TW200732981A - Identification mark reading method and apparatus for the same - Google Patents

Identification mark reading method and apparatus for the same

Info

Publication number
TW200732981A
TW200732981A TW095148994A TW95148994A TW200732981A TW 200732981 A TW200732981 A TW 200732981A TW 095148994 A TW095148994 A TW 095148994A TW 95148994 A TW95148994 A TW 95148994A TW 200732981 A TW200732981 A TW 200732981A
Authority
TW
Taiwan
Prior art keywords
identification mark
wafer
infrared
principle surface
reading method
Prior art date
Application number
TW095148994A
Other languages
English (en)
Other versions
TWI346900B (en
Inventor
Masaharu Sasaki
Original Assignee
Yamaha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamaha Corp filed Critical Yamaha Corp
Publication of TW200732981A publication Critical patent/TW200732981A/zh
Application granted granted Critical
Publication of TWI346900B publication Critical patent/TWI346900B/zh

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K7/00—Methods or arrangements for sensing record carriers, e.g. for reading patterns
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K7/00—Methods or arrangements for sensing record carriers, e.g. for reading patterns
    • G06K7/10—Methods or arrangements for sensing record carriers, e.g. for reading patterns by electromagnetic radiation, e.g. optical sensing; by corpuscular radiation
    • G06K7/10544—Methods or arrangements for sensing record carriers, e.g. for reading patterns by electromagnetic radiation, e.g. optical sensing; by corpuscular radiation by scanning of the records by radiation in the optical part of the electromagnetic spectrum
    • G06K7/10712—Fixed beam scanning
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K7/00—Methods or arrangements for sensing record carriers, e.g. for reading patterns
    • G06K7/10—Methods or arrangements for sensing record carriers, e.g. for reading patterns by electromagnetic radiation, e.g. optical sensing; by corpuscular radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Artificial Intelligence (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing Of Coins (AREA)
TW095148994A 2005-12-27 2006-12-26 Identification mark reading method and apparatus for the same TWI346900B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005375835A JP2007180200A (ja) 2005-12-27 2005-12-27 識別マークの読取方法及び識別マークの読取装置

Publications (2)

Publication Number Publication Date
TW200732981A true TW200732981A (en) 2007-09-01
TWI346900B TWI346900B (en) 2011-08-11

Family

ID=38305108

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095148994A TWI346900B (en) 2005-12-27 2006-12-26 Identification mark reading method and apparatus for the same

Country Status (5)

Country Link
US (1) US20070187514A1 (zh)
JP (1) JP2007180200A (zh)
KR (1) KR20070069071A (zh)
CN (1) CN100520803C (zh)
TW (1) TWI346900B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9746400B2 (en) 2012-05-07 2017-08-29 Shin-Etsu Handotai Co., Ltd. Method for evaluating semiconductor wafer and apparatus for evaluating semiconductor wafer

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5078725B2 (ja) * 2008-04-22 2012-11-21 ラピスセミコンダクタ株式会社 半導体装置
JP2014154661A (ja) * 2013-02-07 2014-08-25 Hitachi Metals Ltd 窒化物半導体ウェハおよび窒化物半導体ウェハのマーキング方法
JP6906859B2 (ja) * 2017-09-13 2021-07-21 株式会社ディスコ 加工装置
CN111723591B (zh) * 2020-05-22 2021-03-30 杭州长川科技股份有限公司 晶圆id读取装置
CN112509948A (zh) * 2020-12-18 2021-03-16 无锡奥特维科技股份有限公司 标记码识别装置、方法及硅片分选设备、电池片生产设备
CN112949804A (zh) * 2021-04-02 2021-06-11 Oppo广东移动通信有限公司 图形码、图形码识别方法、存储介质及相关装置
CN115714103B (zh) * 2022-11-25 2023-11-24 拓荆键科(海宁)半导体设备有限公司 用于晶圆键合对准及检测的装置和方法
CN116503586B (zh) * 2023-06-27 2023-09-05 钜宝(深圳)智能有限公司 一种金点检测机及检测方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4812631A (en) * 1987-06-02 1989-03-14 Kam Kwong Lee Limited Bar code and read-out method thereof
US5733711A (en) * 1996-01-02 1998-03-31 Micron Technology, Inc. Process for forming both fixed and variable patterns on a single photoresist resin mask
JPH10247613A (ja) * 1997-03-04 1998-09-14 Hitachi Ltd 識別パターン付き基板および識別パターン読取方法並びに装置
US6768539B2 (en) * 2001-01-15 2004-07-27 Asml Netherlands B.V. Lithographic apparatus
US7113258B2 (en) * 2001-01-15 2006-09-26 Asml Netherlands B.V. Lithographic apparatus
US7018674B2 (en) * 2001-03-02 2006-03-28 Omron, Corporation Manufacturing methods and apparatuses of an optical device and a reflection plate provided with a resin thin film having a micro-asperity pattern
US7371663B2 (en) * 2005-07-06 2008-05-13 Taiwan Semiconductor Manufacturing Co., Ltd. Three dimensional IC device and alignment methods of IC device substrates
US8247773B2 (en) * 2007-06-26 2012-08-21 Yamaha Corporation Method and apparatus for reading identification mark on surface of wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9746400B2 (en) 2012-05-07 2017-08-29 Shin-Etsu Handotai Co., Ltd. Method for evaluating semiconductor wafer and apparatus for evaluating semiconductor wafer

Also Published As

Publication number Publication date
US20070187514A1 (en) 2007-08-16
TWI346900B (en) 2011-08-11
CN100520803C (zh) 2009-07-29
KR20070069071A (ko) 2007-07-02
JP2007180200A (ja) 2007-07-12
CN101008979A (zh) 2007-08-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees