TW200641518A - Blank, method of forming the same, black matrix using such blank and method of forming the same - Google Patents

Blank, method of forming the same, black matrix using such blank and method of forming the same

Info

Publication number
TW200641518A
TW200641518A TW094143180A TW94143180A TW200641518A TW 200641518 A TW200641518 A TW 200641518A TW 094143180 A TW094143180 A TW 094143180A TW 94143180 A TW94143180 A TW 94143180A TW 200641518 A TW200641518 A TW 200641518A
Authority
TW
Taiwan
Prior art keywords
blank
forming
same
screening
black matrix
Prior art date
Application number
TW094143180A
Other languages
Chinese (zh)
Inventor
Fumihiko Yamada
Takaei Sasaki
Toshiharu Ozaki
Gou Hiramoto
Toru Suzuki
Original Assignee
Ulvac Coating Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Coating Corp filed Critical Ulvac Coating Corp
Publication of TW200641518A publication Critical patent/TW200641518A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/38—Anti-reflection arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Filters (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Liquid Crystal (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

A blank and a black matrix sue highly weather-resistant and excellent in terms of low reflectivily, screening effect and processability but do not make any heavy environmental load so as to be able to meet the requirement of an enhanced capability of processing loads imposed as a result of the remarkable advancement of display technologies. The blank has a screening film or a screening film and an anti-reflection film fomied as a result of directly or indirectly adhering to the surface of a transparent substrate, die screening film containing Ni, Mo and Ti as principal metal components, the Ti content ratio being 10 to 25 atom%.
TW094143180A 2004-12-07 2005-12-07 Blank, method of forming the same, black matrix using such blank and method of forming the same TW200641518A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004353917A JP2006162942A (en) 2004-12-07 2004-12-07 Blanks and its formation method, and black matrix using the blanks and its formation method

Publications (1)

Publication Number Publication Date
TW200641518A true TW200641518A (en) 2006-12-01

Family

ID=36665044

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094143180A TW200641518A (en) 2004-12-07 2005-12-07 Blank, method of forming the same, black matrix using such blank and method of forming the same

Country Status (4)

Country Link
JP (1) JP2006162942A (en)
KR (1) KR20060063759A (en)
CN (1) CN1815327A (en)
TW (1) TW200641518A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200745630A (en) * 2006-04-24 2007-12-16 Asahi Glass Co Ltd Blank, black matrix, and color filter
JP2010094499A (en) 2008-09-16 2010-04-30 Hitachi Maxell Ltd Image acquisition apparatus and biometric information acquisition apparatus
JP2011032507A (en) * 2009-07-30 2011-02-17 Sanyo Electric Co Ltd Electrolytic electrode material, electrolytic electrode and method of producing the same
JP6369750B2 (en) * 2013-09-10 2018-08-08 日立金属株式会社 LAMINATED WIRING FILM, MANUFACTURING METHOD THEREOF, AND NI ALLOY SPUTTERING TARGET MATERIAL
CN107428127B (en) * 2015-03-27 2019-11-19 株式会社Lg化学 Conducting structures, its manufacturing method and the electrode including conducting structures
CN105093760A (en) * 2015-09-18 2015-11-25 京东方科技集团股份有限公司 COA substrate, method for preparing COA substrate, and display device
KR101997661B1 (en) 2015-10-27 2019-07-08 주식회사 엘지화학 Conductive structure body, electrode and display device comprising the same
TW202104131A (en) * 2018-12-14 2021-02-01 日商日鐵化學材料股份有限公司 Substrate for display device, method for producing the same, and resin composition solution for making the antireflection layer of that substrate
CN111965884A (en) * 2020-08-12 2020-11-20 Tcl华星光电技术有限公司 Black matrix for liquid crystal panel and liquid crystal panel
WO2022116046A1 (en) * 2020-12-02 2022-06-09 京东方科技集团股份有限公司 Color filter substrate, fabrication method therefor, display panel and display device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4071849B2 (en) * 1997-10-08 2008-04-02 アルバック成膜株式会社 Blanks and black matrix
JP3958848B2 (en) * 1997-11-10 2007-08-15 大日本印刷株式会社 Black matrix blanks and color filters for liquid crystal displays
JP2001311812A (en) * 2000-04-27 2001-11-09 Mitsubishi Materials Corp Light-shielding film for forming black matrix and sputtering target for forming light-shielding film
JP4419037B2 (en) * 2000-11-27 2010-02-24 三菱マテリアル株式会社 Sputtering target for forming black matrix light-shielding film
JP4419036B2 (en) * 2000-11-27 2010-02-24 三菱マテリアル株式会社 Sputtering target for forming black matrix light-shielding film

Also Published As

Publication number Publication date
JP2006162942A (en) 2006-06-22
CN1815327A (en) 2006-08-09
KR20060063759A (en) 2006-06-12

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