TW200643658A - Organic film release agent, and method and appartus for removing organic film using said release agent - Google Patents
Organic film release agent, and method and appartus for removing organic film using said release agentInfo
- Publication number
- TW200643658A TW200643658A TW095108924A TW95108924A TW200643658A TW 200643658 A TW200643658 A TW 200643658A TW 095108924 A TW095108924 A TW 095108924A TW 95108924 A TW95108924 A TW 95108924A TW 200643658 A TW200643658 A TW 200643658A
- Authority
- TW
- Taiwan
- Prior art keywords
- release agent
- organic film
- substrate
- contact
- tank
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000003795 chemical substances by application Substances 0.000 abstract 15
- 239000000758 substrate Substances 0.000 abstract 10
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract 2
- 238000007599 discharging Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
- C09D9/005—Chemical paint or ink removers containing organic solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/267—Heterocyclic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/343—Lamination or delamination methods or apparatus for photolitographic photosensitive material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Emergency Medicine (AREA)
- Manufacturing & Machinery (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005167563 | 2005-06-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200643658A true TW200643658A (en) | 2006-12-16 |
Family
ID=37498217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095108924A TW200643658A (en) | 2005-06-07 | 2006-03-16 | Organic film release agent, and method and appartus for removing organic film using said release agent |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2006132008A1 (ko) |
KR (1) | KR20080016682A (ko) |
TW (1) | TW200643658A (ko) |
WO (1) | WO2006132008A1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100183853A1 (en) * | 2007-06-12 | 2010-07-22 | Takashi Ihara | Stripping agent for resist film on/above conductive polymer, method for stripping resist film, and substrate having patterned conductive polymer |
JP2018104571A (ja) * | 2016-12-27 | 2018-07-05 | 菊水化学工業株式会社 | 塗膜剥離剤 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0769618B2 (ja) * | 1987-09-25 | 1995-07-31 | 旭化成工業株式会社 | フオトレジスト用剥離剤 |
US5098592A (en) * | 1990-10-01 | 1992-03-24 | Creative Technologies Group, Inc. | Method of activating n-methyl-2-pyrrolidone (nmp) and/or delta-butyrolactone (blo) varnish and paint remover solvents |
EP0629226A1 (en) * | 1992-03-06 | 1994-12-21 | Minnesota Mining And Manufacturing Company | Composition containing lactone and ester for removing coatings |
JPH0665532A (ja) * | 1992-08-20 | 1994-03-08 | Mitsubishi Kasei Corp | 塗膜剥離剤 |
JP3343425B2 (ja) * | 1993-12-03 | 2002-11-11 | 東燃ゼネラル石油株式会社 | 塗装剥離液 |
KR0178680B1 (ko) * | 1996-07-13 | 1999-04-01 | 윤종용 | 반도체장치 제조용의 포토레지스트 박리조성물 및 그를 이용한 반도체장치의 제조방법 |
US6500605B1 (en) * | 1997-05-27 | 2002-12-31 | Tokyo Electron Limited | Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
-
2006
- 2006-02-21 KR KR1020077030430A patent/KR20080016682A/ko not_active Application Discontinuation
- 2006-02-21 WO PCT/JP2006/303019 patent/WO2006132008A1/ja active Application Filing
- 2006-02-21 JP JP2007520027A patent/JPWO2006132008A1/ja active Pending
- 2006-03-16 TW TW095108924A patent/TW200643658A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20080016682A (ko) | 2008-02-21 |
JPWO2006132008A1 (ja) | 2009-01-08 |
WO2006132008A1 (ja) | 2006-12-14 |
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