TW200643053A - Organoaluminum precursor compounds - Google Patents
Organoaluminum precursor compoundsInfo
- Publication number
- TW200643053A TW200643053A TW095104234A TW95104234A TW200643053A TW 200643053 A TW200643053 A TW 200643053A TW 095104234 A TW095104234 A TW 095104234A TW 95104234 A TW95104234 A TW 95104234A TW 200643053 A TW200643053 A TW 200643053A
- Authority
- TW
- Taiwan
- Prior art keywords
- precursor compounds
- organoaluminum precursor
- organoaluminum
- producing
- carbon atoms
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title abstract 4
- 239000002243 precursor Substances 0.000 title abstract 4
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/06—Aluminium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/06—Aluminium compounds
- C07F5/061—Aluminium compounds with C-aluminium linkage
- C07F5/066—Aluminium compounds with C-aluminium linkage compounds with Al linked to an element other than Al, C, H or halogen (this includes Al-cyanide linkage)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/02—Carriers therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/395,142 US7348445B2 (en) | 2005-02-14 | 2006-04-03 | Organoaluminum precursor compounds |
US12/020,953 US7615250B2 (en) | 2005-02-14 | 2008-01-28 | Organoaluminum precursor compounds |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US65199505P | 2005-02-14 | 2005-02-14 | |
US11/341,668 US20060193984A1 (en) | 2005-02-14 | 2006-01-30 | Organoaluminum precursor compounds |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200643053A true TW200643053A (en) | 2006-12-16 |
Family
ID=36916924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095104234A TW200643053A (en) | 2005-02-14 | 2006-02-08 | Organoaluminum precursor compounds |
Country Status (6)
Country | Link |
---|---|
US (1) | US20060193984A1 (zh) |
EP (1) | EP1853384A4 (zh) |
JP (1) | JP2008532932A (zh) |
KR (1) | KR20070107124A (zh) |
TW (1) | TW200643053A (zh) |
WO (1) | WO2006088686A2 (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8318966B2 (en) * | 2006-06-23 | 2012-11-27 | Praxair Technology, Inc. | Organometallic compounds |
KR100958333B1 (ko) * | 2008-10-14 | 2010-05-17 | (주)디엔에프 | 신규한 저머늄유도체 화합물 및 이의 제조방법 |
WO2012053433A1 (ja) * | 2010-10-22 | 2012-04-26 | Jsr株式会社 | アルミナ膜形成方法 |
WO2012053436A1 (ja) * | 2010-10-22 | 2012-04-26 | Jsr株式会社 | アルミナ膜形成用組成物及びアルミナ膜形成方法 |
JP5962124B2 (ja) * | 2012-03-28 | 2016-08-03 | 株式会社明電舎 | 酸化膜の形成方法 |
JP2015149461A (ja) * | 2014-02-10 | 2015-08-20 | 東京エレクトロン株式会社 | 金属酸化物膜の成膜方法および成膜装置 |
CN106163663A (zh) * | 2014-04-07 | 2016-11-23 | 沙特基础工业公司 | 有机铝助催化剂组合物和过渡金属络合物催化剂组合物的冷冻干燥 |
KR102029071B1 (ko) * | 2016-11-21 | 2019-10-07 | 한국화학연구원 | 13족 금속 전구체, 이를 포함하는 박막증착용 조성물 및 이를 이용하는 박막의 제조방법 |
KR20200074263A (ko) * | 2017-11-19 | 2020-06-24 | 어플라이드 머티어리얼스, 인코포레이티드 | 금속 표면들 상의 금속 산화물들의 ald를 위한 방법들 |
EP3728688B1 (en) * | 2017-12-20 | 2021-11-10 | Basf Se | Process for the generation of metal-containing films |
JP7090174B2 (ja) * | 2018-04-05 | 2022-06-23 | アプライド マテリアルズ インコーポレイテッド | 金属酸化物の低温aldのための方法 |
JP7401928B2 (ja) * | 2018-07-30 | 2023-12-20 | ユーピー ケミカル カンパニー リミテッド | アルミニウム化合物及びこれを使用したアルミニウム含有膜の形成方法 |
US11319449B2 (en) | 2019-12-20 | 2022-05-03 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Area selective deposition of metal containing films |
KR20210093011A (ko) * | 2020-01-17 | 2021-07-27 | 주식회사 한솔케미칼 | 원자층 증착용(ald), 화학 기상 증착용(cvd) 전구체 화합물 및 이를 이용한 ald/cvd 증착법 |
WO2021172867A1 (ko) * | 2020-02-24 | 2021-09-02 | 주식회사 유피케미칼 | 알루미늄 전구체 화합물 및 이의 제조 방법, 이를 이용한 알루미늄 함유 막 형성 방법 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4009394A1 (de) * | 1989-12-12 | 1991-06-13 | Merck Patent Gmbh | Heterocyclische metallorganische verbindungen |
-
2006
- 2006-01-30 US US11/341,668 patent/US20060193984A1/en not_active Abandoned
- 2006-02-08 EP EP06720383A patent/EP1853384A4/en not_active Withdrawn
- 2006-02-08 JP JP2007555160A patent/JP2008532932A/ja not_active Abandoned
- 2006-02-08 WO PCT/US2006/004165 patent/WO2006088686A2/en active Application Filing
- 2006-02-08 KR KR1020077020969A patent/KR20070107124A/ko not_active Application Discontinuation
- 2006-02-08 TW TW095104234A patent/TW200643053A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US20060193984A1 (en) | 2006-08-31 |
WO2006088686A3 (en) | 2007-03-22 |
JP2008532932A (ja) | 2008-08-21 |
EP1853384A2 (en) | 2007-11-14 |
EP1853384A4 (en) | 2010-06-30 |
KR20070107124A (ko) | 2007-11-06 |
WO2006088686A2 (en) | 2006-08-24 |
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