TW200734253A - Photomask substrate container unit, photomask substrate conveying method, photomask product manufacturing method, and photomask exposure/transfer method - Google Patents

Photomask substrate container unit, photomask substrate conveying method, photomask product manufacturing method, and photomask exposure/transfer method

Info

Publication number
TW200734253A
TW200734253A TW096102928A TW96102928A TW200734253A TW 200734253 A TW200734253 A TW 200734253A TW 096102928 A TW096102928 A TW 096102928A TW 96102928 A TW96102928 A TW 96102928A TW 200734253 A TW200734253 A TW 200734253A
Authority
TW
Taiwan
Prior art keywords
photomask
photomask substrate
container unit
substrate container
exposure
Prior art date
Application number
TW096102928A
Other languages
Chinese (zh)
Other versions
TWI337161B (en
Inventor
Michiaki Sano
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200734253A publication Critical patent/TW200734253A/en
Application granted granted Critical
Publication of TWI337161B publication Critical patent/TWI337161B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
    • B65D85/48—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

A photomask substrate container unit according to this invention is for conveying and/or storing a photomask substrate and comprises a housing for receiving therein the photomask substrate and holding members for holding the photomask substrate in an inclined posture at a predetermined inclination angle. The photomask substrate container unit can be reduced in height as compared with a longitudinal-type photomask substrate container unit adapted to hold the photomask substrate vertically. Thus, not only the conveyance/storage of the photomask substrate container unit can be facilitated, but also it is possible to avoid the disadvantage that the transportation method is limited.
TW096102928A 2006-01-31 2007-01-26 Photomask substrate container unit, photomask substrate conveying method, photomask product manufacturing method, and photomask exposure/transfer method TWI337161B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006023289 2006-01-31

Publications (2)

Publication Number Publication Date
TW200734253A true TW200734253A (en) 2007-09-16
TWI337161B TWI337161B (en) 2011-02-11

Family

ID=38599765

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102928A TWI337161B (en) 2006-01-31 2007-01-26 Photomask substrate container unit, photomask substrate conveying method, photomask product manufacturing method, and photomask exposure/transfer method

Country Status (3)

Country Link
KR (1) KR100985260B1 (en)
CN (1) CN101013270B (en)
TW (1) TWI337161B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI743169B (en) * 2016-09-09 2021-10-21 日商大福股份有限公司 Article transport device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011126546A (en) * 2009-12-15 2011-06-30 Shin-Etsu Chemical Co Ltd Case for conveying glass substrate and cart for conveying glass substrate
JP2011203309A (en) * 2010-03-24 2011-10-13 Shin-Etsu Chemical Co Ltd Pellicle storage container and truck for conveying pellicle storage container
KR102229465B1 (en) * 2019-03-20 2021-03-18 이현만 Board case carrying case supporting the pedestal

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000031257A (en) * 1998-07-07 2000-01-28 Nikon Corp Container of substrate for manufacturing semiconductor device
JP4251290B2 (en) * 2003-10-09 2009-04-08 旭硝子株式会社 Glass plate packing box, packing method and unpacking method
JP4476727B2 (en) * 2003-11-18 2010-06-09 株式会社 ネットプラスチック Large precision sheet-shaped (semi) sealed container for products
JP2005320050A (en) * 2004-05-11 2005-11-17 Kyokuhei Glass Kako Kk Cassette-housing type glass board transfer box

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI743169B (en) * 2016-09-09 2021-10-21 日商大福股份有限公司 Article transport device

Also Published As

Publication number Publication date
TWI337161B (en) 2011-02-11
CN101013270A (en) 2007-08-08
KR100985260B1 (en) 2010-10-04
CN101013270B (en) 2010-12-15
KR20070079003A (en) 2007-08-03

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees