1337161 九、發明說明： 【發明所屬之技術領域】 本發明係關於針對傳送及/或儲存一光罩基板之一光 罩基板容器裝置，並且特別地是，關於用於製造液晶顯示 面板（LCDPs)、電漿顯示面板（PDPs)或其類似物之一種適合 傳送及/歲儲存一大尺寸光罩基板之光罩基板容器裝置。 更進一步地是，本發明係關於可用在該光罩基板容器 裝置之一種光罩基板傳送方法，一種光罩產品製造方法， 以及一種光罩曝光/傳送方法。 【先前技術】 在近幾年中，在顯示面板如LCD Ps與PDPs之製造中 以增加每一面板主基板（panel mother substrate)上之面板數 量來作爲降低製造成本之技術變得普遍，並因而有面板主 基板之尺寸增加的趨勢。其次，在顯示面板如LC DPs與PDPs 之製造中，用在圖案傳送之光罩基板也有增加尺寸的傾 向。當傳送此大尺寸光罩基板至訂貨者時，該光罩基板係 逐一個別地（即一對一對應）放置於光罩盒（photomask cases) 中，並運載至一貨車或其類似物中。 依照每個適合用來接收一大尺寸光罩基板於其中之傳 統光罩盒，已知有縱向型與橫向型，例如，專利文件1 (曰 本未審査專利申請案公告號（】P-A)第2005 - 1 1 5033號）揭露 一橫向型光罩盒（光罩基板容器），當該盒橫放時，該橫向 型光罩盒具有實行配置、傳送、取出光罩基板等優點，但 是，由於其占有很大的地面面積，因而增加傳送費用與儲 存費用之問題。 1337161 第1圖係傳統具有腳輪（casters)之縱向型光罩盒之透 視圖，第2圖係從第1圖所示之光罩盒之側面看過去之斷 面圖，以及第3圖係第1圖所示之光罩盒之內部前視圖。 此等圖式中所示之光罩盒100包含一用以接收光罩基 板K於其中之殻體101，以及於該殻體101內部用以保持 該光罩基板K之保持部件（之後說明）之圖示。 該殼體101包含一外部箱（outer box)103，該光罩基板 K可通過一接收開口 102以放入與取出，一蓋（lid)104，用 以打開與關閉該接收開口 1 02，以及複數個腳輪1 05，提供 於該外部箱1 03之底部外側上，介於該外部箱1 03與該蓋 1 04之間可提供複數個連結部分1 08以將該些部件連結在 一起。 如該些保持部件，可於該外部箱1 03內側，提供四個 保持部件106，用以保持矩形光罩基板K之四個角部，以 及複數個末端表面加壓器（pressers)107，用以在其四個側面 上加壓該光罩基板K之末端表面。請注意第3圖省略說明 保持部件106與外部箱103之間以及末端表面加壓器107 與外部箱1 0 3之間的關係。 在此，將利用前述光罩盒100來說明光罩基板K之配 置、傳送與取出。 該光罩基板K 一般可於製造廠之潔淨室（Clean room)放 置於光罩盒100中，此操作可在該光罩盒100橫放時，藉 由打開該蓋104,通過該接收開口 102以放置該光罩基板K 至外部箱中103,並接著藉由保持部106保持其四個角部並 藉由末端表面加壓器107以加壓其末端表面來執行》 1337161 ί> 在關閉該蓋104之後，放置 罩盒100可從橫向狀態（lateral (longitudinal posture)，並帶至潔 該光罩盒100可輕易地藉由腳輪 該放置光罩基板K於其中之 擇一傳送方法如陸地傳送，空中 傳送方法而傳送至訂貨者，在此 1 〇〇於縱向狀態，可降低占用之地 費用。 該傳送光罩基板K 一般可於 操作可在當光罩盒100橫放於打 表面加壓器1 0 7之加壓之後執行 然而，當使用縱向型光罩盒 K時，由於該光罩盒變高，而可 線，並因而使光罩盒之傳送變得 傳送方法。 再者，由於縱向型光罩盒隨 增加縱橫比（aspect ratio)之問題 再者，由於縱向型光罩盒主 表面，故負載可能集中於一支撐 保持部上，因而會破壞該光罩基 再者，當該盒於縱向狀態時 其不能將光罩基板放入與取出， 基板時，需要操作從該縱向狀態 以及從橫向狀態立起光罩盒至縱 光罩基板K於其中之該光 posture)立起至縱向狀態 爭室之外部。在此情況下， 105之使用來移動。 光罩盒100可藉由適當選 傳送，航海傳送或類似之 情況下，藉由放置光罩盒 面面積並因而可降低傳送 工廠之潔淨室中取出，此 開該蓋104並鬆開由末端 〇 而傳送該大尺寸光罩基板 能會被光罩盒遮住前方視 困難，且更甚者，會限制 著光罩基板之尺寸增加而 ，因此其容易倒下。 要支撐光罩基板於其末端 該光罩基板低末端表面之 板之低末端側面。 ，由於縱向型光罩盒會使 因此在放置與取出該光罩 放下光罩盒至橫向狀態， 向狀態。若此操作係由單 1337161 一工作者來執行時，可能會發生該光罩盒在操作 地倒下’並因此需要複數個工作者。 本發明可在這些情況下製造並具有一提供一 容器裝置之目的，該容器裝置不僅可輕易傳送， 預防於傳送期間倒下，甚至可放置大尺寸光罩 中’並可更進一步預防由於負載集中而造成之光 破損。 在此說明書中，一光罩基板涵蓋一光罩玻璃 空白光罩（photomask blank)，一光罩或其類似物。 【發明內容】 爲實現上述目的，依據本發明之一光罩基板 可用以傳送及/或儲存一光罩基板，其包含一殼體 收該光罩基板於其中，以及一保持部件，用以保 基板以一預定傾斜角度於一傾斜狀態。在此架構 可適用以垂直地保持該光罩基板之縱向型光罩基 置相比，該光罩基板容器裝置更可降低高度。因 可幫助該光罩基板容器裝置傳送/儲存，而且也更 送方法被限制之缺失。再者，由於可降低該光罩 裝置之縱橫比，因此可預防傳送期間倒下。再者 支撐光罩基板之末端表面與背表面，因此可分散 板之支撐負載•以預防光罩基板之破損。 依據本發明之光罩基板容器裝置中’該光罩 斜角度相對於水平軸可較佳地設爲45到80度， 下，該光罩基板容器裝置之高度、其縱橫比與其 面積（基部面積）可設定爲良好的平衡。 期間意外 光罩基板 而且也可 基板於其 罩基板之 基板，一 容器裝置 ，用以接 持該光罩 下，與一 板容器裝 此，不僅 可避免傳 基板容器 ，由於可 該光罩基 基板之傾 在此架構 佔用地面 1337161 依據本發明之光罩基板容器裝置中，該保持部件可較 佳地提供在殼體內部並保持該光罩基板於該殼體之內部， 在此架構下，由於在放入與取出光罩基板時不需橫放或立 起該光罩基板容器裝置，故對於該光罩基板可簡化其放入 與取出之操作。 依據本發明之光罩基板容器裝置，該保持部件可較佳 地包含一放置部件，用以暫時地接收該光罩基板於其上， 以及一末端表面加壓器，用以加壓光罩基板之末端表面以 放置於該放置部件上。在此架構下，由於光罩基板可被暫 時地放置，因此相對於光罩基板容器裝置來說，可幫助該 光罩基板之包含（containment)。更甚者，藉由末端表面加壓 器來加壓光罩基板之末端表面，其可沿著光罩基板之主表 面而抑制光罩基板之振動，藉以預防摩擦所導致之粉末的 產生。 依據本發明之光罩基板容器裝置，該保持部件更可包 含一主表面加壓器以加壓光罩基板之主表面，在此架構 下，藉由主表面加壓器來加壓光罩基板之主表面，其可抑 制垂直於光罩基板之主表面方向中之振動，藉以預防摩擦 所導致之粉末的產生。 依據本發明之光罩基板容器裝置，該殼體包含一外部 箱（outer box)與一蓋（lid)以形成一接收開口，該用以放入與 取出該光罩基板之接收開口，可形成爲延伸至該外部箱之 一上表面，一前表面，與二側表面上。在此，該接收開口 可從一側表面觀點相對於外部箱而傾斜形成，並且其中之 傾斜角度可實質上與由保持部件所保持之光罩基板之傾斜 13371611337161 IX. Description of the Invention: TECHNICAL FIELD The present invention relates to a reticle substrate container device for transporting and/or storing a reticle substrate, and in particular, for manufacturing liquid crystal display panels (LCDPs) A reticle substrate container device suitable for transporting and storing a large-sized reticle substrate, a plasma display panel (PDPs) or the like. Furthermore, the present invention relates to a reticle substrate transfer method usable in the reticle substrate container device, a reticle product manufacturing method, and a reticle exposure/transfer method. [Prior Art] In recent years, in the manufacture of display panels such as LCD Ps and PDPs, it has become common to increase the number of panels on each panel mother substrate as a technique for reducing manufacturing costs, and thus There is a tendency for the size of the main substrate of the panel to increase. Secondly, in the manufacture of display panels such as LC DPs and PDPs, the reticle substrate used for pattern transfer also has an increased size. When the large-sized reticle substrate is transported to the orderer, the reticle substrates are placed one by one (i.e., one-to-one correspondence) in photomask cases and carried into a truck or the like. According to each conventional photomask case suitable for receiving a large-sized photomask substrate therein, a vertical type and a horizontal type are known, for example, Patent Document 1 (Unexamined Patent Application Publication No. (PA)) 2005 - 1 1 5033) discloses a lateral type mask case (mask substrate container), which has the advantages of performing configuration, transferring, and removing the mask substrate when the box is placed horizontally, but It occupies a large floor area, thus increasing the cost of transmission and storage. 1337161 Fig. 1 is a perspective view of a conventional longitudinal type mask case with casters, and Fig. 2 is a cross-sectional view from the side of the mask case shown in Fig. 1, and Fig. 3 Figure 1 shows the inside front view of the mask box. The photomask case 100 shown in the drawings includes a housing 101 for receiving the mask substrate K therein, and a holding member for holding the mask substrate K inside the housing 101 (described later). Graphic. The housing 101 includes an outer box 103 that can be inserted and removed through a receiving opening 102, a lid 104 for opening and closing the receiving opening 102, and A plurality of casters 105 are provided on the outer side of the bottom of the outer casing 103, and a plurality of joint portions 108 are provided between the outer casing 103 and the cover 104 to join the components together. As the holding members, four holding members 106 are provided inside the outer box 103 for holding the four corners of the rectangular mask substrate K, and a plurality of end surface pressers 107 for The end surface of the mask substrate K is pressed on its four sides. Note that the relationship between the holding member 106 and the outer case 103 and between the end surface presser 107 and the outer case 103 is omitted in the third drawing. Here, the arrangement, transfer, and take-out of the mask substrate K will be described using the photomask case 100 described above. The reticle substrate K can generally be placed in the reticle 100 in a clean room of the manufacturer. This operation can be performed by opening the cover 104 through the receiving opening 102 when the reticle 100 is placed horizontally. To place the reticle substrate K into the outer case 103, and then hold the four corners thereof by the holding portion 106 and pressurize the end surface thereof by the end surface presser 107" 1337161 ί> After the cover 104, the cover case 100 can be placed from a lateral position (longitudinal posture) and brought to the mask case 100, which can be easily transported by the caster to the mask substrate K, such as land transfer. , the air transmission method is transmitted to the orderer, and the longitudinal state is reduced to reduce the cost of occupying the land. The transmission mask substrate K is generally operable to be pressed when the photomask case 100 is placed on the surface of the surface. Execution after the pressurization of the device 107, however, when the longitudinal type mask case K is used, since the mask case becomes high, it is possible to line, and thus the transfer of the mask case becomes a transfer method. Longitudinal reticle box with increased aspect ratio ( The problem of the aspect ratio) Moreover, due to the main surface of the longitudinal type mask case, the load may be concentrated on a support holding portion, thereby destroying the base of the mask, and when the box is in the longitudinal state, it cannot be used as a mask. When the substrate is placed and removed, the substrate needs to be operated to rise from the longitudinal state and from the lateral state to the outside of the longitudinal state by the photomask to the longitudinal post of the longitudinal mask substrate K. In this case, 105 is used to move. The mask case 100 can be removed by the appropriate selection, voyage transport or the like by placing the mask cover area and thereby reducing the removal of the clean room of the transfer factory. The transmission of the large-sized photomask substrate can be difficult to cover the front view by the photomask case, and moreover, the size of the photomask substrate is limited, so that it is easy to fall down. The lower end side of the plate on the lower end surface of the reticle substrate is supported at the end of the reticle substrate. Since the longitudinal type mask case will place the reticle and place the reticle to the lateral state, the state is reversed. If this operation is performed by a worker, 1337161, it may happen that the reticle is operatively falling down and thus requiring multiple workers. The present invention can be manufactured under these circumstances and has the object of providing a container device which can be easily transported not only to prevent falling during transfer, but also to be placed in a large-sized photomask' and can further prevent concentration due to load The light caused is broken. In this specification, a reticle substrate covers a reticle glass photomask blank, a reticle or the like. SUMMARY OF THE INVENTION To achieve the above object, a reticle substrate according to the present invention can be used to transport and/or store a reticle substrate, comprising a housing for receiving the reticle substrate therein, and a holding member for protecting The substrate is inclined at a predetermined inclination angle. In this embodiment, the reticle substrate container device can be lowered in height as compared with a longitudinal reticle base that vertically holds the reticle substrate. This can help the transmissive substrate container device to be transported/stored, and the delivery method is also limited. Further, since the aspect ratio of the photomask device can be lowered, it is possible to prevent the falling during the conveyance. Furthermore, the end surface and the back surface of the reticle substrate are supported, so that the supporting load of the slab can be dispersed to prevent breakage of the reticle substrate. According to the reticle substrate container device of the present invention, the slant angle of the reticle can be preferably set to 45 to 80 degrees with respect to the horizontal axis, and the height, the aspect ratio and the area (base area) of the reticle substrate container device ) can be set to a good balance. Unexpected reticle substrate and substrate on the substrate of the cover substrate, a container device for holding the reticle, and a plate container for not only avoiding the transfer of the substrate container, but the reticle base substrate In the reticle substrate container device according to the present invention, the holding member is preferably provided inside the casing and holds the reticle substrate inside the casing, under the framework Since the photomask substrate container device does not need to be placed or raised when the photomask substrate is placed and taken out, the operation of placing and removing the photomask substrate can be simplified. According to the reticle substrate container device of the present invention, the holding member preferably includes a placing member for temporarily receiving the reticle substrate thereon, and a tip surface presser for pressurizing the reticle substrate The end surface is placed on the placement member. Under this architecture, since the reticle substrate can be temporarily placed, the containment of the reticle substrate can be assisted with respect to the reticle substrate container device. Furthermore, the end surface of the mask substrate is pressed by the end surface presser, which suppresses the vibration of the mask substrate along the main surface of the mask substrate, thereby preventing the generation of powder due to friction. According to the photomask substrate container device of the present invention, the holding member may further comprise a main surface pressurizer for pressing the main surface of the photomask substrate, and under this structure, the photomask substrate is pressed by the main surface pressurizer The main surface, which suppresses vibration in a direction perpendicular to the main surface of the reticle substrate, thereby preventing generation of powder due to friction. According to the reticle substrate container device of the present invention, the housing includes an outer box and a lid to form a receiving opening for receiving and removing the receiving opening of the reticle substrate, which can be formed To extend to one of the upper surfaces of the outer box, a front surface, and two side surfaces. Here, the receiving opening may be formed obliquely with respect to the outer case from a side surface view, and wherein the inclination angle may substantially be inclined with respect to the reticle substrate held by the holding member 1337161
角度相等。在此架構下，當放入與取出該光罩基 光罩基板不會妨害該接收開口，並因此該放入與 作可平穩地由一機器人（robot)來實行。 依據本發明之光罩基板容器裝置，該保持部 在殻體外側以及保持該殻體，以接收該光罩基板 並以傾斜狀態來接收。在此情況下，可裝配一夾 固定該光罩基板而依附於該殻體內部，並更進一 當該殼體體本身傾斜時，該放置光罩基板於其中 固定至一放置平台（placing platform)或其類似物， 下，例如，傳統光罩盒也可被拿來使用。 依據本發明所使用之光罩基板容器裝置，其 發明之光罩基板傳送方法，一光罩產品製造方法 罩曝光方法。亦即，該光罩基板傳送方法係保持 於傾斜狀態中以預定傾斜角度於前述光罩基板容 之方法，並在維持傾斜角度下傳送該光罩基板。 該光罩產品製造方法係一包含至少一光罩基 驟，一基板形成步驟，以及一檢查步驟之方法， 法保持該光罩基板以預定傾斜角度於傾斜狀態中 罩基板容器裝置中，並在維持傾斜角度時於前 執行光罩基板之傳送及/或儲存。 該光罩曝光方法係針對曝露一光至該光罩 其上之圖案傳送至一物件之方法，其包含放置 以預定傾斜角度於傾斜狀態中於前述光罩基板 之步驟’一光罩基板容器裝置在光罩基板放置 預定傾斜角度於傾斜狀態中時傳送至一曝光設 板時，該 取出之操 件可提供 於其中， 具（jig)以 步地是， 之殻體可 在此架構 可實現本 ，或一光 光罩基板 器裝置中 板生產步 其中該方 於前述光 步驟之間 將形成於 光罩基板 器裝置中 其中並以 之步驟， •10- 1337161 以及從光罩基板容器裝置取出一光罩基板並安置光罩基板 於該曝光設備中之步驟。 如上所述，依據本發明，比起適合垂直保持光罩基板 之縱向型光罩基板容器裝置，該光罩基板容器裝置更可降 低其高度，因此，在該光罩基板容器裝置之傳送期間，可 防止視野的阻礙，並因此，不僅有助於該光罩基板容器裝 置之傳送，而且也可避免傳送方法被限制之缺失。更甚者， 由於可降低該光罩基板容器裝置之縱橫比，因此可防止於 傳送及/或儲存期間的倒下。 再者，由於可支撐光罩基板之末端表面與背表面，因 此可分散該光罩基板之支撐負載，以預防光罩基板之破 損。再者，由於在放入與取出光罩基板時不需橫放或立起 該光罩基板容器裝置，因此可簡化光罩基板之放入與取出 操作。換言之，該光罩基板可以預定傾斜角度於傾斜狀態 中放入該光罩基板容器裝置中，當在維持此配置狀態時， 可傳送及/或儲存該光罩基板。 再者，此一步驟可在製造光罩產品中設定爲某一階 段。再者，也可在曝光設備中於安置該光罩產品執行曝光 時’該光罩基板可以預定傾斜角度於傾斜狀態中放置於光 罩基板容器裝置中，並於之後被傳送，當在傳送期間光罩 基板容器裝置維持於一狀態時，光罩基板可從內部取出並 設定至曝光設備中以執行曝光。 【實施方式】 第4圖係依據本發明之一實施例之光罩基板容器裝置 之透視示意圖，第5圖係依第4圖所示之光罩基板容器裝 -11 - 1337161 置之側面看過去之斷面圖，以及第6圖係依第4圖中所示 之光罩基板容器裝置之內部前視圖，第7圖係依第4圖中 所示之光罩基板容器裝置計算重量之解釋圖，以及第8圖 係第4圖中所示之光罩基板容器裝置之重量圖表。 如這些圖示所示，一光罩基板容器裝置1爲一矩形平 行六面體盒用以傳送一矩形光罩基板K並包含一用以接收 該光罩基板K於其中之殻體，以及多個保持部件（於之後說 明），用以保持該光罩基板K於該殼體10之內部。 當該接收的光罩基板K是大尺寸使得其主表面之短側 面的長度超過800mm時，該光罩基板容器裝置1對此是有 益的。例如，該光罩基板容器裝置1可包含一具有12 20mm 高度（短側面）’ 1400mm之長度（長側面），以及13mm之寬 度（厚度）尺寸之大尺寸光罩基板或更大尺寸。因此本發明 在光罩基板K增加尺寸時其效用可變得更明顯。 如上所述，該光罩基板K可爲一光罩玻璃基板，一空 白光罩，或一光罩。 該殼體10包含一外部箱11，一蓋12，以及腳輪13» 該外部箱11可適用以接收該光罩基板K於其中，並形 成有一接收開口 14，可經由其放入與取出光罩基板K，該 接收開口 14可在該外部箱11之上表面、前表面與側表面 之任何一表面上形成’但較佳地從外部箱Π之每個側面來 看可傾斜形成並延伸至該外部箱1 1之上表面、前表面與側 表面上。在此架構下，該接收開口 14可被廣範圍地打開以 有助於光罩基板K經此放入與取出》 再者’在此情況下’該光罩基板K可以傾斜狀態而被 -12- 1337161 保持於該外部箱11之內部，以便可妥善地送到工作者中並 因而可輕易地取出，因此，從外部箱10之側面來看之接收 開口 14之傾斜角度可被設定等於光罩基板K之保持角度。 若該接收開口 14之傾斜角度相對於該光罩基板K之保 持角度可在± 1 0度以內，特別地可在±5度以內，則在光罩 基板放入與取出操作時沒有障礙。因此，在本發明中，相 對於該外部箱11之接收開口 14之傾斜角度可實質上與光 罩基板K之保持角度（傾斜角度）相等，表示相對於光罩基 板K之保持角度，接收開口 14之傾斜角度落在±10度以內。 該蓋1 2打開與關閉該接收開口 1 4，較佳地是，該外部 箱11與蓋12可提供插座與栓接部（spigotjointportions)15 以便可將其配合在一起。再者，連結部16如扣部（buckles) 可提供於外部箱11與蓋12之問。在光罩基板K放置於外 部箱Π中之後，該蓋12可通過連結部16之連結操作而固 定外部箱1 1。 該些腳輪13提供於該外部箱11外側之底部上以助於 光罩基板容器裝置1之傳送（移動）。 該保持部件從其側面來看可保持光罩基板K於傾斜狀 態中。該光罩基板K之傾斜角度相對於水平軸可較佳地爲 45到80度。在此架構下，由於相較於可適用以垂直地保持 該光罩基板Κ之縱向型光罩盒，光罩基板容器裝置丨之高 度可被降低，不僅有助於該光罩基板容器裝置之傳送（移 動）’更可避免傳送方法被限制之缺失。再者，由於該光罩 基板容器裝置1之縱橫比可被降低，故其可防止傳送或儲 存期間的倒下。再者，由於在放入或取出光罩基板K時不 -13- 1337161 需橫放或立起該光罩基板容器裝置1，其可簡化光罩基板κ 之放入與取出之操作。 在圖式之實施例中，該光罩基板Κ係安置於光罩基板 容器裝置1中而成傾斜一維（one-dimensionally)，亦即，只 當從光罩基板K之側面觀察時才傾斜。因此，該光罩基板 K之長側面是水平的。然而，本發明並不拘限於本實施例， 而是也可應用於光罩基板K傾斜二維或三維之容器，亦 即，當從前及/或頂部觀察時也可傾斜。在此情況下，當從 前及/或頂部觀察時，傾斜角度可較佳設定在30度以內爲 較佳。 本實施例之光罩基板容器裝置1具有放置部件（placing me mb er s)20，末端表面加壓器30，以及主表面加壓器40以 作爲該保持部件。 該放置部件20使該光罩基板K能暫時放置，例如，在 此實施例中，該放置部件20可提供於該殻體10內部之四 個位置上並透過缺口（gap)Gl支撐光罩基板 K之四個角 部，以使該光罩基板K能暫時放置，特別地是，下方之二 放置部件20每個均可針對支撐光罩基板K之末端表面之第 一支撐表面21以及針對支撐光罩基板K之背端之第二支撐 表面22而形成。 再參照第2圖所示，在傳統適用以垂直地保持光罩基 板K的光罩盒1〇〇中，光罩基板K之負載主要由該下方的 保持部106之支撐表面106-1來支撐，同時其中之垂直支 撐表面106-2實質上可只用來防止光罩基板K倒下。 另一方面，本發明適用以保持光罩基板K於傾斜狀態 -14- 1337161 中之該光罩基板容器裝置1，由於光罩基板κ之負載可被 該下方的放置部件20之第一支撐表面21與第二支撐表面 22適當地分散，因此可防止因負載集中所導致的光罩基板 Κ的破損。 該末端表面加壓器30可用以加壓該光罩基板Κ之末端 表面於其四個側面上，藉以抑制沿著其主表面之光罩基板 Κ的振動以防止由摩擦所導致粉末的產生。在此實施例 中，該光罩基板容器裝置1包含二個上末端表面加壓器 30，用以加壓光罩基板Κ之上末端表面，二個下末端表面 加壓器30，用以加壓光罩基板Κ之下末端表面，二個左末 端表面加壓器30，用以加壓光罩基板Κ之左末端表面，以 及二個右末端表面加壓器30,用以加壓光罩基板Κ之右末 端表面。藉由這些末端表面加壓器30的使用，可抑制沿著 該光罩基板Κ之主表面向上，向下，向左與向左的振動。 該些末端表面加壓器30之每個加壓器均包含一支撐 板（support plate)31，其具有一螺紋孔並可裝至該外部箱11 上，一螺柄（screw shaft)32，以轉入該支撐板31中，一彈 性部件（elastic member)33，提供於該螺柄32之頂端上’以 及雙螺帽（double nuts) 34，用以固定該螺柄32於一隨意位 置上。亦即，藉由轉動該螺柄32以調整該彈性部件33之 位.置並轉緊該雙螺帽34以使該彈性部件33接觸該光罩基 板K之末端表面，進而加壓該光罩K之末端表面。另一方 面，由於該下方的末端表面加壓器30被要求與該下方放置 部件20之第一支撐表面21齊平（flush)，因此該該彈性部 件33之位置可於其中固定。 -15- 1337161 在此實施例，該末端表面加壓器30只加壓光罩基板 之末緣，然而，該末端表面加壓器30也可裝配以加壓光 基板K之前與後表面。例如，每個彈性部件3 3可形成一 槽於其頂端’並且將光罩基板K之末端部插入於此凹 中，在此架構下，其可同時抑制垂直於光罩基板K之主 面之方向的振動。 該主表面加壓器40可用以加壓光罩基板K之主表酉 藉以抑制垂直於光罩基板K之主表面之方向的振動，以 止由摩擦所導致之粉末的產生。在此實施例中，該光罩 板容器裝置1包含四個主表面加壓器40,以提供至該蓋 之內側上，並隨著該蓋12之關閉操作，可藉由主表面加 器40來加壓光罩基板K之主表面的四個角部。 每個主表面加壓器40包含一管（pipe)41，於該蓋12 內側上突出，一彈性部件42,可移動地收納至該管41之 部，以及一彈簧43，配置於該管41中推動該彈性部件 於突出方向中。藉由帶入該彈性部件42以與光罩基板K 主表面作彈性接觸，則可抑制垂直於光罩基板K之主表 之方向中的振動。 由於依此配置之該光罩基板容器裝置1包含光罩基 K於傾斜狀態中，因此增加表面面積與重量。然而，該 罩基板容器裝置1之重量（實質上正比於表面面積）最多 被抑制約爲相較於縱向型或橫向型光罩盒的二倍。 亦即，如第7圖所示，給定光罩基板K之高度爲Η 其中之長度爲W1，以及其中之傾斜角度爲Θ，則該光罩 板容器裝置1之最小高度爲HI· sine，而於其中之最小 K 罩 凹 槽 表 i， 防 基 12 壓 之 頂 42 之 面 板 光 可 1， 基 長 -16 - 1337161 度爲W1，以及於其中之最小深度爲HI · cose。因此，可 以下列方式來計算每個光罩基板容器裝置1之前與後表面 的面積S1，每個於其中之左與右端側表面面積S2,每個於 其中之上與下端表面面積S3，以及光罩基板容器裝置1之 表面面積S: S1=H1 · W1 · sin Θ 52 = H 12 · sin θ · cos θ 53 = H1 · W1 · cose S=2(S1+S2+S3) 接著當改變傾斜角度Θ於0到90度的範圍中時，則可 改變表面面積（重量），如第8圖所示，但可了解地是，該 表面面積（重量）甚至在變爲最大値之45度上可被抑制爲二 倍或更小。 在此，就放入與取出該光罩基板K之適當的縱橫比、 穩定性，以及容易性來說，該傾斜角度Θ可較佳地設定在 45度到80度的範圍內，並且此外，就抑制重量的增加來 說，該傾斜角度Θ可較佳地設定爲60度到80度的範圍內。 在此，將利用前述光罩基板容器裝置1來說明光罩基 板K的放置 '傳送、以及取出。 該光罩基板K通常係放置在工廠之潔淨室之光罩基板 容器裝置1中。當放置該光罩基板K於光罩基板容器裝置 1中時，可先打開該蓋12且然後暫時放置該光罩基板K於 光罩基板容器裝置1內部之放置部件20上。在此情況下， 該光罩基板K從其側面看過去是傾斜的。之後，可藉由該 末端表面加壓器30來加壓光罩基板K之末端表面並隨後關 -17- 1337161 閉該蓋1 2，當關閉該蓋1 2時，將提供於該蓋1 2之內部側 面上之該主表面加壓器40之彈性部件42與光罩基板κ之 主表面作彈性地接觸。 該放置光罩基板K於其中之光罩基板容器裝置1可帶 至潔淨室之外部，在此情況下，光罩基板容器裝置1可輕 易地藉由腳輪13的使用而傳送（移動）。 該放置光罩基板K於其中之光罩基板容器裝置1可藉 由選擇適當傳送方法來傳送至一傳送目的地，其中該傳送 方法如陸地傳送，空中傳送，航海傳送或類似之傳送方法。 在此情況下，由於相較於適用以垂直保持該光罩基板K之 縱向型容器來說光罩基板容器裝置1可降低高度，不僅可 幫助該光罩基板容器裝置1傳送，而且也更可避免傳送方 法被限制之缺失。再者，由於可降低光罩基板容器裝置1 之縱橫比，因此可防止傳送或儲存期間的倒下。 在傳送至目的地時，該被傳送的光罩基板K通常從工 廠之潔淨室中取出，此操作係在打開該蓋12與鬆開由末端 表面加壓器30之加壓之後執行。 如上所述，依據此實施例之配置，該用以傳送/儲存光 罩基板K之光罩基板容器裝置1包含殻體10，用以包含該 光罩基板K於其中，以及複數個保持部件，用以保持該光 罩基板K於該殼體10的內部，由於該保持部件可配置以保 持光罩基板K從其側面看過去係於傾斜狀態中，因此相較 於適用以垂直保持該光罩基板K之縱向型光罩盒，該光罩 基板容器裝置1可降低高度。因此，不僅可幫助該光罩基 板容器裝置1之傳送，而且也更可避免傳送方法被限制之 -18- 1337161 缺失。再者，由於可降低該光罩基板容器裝置1之縱橫比， 因此可預防傳送期間倒下。再者，由於可支撐光罩基板κ 之末端表面與背表面，因此可分散該光罩基板K之支撐負 載，以預防光罩基板之破損。再者，由於在放入與取出光 罩基板K時不需橫放或立起該光罩基板容器裝置1，故對 於該光罩基板K可簡化其放入與取出之操作。 再者，當光罩基板K之傾斜角度相對於水平軸設定爲 45到80度時，光罩基板容器裝置1之高度，其縱橫比與其 占地面積（基部面積）可被設爲良好的平衡。 再者，當提供作爲該些保持部件之放置部件20以暫時 接收該光罩基板K於其上，並提供末端加壓器30以加壓放 置於放置部件20上之光罩基板K之末端表面，由於光罩基 板K可被暫時地放置，因此相對於光罩基板容器裝置1來 說，其有助於光罩基板K之包含。再者，藉由該末端表面 加壓器30來加壓光罩基板K之末端表面，可抑制光罩基板 K沿著其主表面的振動，藉以防止由摩擦所導致之粉粒的 產生。 再者，當提供作爲保持部件之主表面加壓器40以加壓 光罩基板K之主表面時，藉由主表面加壓器40以加壓光罩 基板K之主表面，其可抑制垂直於光罩基板K之主表面之 方向中的振動，以防止由摩擦所導致之粉粒的產生。 ' 在此，依據本發明之另一實施例之光罩基板容器裝置 可於下說明。 第9圖係依據本發明之另一實施例之光罩基板容器裝 置之透視示意圖並且第10圖係從第9圖中光罩基板容器裝 -19- 1337161 置之側面看過去之斷面圖。 在此實施例中，一殻體10包含一外部箱103，其中光 罩基板K可通過一接收開口 102而放入與取出，以及一蓋 1 04，用以打開與關閉該接收開口 1 02。例如，該殼體除了 該腳輪105被移除外，其可由第1至3圖中所示之傳統殼 體1 0 1來實現。 在該殼體101之內部，可提供作爲保持部件之保持部 件106’用以保持光罩基板Κ之四個角部，並如前述實施 例中所述之末端表面加壓器30,末端表面加壓器（圖式省略） 可用以加壓光罩基板Κ之末端表面於其四個側面》可配置 這些保持部件106與末端表面加壓器以相對於該殻體1〇1 可垂直保持光罩基板Κ。 可以一傾斜狀態來放置該殻體1 0 1於·放置平台1 1 0 上。 該放置平台 110 包含二個交叉部件（crossing members)lll，二個支撐柱（support posts)112，其分別垂直 配置於該交叉部件111之後部，一支撐部件113,其架橋於 該交叉部件 Π1之前部間，複數個保持部（holding pieces)112a，分別朝該支撐柱112之上部突出，一背表面 支撐部件114，架橋於該保持部112a之間|以及複數個腳 輪115,提供於該交叉部件111與支撐部件113之底部上。 該支撐部件113具有一第一支撐表面113a，用以支撐 該殼體101之下方末端表面，以及一第二支撐表面113b， 用以支撐該殼體101於其較低部上之背表面。該背表面支 撐部件114具有一支撐表面，用以支撐該殻體101於其上 -20- 1337161 方部上之背表面。 在此架構下，當該殻體101固定至或放置於該放置平 台110上時，該殻體101之下方末端表面與殻體101之背 表面之下方部可由該支撐部件113來支撐。再者’該殼體 1〇1於其下方部上之左與右側表面可藉由交叉部件111之 前部來支撐，並且該殼體101之背表面之上部可藉由背表 面支撐部件114之來支撐。再者，該殼體101於其上方部 上之左與右側表面可藉由保持部112a來支撐。因此，整個 殼體101可穩固地由該放置平台110來支撐。 將該支撐部件113與背表面支撐部件114之各別支撐 表面形成爲使得當支撐該殼體101時，該殼體101之傾斜 角度相對於水平軸成爲45到80度。在此架構下，由於光 罩基板容器裝置相較於縱向型光罩盒其可降低高度，因此 具有相同於前述實施例中的那些效果，如已呈現之光罩基 板容器裝置之傳送之簡易化。 在此實施例中，可配置該交叉部件111使得可增加朝 向後側之其間距離。因此，垂直配置於該交叉部件111之 後部之支撐柱1 1 2也可增加朝向後側之其間距離。在此架 構下，如第9圖所示，當配置二個放置平台時，該由實線 所指示之後放置平台之下側可放置於一連串雙虛線所指示 之前放置平台之後側上之下方空間中。因此，可以重疊的 方式來緊密地配置複數個放置平台110而不用於前-後方向 之間提供長間隔，而可節省傳送或儲存時的空間。 當該殻體101以一預定角度於傾斜狀態中被放置於放 置平台110上時，可從該殻體101放入或取出該光罩基板 -21- 1337161 κ。然而，依據光罩基板κ被放入或取出時的情況，其也 可於從該放置平台110拆卸該殼體101之狀態下來執行。 本發明也可實施作爲一光罩基板傳送方法。亦即，其 可實現一種光罩基板以預定傾斜角度於傾斜狀態下保持於 前述光罩基板容器裝置中，並於維持該傾斜角度時傳送該 光罩基扳的方法。依據此一傳送方法，由於光罩基板容器 裝置可降低高度’因此不僅有助於光罩基板容器裝置之傳 送’而且也可增加傳送方法的選擇。再者，由於可降低該 Φ 光罩基板容器裝置之縱橫比，因此可防止傳送期間的倒下。 再者，本發明也可實施作爲一光罩產品製造方法，亦 即’可實現包含至少一光罩基板生產步驟，一基板形成步 驟，以及一檢查步驟之光罩產品製造方法，其中該方法以 - 預定傾斜角度於傾斜狀態中保持光罩基板於前述光罩基板 容器裝置中’並在維持該傾斜角度時，在該些步驟之間執 行光罩基板之傳送及/或儲存。 再者’本發明也可實施作爲—光罩曝光/傳送（或曝光） Φ 方法。亦即’其可實現包含—以預定傾斜角度於傾斜狀態 中放置光罩基板於前述光罩基板容器裝置中之步驟，一當 該光罩基板以預定傾斜角度於傾斜狀態放置於其中時，傳 送該光罩基板容器裝置至一曝光/傳送（或曝光）設備之步 驟’以及從光罩基板容器裝置取出該光罩基板與安置該光 罩基板於該曝光/傳送設備中之步驟之光罩曝光/傳送方 法’其中該方法可透過前述步驟而曝光/傳送—圖案於該光 罩基板上。 本發明可應用一光罩基板容器裝置以傳送及/或儲存 -22- 1337161 一光罩基板，且特別可適用以傳送一大尺寸光罩基板於製 造LCDPs、PDP或其類似之物的使用上。 【圖式簡單說明】 第1圖係傳統光罩盒之透視圖； 第2圖係從第1圖所示之光罩盒之側面看過去之斷面 圖；第3圖係第1圖所示之光罩盒之內部前視圖： 第4圖係依據本發明之一實施例之光罩基板容器裝置 之不意圖； 第5圖係依第4圖所示之光罩基板容器裝置之側面看 過去之斷面圖： 第6圖係依第4圖所示之光罩基板容器裝置之內部前 視圖； 第7圖係依據本發明之光罩基板容器裝置計算重量之 解釋圖； 第8圖係依據本發明之光罩基板容器裝置之重量圖 表： 第9圖係依據本發明之另一實施例之光罩基板容器裝 置之透視示意圖；以及 第10圖係沿第9圖中光罩基板容器裝置沿A-A線之斷 面圖。 【主要元件符號說明】 光罩基板容器裝置 光罩盒 殻體 接收開口 外部箱 1 100 10 、 101 14 ' 102 11 、 103 -23- 1337161The angles are equal. Under this architecture, the receiving and opening of the reticle-based reticle substrate does not hinder the receiving opening, and thus the insertion and the slidability can be smoothly performed by a robot. According to the photomask substrate container device of the present invention, the holding portion is outside the casing and holds the casing to receive the photomask substrate and receive it in an inclined state. In this case, a clip can be attached to fix the reticle substrate to be attached to the inside of the housing, and further, when the housing body itself is tilted, the reticle substrate is fixed therein to a placing platform. Or a similar, for example, a conventional photomask case can also be used. A reticle substrate container device for use in accordance with the present invention, a reticle substrate transfer method of the invention, a reticle product manufacturing method, and a cover exposure method. That is, the mask substrate transfer method is maintained in a state in which the mask substrate is accommodated at a predetermined tilt angle in an inclined state, and the mask substrate is transported while maintaining the tilt angle. The reticle product manufacturing method comprises: at least one reticle base step, a substrate forming step, and an inspection step of maintaining the reticle substrate at a predetermined tilt angle in the slanted state in the hood substrate container device, and The transfer and/or storage of the reticle substrate is performed before the tilt angle is maintained. The reticle exposure method is a method for transferring a pattern of light to the reticle to an object, comprising the step of placing the reticle substrate at a predetermined tilt angle in the slanted state on the reticle substrate device When the reticle substrate is placed in an inclined state and is transferred to an exposure plate, the detaching operation member can be provided therein, and the housing can be implemented in this structure. Or a reticle substrate device in the plate production step, wherein the side is formed in the reticle substrate device between the aforementioned light steps and in steps thereof, • 10 - 1337161 and one is taken out from the reticle substrate container device The photomask substrate and the step of locating the reticle substrate in the exposure apparatus. As described above, according to the present invention, the photomask substrate container device can be lowered in height compared to the vertical type photomask substrate container device suitable for vertically holding the photomask substrate, and therefore, during the transfer of the photomask substrate container device, The obstruction of the field of view can be prevented, and therefore, not only the transfer of the photomask substrate container device but also the loss of the transfer method can be avoided. Furthermore, since the aspect ratio of the photomask substrate container device can be lowered, it is possible to prevent falling during transfer and/or storage. Furthermore, since the end surface and the back surface of the mask substrate can be supported, the supporting load of the mask substrate can be dispersed to prevent breakage of the mask substrate. Further, since the photomask substrate container device does not need to be placed or raised when the photomask substrate is placed and taken out, the insertion and removal operations of the photomask substrate can be simplified. In other words, the reticle substrate can be placed in the reticle substrate container device at a predetermined tilt angle in an inclined state, and the reticle substrate can be transferred and/or stored while maintaining the configuration. Furthermore, this step can be set to a certain stage in the manufacture of the reticle product. Furthermore, when the exposure is performed in the exposure apparatus to place the reticle product, the reticle substrate can be placed in the reticle substrate container device at a predetermined tilt angle in an inclined state, and then transferred, during the transfer. When the photomask substrate container device is maintained in a state, the photomask substrate can be taken out from the inside and set into an exposure device to perform exposure. [Embodiment] Fig. 4 is a schematic perspective view of a reticle substrate container device according to an embodiment of the present invention, and Fig. 5 is a side view of the reticle substrate container -11 - 1337161 shown in Fig. 4. The cross-sectional view, and Fig. 6 is an internal front view of the photomask substrate container device shown in Fig. 4, and Fig. 7 is an explanatory view of the weight calculation of the photomask substrate container device shown in Fig. 4. And the weight chart of the photomask substrate container device shown in Fig. 4 of Fig. 4. As shown in these figures, a reticle substrate container device 1 is a rectangular parallelepiped case for conveying a rectangular reticle substrate K and includes a housing for receiving the reticle substrate K therein, and A holding member (described later) for holding the mask substrate K inside the housing 10. The photomask substrate container device 1 is advantageous when the received mask substrate K is large in size such that the length of the short side surface of its main surface exceeds 800 mm. For example, the reticle substrate container device 1 may comprise a large-sized reticle substrate having a height of 12 20 mm (short side) 1400 mm (long side), and a width (thickness) of 13 mm or larger. Therefore, the utility of the present invention can become more apparent when the size of the reticle substrate K is increased. As described above, the mask substrate K can be a photomask glass substrate, a blank mask, or a mask. The housing 10 includes an outer case 11, a cover 12, and a caster 13». The outer case 11 is adapted to receive the reticle substrate K therein and is formed with a receiving opening 14 through which the reticle can be inserted and removed. a substrate K, the receiving opening 14 may be formed on any one of the upper surface, the front surface and the side surface of the outer box 11, but preferably is formed obliquely from the side of the outer box and extends to the substrate The upper surface, the front surface and the side surface of the outer case 1 1 are. Under this architecture, the receiving opening 14 can be opened wide to facilitate the insertion and removal of the mask substrate K. In this case, the mask substrate K can be tilted by the -12. - 1337161 is held inside the outer box 11 so as to be properly transported to the worker and thus easily removed, so that the angle of inclination of the receiving opening 14 viewed from the side of the outer box 10 can be set equal to the mask The holding angle of the substrate K. If the angle of inclination of the receiving opening 14 is within ±10 degrees with respect to the mask substrate K, particularly within ±5 degrees, there is no obstacle in the loading and unloading operation of the reticle substrate. Therefore, in the present invention, the inclination angle with respect to the receiving opening 14 of the outer casing 11 can be substantially equal to the holding angle (inclination angle) of the mask substrate K, indicating the holding angle with respect to the mask substrate K, the receiving opening The tilt angle of 14 falls within ±10 degrees. The cover 12 opens and closes the receiving opening 14 . Preferably, the outer box 11 and the cover 12 provide sockets and spigot joints 15 so that they can be fitted together. Further, the connecting portion 16 such as a buckle can be provided to the outer case 11 and the cover 12. After the mask substrate K is placed in the outer box, the cover 12 can be fixed to the outer box 11 by the joining operation of the joint portion 16. The casters 13 are provided on the bottom of the outer side of the outer casing 11 to facilitate the transfer (movement) of the photomask substrate container device 1. The holding member can hold the mask substrate K in an inclined state as viewed from the side thereof. The angle of inclination of the mask substrate K may preferably be 45 to 80 degrees with respect to the horizontal axis. Under this architecture, the height of the photomask substrate container device can be reduced as compared to a longitudinal type photomask cartridge that can be used to vertically hold the photomask substrate, not only contributing to the photomask substrate container device. Transfer (move) 'more to avoid the loss of the transfer method is limited. Further, since the aspect ratio of the photomask substrate container device 1 can be lowered, it can prevent the fall during transfer or storage. Further, since the photomask substrate container device 1 is not required to be placed or raised when the photomask substrate K is placed or taken out, the operation of putting in and taking out the photomask substrate κ can be simplified. In the embodiment of the drawings, the mask substrate is disposed in the mask substrate container device 1 to be one-dimensionally, that is, tilted only when viewed from the side of the mask substrate K. . Therefore, the long side of the mask substrate K is horizontal. However, the present invention is not limited to the embodiment, but can be applied to a container in which the reticle substrate K is tilted two-dimensionally or three-dimensionally, that is, it can be tilted when viewed from the front and/or the top. In this case, it is preferable that the inclination angle is preferably set within 30 degrees when viewed from the front and/or the top. The photomask substrate container device 1 of the present embodiment has a placing member 20, a tip surface presser 30, and a main surface presser 40 as the holding member. The placing member 20 enables the mask substrate K to be temporarily placed. For example, in this embodiment, the placing member 20 can be provided at four positions inside the casing 10 and support the mask substrate through a gap G1. The four corners of K are such that the mask substrate K can be temporarily placed, in particular, the lower two placement members 20 can each be directed to the first support surface 21 supporting the end surface of the mask substrate K and for supporting The second support surface 22 of the back end of the mask substrate K is formed. Referring again to FIG. 2, in the photomask case 1 which is conventionally applied to vertically hold the mask substrate K, the load of the mask substrate K is mainly supported by the support surface 106-1 of the lower holding portion 106. At the same time, the vertical support surface 106-2 can be used only to prevent the mask substrate K from falling down. On the other hand, the present invention is applicable to the reticle substrate container device 1 in which the reticle substrate K is held in the inclined state-14-1337161, and the first supporting surface of the lower placing member 20 can be supported by the load of the reticle substrate κ The 21 and the second support surface 22 are appropriately dispersed, so that damage of the mask substrate 因 due to load concentration can be prevented. The end surface presser 30 can be used to pressurize the end surface of the mask substrate to its four sides, thereby suppressing vibration of the mask substrate 沿着 along its main surface to prevent generation of powder by friction. In this embodiment, the photomask substrate container device 1 includes two upper end surface pressers 30 for pressurizing the upper end surface of the photomask substrate, and two lower end surface pressers 30 for adding a lower end surface of the calender substrate, two left end surface pressers 30 for pressurizing the left end surface of the mask substrate, and two right end surface pressers 30 for pressurizing the mask The right end surface of the substrate. By the use of these end surface pressers 30, upward, downward, leftward and leftward vibrations along the main surface of the mask substrate can be suppressed. Each of the end surface pressurizers 30 includes a support plate 31 having a threaded hole and attachable to the outer case 11, a screw shaft 32, Turned into the support plate 31, an elastic member 33 is provided on the top end of the screw handle 32 and a double nut 34 for fixing the screw handle 32 in a random position. That is, the position of the elastic member 33 is adjusted by rotating the screw handle 32. The double nut 34 is placed and tightened to bring the elastic member 33 into contact with the end surface of the mask substrate K, thereby pressurizing the mask. The end surface of K. On the other hand, since the lower end surface presser 30 is required to be flush with the first support surface 21 of the lower placement member 20, the position of the elastic member 33 can be fixed therein. -15- 1337161 In this embodiment, the end surface presser 30 only presses the end edge of the reticle substrate, however, the end surface presser 30 can also be assembled to press the front and rear surfaces of the light substrate K. For example, each of the elastic members 33 may form a groove at the top end thereof and insert the end portion of the mask substrate K into the recess, and in this configuration, it may simultaneously suppress the main surface perpendicular to the mask substrate K. Directional vibration. The main surface presser 40 can be used to pressurize the main surface of the mask substrate K to suppress vibration in a direction perpendicular to the main surface of the mask substrate K to prevent generation of powder by friction. In this embodiment, the reticle container device 1 includes four main surface pressers 40 for providing to the inside of the cover, and with the cover 12 being closed, by the main surface mounter 40 The four corners of the main surface of the mask substrate K are pressurized. Each of the main surface pressers 40 includes a pipe 41 projecting from the inside of the cover 12, an elastic member 42 movably received to the portion of the tube 41, and a spring 43 disposed on the tube 41. The elastic member is pushed in the protruding direction. By bringing the elastic member 42 into elastic contact with the main surface of the mask substrate K, vibration in a direction perpendicular to the main surface of the mask substrate K can be suppressed. Since the mask substrate container device 1 configured as described above includes the mask base K in an inclined state, the surface area and weight are increased. However, the weight of the cover substrate container device 1 (substantially proportional to the surface area) is suppressed to at most about twice as large as that of the longitudinal or transverse type mask case. That is, as shown in Fig. 7, given that the height of the mask substrate K is Η, wherein the length is W1, and the inclination angle thereof is Θ, the minimum height of the reticle container device 1 is HI·sine, and In the smallest K-cover groove table i, the panel light of the top 12 of the base 12 can be 1, the base length is -16,337,161 degrees, and the minimum depth is HI · cose. Therefore, the area S1 of the front and rear surfaces of each of the reticle substrate container devices 1 can be calculated in the following manner, each of which has a left and right end side surface area S2, each of which has an upper and lower end surface area S3, and light The surface area of the cover substrate container device 1 is S: S1 = H1 · W1 · sin Θ 52 = H 12 · sin θ · cos θ 53 = H1 · W1 · cose S = 2 (S1 + S2 + S3) Then when changing the tilt angle When the crucible is in the range of 0 to 90 degrees, the surface area (weight) can be changed, as shown in Fig. 8, but it is understood that the surface area (weight) can be changed even to a maximum of 45 degrees. It is suppressed to be twice or less. Here, in terms of an appropriate aspect ratio, stability, and easiness of putting in and taking out the mask substrate K, the inclination angle Θ can be preferably set in the range of 45 to 80 degrees, and further, The inclination angle Θ can be preferably set in the range of 60 to 80 degrees in terms of suppressing an increase in weight. Here, the placement, transfer, and take-out of the mask substrate K will be described using the above-described mask substrate container device 1. The reticle substrate K is usually placed in the reticle substrate container device 1 of the clean room of the factory. When the reticle substrate K is placed in the reticle substrate container device 1, the cover 12 can be opened first and then the reticle substrate K can be temporarily placed on the placement member 20 inside the reticle substrate container device 1. In this case, the mask substrate K is inclined as viewed from the side thereof. Thereafter, the end surface of the photomask substrate K can be pressed by the end surface pressurizer 30 and then the lid 1 2 can be closed by closing -17-1337161, which will be provided to the lid 1 2 when the lid 12 is closed. The elastic member 42 of the main surface presser 40 on the inner side surface elastically contacts the main surface of the mask substrate κ. The photomask substrate container device 1 in which the photomask substrate K is placed can be brought to the outside of the clean room, in which case the photomask substrate container device 1 can be easily transferred (moved) by the use of the casters 13. The photomask substrate container device 1 in which the reticle substrate K is placed can be transported to a transfer destination by selecting an appropriate transfer method such as land transfer, over-the-air transfer, nautical transfer or the like. In this case, since the mask substrate container device 1 can be lowered in height as compared with the vertical type container which is suitable for vertically holding the mask substrate K, it is possible to assist not only the transfer of the mask substrate container device 1, but also the transfer. Avoid missing transmission methods. Furthermore, since the aspect ratio of the photomask substrate container device 1 can be reduced, it is possible to prevent the fall during transfer or storage. Upon delivery to the destination, the transferred reticle substrate K is typically removed from the clean room of the factory, which is performed after opening the cover 12 and releasing the pressurization by the end surface pressurizer 30. As described above, according to the configuration of this embodiment, the photomask substrate container device 1 for transporting/storing the photomask substrate K includes a housing 10 for containing the photomask substrate K therein, and a plurality of holding members. In order to maintain the reticle substrate K inside the casing 10, since the holding member is configurable to keep the reticle substrate K from being viewed from the side thereof in an inclined state, the reticle is held vertically as compared with the application. A longitudinal type mask case of the substrate K, the mask substrate container device 1 can be lowered in height. Therefore, not only the transfer of the reticle substrate container device 1 but also the loss of the transfer method -18-1337161 can be avoided. Further, since the aspect ratio of the photomask substrate container device 1 can be reduced, it is possible to prevent the falling during the transfer. Further, since the end surface and the back surface of the mask substrate κ can be supported, the support load of the mask substrate K can be dispersed to prevent breakage of the mask substrate. Further, since the mask substrate container device 1 does not need to be placed or raised when the mask substrate K is placed and taken out, the operation of placing and removing the mask substrate K can be simplified. Further, when the inclination angle of the mask substrate K is set to 45 to 80 degrees with respect to the horizontal axis, the aspect ratio of the height of the mask substrate container device 1 and its footprint (base area) can be set to a good balance. . Further, when the placing member 20 as the holding members is provided to temporarily receive the mask substrate K thereon, and the end presser 30 is provided to pressurize the end surface of the mask substrate K placed on the placing member 20 Since the photomask substrate K can be temporarily placed, it contributes to the inclusion of the photomask substrate K with respect to the photomask substrate container device 1. Further, by pressing the end surface of the mask substrate K by the end surface presser 30, the vibration of the mask substrate K along the main surface thereof can be suppressed, thereby preventing generation of particles due to friction. Further, when the main surface presser 40 as the holding member is provided to press the main surface of the photomask substrate K, the main surface pressurizer 40 is used to pressurize the main surface of the photomask substrate K, which can suppress vertical Vibration in the direction of the main surface of the mask substrate K to prevent generation of particles caused by friction. Here, the photomask substrate container device according to another embodiment of the present invention can be explained below. Fig. 9 is a perspective view showing a reticle substrate container device according to another embodiment of the present invention, and Fig. 10 is a cross-sectional view taken from the side of the reticle substrate container package -19-1337161 in Fig. 9. In this embodiment, a housing 10 includes an outer case 103 in which the mask substrate K is inserted and removed through a receiving opening 102, and a cover 104 for opening and closing the receiving opening 102. For example, the housing can be realized by the conventional housing 1 0 1 shown in Figs. 1 to 3, except that the caster 105 is removed. Inside the casing 101, a holding member 106' as a holding member may be provided for holding the four corners of the mask substrate, and the end surface presser 30 as described in the foregoing embodiment, the end surface is added The pressure device (illustrated omitted) can be used to press the end surface of the mask substrate 于 on its four sides 》 configurable these holding members 106 and the end surface pressurizer to vertically hold the reticle relative to the housing 1 〇 1 Substrate Κ. The housing 110 can be placed on the platform 1 1 0 in a tilted state. The placement platform 110 includes two crossing members 111, two support posts 112, which are vertically disposed at the rear of the cross member 111, and a support member 113 that is bridged before the cross member Π1. Between the portions, a plurality of holding pieces 112a projecting toward the upper portion of the support column 112, a back surface support member 114, bridged between the holding portions 112a, and a plurality of casters 115 provided on the intersecting member 111 and the bottom of the support member 113. The support member 113 has a first support surface 113a for supporting the lower end surface of the housing 101 and a second support surface 113b for supporting the back surface of the housing 101 on the lower portion thereof. The back surface support member 114 has a support surface for supporting the back surface of the housing 101 on the side of the -20-1337161. Under this configuration, when the casing 101 is fixed to or placed on the placing platform 110, the lower end surface of the casing 101 and the lower portion of the back surface of the casing 101 can be supported by the supporting member 113. Furthermore, the left and right side surfaces of the housing 1〇1 on the lower portion thereof can be supported by the front portion of the cross member 111, and the upper portion of the back surface of the housing 101 can be supported by the back surface supporting member 114. support. Further, the left and right side surfaces of the casing 101 on the upper portion thereof can be supported by the holding portion 112a. Therefore, the entire casing 101 can be stably supported by the placement platform 110. The respective support surfaces of the support member 113 and the back surface support member 114 are formed such that when the housing 101 is supported, the inclination angle of the housing 101 becomes 45 to 80 degrees with respect to the horizontal axis. In this configuration, since the reticle substrate container device can be lowered in height compared to the vertical reticle housing, it has the same effects as those in the foregoing embodiments, such as the simplification of the delivery of the reticle substrate container device which has been presented. . In this embodiment, the cross member 111 can be configured such that the distance to the rear side can be increased. Therefore, the support post 1 1 2 disposed vertically at the rear of the cross member 111 can also increase the distance therebetween toward the rear side. Under this architecture, as shown in FIG. 9, when two placement platforms are configured, the lower side of the placement platform can be placed in the space below the rear side of the platform before being indicated by a series of double dashed lines. . Therefore, a plurality of placement platforms 110 can be closely arranged in an overlapping manner without providing a long interval between the front-rear directions, and space for transmission or storage can be saved. When the casing 101 is placed on the placing platform 110 in a tilted state at a predetermined angle, the photomask substrate -21 - 1337161 κ can be inserted or taken out from the casing 101. However, depending on the case where the photomask substrate κ is placed or taken out, it can also be performed in a state where the housing 101 is detached from the placement stage 110. The present invention can also be implemented as a photomask substrate transfer method. That is, it is possible to realize a method in which the reticle substrate is held in the reticle substrate container device at a predetermined inclination angle in an inclined state, and the reticle base plate is conveyed while maintaining the inclination angle. According to this transfer method, since the photomask substrate container device can be lowered in height, it can contribute not only to the transfer of the photomask substrate container device but also to the selection of the transfer method. Further, since the aspect ratio of the Φ photomask substrate container device can be reduced, it is possible to prevent the falling during the transfer. Furthermore, the present invention can also be implemented as a method for manufacturing a photomask product, that is, a method for manufacturing a photomask product comprising at least one photomask substrate production step, a substrate forming step, and an inspection step, wherein the method is - the predetermined tilt angle maintains the reticle substrate in the reticle substrate container device in an inclined state and performs the transfer and/or storage of the reticle substrate between the steps while maintaining the tilt angle. Furthermore, the present invention can also be implemented as a reticle exposure/transfer (or exposure) Φ method. That is, it can be configured to include a step of placing the reticle substrate in the reticle substrate in the slanted state at a predetermined tilt angle, and transmitting the reticle substrate when the reticle substrate is placed in a tilted state at a predetermined tilt angle. The step of the reticle substrate container device to an exposure/transfer (or exposure) device and the reticle exposure of the reticle substrate from the reticle substrate container device and the step of locating the reticle substrate in the exposure/transfer device / Transfer method 'where the method can be exposed/transmitted through the foregoing steps - patterning on the reticle substrate. The present invention can be applied to a reticle substrate container device for transporting and/or storing -22-33737161 a reticle substrate, and is particularly useful for transferring a large sized reticle substrate for use in the manufacture of LCDPs, PDPs or the like. . BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view of a conventional photomask case; Fig. 2 is a cross-sectional view taken from the side of the photomask case shown in Fig. 1; Fig. 3 is a view of Fig. 1 Internal front view of the photomask case: Fig. 4 is a schematic view of a photomask substrate container device according to an embodiment of the present invention; Fig. 5 is a side view of the photomask substrate container device shown in Fig. 4 Sectional view: Fig. 6 is an internal front view of the reticle substrate container device shown in Fig. 4; Fig. 7 is an explanatory view of calculating the weight of the reticle substrate container device according to the present invention; The weight chart of the photomask substrate container device of the present invention: FIG. 9 is a perspective schematic view of a photomask substrate container device according to another embodiment of the present invention; and FIG. 10 is a photomask substrate container device along the ninth embodiment Sectional view of the AA line. [Description of main component symbols] Photomask substrate container device Photomask case Housing Receiving opening External case 1 100 10 , 101 14 ' 102 11 , 103 -23- 1337161
12 ' 104 蓋 13、 105' 115 腳 輪 106 保 持 部 件 30、 107 末 端 表 面 加 壓 K 光 罩 基 板 15 栓 接 部 16 連 結 部 40 主 表 面 加 壓 器 G1 缺 □ 20 放 置 部 件 2 1 第 一 支 撐 表 面 22 第 二 支 撐 表 面 106- 1 ' 106-2 支 撐 表 面 3 1 支 撐 板 32 螺 柄 33 ' 42 彈 性 部 件 34 雙 螺 帽 4 1 管 43 彈 簧 1 10 放 置 部 件 111 交 叉 部 件 1 12 支 撐 柱 1 12a 保 持 部 113 支 撐 部 件 113a 第 — 支 撐 表 面 113b 第 二 支 撐 表 面 1 14 背 表 面 支 撐 部 -24-12 '104 Cover 13, 105' 115 Caster 106 Holding member 30, 107 End surface pressurization K Photomask substrate 15 Bolt portion 16 Joint portion 40 Main surface presser G1 Missing □ 20 Placement member 2 1 First support surface 22 Second support surface 106-1 '106-2 Support surface 3 1 Support plate 32 Screw shank 33 ' 42 Elastic member 34 Double nut 4 1 Tube 43 Spring 1 10 Placement member 111 Cross member 1 12 Support column 1 12a Holding portion 113 Support member 113a first support surface 113b second support surface 1 14 back surface support portion 24-