TW200716772A - Raw material feeder and vapor deposition apparatus - Google Patents

Raw material feeder and vapor deposition apparatus

Info

Publication number
TW200716772A
TW200716772A TW095136169A TW95136169A TW200716772A TW 200716772 A TW200716772 A TW 200716772A TW 095136169 A TW095136169 A TW 095136169A TW 95136169 A TW95136169 A TW 95136169A TW 200716772 A TW200716772 A TW 200716772A
Authority
TW
Taiwan
Prior art keywords
raw material
vapor deposition
deposition apparatus
material feeder
temperature
Prior art date
Application number
TW095136169A
Other languages
Chinese (zh)
Inventor
Toshihisa Nozawa
Masaji Inoue
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200716772A publication Critical patent/TW200716772A/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material

Abstract

A vapor deposition apparatus and a raw material feeder for use in the vapor deposition apparatus. In particular, there is provided a raw material feeder that improves the stability of film forming speed in vapor deposition apparatus, and provided a vapor deposition apparatus including the raw material feeder. The provided vapor deposition apparatus is vapor deposition apparatus (200) including treatment vessel (201) retaining treatment object substrate (203) thereinside and raw material feeder (100) capable of vaporizing or subliming raw material (101B) and feeding the same to the treatment vessel (201) so that the vaporized or sublimed raw material (101B) is deposited on the treatment object substrate (203), characterized in that the raw material feeder (100) includes vapor generation chamber (101) capable of heating the raw material (101B) at a first temperature to thereby vaporize or sublime the raw material (101B) into a gaseous raw material and temperature regulation chamber (105) capable of regulating the temperature of the gaseous raw material to a second temperature lower than the first temperature.
TW095136169A 2005-09-29 2006-09-29 Raw material feeder and vapor deposition apparatus TW200716772A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005285031A JP2007092149A (en) 2005-09-29 2005-09-29 Raw material feeder, and vapor deposition apparatus

Publications (1)

Publication Number Publication Date
TW200716772A true TW200716772A (en) 2007-05-01

Family

ID=37899692

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095136169A TW200716772A (en) 2005-09-29 2006-09-29 Raw material feeder and vapor deposition apparatus

Country Status (3)

Country Link
JP (1) JP2007092149A (en)
TW (1) TW200716772A (en)
WO (1) WO2007037268A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5011013B2 (en) * 2007-07-24 2012-08-29 大陽日酸株式会社 Xenon difluoride gas supply device
CN103385035B (en) * 2011-03-14 2016-02-17 夏普株式会社 Deposition particle ejecting device and evaporation coating device and evaporation coating method
KR101266553B1 (en) 2011-05-04 2013-05-27 주식회사 아비즈알 A source gas jetting nozzle for vacuum deposition apparatus and a vacuum deposition apparauts including the source gas jetting nozzle
DE102011051260A1 (en) * 2011-06-22 2012-12-27 Aixtron Se Method and device for depositing OLEDs
KR101517958B1 (en) * 2013-06-28 2015-05-06 엘아이지인베니아 주식회사 Assembly for depositing source and apparatus for depositing having the same
DE102014109196A1 (en) * 2014-07-01 2016-01-07 Aixtron Se Apparatus for generating a vapor from a solid or liquid source for a CVD or PVD device
WO2020082282A1 (en) * 2018-10-25 2020-04-30 China Triumph International Engineering Co., Ltd. Vapor deposition apparatus and use thereof
CN112553577A (en) * 2019-09-26 2021-03-26 宝山钢铁股份有限公司 Vacuum coating device for improving vacuum coating yield

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3684343B2 (en) * 2001-09-25 2005-08-17 株式会社日本ビーテック Molecular beam source cell for thin film deposition
JP2004022401A (en) * 2002-06-18 2004-01-22 Sony Corp Apparatus and method for forming organic film

Also Published As

Publication number Publication date
JP2007092149A (en) 2007-04-12
WO2007037268A1 (en) 2007-04-05

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