TW200710245A - Method for making sputtering target - Google Patents

Method for making sputtering target

Info

Publication number
TW200710245A
TW200710245A TW095121840A TW95121840A TW200710245A TW 200710245 A TW200710245 A TW 200710245A TW 095121840 A TW095121840 A TW 095121840A TW 95121840 A TW95121840 A TW 95121840A TW 200710245 A TW200710245 A TW 200710245A
Authority
TW
Taiwan
Prior art keywords
sputtering target
making
mixture
making sputtering
burning
Prior art date
Application number
TW095121840A
Other languages
English (en)
Other versions
TWI306124B (en
Inventor
Seiichiro Takahashi
Hiroshi Watanabe
Original Assignee
Mitsui Mining & Smelting Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining & Smelting Co filed Critical Mitsui Mining & Smelting Co
Publication of TW200710245A publication Critical patent/TW200710245A/zh
Application granted granted Critical
Publication of TWI306124B publication Critical patent/TWI306124B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3286Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
TW095121840A 2005-06-29 2006-06-19 Method for making sputtering target TWI306124B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005190805A JP2007009268A (ja) 2005-06-29 2005-06-29 スパッタリングターゲットの製造方法

Publications (2)

Publication Number Publication Date
TW200710245A true TW200710245A (en) 2007-03-16
TWI306124B TWI306124B (en) 2009-02-11

Family

ID=37596896

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121840A TWI306124B (en) 2005-06-29 2006-06-19 Method for making sputtering target

Country Status (4)

Country Link
JP (1) JP2007009268A (zh)
KR (1) KR100814320B1 (zh)
CN (1) CN100513354C (zh)
TW (1) TWI306124B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101568219B1 (ko) * 2009-08-07 2015-11-11 스미토모 긴조쿠 고잔 가부시키가이샤 증착용 타블렛
JP2012052227A (ja) * 2010-08-05 2012-03-15 Mitsubishi Materials Corp スパッタリングターゲットの製造方法およびスパッタリングターゲット
JP6359901B2 (ja) * 2014-07-16 2018-07-18 三菱マテリアル株式会社 スパッタリングターゲット
CN116332637A (zh) * 2023-02-14 2023-06-27 芜湖映日科技股份有限公司 一种制备太阳能电池行业ito旋转靶材的方法
CN116496081A (zh) * 2023-04-17 2023-07-28 湘潭大学 一种铟锡氧三元化合物靶材及其制备方法和应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2979648B2 (ja) * 1990-12-20 1999-11-15 住友金属鉱山株式会社 Ito焼結体
DE19822570C1 (de) * 1998-05-20 1999-07-15 Heraeus Gmbh W C Verfahren zum Herstellen eines Indium-Zinn-Oxid-Formkörpers
KR100474846B1 (ko) * 2002-03-22 2005-03-09 삼성코닝 주식회사 인듐산화물 분말 및 인듐 주석 산화물 타겟의 제조방법
KR100577743B1 (ko) * 2004-07-01 2006-05-10 전자부품연구원 이동통신단말기 송/수신부용 적층 필터

Also Published As

Publication number Publication date
KR20070001811A (ko) 2007-01-04
KR100814320B1 (ko) 2008-03-18
CN100513354C (zh) 2009-07-15
JP2007009268A (ja) 2007-01-18
CN1891662A (zh) 2007-01-10
TWI306124B (en) 2009-02-11

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