TW200715045A - An improved CPL mask and a method and program product for generating the same - Google Patents

An improved CPL mask and a method and program product for generating the same

Info

Publication number
TW200715045A
TW200715045A TW095129719A TW95129719A TW200715045A TW 200715045 A TW200715045 A TW 200715045A TW 095129719 A TW095129719 A TW 095129719A TW 95129719 A TW95129719 A TW 95129719A TW 200715045 A TW200715045 A TW 200715045A
Authority
TW
Taiwan
Prior art keywords
generating
improved
same
program product
cpl mask
Prior art date
Application number
TW095129719A
Other languages
English (en)
Inventor
Jang Fung Chen
Duan-Fu Stephen Hsu
Den Broeke Douglas Van
Jung-Chul Park
Thomas Laidig
Original Assignee
Asml Masktools Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Masktools Bv filed Critical Asml Masktools Bv
Publication of TW200715045A publication Critical patent/TW200715045A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
TW095129719A 2005-08-12 2006-08-14 An improved CPL mask and a method and program product for generating the same TW200715045A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70755705P 2005-08-12 2005-08-12

Publications (1)

Publication Number Publication Date
TW200715045A true TW200715045A (en) 2007-04-16

Family

ID=37206536

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095129719A TW200715045A (en) 2005-08-12 2006-08-14 An improved CPL mask and a method and program product for generating the same

Country Status (6)

Country Link
US (1) US7892703B2 (zh)
EP (1) EP1752824A3 (zh)
JP (1) JP4580912B2 (zh)
CN (1) CN1936701A (zh)
SG (1) SG130142A1 (zh)
TW (1) TW200715045A (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7763396B2 (en) * 2006-02-16 2010-07-27 Oracle America, Inc. Method and apparatus for fabricating semiconductor chips using varying areas of precision
JP5032948B2 (ja) * 2006-11-14 2012-09-26 エーエスエムエル マスクツールズ ビー．ブイ． Ｄｐｔプロセスで用いられるパターン分解を行うための方法、プログラムおよび装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5446521A (en) 1993-06-30 1995-08-29 Intel Corporation Phase-shifted opaquing ring
TW479159B (en) * 2001-02-09 2002-03-11 Nanya Technology Corp Interlacing phase shift mask and its manufacturing method
JP2003075986A (ja) * 2001-09-07 2003-03-12 Toppan Printing Co Ltd レベンソン型位相シフトマスクの製造方法
JP2003107671A (ja) * 2001-09-27 2003-04-09 Sony Corp 位相シフトマスクにおける欠陥仕様の決定方法
US6605481B1 (en) 2002-03-08 2003-08-12 Numerical Technologies, Inc. Facilitating an adjustable level of phase shifting during an optical lithography process for manufacturing an integrated circuit
JP2004093711A (ja) * 2002-08-30 2004-03-25 Renesas Technology Corp 位相シフトマスク
TWI274969B (en) 2002-09-11 2007-03-01 Asml Masktools Bv Method and computer program product of generating masks and mask generated thereby, device manufacturing method and device manufactured thereby, and method of printing pattern
US7018747B2 (en) * 2002-10-01 2006-03-28 Freescale Semiconductor, Inc. Photomask having line end phase anchors
JP2004219912A (ja) * 2003-01-17 2004-08-05 Fujitsu Ltd 露光用マスクの製造方法、マスク及び半導体装置の製造方法
US20050019673A1 (en) 2003-07-22 2005-01-27 Kunal Taravade Attenuated film with etched quartz phase shift mask
US7014962B2 (en) * 2003-09-13 2006-03-21 Chartered Semiconductor Manufacturing, Ltd Half tone alternating phase shift masks
JP4539955B2 (ja) * 2004-02-02 2010-09-08 シャープ株式会社 位相シフトマスク及びその製造方法並びに露光方法
US7556891B2 (en) * 2004-10-25 2009-07-07 Chartered Semiconductor Manufacturing Ltd. Method and apparatus for contact hole unit cell formation
TWI297101B (en) * 2005-04-20 2008-05-21 Nanya Technology Corp Phase shifting mask for equal line/space dense line patterns

Also Published As

Publication number Publication date
JP2007052430A (ja) 2007-03-01
CN1936701A (zh) 2007-03-28
JP4580912B2 (ja) 2010-11-17
SG130142A1 (en) 2007-03-20
EP1752824A3 (en) 2008-11-12
US20070065733A1 (en) 2007-03-22
US7892703B2 (en) 2011-02-22
EP1752824A2 (en) 2007-02-14

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