TW200739701A - Apparatus and method for processing substrate and recording medium - Google Patents
Apparatus and method for processing substrate and recording mediumInfo
- Publication number
- TW200739701A TW200739701A TW095141331A TW95141331A TW200739701A TW 200739701 A TW200739701 A TW 200739701A TW 095141331 A TW095141331 A TW 095141331A TW 95141331 A TW95141331 A TW 95141331A TW 200739701 A TW200739701 A TW 200739701A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- processing
- state
- mounting stand
- recording medium
- Prior art date
Links
Classifications
-
- H10P72/0452—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/791—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions
- H10D30/797—Arrangements for exerting mechanical stress on the crystal lattice of the channel regions being in source or drain regions, e.g. SiGe source or drain
-
- H10P50/242—
-
- H10P72/0434—
-
- H10P72/0478—
-
- H10P72/7614—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/027—Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs
- H10D30/0275—Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs forming single crystalline semiconductor source or drain regions resulting in recessed gates, e.g. forming raised source or drain regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/01—Manufacture or treatment
- H10D62/021—Forming source or drain recesses by etching e.g. recessing by etching and then refilling
Landscapes
- Drying Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005323329A JP4976002B2 (ja) | 2005-11-08 | 2005-11-08 | 基板処理装置，基板処理方法及び記録媒体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200739701A true TW200739701A (en) | 2007-10-16 |
| TWI313893B TWI313893B (enExample) | 2009-08-21 |
Family
ID=38023193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095141331A TW200739701A (en) | 2005-11-08 | 2006-11-08 | Apparatus and method for processing substrate and recording medium |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4976002B2 (enExample) |
| TW (1) | TW200739701A (enExample) |
| WO (1) | WO2007055190A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5478280B2 (ja) * | 2010-01-27 | 2014-04-23 | 東京エレクトロン株式会社 | 基板加熱装置および基板加熱方法、ならびに基板処理システム |
| JP6400361B2 (ja) | 2014-07-16 | 2018-10-03 | 東京エレクトロン株式会社 | 基板洗浄方法、基板処理方法、基板処理システム、および半導体装置の製造方法 |
| JP6692202B2 (ja) * | 2016-04-08 | 2020-05-13 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| JP7145019B2 (ja) * | 2018-09-19 | 2022-09-30 | 株式会社Ｓｃｒｅｅｎホールディングス | レシピ変換方法、レシピ変換プログラム、レシピ変換装置および基板処理システム |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4124543B2 (ja) * | 1998-11-11 | 2008-07-23 | 東京エレクトロン株式会社 | 表面処理方法及びその装置 |
| JP2004128019A (ja) * | 2002-09-30 | 2004-04-22 | Applied Materials Inc | プラズマ処理方法及び装置 |
| JP4039385B2 (ja) * | 2003-04-22 | 2008-01-30 | 東京エレクトロン株式会社 | ケミカル酸化膜の除去方法 |
-
2005
- 2005-11-08 JP JP2005323329A patent/JP4976002B2/ja not_active Expired - Lifetime
-
2006
- 2006-11-07 WO PCT/JP2006/322155 patent/WO2007055190A1/ja not_active Ceased
- 2006-11-08 TW TW095141331A patent/TW200739701A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007134379A (ja) | 2007-05-31 |
| JP4976002B2 (ja) | 2012-07-18 |
| TWI313893B (enExample) | 2009-08-21 |
| WO2007055190A1 (ja) | 2007-05-18 |
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