TW200517334A - Forming method for tiny flow paths - Google Patents

Forming method for tiny flow paths

Info

Publication number
TW200517334A
TW200517334A TW093136883A TW93136883A TW200517334A TW 200517334 A TW200517334 A TW 200517334A TW 093136883 A TW093136883 A TW 093136883A TW 93136883 A TW93136883 A TW 93136883A TW 200517334 A TW200517334 A TW 200517334A
Authority
TW
Taiwan
Prior art keywords
flow path
tiny flow
resist film
photo resist
laser
Prior art date
Application number
TW093136883A
Other languages
Chinese (zh)
Other versions
TWI274733B (en
Inventor
Hiromi Ishikawa
Kazuhiko Nagano
Yoji Okazaki
Takeshi Fujii
Hiromitsu Yamakawa
Original Assignee
Fuji Photo Film Co Ltd
Fuji Photo Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002149884A external-priority patent/JP2003340924A/en
Priority claimed from JP2002149885A external-priority patent/JP2003340923A/en
Priority claimed from JP2002149886A external-priority patent/JP4731787B2/en
Priority claimed from JP2002199092A external-priority patent/JP2004043981A/en
Priority claimed from JP2002199091A external-priority patent/JP2004042143A/en
Application filed by Fuji Photo Film Co Ltd, Fuji Photo Optical Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200517334A publication Critical patent/TW200517334A/en
Application granted granted Critical
Publication of TWI274733B publication Critical patent/TWI274733B/en

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Micromachines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Optical Scanning Systems (AREA)

Abstract

This invention is to provide a high speed precisely formed tiny flow path formation method, and provide micro flow path formation method to form arbitrary patterned micro flow path at low cost. In the exposure process of photo resist film using space optical modulation element to modulate wave length 350 nm to 450 nm laser corresponding the formation pattern data of tiny flow path, then digitally expose photo resist film with modulated laser. To perform more accurate exposure, it is exposed by deep focus depth laser emitted from the high bright light source.
TW93136883A 2002-05-23 2003-05-09 Forming method for tiny flow paths TWI274733B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002149884A JP2003340924A (en) 2002-05-23 2002-05-23 Laminate forming apparatus
JP2002149885A JP2003340923A (en) 2002-05-23 2002-05-23 Optical-forming apparatus
JP2002149886A JP4731787B2 (en) 2002-04-10 2002-05-23 Exposure head and exposure apparatus
JP2002199092A JP2004043981A (en) 2002-07-08 2002-07-08 Apparatus for bleaching treatment
JP2002199091A JP2004042143A (en) 2002-07-08 2002-07-08 Method for forming micro flow passage

Publications (2)

Publication Number Publication Date
TW200517334A true TW200517334A (en) 2005-06-01
TWI274733B TWI274733B (en) 2007-03-01

Family

ID=37765354

Family Applications (5)

Application Number Title Priority Date Filing Date
TW93136885A TWI263810B (en) 2002-05-23 2003-05-09 Bleaching treatment device
TW93136883A TWI274733B (en) 2002-05-23 2003-05-09 Forming method for tiny flow paths
TW92112637A TWI258601B (en) 2002-05-23 2003-05-09 Exposure head and exposure device
TW93136882A TWI263798B (en) 2002-05-23 2003-05-09 Optical shaping device
TW93136884A TWI268854B (en) 2002-05-23 2003-05-09 Laminated shaping device

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW93136885A TWI263810B (en) 2002-05-23 2003-05-09 Bleaching treatment device

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW92112637A TWI258601B (en) 2002-05-23 2003-05-09 Exposure head and exposure device
TW93136882A TWI263798B (en) 2002-05-23 2003-05-09 Optical shaping device
TW93136884A TWI268854B (en) 2002-05-23 2003-05-09 Laminated shaping device

Country Status (1)

Country Link
TW (5) TWI263810B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI825023B (en) 2017-08-24 2023-12-11 日商索尼股份有限公司 Light modeling device, lighting control method and lighting control program

Also Published As

Publication number Publication date
TW200528754A (en) 2005-09-01
TWI268854B (en) 2006-12-21
TW200405032A (en) 2004-04-01
TWI258601B (en) 2006-07-21
TWI263798B (en) 2006-10-11
TW200517244A (en) 2005-06-01
TW200513677A (en) 2005-04-16
TWI274733B (en) 2007-03-01
TWI263810B (en) 2006-10-11

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Legal Events

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