TW200640318A - Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus - Google Patents

Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus

Info

Publication number
TW200640318A
TW200640318A TW095102840A TW95102840A TW200640318A TW 200640318 A TW200640318 A TW 200640318A TW 095102840 A TW095102840 A TW 095102840A TW 95102840 A TW95102840 A TW 95102840A TW 200640318 A TW200640318 A TW 200640318A
Authority
TW
Taiwan
Prior art keywords
film pattern
electro
electronic apparatus
forming film
optical device
Prior art date
Application number
TW095102840A
Other languages
English (en)
Inventor
Tomoki Sakashita
Katsuyuki Moriya
Toshimitsu Hirai
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of TW200640318A publication Critical patent/TW200640318A/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1258—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by using a substrate provided with a shape pattern, e.g. grooves, banks, resist pattern
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47G—HOUSEHOLD OR TABLE EQUIPMENT
    • A47G1/00—Mirrors; Picture frames or the like, e.g. provided with heating, lighting or ventilating means
    • A47G1/06—Picture frames
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0568—Resist used for applying paste, ink or powder
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
TW095102840A 2005-02-17 2006-01-25 Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus TW200640318A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005040126 2005-02-17
JP2005328485A JP2006259687A (ja) 2005-02-17 2005-11-14 膜パターンの形成方法及びデバイスの製造方法、電気光学装置及び電子機器

Publications (1)

Publication Number Publication Date
TW200640318A true TW200640318A (en) 2006-11-16

Family

ID=36816035

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095102840A TW200640318A (en) 2005-02-17 2006-01-25 Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus

Country Status (4)

Country Link
US (1) US20060183036A1 (zh)
JP (1) JP2006259687A (zh)
KR (1) KR100735951B1 (zh)
TW (1) TW200640318A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008016226A (ja) * 2006-07-03 2008-01-24 Canon Inc 電子源、画像表示装置、画像再生装置、配線基板、及び電子デバイス
JP4356740B2 (ja) * 2006-11-29 2009-11-04 セイコーエプソン株式会社 配線パターン形成方法、デバイスおよび電子機器
JP2009000600A (ja) * 2007-06-20 2009-01-08 Seiko Epson Corp パターン形成方法及び電気光学装置製造方法並びに電子機器製造方法
FR2929864B1 (fr) * 2008-04-09 2020-02-07 Commissariat A L'energie Atomique Auto-assemblage de puces sur un substrat
KR100997185B1 (ko) * 2008-09-17 2010-11-29 삼성전기주식회사 인쇄회로기판 수지의 표면 처리 방법 및 상기 방법에 의해처리된 인쇄회로기판 수지
KR101097330B1 (ko) * 2010-01-19 2011-12-23 삼성모바일디스플레이주식회사 유기 발광 디스플레이 장치 및 이를 제조 하는 방법
US20110318503A1 (en) * 2010-06-29 2011-12-29 Christian Adams Plasma enhanced materials deposition system
US20140000101A1 (en) * 2012-06-29 2014-01-02 Johnson & Johnson Vision Care, Inc. Methods and apparatus to form printed batteries on ophthalmic devices
CN108693573A (zh) * 2017-03-31 2018-10-23 恒颢科技股份有限公司 防眩耐磨盖板及其制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5132248A (en) * 1988-05-31 1992-07-21 The United States Of America As Represented By The United States Department Of Energy Direct write with microelectronic circuit fabrication
US5270256A (en) * 1991-11-27 1993-12-14 Intel Corporation Method of forming a guard wall to reduce delamination effects
JPH116911A (ja) 1997-06-17 1999-01-12 Canon Inc カラーフィルタ基板とその製造方法、及び該基板を用いた液晶素子
KR100370314B1 (ko) * 2000-06-02 2003-01-30 주식회사 비아텍 빌드업 다층 인쇄회로판 제조방법
KR20030075783A (ko) * 2002-03-20 2003-09-26 삼성에스디아이 주식회사 고효율 태양전지 및 그 제조방법
JP4440524B2 (ja) 2002-10-09 2010-03-24 大日本印刷株式会社 有機ｅｌ素子の製造方法
JP4344270B2 (ja) * 2003-05-30 2009-10-14 セイコーエプソン株式会社 液晶表示装置の製造方法

Also Published As

Publication number Publication date
US20060183036A1 (en) 2006-08-17
KR100735951B1 (ko) 2007-07-06
JP2006259687A (ja) 2006-09-28
KR20060092108A (ko) 2006-08-22

Similar Documents

Publication Publication Date Title
TW200640318A (en) Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus
TW200630760A (en) Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
TWI263465B (en) Pattern formation method and pattern formation apparatus, method for manufacturing device, electro-optical device, electronic device, and method for manufacturing active matrix substrate
TW200644075A (en) Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus background of the invention
TW200721279A (en) Method of forming pattern, film structure, electrooptical device and electronic equipment
TW200736693A (en) Electro-optic device, method for manufacturing electro-optic device, projector, and electronic apparatus
TW200618303A (en) Thin film etching method and method of fabricating liquid crystal display device using the same
TW200721892A (en) Method for forming film pattern and method for manufacturing an organic EL device, a color filter substrate and a liquid crystal display device
TWI256139B (en) Method and apparatus for fabricating flat panel display
TW200727461A (en) Semiconductor device and production method thereof
TW200641409A (en) Polarizing plate, producing method thereof and liquid crystal display by using the same
TW200740288A (en) Mask, film forming method, light-emitting device, and electronic apparatus
TW200704532A (en) Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus
EP2088122A4 (en) TRANSPARENT CONDUCTIVE FILM, TRANSPARENT ELECTRODE SUBSTRATE, AND PROCESS FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM USING THE SAME, AND CARBON NANOTUBE AND PROCESS FOR PRODUCING THE SAME
TW200739211A (en) Method for manufacture of liquid crystal cell substrates, liquid crystal cell substrates, and liquid crystal device
TW200721278A (en) Forming method for film pattern, device, electro-optical apparatus, electronic apparatus, and manufacturing method for active matrix substrate
TW200621381A (en) Thin film pattern substrate, method for manufacturing device, electro-optic device, and electronic apparatus
TW200608576A (en) Method for fabricating organic thin film transistor and method for fabricating liquid crystal display device using the same
TW200702807A (en) Method of manufacturing liquid crystal display device
TW200729311A (en) Liquid processing method and liquid processing apparatus
TW200631477A (en) Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
TW200638088A (en) Method of manufacturing a liquid crystal display and a mask for use in same
TW200629430A (en) Wiring pattern forming method, film pattern forming method, semiconductor device, electro-optical device, and electronic equipment
TW200746440A (en) Method for forming metal wiring, method for manufacturing active matrix substrate, device, electro-optical device, and electronic apparatus
TW200801697A (en) Liquid crystal display and electronic apparatus