TW200715915A - Atmospheric glow plasma surface processing method and device for flexible material - Google Patents

Atmospheric glow plasma surface processing method and device for flexible material

Info

Publication number
TW200715915A
TW200715915A TW094135784A TW94135784A TW200715915A TW 200715915 A TW200715915 A TW 200715915A TW 094135784 A TW094135784 A TW 094135784A TW 94135784 A TW94135784 A TW 94135784A TW 200715915 A TW200715915 A TW 200715915A
Authority
TW
Taiwan
Prior art keywords
plasma
processing method
flexible material
atmospheric glow
surface processing
Prior art date
Application number
TW094135784A
Other languages
English (en)
Chinese (zh)
Other versions
TWI295547B (cs
Inventor
Min-Wen Wu
Zheng-Chang Xie
Chi-Fong Ai
guo-chuan Zheng
Tien-Hsiang Hsueh
Original Assignee
Atomic Energy Council
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atomic Energy Council filed Critical Atomic Energy Council
Priority to TW094135784A priority Critical patent/TW200715915A/zh
Publication of TW200715915A publication Critical patent/TW200715915A/zh
Application granted granted Critical
Publication of TWI295547B publication Critical patent/TWI295547B/zh

Links

Landscapes

  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW094135784A 2005-10-14 2005-10-14 Atmospheric glow plasma surface processing method and device for flexible material TW200715915A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094135784A TW200715915A (en) 2005-10-14 2005-10-14 Atmospheric glow plasma surface processing method and device for flexible material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094135784A TW200715915A (en) 2005-10-14 2005-10-14 Atmospheric glow plasma surface processing method and device for flexible material

Publications (2)

Publication Number Publication Date
TW200715915A true TW200715915A (en) 2007-04-16
TWI295547B TWI295547B (cs) 2008-04-01

Family

ID=45068474

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094135784A TW200715915A (en) 2005-10-14 2005-10-14 Atmospheric glow plasma surface processing method and device for flexible material

Country Status (1)

Country Link
TW (1) TW200715915A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112638471A (zh) * 2019-06-24 2021-04-09 永进生物科技股份有限公司 包括二进气口的电浆装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI486996B (zh) * 2013-12-04 2015-06-01 Ind Tech Res Inst 電漿裝置及電漿裝置的操作方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112638471A (zh) * 2019-06-24 2021-04-09 永进生物科技股份有限公司 包括二进气口的电浆装置

Also Published As

Publication number Publication date
TWI295547B (cs) 2008-04-01

Similar Documents

Publication Publication Date Title
TW200802598A (en) Plasma processing apparatus and plasma processing method
TW200802549A (en) Vertical plasma processing apparatus for semiconductor process
TW200644118A (en) Plasma processor
WO2008156562A3 (en) Showerhead electrode assemblies for plasma processing apparatuses
WO2008082518A3 (en) Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
TWI370332B (en) Apparatus comprising a rotating contaminant trap
WO2009044473A1 (ja) 高周波スパッタリング装置
WO2011038344A3 (en) Unitized confinement ring arrangements and methods thereof
WO2011029096A3 (en) Plasma enhanced chemical vapor deposition apparatus
IL179152A0 (en) Method of electric discharge surface treatment
TW200634925A (en) Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses
CN101835339A (zh) 常压下平板电极射频电容耦合氩氧/氩氮等离子体发生器
MX2014006252A (es) Celda de plasma no termica.
NZ704253A (en) Apparatus and method for the plasma coating of a substrate, in particular a press platen
TW200715915A (en) Atmospheric glow plasma surface processing method and device for flexible material
WO2008147184A3 (en) Atmospheric pressure glow discharge plasma method and system using heated substrate
WO2009104919A3 (en) Apparatus and method for processing substrate
US20070154650A1 (en) Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure
TW200630505A (en) Apparatus for producing carbon film and production method therefor
TWI318545B (en) Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge
RU2009104671A (ru) Способ получения блочного пеностекла
TW201129712A (en) Plasma processing apparatus
KR20110065353A (ko) 마그네트론 스퍼터 전극용의 자석 유닛 및 스퍼터링 장치
TW200711542A (en) Inductively coupled plasma processing apparatus
WO2007017271A3 (de) Plasmaerzeugungsvorrichtung und plasmaerzeugungsverfahren

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees