TW200741277A - Holding device and exposure apparatus using the same - Google Patents

Holding device and exposure apparatus using the same

Info

Publication number
TW200741277A
TW200741277A TW096102534A TW96102534A TW200741277A TW 200741277 A TW200741277 A TW 200741277A TW 096102534 A TW096102534 A TW 096102534A TW 96102534 A TW96102534 A TW 96102534A TW 200741277 A TW200741277 A TW 200741277A
Authority
TW
Taiwan
Prior art keywords
shaped protrusions
holding device
disposed
same
exposure apparatus
Prior art date
Application number
TW096102534A
Other languages
English (en)
Inventor
Ryota Makino
Yukio Takabayashi
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200741277A publication Critical patent/TW200741277A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096102534A 2006-01-24 2007-01-23 Holding device and exposure apparatus using the same TW200741277A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006014640A JP2007200958A (ja) 2006-01-24 2006-01-24 保持装置およびそれを用いた露光装置

Publications (1)

Publication Number Publication Date
TW200741277A true TW200741277A (en) 2007-11-01

Family

ID=38321841

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102534A TW200741277A (en) 2006-01-24 2007-01-23 Holding device and exposure apparatus using the same

Country Status (4)

Country Link
US (1) US7352520B2 (zh)
JP (1) JP2007200958A (zh)
KR (1) KR20070077789A (zh)
TW (1) TW200741277A (zh)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007200958A (ja) 2006-01-24 2007-08-09 Canon Inc 保持装置およびそれを用いた露光装置
US7859772B2 (en) * 2006-06-13 2010-12-28 Panasonic Corporation Composite optical element and method for manufacturing the same
WO2010027790A2 (en) * 2008-08-26 2010-03-11 Advanced Machine Technologies, Llc Apparatus for forming a kinematic coupling and related methods
EP2415235A1 (en) * 2009-03-30 2012-02-08 GE Healthcare Bio-Sciences AB Holder for a holographic grating
JP5506473B2 (ja) * 2010-03-12 2014-05-28 キヤノン株式会社 保持装置、光学装置及び望遠鏡
DE102010028941B4 (de) 2010-05-12 2012-03-22 Carl Zeiss Smt Gmbh Vorrichtung für eine optische Anordnung und Verfahren zum Positionieren eines optischen Elements einer optischen Anordnung
US8651677B2 (en) * 2010-06-28 2014-02-18 Lexmark International, Inc. Mounting mechanism for a component of an imaging apparatus, and methods of making and using same
NL2007392C2 (en) * 2011-09-12 2013-03-13 Mapper Lithography Ip Bv Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly.
US9435626B2 (en) 2011-08-12 2016-09-06 Corning Incorporated Kinematic fixture for transparent part metrology
TW201312297A (zh) 2011-09-12 2013-03-16 Mapper Lithography Ip Bv 用於提供二個或以上模組之調準堆疊之組件以及包含此組件之微影系統或顯微系統
US10151423B2 (en) * 2013-04-04 2018-12-11 Ben Shelef Kinematic mount
JP2016109740A (ja) * 2014-12-02 2016-06-20 オリンパス株式会社 レンズ鏡筒
US10211589B2 (en) 2015-04-20 2019-02-19 Mitsubishi Electric Corporation Laser apparatus and extreme ultraviolet light generation apparatus
JP7090464B2 (ja) * 2018-04-26 2022-06-24 キヤノン株式会社 保持装置および光学装置
CN110955058B (zh) * 2019-12-17 2021-08-10 中国工程物理研究院应用电子学研究所 一种三自由度应力释放器
CN110955038A (zh) * 2019-12-27 2020-04-03 北京卓立汉光仪器有限公司 一种显微光路激光耦合重复定位装置
DE102023201840A1 (de) 2023-03-01 2024-02-22 Carl Zeiss Smt Gmbh Baugruppe für die Halbleitertechnik und Projektionsbelichtungsanlage

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6443320A (en) * 1987-08-12 1989-02-15 Nippon Systemation Eng Filter
DE4133037C2 (de) * 1990-10-05 1999-07-22 Canon Kk Belichtungsvorrichtung
JP4115605B2 (ja) 1998-10-01 2008-07-09 日本電産トーソク株式会社 リードフレーム搬送装置
JP2000292669A (ja) * 1999-04-09 2000-10-20 Nikon Corp 支持装置
US6809802B1 (en) * 1999-08-19 2004-10-26 Canon Kabushiki Kaisha Substrate attracting and holding system for use in exposure apparatus
JP2003059797A (ja) * 2001-08-09 2003-02-28 Canon Inc 移動装置、ステージ装置及び露光装置
JP2004078209A (ja) * 2002-07-31 2004-03-11 Canon Inc 保持装置、露光装置及びデバイス製造方法
CN100462762C (zh) 2002-07-31 2009-02-18 佳能株式会社 保持器,曝光装置及设备的制造方法
US6997512B1 (en) * 2004-12-23 2006-02-14 Ming-Ming Yu 360 degree swivel cushion for bathroom use
JP2007200958A (ja) 2006-01-24 2007-08-09 Canon Inc 保持装置およびそれを用いた露光装置

Also Published As

Publication number Publication date
US7352520B2 (en) 2008-04-01
JP2007200958A (ja) 2007-08-09
KR20070077789A (ko) 2007-07-27
US20070177282A1 (en) 2007-08-02

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