 2009-04-01 | 가부시키가이샤 니콘 | 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법 |
JPWO2008007632A1 (ja) * | 2006-07-12 | 2009-12-10 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
DE102006032810A1 (de) | 2006-07-14 | 2008-01-17 | Carl Zeiss Smt Ag | Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement |
JP5308638B2 (ja) * | 2006-07-14 | 2013-10-09 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置用の照明光学系 |
JP4883482B2 (ja) * | 2006-08-18 | 2012-02-22 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
US8384875B2 (en) | 2008-09-29 | 2013-02-26 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
JP5187519B2 (ja) * | 2008-12-10 | 2013-04-24 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
US8610878B2 (en) | 2010-03-04 | 2013-12-17 | Asml Netherlands B.V. | Lithographic apparatus and method |
US9081297B2 (en) | 2012-05-01 | 2015-07-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography apparatus having dual reticle edge masking assemblies and method of use |
JP6114952B2 (ja) * | 2013-01-17 | 2017-04-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | リソグラフィによって感光性表面にパターンを転写する方法およびマイクロリソグラフィ投影露光装置の照明システム |
US11175487B2 (en) * | 2017-06-19 | 2021-11-16 | Suss Microtec Photonic Systems Inc. | Optical distortion reduction in projection systems |
WO2021186697A1 (ja) * | 2020-03-19 | 2021-09-23 | ギガフォトン株式会社 | 露光システム及び電子デバイスの製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11111601A (ja) * | 1997-10-06 | 1999-04-23 | Nikon Corp | 露光方法及び装置 |
JP2000021748A (ja) * | 1998-06-30 | 2000-01-21 | Canon Inc | 露光方法および露光装置 |
JP2000021742A (ja) * | 1998-06-30 | 2000-01-21 | Canon Inc | 露光方法および露光装置 |
JP3969855B2 (ja) * | 1998-07-02 | 2007-09-05 | キヤノン株式会社 | 露光方法および露光装置 |
JP2000021765A (ja) | 1998-07-03 | 2000-01-21 | Nikon Corp | 照明装置及びそれを用いた投影露光装置 |
JP2000031028A (ja) * | 1998-07-07 | 2000-01-28 | Canon Inc | 露光方法および露光装置 |
JP2001297976A (ja) * | 2000-04-17 | 2001-10-26 | Canon Inc | 露光方法及び露光装置 |
JP4323903B2 (ja) * | 2003-09-12 | 2009-09-02 | キヤノン株式会社 | 照明光学系及びそれを用いた露光装置 |
-
2006
- 2006-04-12 JP JP2006110342A patent/JP4784746B2/ja not_active Expired - Fee Related
-
2007
- 2007-04-10 TW TW096112420A patent/TW200741328A/zh unknown
- 2007-04-10 WO PCT/JP2007/058223 patent/WO2007119839A1/en active Application Filing
- 2007-04-10 EP EP07741659A patent/EP2005253A1/en not_active Withdrawn
- 2007-04-10 KR KR1020087027735A patent/KR20090019782A/ko not_active Application Discontinuation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI651602B (zh) * | 2017-01-18 | 2019-02-21 | 日商佳能股份有限公司 | 評價方法、物品製造方法及評價程式 |
TWI736303B (zh) * | 2019-06-05 | 2021-08-11 | 美商應用材料股份有限公司 | 用於平坦光學裝置的孔 |
US11982824B2 (en) | 2020-07-20 | 2024-05-14 | Applied Materials, Inc. | Integrated conductive apertures for optical devices |
CN113805439A (zh) * | 2021-09-23 | 2021-12-17 | 上海度宁科技有限公司 | 一种投影光刻机、照明系统、控制系统及方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2005253A1 (en) | 2008-12-24 |
WO2007119839A1 (en) | 2007-10-25 |
KR20090019782A (ko) | 2009-02-25 |
JP4784746B2 (ja) | 2011-10-05 |
JP2007287760A (ja) | 2007-11-01 |
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