TW200735727A - Plasma treatment apparatus, matching box, impedance matching device, and coupler - Google Patents
Plasma treatment apparatus, matching box, impedance matching device, and couplerInfo
- Publication number
- TW200735727A TW200735727A TW096120782A TW96120782A TW200735727A TW 200735727 A TW200735727 A TW 200735727A TW 096120782 A TW096120782 A TW 096120782A TW 96120782 A TW96120782 A TW 96120782A TW 200735727 A TW200735727 A TW 200735727A
- Authority
- TW
- Taiwan
- Prior art keywords
- power feeding
- feeding bar
- contact device
- matching box
- insertion hole
- Prior art date
Links
- 238000009832 plasma treatment Methods 0.000 title 1
- 230000037431 insertion Effects 0.000 abstract 5
- 238000003780 insertion Methods 0.000 abstract 5
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- 230000005611 electricity Effects 0.000 abstract 1
- 230000001939 inductive effect Effects 0.000 abstract 1
- 239000012774 insulation material Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001380183A JP4488662B2 (ja) | 2001-12-13 | 2001-12-13 | プラズマ処理装置、マッチングボックス |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200735727A true TW200735727A (en) | 2007-09-16 |
TWI301039B TWI301039B (zh) | 2008-09-11 |
Family
ID=19187109
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096120782A TW200735727A (en) | 2001-12-13 | 2002-12-13 | Plasma treatment apparatus, matching box, impedance matching device, and coupler |
TW091136099A TWI290811B (en) | 2001-12-13 | 2002-12-13 | Plasma processing apparatus, matching box, impedance integrator and coupler |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091136099A TWI290811B (en) | 2001-12-13 | 2002-12-13 | Plasma processing apparatus, matching box, impedance integrator and coupler |
Country Status (6)
Country | Link |
---|---|
US (1) | US7025857B2 (zh) |
JP (1) | JP4488662B2 (zh) |
KR (1) | KR100625762B1 (zh) |
AU (1) | AU2002354234A1 (zh) |
TW (2) | TW200735727A (zh) |
WO (1) | WO2003054940A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6939434B2 (en) * | 2000-08-11 | 2005-09-06 | Applied Materials, Inc. | Externally excited torroidal plasma source with magnetic control of ion distribution |
KR100470224B1 (ko) * | 2002-02-05 | 2005-02-05 | 주성엔지니어링(주) | 매칭박스 고정장치를 가지는 척 |
JP2006339144A (ja) * | 2005-05-31 | 2006-12-14 | Ngk Insulators Ltd | プラズマ処理装置 |
JP2007191792A (ja) * | 2006-01-19 | 2007-08-02 | Atto Co Ltd | ガス分離型シャワーヘッド |
US8920597B2 (en) | 2010-08-20 | 2014-12-30 | Applied Materials, Inc. | Symmetric VHF source for a plasma reactor |
US9032012B2 (en) * | 2011-06-27 | 2015-05-12 | International Business Machines Corporation | Configurable pacing for messaging systems |
JP2013098177A (ja) * | 2011-10-31 | 2013-05-20 | Semes Co Ltd | 基板処理装置及びインピーダンスマッチング方法 |
US9132436B2 (en) * | 2012-09-21 | 2015-09-15 | Applied Materials, Inc. | Chemical control features in wafer process equipment |
KR101605722B1 (ko) * | 2014-08-29 | 2016-03-23 | 세메스 주식회사 | 피더 및 기판 처리 장치 |
KR101864821B1 (ko) * | 2017-11-16 | 2018-06-05 | 전북대학교산학협력단 | 태양전지 보호 기판 코팅용 플라즈마 표면처리 장치 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3122618B2 (ja) * | 1996-08-23 | 2001-01-09 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JPH11330058A (ja) * | 1998-05-19 | 1999-11-30 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2001262355A (ja) * | 2000-03-16 | 2001-09-26 | Applied Materials Inc | プラズマcvd装置およびその異常検出方法 |
TW529085B (en) * | 2000-09-22 | 2003-04-21 | Alps Electric Co Ltd | Method for evaluating performance of plasma treatment apparatus or performance confirming system of plasma treatment system |
JP3559760B2 (ja) * | 2000-09-26 | 2004-09-02 | 株式会社日立製作所 | プラズマ処理装置及びそのメンテナンス方法 |
JP4798834B2 (ja) * | 2000-10-25 | 2011-10-19 | アプライド マテリアルズ インコーポレイテッド | ドライエッチング装置 |
-
2001
- 2001-12-13 JP JP2001380183A patent/JP4488662B2/ja not_active Expired - Fee Related
-
2002
- 2002-12-13 WO PCT/JP2002/013094 patent/WO2003054940A1/ja active Application Filing
- 2002-12-13 TW TW096120782A patent/TW200735727A/zh not_active IP Right Cessation
- 2002-12-13 TW TW091136099A patent/TWI290811B/zh not_active IP Right Cessation
- 2002-12-13 KR KR1020047009011A patent/KR100625762B1/ko not_active IP Right Cessation
- 2002-12-13 AU AU2002354234A patent/AU2002354234A1/en not_active Abandoned
- 2002-12-13 US US10/498,222 patent/US7025857B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2003178988A (ja) | 2003-06-27 |
TW200304764A (en) | 2003-10-01 |
KR100625762B1 (ko) | 2006-09-21 |
TWI301039B (zh) | 2008-09-11 |
US7025857B2 (en) | 2006-04-11 |
US20050011450A1 (en) | 2005-01-20 |
KR20040065248A (ko) | 2004-07-21 |
TWI290811B (en) | 2007-12-01 |
JP4488662B2 (ja) | 2010-06-23 |
AU2002354234A1 (en) | 2003-07-09 |
WO2003054940A1 (fr) | 2003-07-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |