CN101013270A - Photomask substrate container unit, photomask substrate transportation and exposal method - Google Patents
Photomask substrate container unit, photomask substrate transportation and exposal method Download PDFInfo
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- CN101013270A CN101013270A CNA2007100083998A CN200710008399A CN101013270A CN 101013270 A CN101013270 A CN 101013270A CN A2007100083998 A CNA2007100083998 A CN A2007100083998A CN 200710008399 A CN200710008399 A CN 200710008399A CN 101013270 A CN101013270 A CN 101013270A
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- photomask substrate
- photomask
- container unit
- substrate container
- substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/48—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
Abstract
A photomask substrate container unit according to the present invention is used for conveying and/or storing the photomask substrate and includes: a housing for accommodating the photomask substrate; and a holding member for holding the photomask substrate with an incline pose having predetermined incline angle. Compared with the longitudinal type photomask substrate container unit for vertically holding a photomask substrate, the photomask substrate container unit can be reduced in height. Therefore, the photomask substrate container unit of the invention is convenient in convey/storage of the photomask substrate container unit, and also can conquer the fault that the convey method might be limited.
Description
Technical field
The present invention relates to the photomask substrate container unit of a kind of transportation and/or storage photomask substrate, especially, relate to a kind of photomask substrate container unit that is suitable for transportation and/or is stored in the large-size photomask substrate that uses in manufacturing display panels (LCDPs), the Plasmia indicating panel (PDPs) etc.
In addition, the present invention relates to a kind of photomask substrate transportation resources, a kind of photomask Manufacturing Method of Products and a kind of photomask exposure/printing transferring method that uses this photomask substrate container unit.
Background technology
In recent years, in the display panel of Production Example such as LCDPs and PDPs, as the technology that reduces manufacturing cost, having become general is panel quantity on each that increases in the female substrate of panel, thus, and the trend that exists the female substrate dimension of panel to increase.Therefore, in the display panel of Production Example such as LCDPs and PDPs, use the photomask substrate in graph transfer printing (pattern transfer) also to trend towards increasing size.When these large-sized photomask substrate being transported to when deciding the consumer, photomask substrate one by one is placed on respectively in the photomask box, promptly be placed on correspondingly in the photomask box, and transportation in motorlorry etc.
Be suitable for holding the conventional photomask box of large-size photomask substrate within it as each, vertical type of known existence and lateral type.For example, patent documentation 1 (open (JP-A) No.2005-115033 of Japanese uncensored patented claim) has disclosed the photomask box (photomask substrate container) of lateral type.Lateral type photomask box has following advantage: when the photomask box is laterally put, can implement placement, transportation, taking-up of photomask substrate or the like, but because the photomask box has taken very wide ground region, so there is the problem that has increased transportation cost and carrying cost.
Fig. 1 is the vertical skeleton view of type light mask cassette of tradition with Caster, and Fig. 2 is the cross sectional view when the side of the photomask box shown in Fig. 1 is seen, and Fig. 3 is the inside front view of the photomask box shown in Fig. 1.
As holding member, be provided with four retaining parts 106 at four angles keeping rectangular light mask substrate K in outer container 103 inside and at a plurality of end face pressing elements 107 of the end face of the four sides extruding photomask substrate K of photomask substrate K.Be noted that Fig. 3 has omitted between retaining part 106 and the outer container 103 and the diagram of the relation between end face pressing element 107 and the outer container 103.
To describe now and use aforementioned lights mask cassette 100 to place, transport and take out photomask substrate K.
Photomask substrate K is placed in the photomask box 100 in the factory toilet usually.This operation is carried out by following steps: uncap 104 when photomask box 100 is laterally put, with photomask substrate K by receiving opening 102 and be placed in the outer container 103 and keep by retaining part 106 then four angles, and the end face by end face pressing element 107 extruding photomask substrate K of photomask substrate K.
After lid 104 was closed, the photomask box 100 with placement photomask substrate K within it was raised to vertical posture from horizontal posture, and was transported to the outside of toilet.In the case, can be by using the easily mobile photomask box 100 of Caster 105.
The photomask substrate K that is paid takes out in the toilet of factory usually.This operation is carried out by following step: after the uncap 104, discharge the extruding by end face pressing element 106 when photomask box 100 is laterally put.
Yet, when using vertical type light mask cassette transportation large-size photomask substrate K because the photomask box uprises, so possible be the obstruction that the vision of front is subjected to the photomask box, therefore the transportation of photomask box becomes very difficult, and transportation resources is restricted in addition.
In addition, the problem below existing: because vertically the type light mask cassette increases along with the photomask substrate size and increased aspect ratio (aspect ratio), vertically the type light mask cassette is easy to.
In addition because vertically the type light mask cassette mainly supports photomask substrate at its end face, so possible be load concentration on the support section of the lower surface of supporting photomask substrate, thereby the lower end side of photomask substrate is broken.
In addition, because vertically the type light mask cassette makes and can not put into and take out photomask substrate at the photomask box during in vertical posture, so operation below needing: when taking out in the placement photomask substrate with photomask substrate, with the photomask box from fell horizontal posture and the photomask box is raised up to vertical posture from horizontal posture of vertical posture.If these operations are carried out by single workman, just may take place the photomask box during operation accident fall down therefore a plurality of workmans of needs.
Consider that above situation makes the present invention, and the purpose of this invention is to provide a kind of photomask substrate container unit, described photomask substrate container unit not only can easily be transported, even under large-size photomask substrate placement situation within it, also can prevent from during transportation to fall down, in addition, described photomask substrate container unit can prevent that photomask substrate is owing to breaking that load concentration causes.
In this instructions, photomask substrate comprises the glass substrate that is used for photomask, photomask blank, photomask etc.
Summary of the invention
In order to realize aforementioned purpose, proposed a kind ofly according to photomask substrate container unit of the present invention, described photomask substrate container unit is used for transportation and/or storage photomask substrate and comprising: housing, described housing are used for holding described photomask substrate within it; And holding member, described holding member keeps described photomask substrate with the inclination attitude of pre-determined tilt angle.Utilize this structure, compared to the vertical type light mask substrate container unit that is suitable for vertically keeping photomask substrate, described photomask substrate container unit can in height reduce.Thus, not only can be so that the transported/stored of photomask substrate container unit, and can overcome the shortcoming that transportation resources is restricted.In addition, because the aspect ratio of photomask substrate container unit reduces, so can prevent falling down between the delivery period.In addition, because the end face of photomask substrate and the back side can be supported, thus support loads that can the dispersed light mask substrate, thus breaking of photomask substrate prevented.
In photomask substrate container unit according to the present invention, described photomask substrate preferably is set at 45 to 80 degree with respect to the angle of inclination of horizontal axis.Utilize this structure, the height of photomask substrate container unit, aspect ratio, the floor area (base portion area) that takies can be set the balance that reaches good.
In photomask substrate container unit according to the present invention, preferably, described holding member is arranged on described enclosure interior and described photomask substrate is remained on described enclosure interior.Utilize this structure because when putting into and take out photomask substrate, there is no need to fall or lift (raise up) photomask substrate container unit, so can simplify photomask substrate put into and take out operation.
In photomask substrate container unit according to the present invention, described holding member preferably includes placing component and end face pressing element, described placing component holds described photomask substrate thereon temporarily, and described end face pressing element extruding is placed on the end face of the described photomask substrate on the described placing component.Utilize this structure because photomask substrate can be placed temporarily, so that photomask substrate holding with respect to the photomask substrate container unit.In addition, by using the end face of end face pressing element extruding photomask substrate, can suppress along the vibration of the first type surface of photomask substrate, thereby prevent to produce the dust that causes by friction.
In photomask substrate container unit according to the present invention, described holding member may further include the first type surface pressing element, and described first type surface pressing element is used to push the first type surface of described photomask substrate.Utilize this structure,, can suppress perpendicular to the vibration on the direction of the first type surface of photomask substrate, thereby prevent to produce the dust that causes by friction by using the first type surface of first type surface pressing element extruding photomask substrate.
In photomask substrate container unit according to the present invention, described housing comprises outer container and is used to form the lid that receives opening.Described upper surface, front surface and the both side surface that is used for to form the described outer container of extend through by the reception opening that it put into and took out described photomask substrate.Here, preferably, described reception opening is formed obliquely when a side surface is seen with respect to described outer container, and the angle of inclination of reception opening equals the angle of inclination by the described photomask substrate of described holding member maintenance substantially.Utilize this structure, when putting into and take out photomask substrate, photomask substrate does not have and receives the opening interference, thus, even can implement to put into and take out operation reposefully by robot.
In photomask substrate container unit according to the present invention, described holding member can be arranged on the outside of described housing and keep described housing, and described photomask substrate is accommodated in the described housing with the posture that tilts.In the case, the anchor clamps that described holding member can be configured for the stationary photomask substrate are connected to enclosure interior, and further, and the housing with placement photomask substrate within it is fixed on the placement platform etc., and housing self tilts simultaneously.Utilize this structure, for example, can use traditional photomask box as the photomask substrate container unit.
Use can realize the invention of a kind of photomask substrate transportation resources, a kind of photomask Manufacturing Method of Products or a kind of photomask exposure method according to photomask substrate container unit of the present invention.Be that described transportation resources is that inclination attitude with the pre-determined tilt angle remains on photomask substrate in the aforementioned lights mask substrate container unit and the method for transportation photomask substrate when keeping described angle of inclination.
Described photomask Manufacturing Method of Products is the method that may further comprise the steps at least: the photomask substrate production stage, substrate forms step, with check step, wherein said manufacture method remains on photomask substrate in the aforementioned lights mask substrate container unit with the inclination attitude of pre-determined tilt angle and the transportation and/or the storage of the photomask substrate between the execution in step when keeping described angle of inclination.
Described photomask exposure method is to be used to the irradiation that makes photomask be subjected to light and will to be formed on the method for pattern transfer on the target on the photomask, and described photomask exposure method may further comprise the steps: with the inclination attitude of pre-determined tilt angle described photomask substrate is placed on step in the aforementioned lights mask substrate container unit; Described photomask substrate container unit is transported to exposure sources, and simultaneously described photomask substrate is placed on step in the photomask substrate container unit with the inclination attitude of described pre-determined tilt angle; With described photomask substrate is taken out from described photomask substrate container unit and described photomask substrate is placed to step in the described exposure sources.
As mentioned above, according to the present invention, compared to the vertical type light mask substrate container unit that is suitable for vertically keeping photomask substrate, described photomask substrate container unit can in height reduce.Thus, can prevent that the visual field during transportation photomask substrate container unit from hindering, therefore, not only can be so that the transportation of photomask substrate container unit, and can overcome the shortcoming that transportation resources is restricted.In addition, because the aspect ratio of photomask substrate container unit reduces, so can prevent falling down during the transported/stored.
In addition, because the end face of photomask substrate and the back side can be supported, thus support loads that can the dispersed light mask substrate, thus breaking of photomask substrate prevented.In addition because unnecessaryly when putting into and take out photomask substrate fell or lifted the photomask substrate container unit, so can simplify photomask substrate put into and take out operation.In other words, the inclination attitude that photomask substrate can the pre-determined tilt angle is put into the photomask substrate container unit, and in the posture, photomask substrate can betransported and/or store when keeping this and put into.
In addition, this step can be set in some stages of making photomask substrate.In addition, the photomask product is being placed in the exposure sources when carrying out exposure equally, photomask substrate can the pre-determined tilt angle inclination attitude be placed in the photomask substrate container unit and betransported, then, when the photomask substrate container unit was during transportation kept this posture, photomask substrate can be taken out and be placed in the exposure sources so that exposure from the inside of photomask substrate container unit.
Description of drawings
Fig. 1 is the skeleton view of conventional photomask box;
Fig. 2 is the cross sectional view when the side of the photomask box shown in Fig. 1 is seen;
Fig. 3 is the inside front view of the photomask box shown in Fig. 1;
Fig. 4 is the perspective schematic view of photomask substrate container unit according to an embodiment of the invention;
Fig. 5 is the cross sectional view when the photomask substrate container unit side shown in Fig. 4 is seen;
Fig. 6 is the inside front view of the photomask substrate container unit shown in Fig. 4;
Fig. 7 is the keychart that is used to calculate according to the weight of photomask substrate container unit of the present invention;
Fig. 8 is the curve map that shows according to the weight of photomask substrate container unit of the present invention;
Fig. 9 is the perspective schematic view of photomask substrate container unit according to another embodiment of the present invention; With
Figure 10 is the cross sectional view along the photomask substrate container unit of the A-A line among Fig. 9.
Embodiment
Fig. 4 shows the perspective schematic view of photomask substrate container unit according to an embodiment of the invention, Fig. 5 is the cross sectional view of seeing from the side of the photomask substrate container unit shown in Fig. 4, and Fig. 6 is the inside front view of the photomask substrate container unit shown in Fig. 4.Fig. 7 is the keychart that is used for the weight of the photomask substrate container unit shown in the calculating chart 4, and Fig. 8 is the curve map of the weight of the photomask substrate container unit shown in the displayed map 4.
As shown in these figures, photomask substrate container unit 1 is the rectangular parallelepiped protrusion part box that is used to transport photomask substrate K, and comprises housing 10, and described housing 10 is used for holding photomask substrate K within it; And holding member (back description), described holding member is used for photomask substrate K is remained in the housing 10.
When thereby very big its length of minor face of first type surface surpassed 800mm on the photomask substrate K size that is received, photomask substrate container unit 1 was favourable.For example, photomask substrate container unit 1 can hold and has height (minor face) and be the size of 13mm or larger sized large-size photomask substrate for 1220mm, length (long limit) for 1400mm and width (thickness).When photomask substrate K size increased, effect of the present invention became more remarkable.
As previously mentioned, photomask substrate K can be glass substrate, photomask blank or the photomask that is used for photomask.
In addition, in the case, inner easily by in the at arm's length scope of workman and can easily be taken out thus thereby photomask substrate K is maintained at outer container 11 with the posture that tilts.Therefore, can be configured to equal the maintenance angle of photomask substrate K when the angle of inclination that when the side of outer container 10 is seen, receives opening 14.
If receive opening 14 with respect to the angle of inclination of the maintenance angle of photomask substrate K within ± 10 degree, particularly within ± 5 degree, will can not hinder putting into and taking out of photomask substrate so.Therefore, in the present invention, receive maintenance angle (angle of inclination) expression that opening equals photomask substrate K substantially with respect to the angle of inclination of outer container 11 receive opening 14 with respect to the angle of inclination of the maintenance angle of photomask substrate K fall into ± scopes of 10 degree in.
When the side of photomask substrate K was seen, holding member remained on inclination attitude with photomask substrate K.Photomask substrate K is with respect to the pitch angle of horizontal axis 45 to 80 degree preferably.Utilize this structure, because the height of photomask substrate container unit 1 be suitable for the vertical vertical type light mask cassette of photomask substrate K that keeps and compare and can reduce, so not only can be so that the transportation of photomask substrate container unit 1 (moving), and can overcome the confined shortcoming of transportation resources.In addition, because the aspect ratio of photomask substrate container unit 1 can be reduced, so can prevent to transport and the falling down of memory period.In addition because unnecessaryly when putting into and taking out photomask substrate K fell or lifted photomask substrate container unit 1, so can simplify photomask substrate K put into and take out operation.
In illustrated embodiment, photomask substrate K is configured to one dimension in photomask substrate container unit 1, promptly only when tilting when the side of photomask substrate K is seen.Therefore, the long limit of photomask substrate K is a level.Yet, the invention is not restricted to this embodiment, but can be applied to also that photomask substrate K bidimensional tilts or the situation of three-dimensional tilt, promptly only when from the front and/or top inclination when seeing.In the case, preferably be set within 30 degree when the angle of inclination when front and/or top are seen.
The photomask substrate container unit 1 of this embodiment has placing component 20, end face pressing element 30 and the first type surface pressing element 40 as holding member.
Refer again to Fig. 2, vertically keep in the conventional photomask box 100 of photomask substrate K being suitable for, the load of photomask substrate K is mainly by the stayed surface 106-1 support of retaining part 106 down, and the vertical support of retaining part 106 surface 106-2 only is used to substantially prevent that photomask substrate K from falling down down.
On the other hand, be suitable for photomask substrate K is remained in the photomask substrate container unit 1 of inclination attitude of the present invention, because the load of photomask substrate K suitably is distributed to down first stayed surface 21 and second stayed surface 22 of placing component 20, so can prevent breaking of the photomask substrate K that causes by load concentration.
End face pressing element 30 is used at four sides of photomask substrate K extruding photomask substrate K, thus suppress photomask substrate K along the vibrations of its first type surface to prevent to produce the dust that friction causes.In this embodiment, photomask substrate container unit 1 comprises two upper surface pressing elements 30 of the upper surface that is used to push photomask substrate K, be used to push two lower surface pressing elements 30 of the lower surface of photomask substrate K, two the left side pressing elements 30 and being used to that are used to push the left side of photomask substrate K push two right side pressing elements 30 of the right side of photomask substrate K.By using these end face pressing elements 30, along the first type surface of photomask substrate K upwards, downwards, left and to the right vibration is inhibited.
In these end face pressing elements 30 each comprises back up pad 31, and described back up pad 31 has threaded hole and is connected to outer container 11; Thread spindle 32, described thread spindle 32 is threaded in the back up pad 31; Elastomeric element 33, described elastomeric element 33 is arranged on the tip of thread spindle 32; With double nut 34, described double nut 34 is fixed on optional position with thread spindle 32.That is, by rotating thread spindle 32 with the position of adjustment elastomeric element 33 with by double nut 34 being fastened on the end face state of contact of elastomeric element 33 and photomask substrate K, the end face of photomask substrate K is extruded.On the other hand, because lower surface pressing element 30 need flush with first stayed surface 21 of following placing component 20, so the position of the elastomeric element 33 of lower surface pressing element 30 can be fixed.
In this embodiment, end face pressing element 30 only pushes the edge of photomask substrate K.Yet end face pressing element 30 can be configured to also push front surface and the rear surface of photomask substrate K.For example, each elastomeric element 33 end of being formed with recess and photomask substrate K at its tip is fitted in this recess.Utilize this structure, can be suppressed at simultaneously perpendicular to the vibration on the direction of the first type surface of photomask substrate K.
First type surface pressing element 40 is used to push the first type surface of photomask substrate K, thereby is suppressed at perpendicular to the vibration on the direction of the first type surface of photomask substrate K, with the dust that prevents to be caused by friction.In this embodiment, photomask substrate container unit 1 comprises four first type surface pressing elements 40 on the inboard that is arranged on lid 12, and follows closely after the shutoff operation of lid 12, and four angles of the first type surface of photomask substrate K are by 40 extruding of first type surface pressing element.
In the first type surface pressing element 40 each comprises pipeline 41, and described pipeline 41 is outstanding on the inboard of lid 12; Elastomeric element 42, described elastomeric element 42 is movably received within the tip portion of pipeline 41; With spring 43, described spring 43 is arranged in the pipeline 41, thereby promotes elastomeric element 42 on projected direction.By making the first type surface Elastic Contact of elastomeric element 42 and photomask substrate K, be inhibited perpendicular to the vibration on the direction of the first type surface of photomask substrate K.
Because Gou Zao photomask substrate container unit 1 holds photomask substrate K with inclination attitude thus, surface area and weight have been increased.Yet when comparing with vertical type or lateral type photomask box, the weight of photomask substrate container unit 1 (proportional with surface area substantially) can be suppressed to about twice in maximal value.
Promptly, as shown in Figure 7, the height of supposing photomask substrate K is that the length of H1, photomask substrate K is that the angle of inclination of W1 and photomask substrate K is θ, then the minimum constructive height of photomask substrate container unit 1 is H1sin θ, the minimum length of photomask substrate container unit 1 is W1, and the minimum-depth of photomask substrate container unit 1 is H1cos θ.Therefore, the front surface of photomask substrate container unit 1 and in the rear surface each area S1, photomask substrate container unit 1 the left surface and in the right surface each area S2 and the upper surface of photomask substrate container unit 1 and in the lower surface each area S3 and the surface area S of photomask substrate container unit 1 calculate as follows:
S1＝H1·W1·sinθ
S2＝H1
2·sinθ·cosθ
S3＝H1·W1·cosθ
S＝2(S1+S2+S3)
Then, when tilt angle theta changes in the scope of 0 to 90 degree, surface area (weight) variation as shown in Figure 8, but it being understood that surface area (weight) even become that 45 maximum degree places also can be suppressed to twice or less than twice at surface area.
Here, with regard to suitable aspect ratio, stability and the easiness of putting into and taking out photomask substrate K, tilt angle theta preferably is set in the scope of 45 to 80 degree, and just suppresses the increase of weight, and tilt angle theta further preferably is set in the scope of 60 to 80 degree.
To describe now and use aforementioned lights mask substrate container unit 1 to place, transport and take out photomask substrate K.
Photomask substrate K is placed in the photomask substrate container unit 1 in the toilet of factory usually.When being placed into photomask substrate K in the photomask substrate container unit 1, at first uncap 12, photomask substrate K are placed on temporarily on the placing component 20 of photomask substrate container unit 1 inside then.In the case, photomask substrate K is when tilting when its side is seen.After this, the end face of photomask substrate K is by 30 extruding of end face pressing element, and lid 12 is closed then.When lid 12 is closed, be arranged on the first type surface Elastic Contact of elastomeric element 42 with the photomask substrate K of the first type surface pressing element 40 on the inboard of lid 12.
Photomask substrate container unit 1 with placement photomask substrate K within it is transported to the outside of toilet.In the case, photomask substrate container unit 1 can easily be transported (moving) by using Caster 13.
Photomask substrate container unit 1 with placement photomask substrate K within it is transported to by the transportation resources of suitably selecting for example land transportation, air transportation, marine transportation etc. pays the destination.In the case, because photomask substrate container unit 1 be suitable for the vertical vertical type light mask cassette of photomask substrate K that keeps and compare and can in height reduce, so not only can be so that transportation photomask substrate container unit 1, and can overcome the shortcoming that transportation resources is restricted.In addition, because the aspect ratio of photomask substrate container unit 1 reduces, so can prevent to transport or the falling down of memory period.
Paying the destination, the photomask substrate K that is paid takes out in the toilet of factory usually.This operates in uncap 12 and discharges by carrying out after the extruding of end face pressing element 30.
As mentioned above, according to this this embodiment that constitutes thus, the photomask substrate container unit 1 that is used for transported/stored photomask substrate K comprises housing 10 and holding member, described housing 10 is used for holding photomask substrate K within it, and described holding member is used for photomask substrate K is remained in the housing 10.Because holding member is configured to keep photomask substrate K with inclination attitude (when when the side of photomask substrate K is seen), so photomask substrate container unit 1 is when reducing highly when being suitable for the vertical vertical type light mask cassette comparison that keeps photomask substrate K.Thus, not only can be so that transportation photomask substrate container unit 1, and can overcome the shortcoming that transportation resources is restricted.In addition, because the aspect ratio of photomask substrate container unit 1 reduces, so can prevent falling down between the delivery period.In addition, because the end face of photomask substrate K and the back side can be supported, thus support loads that can dispersed light mask substrate K, thus breaking of photomask substrate K prevented.In addition because when putting into and taking out photomask substrate K, needn't put down or lift photomask substrate container unit 1, so can simplify photomask substrate K put into and take out operation.
In addition, when photomask substrate K is set to 45 to 80 when spending with respect to the angle of inclination of horizontal axis, the height of photomask substrate container unit 1, aspect ratio, the floor area (base portion area) that takies can be set the balance that reaches good.
In addition, when provide placing component 20 (being used for holding photomask substrate K thereon) as holding member and end face pressing element 30 when (being used to push the end face that is placed on the photomask substrate K on the placing component 20) temporarily, because photomask substrate K can be placed temporarily, so that photomask substrate K holding with respect to photomask substrate container unit 1.In addition, by using the end face of end face pressing element 30 extruding photomask substrate K, can suppress along the vibration of the first type surface of photomask substrate K, thereby prevent to produce the dust that causes by friction.
In addition, when providing first type surface pressing element 40 when (being used to push the first type surface of photomask substrate K) as holding member, by using the first type surface of first type surface pressing element 40 extruding photomask substrate K, can suppress perpendicular to the vibration on the direction of the first type surface of photomask substrate K, thereby prevent to produce the dust that causes by friction.
Photomask substrate container unit according to another embodiment of the present invention will be described now.
Fig. 9 is the perspective schematic view of photomask substrate container unit according to another embodiment of the present invention, and Figure 10 is the cross sectional view when the side of photomask substrate container unit shown in Figure 9 is seen.
In this embodiment, housing 101 comprises outer container 103, and photomask substrate K puts into outer container 103 by reception opening 102 and takes out from outer container 103; With lid 104, described lid 104 is used for opening and closing reception opening 102.For example, described housing can be implemented as the conventional housings 101 shown in Fig. 1 to Fig. 3, except Caster 105 is removed.
In housing 101 inside, be provided with retaining part 106, four angles that described retaining part 106 keeps photomask substrate K as holding member; Describe end face pressing element 30 end face pressing element (diagram is omitted) equally as described above among the embodiment, described end face pressing element is used for the end face at the four sides extruding photomask substrate K of photomask substrate K.These retaining parts 106 are configured to respect to housing 101 vertical maintenance photomask substrate K with the end face pressing element.
Utilize this structure, when housing 101 was fixed or be placed on the placement platform 110, the supported parts 113 in the bottom at the lower surface of housing 101 and housing 101 back sides supported.In addition, by the front support of cross member 111, and supported by back support parts 114 by the top of back side of shell in the left-hand face of its bottom and right lateral surface for housing 101.And housing 101 is held part 112a support in the left side and the right lateral surface on its top.As a result, whole housing 101 is placed platform 110 and supports securely.
When support housing 101, each stayed surface of support component 113 and back support parts 114 forms housing 101 and becomes 45 to 80 degree with respect to the pitch angle of horizontal axis.Utilize this structure, can reduce height because the photomask substrate container unit is compared with vertical type light mask cassette, thus with the identical effect of effect in the previous embodiment, the transportation of for example being convenient to the photomask substrate container unit is shown.
In this facility example, the distance that cross member 111 is arranged between the cross member 111 increases towards rear side.Therefore, the support column 112 that is vertically set on cross member 111 rear portions has also increased between the support column 112 distance towards rear side.Utilize this structure, as shown in Figure 9, when arranging two placement platforms, the downside of the placement platform of representing with solid line of back can be placed in the lower space on the rear side of placement platform of the front of representing with double dot dash line.Therefore, the mode that a plurality of placement platforms 110 can be overlapping is closely arranged and long interval is being provided between placement platform 110 on the fore-and-aft direction, thereby can or store the time save space in transportation.
Photomask substrate K can be placed in the housing 101 or in housing 101 and take out, and the posture that while housing 101 tilts at a predetermined angle is placed on the placement platform 110.Yet photomask substrate K be placed or be taken out to the condition during according to placement or taking-up photomask substrate K also can under the state that housing 101 separates from placement platform 110.
The present invention also may be embodied as the photomask substrate transportation resources.That is, can realize that inclination attitude with the pre-determined tilt angle remains on photomask substrate in the aforementioned lights mask substrate container unit and transport the method for this photomask substrate when keeping this angle of inclination.According to this transportation resources, because the photomask substrate container unit can reduce height, thus not only be convenient to the transportation of photomask substrate container unit, and increased the selectance of transportation resources.In addition, because the aspect ratio of photomask substrate container unit reduces, so can prevent falling down between the delivery period.
In addition, the present invention also may be embodied as the photomask Manufacturing Method of Products.Promptly, can realize the photomask Manufacturing Method of Products, described manufacture method may further comprise the steps at least: the photomask substrate production stage, substrate forms step, with check step, wherein said manufacture method remains on photomask substrate in the aforementioned lights mask substrate container unit with the inclination attitude of pre-determined tilt angle and the transportation and/or the storage of the photomask substrate between the execution in step when keeping described angle of inclination.
In addition, the present invention also may be embodied as photomask exposure/transfer printing (or exposure) method.That is, can realize photomask exposure/printing transferring method, described photomask exposure/printing transferring method may further comprise the steps: photomask substrate is placed on step in the aforementioned lights mask substrate container unit with the inclination attitude of pre-determined tilt angle; The photomask substrate container unit is transported to the step of exposure/transfer printing or exposure sources, and photomask substrate is placed in the photomask substrate container unit with the inclination attitude of pre-determined tilt angle simultaneously; With photomask substrate is taken out and photomask substrate is arranged on step in exposure/transfer apparatus from the photomask substrate container unit, wherein said photomask exposure/printing transferring method by abovementioned steps with pattern exposure/be transferred on the photomask substrate.
The present invention can be applicable to be used to transport and/or store the photomask substrate container unit of photomask substrate, and is particularly suitable for transporting the large-size photomask substrate that uses in making LCDPs, PDPs etc.
Claims (11)
1, a kind of photomask substrate container unit that is used to transport and/or store photomask substrate, described photomask substrate container unit comprises:
Holding member, described holding member keeps described photomask substrate with the inclination attitude of pre-determined tilt angle; With
Housing, described housing are used for holding described photomask substrate within it.
2, photomask substrate container unit according to claim 1, wherein said photomask substrate is 45 to 80 degree with respect to the angle of inclination of horizontal axis.
3, photomask substrate container unit according to claim 2, wherein said holding member are arranged on described enclosure interior and described photomask substrate are remained on described enclosure interior.
4, photomask substrate container unit according to claim 3, wherein said holding member comprises placing component and end face pressing element, described placing component holds described photomask substrate thereon temporarily, and described end face pressing element extruding is placed on the end face of the described photomask substrate on the described placing component.
5, photomask substrate container unit according to claim 4, wherein said holding member further comprises the first type surface pressing element, described first type surface pressing element is used to push the first type surface of described photomask substrate.
6, photomask substrate container unit according to claim 3, wherein said housing comprises outer container and is used to form the lid that receives opening, described upper surface, front surface and the both side surface that is used for forming by the reception opening that it put into and took out described photomask substrate the described outer container of extend through.
7, photomask substrate container unit according to claim 6, wherein said reception opening is formed obliquely when a side surface is seen with respect to described outer container, and the angle of inclination of reception opening equals the angle of inclination by the described photomask substrate of described holding member maintenance substantially.
8, photomask substrate container unit according to claim 2, wherein said holding member are arranged on the outside of described housing and keep described housing, and described photomask substrate is accommodated in the described housing with the posture that tilts.
9, a kind of photomask substrate transportation resources said method comprising the steps of:
The inclination attitude of described photomask substrate with the pre-determined tilt angle remained on according in each described photomask substrate container unit among the claim 1-8; With
Transport described photomask substrate, keep described angle of inclination simultaneously.
10, a kind of photomask Manufacturing Method of Products, described photomask Manufacturing Method of Products comprise that at least photomask substrate production stage, substrate form step and check step,
Wherein said manufacture method remains on photomask substrate according in each described photomask substrate container unit among the claim 1-8 and carry out the transportation and/or the storage of the described photomask substrate between the described step when keeping described angle of inclination with the inclination attitude of pre-determined tilt angle.
11, a kind of photomask exposure method is used to the irradiation that makes photomask be subjected to light and will be formed on pattern transfer on the photomask to target, and described photomask exposure/printing transferring method may further comprise the steps:
With the inclination attitude of pre-determined tilt angle described photomask substrate is placed on according in each the photomask substrate container unit among the claim 1-8;
Described photomask substrate container unit is transported to exposure sources, and described photomask substrate is placed in the photomask substrate container unit with the inclination attitude of described pre-determined tilt angle simultaneously; With
Described photomask substrate is taken out from described photomask substrate container unit and described photomask substrate is set in the described exposure sources.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006023289 | 2006-01-31 | ||
| JP2006-023289 | 2006-01-31 | ||
| JP2006023289 | 2006-01-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101013270A true CN101013270A (en) | 2007-08-08 |
| CN101013270B CN101013270B (en) | 2010-12-15 |
Family
ID=38599765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007100083998A Expired - Fee Related CN101013270B (en) | 2006-01-31 | 2007-01-29 | Photomask substrate container unit, photomask substrate transportation and exposal method |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100985260B1 (en) |
| CN (1) | CN101013270B (en) |
| TW (1) | TWI337161B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102161409A (en) * | 2009-12-15 | 2011-08-24 | 信越化学工业株式会社 | Case for conveying glass substrate and carriage for conveying glass substrate |
| CN102201352A (en) * | 2010-03-24 | 2011-09-28 | 信越化学工业株式会社 | Receiving container for dustproof thin film component and trolley for transporting the same |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6693356B2 (en) * | 2016-09-09 | 2020-05-13 | 株式会社ダイフク | Article carrier |
| KR102229465B1 (en) * | 2019-03-20 | 2021-03-18 | 이현만 | Board case carrying case supporting the pedestal |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000031257A (en) * | 1998-07-07 | 2000-01-28 | Nikon Corp | Container of substrate for manufacturing semiconductor device |
| JP4251290B2 (en) * | 2003-10-09 | 2009-04-08 | 旭硝子株式会社 | Glass plate packing box, packing method and unpacking method |
| JP4476727B2 (en) * | 2003-11-18 | 2010-06-09 | 株式会社 ネットプラスチック | Large precision sheet-shaped (semi) sealed container for products |
| JP2005320050A (en) * | 2004-05-11 | 2005-11-17 | Kyokuhei Glass Kako Kk | Cassette-housing type glass board transfer box |
-
2007
- 2007-01-26 TW TW096102928A patent/TWI337161B/en not_active IP Right Cessation
- 2007-01-29 CN CN2007100083998A patent/CN101013270B/en not_active Expired - Fee Related
- 2007-01-30 KR KR1020070009250A patent/KR100985260B1/en not_active IP Right Cessation
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102161409A (en) * | 2009-12-15 | 2011-08-24 | 信越化学工业株式会社 | Case for conveying glass substrate and carriage for conveying glass substrate |
| CN102161409B (en) * | 2009-12-15 | 2013-01-23 | 信越化学工业株式会社 | Case for conveying glass substrate and carriage for conveying glass substrate |
| CN102201352A (en) * | 2010-03-24 | 2011-09-28 | 信越化学工业株式会社 | Receiving container for dustproof thin film component and trolley for transporting the same |
| CN102201352B (en) * | 2010-03-24 | 2013-10-16 | 信越化学工业株式会社 | Trolley for transporting receiving container for dustproof thin film component |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI337161B (en) | 2011-02-11 |
| TW200734253A (en) | 2007-09-16 |
| KR100985260B1 (en) | 2010-10-04 |
| CN101013270B (en) | 2010-12-15 |
| KR20070079003A (en) | 2007-08-03 |
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