TW200707093A - Photosensitive resin compositions, cured articles of the compositions, and films containing the compositions - Google Patents

Photosensitive resin compositions, cured articles of the compositions, and films containing the compositions

Info

Publication number
TW200707093A
TW200707093A TW095116440A TW95116440A TW200707093A TW 200707093 A TW200707093 A TW 200707093A TW 095116440 A TW095116440 A TW 095116440A TW 95116440 A TW95116440 A TW 95116440A TW 200707093 A TW200707093 A TW 200707093A
Authority
TW
Taiwan
Prior art keywords
compositions
meth
photosensitive resin
compound
hydroxyl groups
Prior art date
Application number
TW095116440A
Other languages
Chinese (zh)
Other versions
TWI382998B (en
Inventor
Hideaki Kametani
Kikuo Imazumi
Hirokazu Karino
Hiroo Koyanagi
Go Mizutani
Kiyohisa Tokuda
Daisuke Kobayashi
Masahiro Naitou
Original Assignee
Nippon Kayaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Kk filed Critical Nippon Kayaku Kk
Publication of TW200707093A publication Critical patent/TW200707093A/en
Application granted granted Critical
Publication of TWI382998B publication Critical patent/TWI382998B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/254—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of protective topcoat layers
    • G11B7/2542—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of protective topcoat layers consisting essentially of organic resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2115/00—Oligomerisation
    • C08G2115/02—Oligomerisation to isocyanurate groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

To provide a photosensitive resin composition suitable for hard coats which permits thick coating with low curling and little causes crack, and to provide a resin composition for the protective coating for high-density optical discs which is excellent in transparency and the resistance to water absorption and which exhibits high endurance with little warpage, and cured articles of the composition. A photosensitive resin obtained by reacting an isocyanate compound (A) prepared by reacting a diisocyanate compound (a) with an alcohol compound (b) having at least two hydroxyl groups in the molecule or an isocyanate compound (A') derived from a diisocyanate compound (a) by converting either of the isocyanate groups into an isocyanurate ring structure with a mixture (B) of polyfunctional (meth)acrylate compounds, namely, polyhydric alcohol (meth)acrylates, which mixture comprises a polyhydric alcohol (meth)acrylate having one or more hydroxyl groups and a polyhydric alcohol (meth)acrylate wherein all the hydroxyl groups are esterified.
TW095116440A 2005-05-12 2006-05-09 A protective coating agent for a disc, a hardened product thereof and a film containing the same TWI382998B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005139216 2005-05-12
JP2005177123 2005-06-17

Publications (2)

Publication Number Publication Date
TW200707093A true TW200707093A (en) 2007-02-16
TWI382998B TWI382998B (en) 2013-01-21

Family

ID=37396397

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095116440A TWI382998B (en) 2005-05-12 2006-05-09 A protective coating agent for a disc, a hardened product thereof and a film containing the same

Country Status (5)

Country Link
JP (1) JP5209310B2 (en)
KR (1) KR101299025B1 (en)
CN (1) CN101171278B (en)
TW (1) TWI382998B (en)
WO (1) WO2006120887A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI677736B (en) * 2015-03-31 2019-11-21 日商日東電工股份有限公司 Liquid crystal panel and image display device

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008248069A (en) * 2007-03-30 2008-10-16 Sanyo Chem Ind Ltd Active energy ray-curable resin composition for hard-coating use
CN101382668B (en) * 2007-09-04 2010-09-08 成都博深高技术材料开发有限公司 Temperature sensitive light modulation material, method for making same and optical device composed of the same
JP5568832B2 (en) * 2007-09-28 2014-08-13 大日本印刷株式会社 Curable resin composition and hard coat film
JP5187006B2 (en) * 2008-06-04 2013-04-24 横浜ゴム株式会社 Curable resin composition
EP2218744A1 (en) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Method of manufacturing holographic photopolymers on polymer films
JP5448152B2 (en) * 2009-07-16 2014-03-19 日本化薬株式会社 Ultraviolet curable resin composition for optical disc and cured product thereof
KR101719844B1 (en) * 2009-07-23 2017-03-24 우베 고산 가부시키가이샤 Aqueous polyurethane resin dispersion and method for producing the same
JP5456460B2 (en) * 2009-12-25 2014-03-26 第一工業製薬株式会社 Energy ray curable paint
JP5377373B2 (en) * 2010-03-12 2013-12-25 積水化成品工業株式会社 Modified urethane resin particles, method for producing the same, and light diffusion film
JP5707420B2 (en) * 2010-12-24 2015-04-30 旭化成イーマテリアルズ株式会社 Photosensitive resin composition
JP2012229412A (en) * 2011-04-13 2012-11-22 Nippon Synthetic Chem Ind Co Ltd:The Resin composition and coating agent
JP5728290B2 (en) * 2011-05-12 2015-06-03 ディーエイチ・マテリアル株式会社 Encapsulant and molded article, optical member and light emitting diode using the same
JP5695622B2 (en) * 2012-09-24 2015-04-08 株式会社タムラ製作所 Black curable resin composition
KR102130700B1 (en) 2013-05-30 2020-07-07 삼성디스플레이 주식회사 Window for display device and display device including the window
KR102130533B1 (en) 2014-01-24 2020-07-06 동우 화인켐 주식회사 The a colored photosensitive resin composition for forming the frontal light shielding layer of a display device
JP6388116B2 (en) * 2014-09-17 2018-09-12 東亞合成株式会社 Curable composition
KR102065717B1 (en) * 2016-12-26 2020-01-13 주식회사 엘지화학 Polarizer protecting film, polarizer plate comprising the same, liquid crystal display comprising the polarizer plate, and coating composition for polarizer protecting film

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61207423A (en) * 1985-03-12 1986-09-13 Sanyo Kokusaku Pulp Co Ltd Production of urethane (meth)acrylate compound
JP2665809B2 (en) * 1989-10-27 1997-10-22 ダイセル化学工業株式会社 Polyfunctional urethane acrylate
JPH03273017A (en) * 1990-03-20 1991-12-04 Toyobo Co Ltd Radiation-curable resin and its composition
JP3251608B2 (en) * 1991-06-17 2002-01-28 広栄化学工業株式会社 Method for producing urethane (meth) acrylate oligomer and photocurable resin composition using the same
JP3079117B2 (en) * 1992-06-18 2000-08-21 ダイセル・ユーシービー株式会社 Active energy ray-curable resin composition
JP2000007741A (en) * 1998-06-25 2000-01-11 Kyoeisha Chem Co Ltd High-refractive-index resin composition excellent in scratch resistance
JP4271840B2 (en) * 1999-11-10 2009-06-03 パナソニック株式会社 optical disk
JP3993139B2 (en) * 2003-06-23 2007-10-17 シャープ株式会社 Data storage
KR20060079793A (en) * 2003-08-26 2006-07-06 니폰 가야꾸 가부시끼가이샤 Ultraviolet-curing resin compostion and cured product thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI677736B (en) * 2015-03-31 2019-11-21 日商日東電工股份有限公司 Liquid crystal panel and image display device

Also Published As

Publication number Publication date
CN101171278B (en) 2011-01-19
CN101171278A (en) 2008-04-30
JPWO2006120887A1 (en) 2008-12-18
TWI382998B (en) 2013-01-21
JP5209310B2 (en) 2013-06-12
KR20080005412A (en) 2008-01-11
WO2006120887A1 (en) 2006-11-16
KR101299025B1 (en) 2013-08-27

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees