TW200728482A - Inertial bonding method of forming a sputtering target assembly and assembly made therefrom - Google Patents

Inertial bonding method of forming a sputtering target assembly and assembly made therefrom

Info

Publication number
TW200728482A
TW200728482A TW095135801A TW95135801A TW200728482A TW 200728482 A TW200728482 A TW 200728482A TW 095135801 A TW095135801 A TW 095135801A TW 95135801 A TW95135801 A TW 95135801A TW 200728482 A TW200728482 A TW 200728482A
Authority
TW
Taiwan
Prior art keywords
sputtering target
assembly
forming
made therefrom
bonding method
Prior art date
Application number
TW095135801A
Other languages
English (en)
Inventor
Charles E Wickersham Jr
Jason Haag
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of TW200728482A publication Critical patent/TW200728482A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C11/00—Alloys based on lead
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
TW095135801A 2005-09-28 2006-09-27 Inertial bonding method of forming a sputtering target assembly and assembly made therefrom TW200728482A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72143105P 2005-09-28 2005-09-28

Publications (1)

Publication Number Publication Date
TW200728482A true TW200728482A (en) 2007-08-01

Family

ID=37682777

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095135801A TW200728482A (en) 2005-09-28 2006-09-27 Inertial bonding method of forming a sputtering target assembly and assembly made therefrom

Country Status (7)

Country Link
US (1) US20070084719A1 (zh)
JP (1) JP2009510264A (zh)
KR (1) KR20080054414A (zh)
CN (1) CN101313083A (zh)
DE (1) DE112006002609T5 (zh)
TW (1) TW200728482A (zh)
WO (1) WO2007038651A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI561654B (en) * 2010-11-24 2016-12-11 Plansee Se Composition for bonding rotary target for sputtering and method for bonding rotary target using the same
TWI746634B (zh) * 2017-09-12 2021-11-21 日商三菱綜合材料股份有限公司 圓筒型濺鍍靶

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* Cited by examiner, † Cited by third party
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EP2213763A3 (en) * 2003-08-11 2010-08-18 Honeywell International Inc. Target/backing plate constructions, and methods of forming target/backing plate constructions
EP2230325A1 (en) * 2009-03-20 2010-09-22 Applied Materials, Inc. Deposition apparatus with high temperature rotatable target and method of operating thereof
CN103354210B (zh) * 2013-06-27 2016-08-10 清华大学 一种键合方法及采用该键合方法形成的键合结构
US10192849B2 (en) * 2014-02-10 2019-01-29 Infineon Technologies Ag Semiconductor modules with semiconductor dies bonded to a metal foil
KR101923292B1 (ko) * 2014-07-31 2018-11-28 제이엑스금속주식회사 방식성의 금속과 Mo 또는 Mo 합금을 확산 접합한 백킹 플레이트, 및 그 백킹 플레이트를 구비한 스퍼터링 타깃-백킹 플레이트 조립체
US20160167353A1 (en) * 2014-12-12 2016-06-16 GM Global Technology Operations LLC Systems and methods for joining components
US10807864B2 (en) * 2017-01-30 2020-10-20 The Regents Of The University Of Colorado, A Body Corporate Methods of achieving universal interfacing using suspended and/or freestanding structures
EP3825126B1 (en) * 2019-11-25 2023-03-15 Linxens Holding Laminated foil structure and method of forming the same
CN115647571A (zh) * 2022-12-26 2023-01-31 北京坤飞航天科技有限公司 一种t形接头的铸焊铆复合连接方法及连接结构
CN116511752B (zh) * 2023-01-31 2024-02-06 度亘核芯光电技术(苏州)有限公司 一种铜表面结构、制备方法及其焊接方法

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US3452421A (en) * 1964-03-13 1969-07-01 Caterpillar Tractor Co Friction welding of dissimilar materials
US3693238A (en) * 1970-10-02 1972-09-26 Aluminum Co Of America Friction welding of aluminum and ferrous workpieces
US3804691A (en) * 1972-05-12 1974-04-16 Western Electric Co Method of bonding using an infrared heating lamp
US3998376A (en) * 1975-12-12 1976-12-21 Estan Manufacturing Company Method for forming a connection between two tubes
US4349954A (en) * 1980-11-26 1982-09-21 The United States Of America As Represented By The United States National Aeronautics And Space Administration Mechanical bonding of metal method
DE3233215C1 (de) * 1982-09-07 1984-04-19 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Befestigen von in Scheiben- oder Plattenform vorliegenden Targetmaterialien auf Kuehlteller fuer Aufstaeubanlagen
US5230459A (en) * 1992-03-18 1993-07-27 Tosoh Smd, Inc. Method of bonding a sputter target-backing plate assembly assemblies produced thereby
US5269899A (en) * 1992-04-29 1993-12-14 Tosoh Smd, Inc. Cathode assembly for cathodic sputtering apparatus
US5693203A (en) * 1992-09-29 1997-12-02 Japan Energy Corporation Sputtering target assembly having solid-phase bonded interface
US5286361A (en) * 1992-10-19 1994-02-15 Regents Of The University Of California Magnetically attached sputter targets
US5342496A (en) * 1993-05-18 1994-08-30 Tosoh Smd, Inc. Method of welding sputtering target/backing plate assemblies
US6199259B1 (en) * 1993-11-24 2001-03-13 Applied Komatsu Technology, Inc. Autoclave bonding of sputtering target assembly
WO1996015283A1 (en) * 1994-11-15 1996-05-23 Tosoh Smd, Inc. Method of bonding targets to backing plate member
US5593082A (en) * 1994-11-15 1997-01-14 Tosoh Smd, Inc. Methods of bonding targets to backing plate members using solder pastes and target/backing plate assemblies bonded thereby
US5522535A (en) * 1994-11-15 1996-06-04 Tosoh Smd, Inc. Methods and structural combinations providing for backing plate reuse in sputter target/backing plate assemblies
JPH08218166A (ja) * 1995-02-10 1996-08-27 Sumitomo Chem Co Ltd スパッタリング用ターゲットの接合方法
US5836506A (en) * 1995-04-21 1998-11-17 Sony Corporation Sputter target/backing plate assembly and method of making same
US5857611A (en) * 1995-08-16 1999-01-12 Sony Corporation Sputter target/backing plate assembly and method of making same
US5863398A (en) * 1996-10-11 1999-01-26 Johnson Matthey Electonics, Inc. Hot pressed and sintered sputtering target assemblies and method for making same
JPH1112716A (ja) * 1997-06-19 1999-01-19 Seiko Epson Corp ロウ接用材料およびその製造方法
US6071389A (en) * 1998-08-21 2000-06-06 Tosoh Smd, Inc. Diffusion bonded sputter target assembly and method of making
US6749103B1 (en) * 1998-09-11 2004-06-15 Tosoh Smd, Inc. Low temperature sputter target bonding method and target assemblies produced thereby
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6725522B1 (en) * 2000-07-12 2004-04-27 Tosoh Smd, Inc. Method of assembling target and backing plates
WO2002022300A1 (en) * 2000-09-11 2002-03-21 Tosoh Smd, Inc. Method of manufacturing sputter targets with internal cooling channels
WO2002047865A1 (en) * 2000-12-15 2002-06-20 Tosoh Smd, Inc. Friction fit target assembly for high power sputtering operation
EP1349682B1 (en) * 2000-12-18 2008-10-08 Tosoh Smd, Inc. Low temperature sputter target/backing plate joining technique and assemblies made thereby
US6536653B2 (en) * 2001-01-16 2003-03-25 Industrial Technology Research Institute One-step bumping/bonding method for forming semiconductor packages
DE60326621D1 (de) * 2002-10-21 2009-04-23 Cabot Corp Verfahren zur herstellung eines sputtertargets und sputtertarget

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI561654B (en) * 2010-11-24 2016-12-11 Plansee Se Composition for bonding rotary target for sputtering and method for bonding rotary target using the same
TWI746634B (zh) * 2017-09-12 2021-11-21 日商三菱綜合材料股份有限公司 圓筒型濺鍍靶

Also Published As

Publication number Publication date
JP2009510264A (ja) 2009-03-12
CN101313083A (zh) 2008-11-26
WO2007038651A1 (en) 2007-04-05
DE112006002609T5 (de) 2008-08-21
KR20080054414A (ko) 2008-06-17
US20070084719A1 (en) 2007-04-19

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