TW200703486A - An optical system with at least a semiconductor light source and a method for removing contaminations and/or heating the system - Google Patents
An optical system with at least a semiconductor light source and a method for removing contaminations and/or heating the systemInfo
- Publication number
- TW200703486A TW200703486A TW095124222A TW95124222A TW200703486A TW 200703486 A TW200703486 A TW 200703486A TW 095124222 A TW095124222 A TW 095124222A TW 95124222 A TW95124222 A TW 95124222A TW 200703486 A TW200703486 A TW 200703486A
- Authority
- TW
- Taiwan
- Prior art keywords
- light source
- semiconductor light
- heating
- optical system
- contaminations
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Landscapes
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Cleaning In General (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005031792A DE102005031792A1 (de) | 2005-07-07 | 2005-07-07 | Verfahren zur Entfernung von Kontamination von optischen Elementen, insbesondere von Oberflächen optischer Elemente sowie ein optisches System oder Teilsystem hierfür |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200703486A true TW200703486A (en) | 2007-01-16 |
Family
ID=37023114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095124222A TW200703486A (en) | 2005-07-07 | 2006-07-03 | An optical system with at least a semiconductor light source and a method for removing contaminations and/or heating the system |
Country Status (4)
Country | Link |
---|---|
US (1) | US20080212045A1 (zh) |
DE (1) | DE102005031792A1 (zh) |
TW (1) | TW200703486A (zh) |
WO (1) | WO2007006447A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI695237B (zh) * | 2015-06-17 | 2020-06-01 | 德商維斯塔電子束公司 | 微粒射束設備及操作微粒射束設備的方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7385670B2 (en) | 2004-10-05 | 2008-06-10 | Asml Netherlands B.V. | Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus |
US7880860B2 (en) | 2004-12-20 | 2011-02-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8125610B2 (en) | 2005-12-02 | 2012-02-28 | ASML Metherlands B.V. | Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus |
US7671347B2 (en) * | 2006-10-10 | 2010-03-02 | Asml Netherlands B.V. | Cleaning method, apparatus and cleaning system |
US8947629B2 (en) | 2007-05-04 | 2015-02-03 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US9013672B2 (en) | 2007-05-04 | 2015-04-21 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US20090025753A1 (en) | 2007-07-24 | 2009-01-29 | Asml Netherlands B.V. | Lithographic Apparatus And Contamination Removal Or Prevention Method |
US7916269B2 (en) | 2007-07-24 | 2011-03-29 | Asml Netherlands B.V. | Lithographic apparatus and contamination removal or prevention method |
SG151198A1 (en) | 2007-09-27 | 2009-04-30 | Asml Netherlands Bv | Methods relating to immersion lithography and an immersion lithographic apparatus |
NL1035942A1 (nl) | 2007-09-27 | 2009-03-30 | Asml Netherlands Bv | Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus. |
DE102007051459A1 (de) | 2007-10-27 | 2009-05-14 | Asml Netherlands B.V. | Reinigung eines optischen Systems mittels Strahlungsenergie |
NL1036273A1 (nl) | 2007-12-18 | 2009-06-19 | Asml Netherlands Bv | Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus. |
NL1036306A1 (nl) | 2007-12-20 | 2009-06-23 | Asml Netherlands Bv | Lithographic apparatus and in-line cleaning apparatus. |
US8339572B2 (en) | 2008-01-25 | 2012-12-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102008041827A1 (de) | 2008-09-05 | 2010-03-18 | Carl Zeiss Smt Ag | Schutzmodul für EUV-Lithographievorrichtung sowie EUV-Lithographievorrichtung |
US20100192973A1 (en) * | 2009-01-19 | 2010-08-05 | Yoshifumi Ueno | Extreme ultraviolet light source apparatus and cleaning method |
JP5559562B2 (ja) * | 2009-02-12 | 2014-07-23 | ギガフォトン株式会社 | 極端紫外光光源装置 |
JP2011023712A (ja) | 2009-06-19 | 2011-02-03 | Gigaphoton Inc | 極端紫外光源装置 |
DE102009033319B4 (de) | 2009-07-15 | 2019-02-21 | Carl Zeiss Microscopy Gmbh | Partikelstrahl-Mikroskopiesystem und Verfahren zum Betreiben desselben |
DE102011004375B3 (de) * | 2011-02-18 | 2012-05-31 | Carl Zeiss Smt Gmbh | Vorrichtung zur Führung von elektromagnetischer Strahlung in eine Projektionsbelichtungsanlage |
DE102012216284A1 (de) * | 2011-09-27 | 2013-03-28 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage |
JP2014053416A (ja) * | 2012-09-06 | 2014-03-20 | Toshiba Corp | Euv露光装置及びクリーニング方法 |
JP6236095B2 (ja) | 2013-03-13 | 2017-11-22 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ装置 |
US10180248B2 (en) | 2015-09-02 | 2019-01-15 | ProPhotonix Limited | LED lamp with sensing capabilities |
US11392041B2 (en) * | 2020-09-28 | 2022-07-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Particle removal device and method |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5719704A (en) * | 1991-09-11 | 1998-02-17 | Nikon Corporation | Projection exposure apparatus |
US5995263A (en) * | 1993-11-12 | 1999-11-30 | Nikon Corporation | Projection exposure apparatus |
JP3368091B2 (ja) * | 1994-04-22 | 2003-01-20 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
US6018384A (en) * | 1994-09-07 | 2000-01-25 | Nikon Corporation | Projection exposure system |
US5883704A (en) * | 1995-08-07 | 1999-03-16 | Nikon Corporation | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
US6233039B1 (en) * | 1997-06-05 | 2001-05-15 | Texas Instruments Incorporated | Optical illumination system and associated exposure apparatus |
EP0980581A1 (en) * | 1998-03-05 | 2000-02-23 | Fed Corporation | Blue and ultraviolet photolithography with organic light emitting devices |
DE19830438A1 (de) * | 1998-07-08 | 2000-01-13 | Zeiss Carl Fa | Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen |
US6256086B1 (en) * | 1998-10-06 | 2001-07-03 | Canon Kabushiki Kaisha | Projection exposure apparatus, and device manufacturing method |
DE10000191B8 (de) * | 2000-01-05 | 2005-10-06 | Carl Zeiss Smt Ag | Projektbelichtungsanlage der Mikrolithographie |
US20020126479A1 (en) * | 2001-03-08 | 2002-09-12 | Ball Semiconductor, Inc. | High power incoherent light source with laser array |
US6828569B2 (en) * | 2001-11-19 | 2004-12-07 | Asml Netherlands B.V. | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
DE10211611A1 (de) * | 2002-03-12 | 2003-09-25 | Zeiss Carl Smt Ag | Verfahren und Vorrichtung zur Dekontamination optischer Oberflächen |
CN1653297B (zh) * | 2002-05-08 | 2010-09-29 | 佛森技术公司 | 高效固态光源及其使用和制造方法 |
DE10230652A1 (de) * | 2002-07-08 | 2004-01-29 | Carl Zeiss Smt Ag | Optische Vorrichtung mit einer Beleuchtungslichtquelle |
DE10240002A1 (de) * | 2002-08-27 | 2004-03-11 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Optisches Teilsystem insbesondere für eine Projektionsbelichtungsanlage mit mindestens einem in mindestens zwei Stellungen verbringbaren optischen Element |
US6967342B2 (en) * | 2003-07-31 | 2005-11-22 | Fusion Uv Systems, Inc. | Method and apparatus for improved ultraviolet (UV) treatment of large three-dimensional (3D) objects |
WO2005078774A1 (ja) * | 2004-02-13 | 2005-08-25 | Nikon Corporation | 露光方法及び装置、並びにデバイス製造方法 |
US20080204682A1 (en) * | 2005-06-28 | 2008-08-28 | Nikon Corporation | Exposure method and exposure apparatus, and device manufacturing method |
-
2005
- 2005-07-07 DE DE102005031792A patent/DE102005031792A1/de not_active Ceased
-
2006
- 2006-07-03 WO PCT/EP2006/006441 patent/WO2007006447A1/en active Application Filing
- 2006-07-03 TW TW095124222A patent/TW200703486A/zh unknown
-
2008
- 2008-01-07 US US11/970,456 patent/US20080212045A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI695237B (zh) * | 2015-06-17 | 2020-06-01 | 德商維斯塔電子束公司 | 微粒射束設備及操作微粒射束設備的方法 |
US10814361B2 (en) | 2015-06-17 | 2020-10-27 | Vistec Electron Beam Gmbh | Particle beam apparatus and method for operating a particle beam apparatus |
Also Published As
Publication number | Publication date |
---|---|
US20080212045A1 (en) | 2008-09-04 |
WO2007006447A1 (en) | 2007-01-18 |
DE102005031792A1 (de) | 2007-01-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200703486A (en) | An optical system with at least a semiconductor light source and a method for removing contaminations and/or heating the system | |
WO2007059294A3 (en) | Process for pulsed uv curing of coatings on wood | |
TW200639378A (en) | A sensor | |
WO2008028182A3 (en) | Reducing thermal load on optical head | |
TWI369000B (en) | Semiconductor light emiting element and method for making the same | |
TW200741818A (en) | Exposure apparatus and device manufacturing method | |
NL2000141A1 (nl) | Oppervlaktelichtbron welke gebruik maakt van een LED en rugverlichtingseenheid welke de oppervlaktelichtbron heeft. | |
ATE529768T1 (de) | Optisches bauelement und beleuchtungsvorrichtung | |
WO2007078579A3 (en) | Optical diffuser with uv blocking coating | |
EP1953805A4 (en) | OPTICAL LIGHTING SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD | |
TW200605255A (en) | Elongated features for improved alignment process integration | |
WO2007140347A3 (en) | Extraction of light from a light conducting medium in a preferred emanation pattern | |
HK1111473A1 (en) | Polarization conversion element, lighting optical device, exposure system, and exposure method | |
WO2010048237A3 (en) | Ultraviolet reflector with coolant gas holes and method | |
EP2105239A4 (en) | OPTICAL LIGHT CONDENSER SYSTEM. LASER PROCESSING METHOD AND DEVICE AND METHOD FOR PRODUCING FRAGILE MATERIAL | |
DE202006019837U1 (de) | Tragkonstruktionsvorrichtung für Solaranlagen auf Flachdächern | |
ATE529010T1 (de) | System zur individualisierung eines schuhes | |
TW200739138A (en) | Prism sheet, planar light source device and method for manufacturing the prism sheet | |
GB2427914B (en) | Method And System For Image Processing For Profiling With Uncoded Structured Light | |
TW200717039A (en) | Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method | |
TW200632590A (en) | Immersion liquid, exposure apparatus, and exposure process | |
TW200622507A (en) | Lithographic apparatus and device manufacturing method | |
TW200739267A (en) | Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device | |
TW200730876A (en) | Optical integrator, illuminating system, exposure system, and manufacturing method of the device | |
DE60026778D1 (de) | Substrat für lichtemittierende Vorrichtung, lichtemittierende Vorrichtung und Herstellungsverfahren |