TW200608556A - Storage element - Google Patents

Storage element

Info

Publication number
TW200608556A
TW200608556A TW094113312A TW94113312A TW200608556A TW 200608556 A TW200608556 A TW 200608556A TW 094113312 A TW094113312 A TW 094113312A TW 94113312 A TW94113312 A TW 94113312A TW 200608556 A TW200608556 A TW 200608556A
Authority
TW
Taiwan
Prior art keywords
storage element
variable resistive
film
transistor
drain
Prior art date
Application number
TW094113312A
Other languages
English (en)
Inventor
Shunsaku Muraoka
Koichi Osano
Ken Takahashi
Masafumi Shimotashiro
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Publication of TW200608556A publication Critical patent/TW200608556A/zh

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0007—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021—Auxiliary circuits
    • G11C13/0069—Writing or programming circuits or methods
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/30—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/821—Device geometry
    • H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/883—Oxides or nitrides
    • H10N70/8836—Complex metal oxides, e.g. perovskites, spinels
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021—Auxiliary circuits
    • G11C13/0069—Writing or programming circuits or methods
    • G11C2013/009—Write using potential difference applied between cell electrodes
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/30—Resistive cell, memory material aspects
    • G11C2213/31—Material having complex metal oxide, e.g. perovskite structure
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70—Resistive array aspects
    • G11C2213/79—Array wherein the access device being a transistor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Networks Using Active Elements (AREA)
  • Semiconductor Integrated Circuits (AREA)
TW094113312A 2004-04-27 2005-04-26 Storage element TW200608556A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004131554 2004-04-27

Publications (1)

Publication Number Publication Date
TW200608556A true TW200608556A (en) 2006-03-01

Family

ID=35241933

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094113312A TW200608556A (en) 2004-04-27 2005-04-26 Storage element

Country Status (2)

Country Link
TW (1) TW200608556A (zh)
WO (1) WO2005106955A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1898749B (zh) * 2003-12-26 2012-01-18 松下电器产业株式会社 具有可变电阻的存储器件、存储电路及半导体集成电路
JP4792006B2 (ja) * 2007-06-12 2011-10-12 株式会社東芝 情報記録再生装置
JP4792010B2 (ja) * 2007-06-12 2011-10-12 株式会社東芝 情報記録再生装置
JP4792007B2 (ja) 2007-06-12 2011-10-12 株式会社東芝 情報記録再生装置
JP4792009B2 (ja) * 2007-06-12 2011-10-12 株式会社東芝 情報記録再生装置
JPWO2009098734A1 (ja) * 2008-02-06 2011-05-26 株式会社東芝 情報記録再生装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07262646A (ja) * 1994-03-24 1995-10-13 Otari Kk ビデオテープの部分消去検出方法及び検出装置
GB9426008D0 (en) * 1994-12-22 1995-02-22 Philips Electronics Uk Ltd Programmed semiconductor memory devices and methods of fabricating such
JP3603771B2 (ja) * 2000-09-26 2004-12-22 松下電器産業株式会社 磁気抵抗素子およびそれを用いた磁気センサ、メモリー装置
US6791859B2 (en) * 2001-11-20 2004-09-14 Micron Technology, Inc. Complementary bit PCRAM sense amplifier and method of operation
JP4103497B2 (ja) * 2002-04-18 2008-06-18 ソニー株式会社 記憶装置とその製造方法および使用方法、半導体装置とその製造方法
US6583003B1 (en) * 2002-09-26 2003-06-24 Sharp Laboratories Of America, Inc. Method of fabricating 1T1R resistive memory array

Also Published As

Publication number Publication date
WO2005106955A1 (ja) 2005-11-10

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