TW200741328A - Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method - Google Patents

Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method

Info

Publication number
TW200741328A
TW200741328A TW096112420A TW96112420A TW200741328A TW 200741328 A TW200741328 A TW 200741328A TW 096112420 A TW096112420 A TW 096112420A TW 96112420 A TW96112420 A TW 96112420A TW 200741328 A TW200741328 A TW 200741328A
Authority
TW
Taiwan
Prior art keywords
projection
optical system
exposure light
reticle
device manufacturing
Prior art date
Application number
TW096112420A
Other languages
English (en)
Chinese (zh)
Inventor
Michio Noboru
Naomasa Shiraishi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200741328A publication Critical patent/TW200741328A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW096112420A 2006-04-12 2007-04-10 Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method TW200741328A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006110342A JP4784746B2 (ja) 2006-04-12 2006-04-12 照明光学装置、投影露光装置、投影光学系、及びデバイス製造方法

Publications (1)

Publication Number Publication Date
TW200741328A true TW200741328A (en) 2007-11-01

Family

ID=38158055

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096112420A TW200741328A (en) 2006-04-12 2007-04-10 Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method

Country Status (5)

Country Link
EP (1) EP2005253A1 (fr)
JP (1) JP4784746B2 (fr)
KR (1) KR20090019782A (fr)
TW (1) TW200741328A (fr)
WO (1) WO2007119839A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI651602B (zh) * 2017-01-18 2019-02-21 日商佳能股份有限公司 評價方法、物品製造方法及評價程式
TWI736303B (zh) * 2019-06-05 2021-08-11 美商應用材料股份有限公司 用於平坦光學裝置的孔
CN113805439A (zh) * 2021-09-23 2021-12-17 上海度宁科技有限公司 一种投影光刻机、照明系统、控制系统及方法
US11982824B2 (en) 2020-07-20 2024-05-14 Applied Materials, Inc. Integrated conductive apertures for optical devices

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090033165A (ko) * 2006-07-12 2009-04-01 가부시키가이샤 니콘 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법
JPWO2008007632A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
DE102006032810A1 (de) 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
JP5308638B2 (ja) * 2006-07-14 2013-10-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置用の照明光学系
JP4883482B2 (ja) * 2006-08-18 2012-02-22 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP5187519B2 (ja) * 2008-12-10 2013-04-24 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US8610878B2 (en) 2010-03-04 2013-12-17 Asml Netherlands B.V. Lithographic apparatus and method
US9081297B2 (en) 2012-05-01 2015-07-14 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography apparatus having dual reticle edge masking assemblies and method of use
JP6114952B2 (ja) * 2013-01-17 2017-04-19 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィによって感光性表面にパターンを転写する方法およびマイクロリソグラフィ投影露光装置の照明システム
US11175487B2 (en) * 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems
WO2021186697A1 (fr) * 2020-03-19 2021-09-23 ギガフォトン株式会社 Système d'exposition et procédé de fabrication de dispositif électronique

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11111601A (ja) * 1997-10-06 1999-04-23 Nikon Corp 露光方法及び装置
JP2000021748A (ja) * 1998-06-30 2000-01-21 Canon Inc 露光方法および露光装置
JP2000021742A (ja) * 1998-06-30 2000-01-21 Canon Inc 露光方法および露光装置
JP3969855B2 (ja) * 1998-07-02 2007-09-05 キヤノン株式会社 露光方法および露光装置
JP2000021765A (ja) 1998-07-03 2000-01-21 Nikon Corp 照明装置及びそれを用いた投影露光装置
JP2000031028A (ja) * 1998-07-07 2000-01-28 Canon Inc 露光方法および露光装置
JP2001297976A (ja) * 2000-04-17 2001-10-26 Canon Inc 露光方法及び露光装置
JP4323903B2 (ja) * 2003-09-12 2009-09-02 キヤノン株式会社 照明光学系及びそれを用いた露光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI651602B (zh) * 2017-01-18 2019-02-21 日商佳能股份有限公司 評價方法、物品製造方法及評價程式
TWI736303B (zh) * 2019-06-05 2021-08-11 美商應用材料股份有限公司 用於平坦光學裝置的孔
US11982824B2 (en) 2020-07-20 2024-05-14 Applied Materials, Inc. Integrated conductive apertures for optical devices
CN113805439A (zh) * 2021-09-23 2021-12-17 上海度宁科技有限公司 一种投影光刻机、照明系统、控制系统及方法

Also Published As

Publication number Publication date
EP2005253A1 (fr) 2008-12-24
WO2007119839A1 (fr) 2007-10-25
KR20090019782A (ko) 2009-02-25
JP4784746B2 (ja) 2011-10-05
JP2007287760A (ja) 2007-11-01

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