TW200701333A - Substrate processing apparatus and substrate processing method - Google Patents

Substrate processing apparatus and substrate processing method

Info

Publication number
TW200701333A
TW200701333A TW095108998A TW95108998A TW200701333A TW 200701333 A TW200701333 A TW 200701333A TW 095108998 A TW095108998 A TW 095108998A TW 95108998 A TW95108998 A TW 95108998A TW 200701333 A TW200701333 A TW 200701333A
Authority
TW
Taiwan
Prior art keywords
displacement
change
vacuum pressure
substrate
substrate processing
Prior art date
Application number
TW095108998A
Other languages
Chinese (zh)
Other versions
TWI305933B (en
Inventor
Yoshitaka Otsuka
Takashi Nakamitsu
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200701333A publication Critical patent/TW200701333A/en
Application granted granted Critical
Publication of TWI305933B publication Critical patent/TWI305933B/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47C—CHAIRS; SOFAS; BEDS
    • A47C27/00—Spring, stuffed or fluid mattresses or cushions specially adapted for chairs, beds or sofas
    • A47C27/14—Spring, stuffed or fluid mattresses or cushions specially adapted for chairs, beds or sofas with foamed material inlays
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47G—HOUSEHOLD OR TABLE EQUIPMENT
    • A47G27/00—Floor fabrics; Fastenings therefor
    • A47G27/02—Carpets; Stair runners; Bedside rugs; Foot mats

Abstract

If change arises to the vacuum pressure of the vacuum mechanism in which it is used in order to stabilize surfacing power, the control circuit of a nozzle height position compensation part detects change of the vacuum pressure through a pressure sensor, the control signal which has the fixed response characteristic to change of such vacuum pressure is generated, and drive control of piezo-electric actuator is carried out, and variable control of the height position of a resist nozzle is carried out by the displacement generated from piezo-electric actuator. When the surfacing height of the substrate G is displaced upwards rather than the setting surfacing height Hb according to change of the vacuum pressure of a vacuum mechanism, the displacement of the resist nozzle 78 is carried out the almost same displacement at the same timing as the displacement of the substrate G, and the gap S of the resist nozzle 78 and Substrate G is kept consequent to a setting value.
TW095108998A 2005-03-17 2006-03-16 Substrate processing apparatus and substrate processing method TWI305933B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005076879A JP4429943B2 (en) 2005-03-17 2005-03-17 Substrate processing apparatus and substrate processing method

Publications (2)

Publication Number Publication Date
TW200701333A true TW200701333A (en) 2007-01-01
TWI305933B TWI305933B (en) 2009-02-01

Family

ID=37100296

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095108998A TWI305933B (en) 2005-03-17 2006-03-16 Substrate processing apparatus and substrate processing method

Country Status (3)

Country Link
JP (1) JP4429943B2 (en)
KR (1) KR101061615B1 (en)
TW (1) TWI305933B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI412407B (en) * 2008-02-12 2013-10-21 Koyo Thermo Sys Co Ltd Reduced pressure drying apparatus
TWI459495B (en) * 2010-07-14 2014-11-01 Dainippon Screen Mfg Substrate processing apparatus, and substrate transport method

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4407970B2 (en) * 2006-11-28 2010-02-03 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
KR100834145B1 (en) 2006-12-27 2008-06-02 세메스 주식회사 Apparatus for coating photoresist including a weight supporter
JP5188759B2 (en) * 2007-08-07 2013-04-24 東京応化工業株式会社 Coating apparatus and coating method
JP4942589B2 (en) * 2007-08-30 2012-05-30 東京応化工業株式会社 Coating apparatus and coating method
JP5029486B2 (en) 2008-05-13 2012-09-19 東京エレクトロン株式会社 Coating apparatus, coating method, and storage medium
JP5012651B2 (en) 2008-05-14 2012-08-29 東京エレクトロン株式会社 Coating device, coating method, coating, developing device and storage medium
KR101071583B1 (en) 2009-08-21 2011-10-10 주식회사 케이씨텍 Inline type substrate coater apparatus
JP5081261B2 (en) * 2010-02-24 2012-11-28 東京エレクトロン株式会社 Coating device
KR101543882B1 (en) * 2013-12-17 2015-08-11 세메스 주식회사 Apparatus for transferring substrate and apparatus for inspecting substrate including the same
JP6518891B2 (en) * 2014-08-01 2019-05-29 株式会社ブイ・テクノロジー Transport device
JP6595276B2 (en) * 2015-09-18 2019-10-23 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing apparatus and substrate processing method
JP6890438B2 (en) * 2017-03-03 2021-06-18 株式会社Ｓｃｒｅｅｎホールディングス Floating amount calculation device, coating device and coating method
CN108620288B (en) * 2017-03-22 2020-02-14 深圳市腾盛精密装备股份有限公司 Glue dispensing height compensation method and device
CN113955485B (en) * 2021-10-25 2023-05-23 博众精工科技股份有限公司 Product circle pasting device and product circle pasting method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004294926A (en) 2003-03-27 2004-10-21 Kyocera Corp Apparatus and method for rubbing alignment film
JP2004345814A (en) 2003-05-23 2004-12-09 Murata Mach Ltd Floatation transport device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI412407B (en) * 2008-02-12 2013-10-21 Koyo Thermo Sys Co Ltd Reduced pressure drying apparatus
TWI459495B (en) * 2010-07-14 2014-11-01 Dainippon Screen Mfg Substrate processing apparatus, and substrate transport method

Also Published As

Publication number Publication date
TWI305933B (en) 2009-02-01
JP2006261394A (en) 2006-09-28
JP4429943B2 (en) 2010-03-10
KR20060101311A (en) 2006-09-22
KR101061615B1 (en) 2011-09-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees