TW200626734A - Vapour-deposition material for the production of layers of high refractive index - Google Patents

Vapour-deposition material for the production of layers of high refractive index

Info

Publication number
TW200626734A
TW200626734A TW094135370A TW94135370A TW200626734A TW 200626734 A TW200626734 A TW 200626734A TW 094135370 A TW094135370 A TW 094135370A TW 94135370 A TW94135370 A TW 94135370A TW 200626734 A TW200626734 A TW 200626734A
Authority
TW
Taiwan
Prior art keywords
vapour
layers
production
refractive index
high refractive
Prior art date
Application number
TW094135370A
Other languages
English (en)
Inventor
Martin Friz
Uwe Anthes
Reiner Dombrowski
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of TW200626734A publication Critical patent/TW200626734A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G35/00—Compounds of tantalum
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/218—V2O5, Nb2O5, Ta2O5
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Compositions Of Oxide Ceramics (AREA)
TW094135370A 2004-10-14 2005-10-11 Vapour-deposition material for the production of layers of high refractive index TW200626734A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004049996A DE102004049996A1 (de) 2004-10-14 2004-10-14 Aufdampfmaterial zur Herstellung hochbrechender Schichten

Publications (1)

Publication Number Publication Date
TW200626734A true TW200626734A (en) 2006-08-01

Family

ID=35447615

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094135370A TW200626734A (en) 2004-10-14 2005-10-11 Vapour-deposition material for the production of layers of high refractive index

Country Status (10)

Country Link
US (1) US7598196B2 (zh)
EP (1) EP1648034B9 (zh)
JP (1) JP5138881B2 (zh)
KR (1) KR101256659B1 (zh)
CN (1) CN1792929B (zh)
AT (1) ATE453929T1 (zh)
CA (1) CA2523327A1 (zh)
DE (2) DE102004049996A1 (zh)
ES (1) ES2338663T3 (zh)
TW (1) TW200626734A (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006036711B3 (de) * 2006-08-05 2008-02-21 Gfe Metalle Und Materialien Gmbh Verfahren zur Herstellung oxidischer Beschichtungswerkstoffe auf der Basis von Refraktärmetallen
JP5284822B2 (ja) * 2008-03-03 2013-09-11 東邦チタニウム株式会社 酸化タンタル蒸着材、その製造方法、および酸化タンタル蒸着膜の製造方法
JP5284821B2 (ja) * 2008-03-03 2013-09-11 東邦チタニウム株式会社 金属酸化物蒸着材、その製造方法、および金属酸化物蒸着膜の製造方法
JP5426136B2 (ja) * 2008-10-16 2014-02-26 東邦チタニウム株式会社 酸化タンタル蒸着材、その製造方法、および酸化タンタル蒸着膜の製造方法
US10054715B2 (en) 2012-09-28 2018-08-21 Hoya Corporation Eyeglass lens having improved heat resistance and scratch resistance
US11944574B2 (en) 2019-04-05 2024-04-02 Amo Groningen B.V. Systems and methods for multiple layer intraocular lens and using refractive index writing
US11583388B2 (en) 2019-04-05 2023-02-21 Amo Groningen B.V. Systems and methods for spectacle independence using refractive index writing with an intraocular lens
US11529230B2 (en) 2019-04-05 2022-12-20 Amo Groningen B.V. Systems and methods for correcting power of an intraocular lens using refractive index writing
US11583389B2 (en) 2019-04-05 2023-02-21 Amo Groningen B.V. Systems and methods for correcting photic phenomenon from an intraocular lens and using refractive index writing
US11678975B2 (en) 2019-04-05 2023-06-20 Amo Groningen B.V. Systems and methods for treating ocular disease with an intraocular lens and refractive index writing
US11564839B2 (en) 2019-04-05 2023-01-31 Amo Groningen B.V. Systems and methods for vergence matching of an intraocular lens with refractive index writing
CN110468378A (zh) * 2019-09-12 2019-11-19 西安邮电大学 一种致密五氧化二钽薄膜的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4156622A (en) 1976-11-10 1979-05-29 Solarex Corporation Tantalum oxide antireflective coating and method of forming same
JP3160309B2 (ja) 1991-04-25 2001-04-25 キヤノン株式会社 薄膜形成方法
DE69633631T2 (de) * 1995-08-23 2005-10-20 Asahi Glass Ceramics Co., Ltd. Target, verfahren zu dessen herstellung und herstellung hochrefraktiver filme
AU3996700A (en) * 1998-12-30 2000-07-31 Corning Incorporated Tantala doped waveguide and method of manufacture
JP4298067B2 (ja) * 1999-06-23 2009-07-15 キヤノンオプトロン株式会社 光学薄膜の成膜方法
JP2002121048A (ja) * 2000-10-11 2002-04-23 Nippon Sheet Glass Co Ltd 屈折率分布型レンズ用母材ガラス組成物
TW200500311A (en) * 2003-01-28 2005-01-01 Koninkl Philips Electronics Nv Transparent zirconium oxide-tantalum and/or tantalum oxide coating

Also Published As

Publication number Publication date
US20060088466A1 (en) 2006-04-27
DE102004049996A1 (de) 2006-04-20
CN1792929B (zh) 2012-03-28
ATE453929T1 (de) 2010-01-15
CN1792929A (zh) 2006-06-28
JP5138881B2 (ja) 2013-02-06
DE502005008772D1 (de) 2010-02-11
CA2523327A1 (en) 2006-04-14
JP2006111974A (ja) 2006-04-27
EP1648034B9 (de) 2010-07-14
EP1648034A1 (de) 2006-04-19
KR101256659B1 (ko) 2013-04-19
ES2338663T3 (es) 2010-05-11
US7598196B2 (en) 2009-10-06
EP1648034B1 (de) 2009-12-30
KR20060054000A (ko) 2006-05-22

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