TW200707150A - Temperature control unit for bubblers - Google Patents

Temperature control unit for bubblers

Info

Publication number
TW200707150A
TW200707150A TW095109180A TW95109180A TW200707150A TW 200707150 A TW200707150 A TW 200707150A TW 095109180 A TW095109180 A TW 095109180A TW 95109180 A TW95109180 A TW 95109180A TW 200707150 A TW200707150 A TW 200707150A
Authority
TW
Taiwan
Prior art keywords
temperature control
container
bubblers
control unit
bubbler
Prior art date
Application number
TW095109180A
Other languages
English (en)
Other versions
TWI431449B (zh
Inventor
Boris Atlas
Yefim Bichutsky
Boris Bruk
Original Assignee
Noah Prec Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Noah Prec Llc filed Critical Noah Prec Llc
Publication of TW200707150A publication Critical patent/TW200707150A/zh
Application granted granted Critical
Publication of TWI431449B publication Critical patent/TWI431449B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
TW095109180A 2005-03-17 2006-03-17 起泡器的溫度控制裝置 TWI431449B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66307205P 2005-03-17 2005-03-17
US66300005P 2005-03-17 2005-03-17

Publications (2)

Publication Number Publication Date
TW200707150A true TW200707150A (en) 2007-02-16
TWI431449B TWI431449B (zh) 2014-03-21

Family

ID=36992481

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095109180A TWI431449B (zh) 2005-03-17 2006-03-17 起泡器的溫度控制裝置

Country Status (5)

Country Link
US (1) US8118939B2 (zh)
EP (1) EP1866458A4 (zh)
JP (1) JP5156621B2 (zh)
TW (1) TWI431449B (zh)
WO (1) WO2006099619A2 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
US20080018004A1 (en) * 2006-06-09 2008-01-24 Air Products And Chemicals, Inc. High Flow GaCl3 Delivery
US8568529B2 (en) * 2009-04-10 2013-10-29 Applied Materials, Inc. HVPE chamber hardware
WO2011053505A1 (en) 2009-11-02 2011-05-05 Sigma-Aldrich Co. Evaporator
EA028837B1 (ru) * 2009-11-30 2018-01-31 Петер Сентиваньи Способ и устройство для обработки газов
CN102467136B (zh) * 2010-10-31 2015-03-25 扬州百思德新材料有限公司 反应釜温度控制装置
DE102012015045A1 (de) * 2012-07-31 2014-02-06 Dockweiler Ag Vorrichtung zum Temperieren eines Gefäßes in einer Kammer
US20150053375A1 (en) * 2013-08-20 2015-02-26 Noah Precision, Llc Multi-loop temperature control system for a semiconductor manufacture process
JP6094513B2 (ja) * 2014-02-28 2017-03-15 東京エレクトロン株式会社 処理ガス発生装置、処理ガス発生方法、基板処理方法及び記憶媒体
US11561032B2 (en) 2019-11-12 2023-01-24 Heat X, LLC Magnetic induction water heater/chiller with separate heating/chilling zones

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3470902A (en) * 1967-03-01 1969-10-07 Atomic Energy Commission Liquid flow control device
US4269057A (en) * 1979-10-24 1981-05-26 The United States Of America As Represented By The Secretary Of The Army Multipurpose humidity controlled agent generator
CA1179144A (en) * 1981-04-04 1984-12-11 Hiroshi Ishizuka Method and an apparatus for producing titanium metal from titanium tetrachloride
JPS5995170U (ja) * 1982-12-17 1984-06-28 富士通株式会社 化学気相成長装置
JPS62104022A (ja) * 1985-10-30 1987-05-14 Seiko Epson Corp 液体原料気化装置
US4612772A (en) * 1985-11-04 1986-09-23 Jones David E Thermo-electric temperature controller for liquid chemical bubbler containers
US4911101A (en) * 1988-07-20 1990-03-27 General Electric Company Metal organic molecular beam epitaxy (MOMBE) apparatus
JPH0760258B2 (ja) * 1988-09-28 1995-06-28 富士写真フイルム株式会社 ハロゲン化銀カラー写真感光材料の処理方法
EP0366601B1 (de) * 1988-10-21 1993-12-22 Büchi Laboratoriums-Technik AG Rotationsverdampfer
JPH0644098Y2 (ja) * 1989-02-27 1994-11-14 黒谷 信子 半導体ウェハーの洗浄用バブラー
JPH0697081A (ja) * 1992-09-10 1994-04-08 Fujitsu Ltd 気相成長装置
JP2791424B2 (ja) * 1993-03-19 1998-08-27 工業技術院長 半導体加工装置
TW359943B (en) * 1994-07-18 1999-06-01 Silicon Valley Group Thermal Single body injector and method for delivering gases to a surface
US5968379A (en) * 1995-07-14 1999-10-19 Applied Materials, Inc. High temperature ceramic heater assembly with RF capability and related methods
JPH10130845A (ja) * 1996-10-29 1998-05-19 Mitsubishi Heavy Ind Ltd 化学蒸着用蒸気発生装置
JP2948791B2 (ja) * 1998-01-22 1999-09-13 アプライド マテリアルズ インコーポレイテッド 液体貯蔵容器の交換方法
FI118805B (fi) 2000-05-15 2008-03-31 Asm Int Menetelmä ja kokoonpano kaasufaasireaktantin syöttämiseksi reaktiokammioon
US6561498B2 (en) 2001-04-09 2003-05-13 Lorex Industries, Inc. Bubbler for use in vapor generation systems
TW539822B (en) * 2001-07-03 2003-07-01 Asm Inc Source chemical container assembly
US6790475B2 (en) * 2002-04-09 2004-09-14 Wafermasters Inc. Source gas delivery
US7077388B2 (en) * 2002-07-19 2006-07-18 Asm America, Inc. Bubbler for substrate processing
JP2004327534A (ja) 2003-04-22 2004-11-18 Nec Kansai Ltd 有機金属原料気相成長装置
KR20050004379A (ko) * 2003-07-02 2005-01-12 삼성전자주식회사 원자층 증착용 가스 공급 장치

Also Published As

Publication number Publication date
US8118939B2 (en) 2012-02-21
TWI431449B (zh) 2014-03-21
JP2008533746A (ja) 2008-08-21
WO2006099619A2 (en) 2006-09-21
EP1866458A4 (en) 2010-10-20
WO2006099619A3 (en) 2007-08-30
US20060213446A1 (en) 2006-09-28
JP5156621B2 (ja) 2013-03-06
EP1866458A2 (en) 2007-12-19
WO2006099619A9 (en) 2006-11-23

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees