TW200624766A - Stage apparatus - Google Patents

Stage apparatus

Info

Publication number
TW200624766A
TW200624766A TW094139301A TW94139301A TW200624766A TW 200624766 A TW200624766 A TW 200624766A TW 094139301 A TW094139301 A TW 094139301A TW 94139301 A TW94139301 A TW 94139301A TW 200624766 A TW200624766 A TW 200624766A
Authority
TW
Taiwan
Prior art keywords
laser beam
mirror
stage
reflected
measuring apparatus
Prior art date
Application number
TW094139301A
Other languages
English (en)
Other versions
TWI338121B (zh
Inventor
Naoto Sano
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200624766A publication Critical patent/TW200624766A/zh
Application granted granted Critical
Publication of TWI338121B publication Critical patent/TWI338121B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C3/00—Measuring distances in line of sight; Optical rangefinders
    • G01C3/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094139301A 2005-01-12 2005-11-09 Stage apparatus TW200624766A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005005122A JP4513574B2 (ja) 2005-01-12 2005-01-12 ステージ装置

Publications (2)

Publication Number Publication Date
TW200624766A true TW200624766A (en) 2006-07-16
TWI338121B TWI338121B (zh) 2011-03-01

Family

ID=36800878

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094139301A TW200624766A (en) 2005-01-12 2005-11-09 Stage apparatus

Country Status (4)

Country Link
JP (1) JP4513574B2 (zh)
KR (1) KR100911600B1 (zh)
CN (1) CN1808625B (zh)
TW (1) TW200624766A (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008145140A (ja) * 2006-12-06 2008-06-26 Ushio Inc 磁束センサおよび磁束センサを備えた平面ステージ
JP4702313B2 (ja) * 2007-03-22 2011-06-15 ウシオ電機株式会社 ステージ装置
JP5242940B2 (ja) * 2007-04-24 2013-07-24 三鷹光器株式会社 非接触形状測定装置
CN101354245B (zh) * 2007-07-26 2010-11-10 鸿富锦精密工业（深圳）有限公司 承载台及采用该承载台的测量设备
JP5556774B2 (ja) * 2011-09-16 2014-07-23 ウシオ電機株式会社 露光装置
JP6689489B2 (ja) * 2015-03-27 2020-04-28 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
GB2575686B (en) * 2018-07-20 2021-11-17 Dyson Technology Ltd Energy storage device
CN111156901A (zh) * 2018-11-08 2020-05-15 苏州多祥自动化科技有限公司 一种批量内孔高度检测装置
CN111238337B (zh) * 2020-01-21 2021-11-30 中国计量科学研究院 基于激光干涉可消除阿贝误差的步距规校准方法及系统
CN114029670A (zh) * 2021-09-27 2022-02-11 苏州邦拓精密机械股份有限公司 一种用于钣金件的高精度钣金组合件焊接系统

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04351905A (ja) * 1991-05-30 1992-12-07 Fujitsu Ltd レーザ測長装置を備えたｘｙステージ
JPH05217837A (ja) * 1992-02-04 1993-08-27 Toshiba Corp Ｘｙ移動テーブル
JPH07115052A (ja) * 1993-10-15 1995-05-02 Canon Inc 移動ステージ装置
US5757160A (en) * 1996-12-23 1998-05-26 Svg Lithography Systems, Inc. Moving interferometer wafer stage
JP3604944B2 (ja) 1999-03-17 2004-12-22 キヤノン株式会社 ３次元形状測定機およびその測定方法
WO2001052004A1 (en) * 2000-01-11 2001-07-19 Electro Scientific Industries, Inc. Abbe error correction system and method
JP3604996B2 (ja) 2000-05-12 2004-12-22 キヤノン株式会社 ３次元形状測定機及びその測定方法

Also Published As

Publication number Publication date
KR100911600B1 (ko) 2009-08-07
CN1808625B (zh) 2010-09-22
CN1808625A (zh) 2006-07-26
JP4513574B2 (ja) 2010-07-28
JP2006194672A (ja) 2006-07-27
KR20060082394A (ko) 2006-07-18
TWI338121B (zh) 2011-03-01

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