TW200707099A - Curable composition, cured product and liquid crystal display device using same - Google Patents
Curable composition, cured product and liquid crystal display device using sameInfo
- Publication number
- TW200707099A TW200707099A TW095115031A TW95115031A TW200707099A TW 200707099 A TW200707099 A TW 200707099A TW 095115031 A TW095115031 A TW 095115031A TW 95115031 A TW95115031 A TW 95115031A TW 200707099 A TW200707099 A TW 200707099A
- Authority
- TW
- Taiwan
- Prior art keywords
- cured product
- liquid crystal
- crystal display
- curable composition
- spacers
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Mathematical Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Epoxy Resins (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
Abstract
The present invention relates to a curable composition for use in a liquid crystal display, capable of forming a cured product that has a high deformation volume when subjected to an external pressure (i.e. the uneven compression force can be counteracted upon the formation of a substrate) and has a recovery ratio that never significantly decreases even under a high pressure (i.e. the recovery ratio is less dependent on the pressure). In a loading-unloading test by using a microsclerometer, the cured product as formed satisfies the following formulas: |H1-H2|/|P1-P2| ≥0.35 and |R1-R2|/|P1-P2| ≤15, wherein H1 and H2 represent the total deformation volume (μm) of spacers having upper cross-section areas of 40 ± 5 μm2 and 150 ± 5 μm2, respectively, P1 and P2 represent the pressure (mN/μm2) exerted on the spacers having upper cross-section areas of 40 ± 5 μm2 and 150 ± 5 μm2, respectively, and R1 and R2 represent the elastic recovery ratio (%) of the spacers having upper cross-section areas of 40 ±5 μm2 and 150 ± 5 μm2, respectively.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005129898 | 2005-04-27 | ||
JP2005129193 | 2005-04-27 | ||
JP2005129897 | 2005-04-27 | ||
JP2005282409 | 2005-09-28 | ||
JP2005282408A JP5597905B2 (en) | 2005-04-27 | 2005-09-28 | Curable composition, cured product, and liquid crystal display device using the same |
JP2005291817A JP5109246B2 (en) | 2004-12-09 | 2005-10-04 | Curable composition, cured product, color filter, and liquid crystal display device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200707099A true TW200707099A (en) | 2007-02-16 |
TWI398726B TWI398726B (en) | 2013-06-11 |
Family
ID=37307894
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095115031A TWI398726B (en) | 2005-04-27 | 2006-04-27 | Curable composition, cured product and liquid crystal display device using same |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR101325949B1 (en) |
CN (2) | CN101120029B (en) |
TW (1) | TWI398726B (en) |
WO (1) | WO2006118094A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007119718A (en) * | 2005-04-27 | 2007-05-17 | Mitsubishi Chemicals Corp | Curable composition, cured product and liquid crystal display device using the same |
KR101453771B1 (en) * | 2010-11-08 | 2014-10-23 | 제일모직 주식회사 | Photosensitive resin composition for color filter and color filter using same |
TW201235783A (en) * | 2010-12-10 | 2012-09-01 | Sumitomo Chemical Co | Photosensitive resin composition |
US8680171B2 (en) * | 2011-07-01 | 2014-03-25 | Arkema France | Method of encapsulating a photovoltaic cell and encapsulated photovoltaic cell |
CN103649788B (en) | 2012-06-08 | 2017-05-10 | Dic株式会社 | Organic pigment composition for color filters, method for producing same, and color filter |
CN108368336B (en) * | 2015-12-25 | 2021-09-10 | 日保丽公司 | Curable composition, cured product, overcoat film, covered flexible wiring board, and method for producing same |
CN111149058B (en) * | 2017-09-22 | 2024-03-08 | 东丽株式会社 | Transparent photosensitive resin composition and application thereof, photoetching spacer, liquid crystal display device and manufacturing method thereof |
US20200089031A1 (en) * | 2018-09-19 | 2020-03-19 | Sharp Kabushiki Kaisha | Method of producing liquid crystal panel |
CN110441934B (en) * | 2019-07-26 | 2020-10-13 | 惠州市华星光电技术有限公司 | Liquid crystal panel and selection method of spacer column in liquid crystal panel |
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US4914165A (en) * | 1988-02-03 | 1990-04-03 | Minnesota Mining And Manufacturing Company | Radiation crosslinkable compositions |
JPH066016A (en) * | 1991-11-06 | 1994-01-14 | Nippon Paint Co Ltd | Solder stopping mask forming method |
JP3288140B2 (en) * | 1993-07-16 | 2002-06-04 | 株式会社日本触媒 | Ink composition for solder resist |
JPH06348009A (en) * | 1993-06-10 | 1994-12-22 | Nippon Kayaku Co Ltd | Resist ink composition and its hardened product |
JP3274545B2 (en) * | 1993-07-16 | 2002-04-15 | 株式会社日本触媒 | Liquid photosensitive resin composition |
JPH0772624A (en) * | 1993-09-02 | 1995-03-17 | Goou Kagaku Kogyo Kk | Photosensitive resin composition as well as film, resist ink, resist, solder resist and printed circuit board formed by using the same |
WO1996028764A1 (en) * | 1993-09-02 | 1996-09-19 | Goo Chemical Industries Co., Ltd. | Photosensitive resin composition, and coating film, resist ink, resist, solder resist and printed circuit board each produced therefrom |
JPH08160616A (en) * | 1994-12-12 | 1996-06-21 | Toagosei Co Ltd | Manufacture of resist resin composition |
JP3634141B2 (en) * | 1998-03-02 | 2005-03-30 | 太陽インキ製造株式会社 | Photosensitive composition and fired product pattern obtained using the same |
JP3771711B2 (en) * | 1998-03-31 | 2006-04-26 | 互応化学工業株式会社 | Method for producing photo solder resist ink |
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JP4532002B2 (en) * | 2000-03-06 | 2010-08-25 | 互応化学工業株式会社 | Solder resist ink |
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JP2002169281A (en) * | 2000-09-20 | 2002-06-14 | Showa Highpolymer Co Ltd | Curing resin composition and photosensitive resin composition |
JP4839525B2 (en) | 2000-09-29 | 2011-12-21 | 大日本印刷株式会社 | Photosensitive resin composition and color filter for liquid crystal display |
JP2002236363A (en) * | 2000-11-17 | 2002-08-23 | Nippon Paint Co Ltd | Photo soldering resist composition |
JP2002212235A (en) | 2001-01-19 | 2002-07-31 | Nippon Kayaku Co Ltd | Resin composition and cured product thereof |
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JP2002287354A (en) * | 2001-03-28 | 2002-10-03 | Nippon Paint Co Ltd | Photosensitive solder resist composition |
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JP3771844B2 (en) * | 2002-01-10 | 2006-04-26 | 互応化学工業株式会社 | Photosensitive resin composition, photo solder resist ink, printed wiring board and dry film |
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JP2005091853A (en) | 2003-09-18 | 2005-04-07 | Toppan Printing Co Ltd | Photosensitive composition and color filter having photospacer formed by using the same |
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-
2006
- 2006-04-25 CN CN2006800053214A patent/CN101120029B/en active Active
- 2006-04-25 CN CN2010102246559A patent/CN101921375B/en active Active
- 2006-04-25 KR KR1020077017257A patent/KR101325949B1/en active IP Right Grant
- 2006-04-25 WO PCT/JP2006/308604 patent/WO2006118094A1/en active Application Filing
- 2006-04-27 TW TW095115031A patent/TWI398726B/en active
Also Published As
Publication number | Publication date |
---|---|
KR20080000556A (en) | 2008-01-02 |
TWI398726B (en) | 2013-06-11 |
CN101120029A (en) | 2008-02-06 |
CN101921375B (en) | 2012-12-05 |
CN101120029B (en) | 2010-09-29 |
WO2006118094A1 (en) | 2006-11-09 |
CN101921375A (en) | 2010-12-22 |
KR101325949B1 (en) | 2013-11-07 |
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