TW200634146A - Cleaning agent composition and cleaning method - Google Patents

Cleaning agent composition and cleaning method

Info

Publication number
TW200634146A
TW200634146A TW095106542A TW95106542A TW200634146A TW 200634146 A TW200634146 A TW 200634146A TW 095106542 A TW095106542 A TW 095106542A TW 95106542 A TW95106542 A TW 95106542A TW 200634146 A TW200634146 A TW 200634146A
Authority
TW
Taiwan
Prior art keywords
agent composition
cleaning
cleaning agent
components
acetic acid
Prior art date
Application number
TW095106542A
Other languages
Chinese (zh)
Other versions
TWI330195B (en
Inventor
Ko Aoyagi
Keita Matsushita
Tomomi Okada
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Publication of TW200634146A publication Critical patent/TW200634146A/en
Application granted granted Critical
Publication of TWI330195B publication Critical patent/TWI330195B/en

Links

Abstract

This invention provides a cleaning agent composition and a cleaning method for removing flux, was, machine oil, or the like, particularly complex dirt of these substances that has adhered to electrical and electronic components, optical components, automotive components, precision machinery components, and other such components. A cleaning agent composition of this invention contains 20 to 60 wt% of a saturated hydrocarbon with a boiling point of 200 to 350 DEG C, and 40 to 80 wt% of an acetic acid ester. Preferably, the carbon number of the saturated hydrocarbon is from 12 to 19, the acetic acid ester is 3-methyl-3-methoxybutyl acetate, and the flashpoint of the cleaning agent composition is at least 70 DEG C. Also, by a cleaning method comprising dip cleaning a material to be cleaned using this cleaning agent composition and dip rinsing in a hydrofluorocarbon or a hydrofluoroether, a wide variety of dirt can be removed enough.
TW95106542A 2005-03-08 2006-02-27 Cleaning agent composition and cleaning method TWI330195B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005063234A JP4761293B2 (en) 2005-03-08 2005-03-08 Cleaning composition and cleaning method

Publications (2)

Publication Number Publication Date
TW200634146A true TW200634146A (en) 2006-10-01
TWI330195B TWI330195B (en) 2010-09-11

Family

ID=36993599

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95106542A TWI330195B (en) 2005-03-08 2006-02-27 Cleaning agent composition and cleaning method

Country Status (3)

Country Link
JP (1) JP4761293B2 (en)
CN (1) CN1831099B (en)
TW (1) TWI330195B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI393941B (en) * 2007-07-17 2013-04-21 Dexerials Corp Method for manufacturing display device

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4775852B2 (en) * 2006-10-23 2011-09-21 Jx日鉱日石エネルギー株式会社 Cleaning method for sintered parts
JP2009120650A (en) * 2007-11-12 2009-06-04 Japan Energy Corp Urethane-washing liquid composition
JP5363225B2 (en) * 2009-07-16 2013-12-11 Jx日鉱日石エネルギー株式会社 Cleaning method
CN102041193B (en) * 2009-10-20 2013-03-13 中国石油化工股份有限公司 Cleaning solvent and cleaning method for butyl rubber polymerization reactor
CN102527662A (en) * 2010-12-16 2012-07-04 湖北泰晶电子科技有限公司 Method for cleaning quartz crystal elements
CN105154269B (en) * 2015-09-11 2018-06-29 中国石油大学(华东) A kind of oils dirt cleaning agent and preparation method
CN108580472B (en) * 2018-01-26 2021-02-19 广西洁邦环保科技有限公司 Environment-friendly sanitary cleaning method for garbage can
CN108570369B (en) * 2018-04-09 2020-12-29 三明市海斯福化工有限责任公司 Cleaning compositions containing oxahydrofluoroether compounds and methods for cleaning
CN115873669A (en) * 2022-11-04 2023-03-31 三明市海斯福化工有限责任公司 Rinsing agent and cleaning method of mask for OLED (organic light emitting diode) process

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10316997A (en) * 1997-05-15 1998-12-02 Mitsubishi Rayon Co Ltd Method for cleaning residue adhered to industrial device
JP2000087087A (en) * 1998-09-10 2000-03-28 Hitachi Techno Eng Co Ltd Hydrocarbon cleaning solvent
JP2000303094A (en) * 1999-04-23 2000-10-31 Kyowa Yuka Kk Composition containing saturated hydrocarbon and alkoxyalkyl acetate
JP2003027099A (en) * 2001-07-19 2003-01-29 Lion Corp Liquid detergent composition and method for cleaning sink
JP4046996B2 (en) * 2001-12-11 2008-02-13 株式会社ジャパンエナジー Hydrocarbon cleaning liquid composition
JP4488681B2 (en) * 2003-01-31 2010-06-23 関東化成工業株式会社 Cleaning liquid for cleaning uncured paint or undried paint adhering to mask jig for painting, cleaning method and apparatus using the same
JP2004307839A (en) * 2003-03-24 2004-11-04 Tosoh Corp Azeotrope-like detergent composition
KR101026095B1 (en) * 2003-06-27 2011-03-31 아사히 가라스 가부시키가이샤 Cleaning/rinsing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI393941B (en) * 2007-07-17 2013-04-21 Dexerials Corp Method for manufacturing display device

Also Published As

Publication number Publication date
CN1831099B (en) 2012-05-16
CN1831099A (en) 2006-09-13
JP2006249114A (en) 2006-09-21
TWI330195B (en) 2010-09-11
JP4761293B2 (en) 2011-08-31

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