TW200710563A - An optical pellicle with a filter and a vent - Google Patents
An optical pellicle with a filter and a ventInfo
- Publication number
- TW200710563A TW200710563A TW095122917A TW95122917A TW200710563A TW 200710563 A TW200710563 A TW 200710563A TW 095122917 A TW095122917 A TW 095122917A TW 95122917 A TW95122917 A TW 95122917A TW 200710563 A TW200710563 A TW 200710563A
- Authority
- TW
- Taiwan
- Prior art keywords
- filter
- vent
- optical pellicle
- frame
- exterior surface
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packaging Frangible Articles (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/204,918 US20070037067A1 (en) | 2005-08-15 | 2005-08-15 | Optical pellicle with a filter and a vent |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200710563A true TW200710563A (en) | 2007-03-16 |
Family
ID=37742904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095122917A TW200710563A (en) | 2005-08-15 | 2006-06-26 | An optical pellicle with a filter and a vent |
Country Status (3)
Country | Link |
---|---|
US (1) | US20070037067A1 (zh) |
JP (1) | JP2007052429A (zh) |
TW (1) | TW200710563A (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4870788B2 (ja) * | 2009-01-27 | 2012-02-08 | 信越化学工業株式会社 | リソグラフィー用ペリクル |
JP5142297B2 (ja) * | 2009-06-19 | 2013-02-13 | 信越化学工業株式会社 | ペリクル |
JP5047232B2 (ja) * | 2009-06-26 | 2012-10-10 | 信越化学工業株式会社 | ペリクル |
JP4951051B2 (ja) * | 2009-10-30 | 2012-06-13 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
TW201308425A (zh) * | 2011-08-05 | 2013-02-16 | Tian-Xing Huang | 光罩淨化裝置及光罩淨化方法 |
TWI797380B (zh) | 2018-09-12 | 2023-04-01 | 美商福昌公司 | 用於平板顯示器光罩之護膜 |
KR102236451B1 (ko) * | 2020-11-02 | 2021-04-06 | 서울엔지니어링(주) | Euv 펠리클 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4470508A (en) * | 1983-08-19 | 1984-09-11 | Micro Lithography, Inc. | Dustfree packaging container and method |
US4833051A (en) * | 1984-08-20 | 1989-05-23 | Nippon Kogaku K.K. | Protective device for photographic masks |
US4737387A (en) * | 1986-07-07 | 1988-04-12 | Yen Yung Tsai | Removable pellicle and method |
JPH01105255A (ja) * | 1987-10-19 | 1989-04-21 | Hitachi Ltd | ガラスマスク |
US5339197A (en) * | 1989-03-31 | 1994-08-16 | Yen Yung Tsai | Optical pellicle with controlled transmission peaking |
US5254375A (en) * | 1991-08-26 | 1993-10-19 | Yen Yung Tsai | Apparatus for controllably separating framed working area from remainder of the membrane |
US5168993A (en) * | 1991-08-26 | 1992-12-08 | Yen Yung Tsai | Optical pellicle holder |
US5203961A (en) * | 1991-09-20 | 1993-04-20 | Yen Yung Tsai | Wet die cutter assembly and method |
JPH05150445A (ja) * | 1991-11-29 | 1993-06-18 | Hitachi Ltd | 露光用マスク |
US5271803A (en) * | 1992-01-09 | 1993-12-21 | Yen Yung Tsai | Method of forming finished edge of plural-layer optical membrane |
US5305878A (en) * | 1993-04-01 | 1994-04-26 | Yen Yung Tsai | Packaged optical pellicle |
US5332604A (en) * | 1993-04-01 | 1994-07-26 | Yen Yung Tsai | Adhesive system for reducing the likelihood of particulate |
US5314728A (en) * | 1993-04-01 | 1994-05-24 | Yen Yung Tsai | Capture layer and method for delayed entrapment of contaminant particles |
US5453816A (en) * | 1994-09-22 | 1995-09-26 | Micro Lithography, Inc. | Protective mask for pellicle |
US5576125A (en) * | 1995-07-27 | 1996-11-19 | Micro Lithography, Inc. | Method for making an optical pellicle |
US5820950A (en) * | 1996-10-30 | 1998-10-13 | Micro Lithography, Inc. | Optical pellicle and package |
US5772817A (en) * | 1997-02-10 | 1998-06-30 | Micro Lithography, Inc. | Optical pellicle mounting system |
US5769984A (en) * | 1997-02-10 | 1998-06-23 | Micro Lithography, Inc. | Optical pellicle adhesion system |
US6190743B1 (en) * | 1998-07-06 | 2001-02-20 | Micro Lithography, Inc. | Photomask protection system |
US6614504B2 (en) * | 2000-03-30 | 2003-09-02 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
JP2002323752A (ja) * | 2001-04-24 | 2002-11-08 | Asahi Glass Co Ltd | ペリクル |
US6594073B2 (en) * | 2001-05-30 | 2003-07-15 | Micro Lithography, Inc. | Antistatic optical pellicle |
US6566021B2 (en) * | 2001-07-26 | 2003-05-20 | Micro Lithography, Inc. | Fluoropolymer-coated photomasks for photolithography |
US6573980B2 (en) * | 2001-07-26 | 2003-06-03 | Micro Lithography, Inc. | Removable optical pellicle |
JP2003057804A (ja) * | 2001-08-21 | 2003-02-28 | Shin Etsu Chem Co Ltd | リソグラフィ用ペリクル |
US6841317B2 (en) * | 2002-08-27 | 2005-01-11 | Micro Lithography, Inc. | Vent for an optical pellicle system |
US7094505B2 (en) * | 2002-10-29 | 2006-08-22 | Toppan Photomasks, Inc. | Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
JP4027214B2 (ja) * | 2002-11-28 | 2007-12-26 | キヤノン株式会社 | 搬送装置、デバイス製造装置、搬送方法およびデバイス製造方法 |
JP2005070120A (ja) * | 2003-08-27 | 2005-03-17 | Shin Etsu Chem Co Ltd | リソグラフィ用ペリクル |
JP2005079297A (ja) * | 2003-08-29 | 2005-03-24 | Canon Inc | 原版搬送装置及び半導体露光装置 |
JP2005250188A (ja) * | 2004-03-05 | 2005-09-15 | Asahi Glass Co Ltd | ペリクル |
US7110195B2 (en) * | 2004-04-28 | 2006-09-19 | International Business Machines Corporation | Monolithic hard pellicle |
-
2005
- 2005-08-15 US US11/204,918 patent/US20070037067A1/en not_active Abandoned
-
2006
- 2006-06-26 TW TW095122917A patent/TW200710563A/zh unknown
- 2006-08-14 JP JP2006220828A patent/JP2007052429A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2007052429A (ja) | 2007-03-01 |
US20070037067A1 (en) | 2007-02-15 |
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