TW200606595A - Exposure pattern forming method - Google Patents

Exposure pattern forming method

Info

Publication number
TW200606595A
TW200606595A TW094113745A TW94113745A TW200606595A TW 200606595 A TW200606595 A TW 200606595A TW 094113745 A TW094113745 A TW 094113745A TW 94113745 A TW94113745 A TW 94113745A TW 200606595 A TW200606595 A TW 200606595A
Authority
TW
Taiwan
Prior art keywords
pattern
glass substrate
exposure
imaged
carrying means
Prior art date
Application number
TW094113745A
Other languages
English (en)
Other versions
TWI380134B (en
Inventor
Miyoshi Ito
Original Assignee
Integrated Solutions Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Integrated Solutions Co Ltd filed Critical Integrated Solutions Co Ltd
Publication of TW200606595A publication Critical patent/TW200606595A/zh
Application granted granted Critical
Publication of TWI380134B publication Critical patent/TWI380134B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
TW94113745A 2004-04-28 2005-04-28 Exposure pattern forming method TWI380134B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004134441A JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法

Publications (2)

Publication Number Publication Date
TW200606595A true TW200606595A (en) 2006-02-16
TWI380134B TWI380134B (en) 2012-12-21

Family

ID=35241830

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94113745A TWI380134B (en) 2004-04-28 2005-04-28 Exposure pattern forming method

Country Status (5)

Country Link
JP (1) JP4253707B2 (zh)
KR (1) KR101094468B1 (zh)
CN (1) CN100483258C (zh)
TW (1) TWI380134B (zh)
WO (1) WO2005106591A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5344730B2 (ja) * 2006-05-22 2013-11-20 株式会社ブイ・テクノロジー 露光装置
JP5319175B2 (ja) * 2008-06-17 2013-10-16 日立造船株式会社 パターン描画方法及び装置
CN102725680B (zh) * 2010-01-21 2015-02-11 夏普株式会社 基板、针对基板的曝光方法、光取向处理方法
JP5538049B2 (ja) * 2010-04-22 2014-07-02 日東電工株式会社 フォトマスクと基材との位置合わせ方法および配線回路基板の製造方法
JP5704315B2 (ja) * 2011-01-07 2015-04-22 株式会社ブイ・テクノロジー 露光装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010623A (ja) * 1983-06-29 1985-01-19 Fujitsu Ltd ホトリピ−タ
JPS62124999A (ja) * 1985-11-27 1987-06-06 株式会社ニコン 自動作図装置
JP3046697B2 (ja) * 1993-11-08 2000-05-29 シャープ株式会社 露光装置
JPH09171106A (ja) * 1995-10-19 1997-06-30 Fuji Photo Film Co Ltd カラーフィルターの作製方法
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
CN100483258C (zh) 2009-04-29
KR20070001251A (ko) 2007-01-03
KR101094468B1 (ko) 2011-12-19
TWI380134B (en) 2012-12-21
JP4253707B2 (ja) 2009-04-15
JP2005316167A (ja) 2005-11-10
WO2005106591A1 (ja) 2005-11-10
CN1947064A (zh) 2007-04-11

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