TW200628869A - Focus detecting device - Google Patents

Focus detecting device

Info

Publication number
TW200628869A
TW200628869A TW094137925A TW94137925A TW200628869A TW 200628869 A TW200628869 A TW 200628869A TW 094137925 A TW094137925 A TW 094137925A TW 94137925 A TW94137925 A TW 94137925A TW 200628869 A TW200628869 A TW 200628869A
Authority
TW
Taiwan
Prior art keywords
field stop
object surface
imaging means
intermediate image
detecting device
Prior art date
Application number
TW094137925A
Other languages
English (en)
Inventor
Tatsuo Fukui
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200628869A publication Critical patent/TW200628869A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Focusing (AREA)
TW094137925A 2004-10-29 2005-10-28 Focus detecting device TW200628869A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004315330A JP4604651B2 (ja) 2004-10-29 2004-10-29 焦点検出装置

Publications (1)

Publication Number Publication Date
TW200628869A true TW200628869A (en) 2006-08-16

Family

ID=36227673

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094137925A TW200628869A (en) 2004-10-29 2005-10-28 Focus detecting device

Country Status (3)

Country Link
JP (1) JP4604651B2 (zh)
TW (1) TW200628869A (zh)
WO (1) WO2006046430A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI461675B (zh) * 2010-07-23 2014-11-21 Konica Minolta Opto Inc Aperture position measuring method, Aperture position measuring device, Aperture position determining method, and aperture position determining device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230152563A1 (en) * 2020-02-20 2023-05-18 Sony Group Corporation Microscope system, imaging method, and imaging apparatus
CN117452782B (zh) * 2023-12-08 2024-04-09 魅杰光电科技(上海)有限公司 一种图像聚焦方法和图像聚焦系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08247758A (ja) * 1994-12-28 1996-09-27 Fuji Film Micro Device Kk 測距装置
JPH0980301A (ja) * 1995-09-12 1997-03-28 Nikon Corp オートフォーカス装置
JPH10223517A (ja) * 1997-01-31 1998-08-21 Nikon Corp 合焦装置、それを備えた観察装置及びその観察装置を備えた露光装置
JPH10223157A (ja) * 1997-02-05 1998-08-21 Funai Electric Co Ltd 偏向ヨークの首振り固定構造
JP4613357B2 (ja) * 2000-11-22 2011-01-19 株式会社ニコン 光学的位置ずれ測定装置の調整装置および方法
JP2002190439A (ja) * 2000-12-21 2002-07-05 Nikon Corp 位置計測方法及びその装置、露光方法及びその装置、並びにデバイス製造方法
JP2003035511A (ja) * 2001-07-24 2003-02-07 Nikon Corp 位置検出装置、および該位置検出装置を備えた露光装置
JP2004004634A (ja) * 2002-04-02 2004-01-08 Nikon Corp 焦点位置検出装置およびそれを備えた蛍光顕微鏡

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI461675B (zh) * 2010-07-23 2014-11-21 Konica Minolta Opto Inc Aperture position measuring method, Aperture position measuring device, Aperture position determining method, and aperture position determining device

Also Published As

Publication number Publication date
JP4604651B2 (ja) 2011-01-05
JP2006126540A (ja) 2006-05-18
WO2006046430A1 (ja) 2006-05-04

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