WO2002069336A3 - Method for producing photoresist master for optical information medium, and method for producing stamper for optical information medium - Google Patents

Method for producing photoresist master for optical information medium, and method for producing stamper for optical information medium Download PDF

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Publication number
WO2002069336A3
WO2002069336A3 PCT/JP2002/001720 JP0201720W WO02069336A3 WO 2002069336 A3 WO2002069336 A3 WO 2002069336A3 JP 0201720 W JP0201720 W JP 0201720W WO 02069336 A3 WO02069336 A3 WO 02069336A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical information
information medium
producing
photoresist
pattern
Prior art date
Application number
PCT/JP2002/001720
Other languages
French (fr)
Other versions
WO2002069336A2 (en
Inventor
Hisaji Oyake
Hiroaki Takahata
Original Assignee
Tdk Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tdk Corp filed Critical Tdk Corp
Priority to JP2002568371A priority Critical patent/JP2004519803A/en
Priority to EP02700786A priority patent/EP1364367A2/en
Priority to KR10-2003-7011163A priority patent/KR20030078085A/en
Publication of WO2002069336A2 publication Critical patent/WO2002069336A2/en
Publication of WO2002069336A3 publication Critical patent/WO2002069336A3/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

A method for producing a photoresist master adapted for use in the manufacture of an optical information medium is provided. This method has enabled formation of a fine pattern having a minimum width which is about half of the wavelength used for the exposure, and in this method, decrease in the pattern height has been suppressed and tapering of the pattern profile has been improved. In this method comprising the steps of applying a photoresist layer on a substrate, exposing the photoresist laxer to a laser beam to form a latent image to form a protrusion/depression pattern to thereby produce the photoresist master, and in this method; a light absorbing layer is formed between the substrate and the photoresist layer and in contact with the photoresist layer exhibits light absorption at the wavelength of said laser beam.
PCT/JP2002/001720 2001-02-27 2002-02-26 Method for producing photoresist master for optical information medium, and method for producing stamper for optical information medium WO2002069336A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002568371A JP2004519803A (en) 2001-02-27 2002-02-26 Method of manufacturing photoresist master for optical information medium and method of manufacturing stamper for optical information medium
EP02700786A EP1364367A2 (en) 2001-02-27 2002-02-26 Method for producing photoresist master for optical information medium, and method for producing stamper for optical information medium
KR10-2003-7011163A KR20030078085A (en) 2001-02-27 2002-02-26 Method for Producing Photoresist Master for Optical Information Medium, and Method for Producing Stamper for Optical Information Medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001-053030 2001-02-27
JP2001053030 2001-02-27

Publications (2)

Publication Number Publication Date
WO2002069336A2 WO2002069336A2 (en) 2002-09-06
WO2002069336A3 true WO2002069336A3 (en) 2003-04-03

Family

ID=18913562

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/001720 WO2002069336A2 (en) 2001-02-27 2002-02-26 Method for producing photoresist master for optical information medium, and method for producing stamper for optical information medium

Country Status (7)

Country Link
US (1) US20020160312A1 (en)
EP (1) EP1364367A2 (en)
JP (1) JP2004519803A (en)
KR (1) KR20030078085A (en)
CN (1) CN1238852C (en)
TW (1) TW565837B (en)
WO (1) WO2002069336A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4791653B2 (en) * 2001-06-07 2011-10-12 独立行政法人産業技術総合研究所 Fine pattern drawing material, drawing method and fine pattern forming method using the same
JP2003085829A (en) * 2001-09-06 2003-03-20 Tdk Corp Method of manufacturing stamper for optical information medium, master photoresist disk used for the same, stamper for optical information recording medium and optical information medium
TWI254306B (en) * 2002-01-08 2006-05-01 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the photoresist template
TWI258142B (en) * 2002-01-08 2006-07-11 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the stamper spacer with template
AU2003221338A1 (en) * 2002-03-11 2003-09-22 Tdk Corporation Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium
JP2004013973A (en) * 2002-06-05 2004-01-15 Tdk Corp Manufacturing method of photoresist master disk, manufacturing method of stamper for producing optical recording medium, stamper, photoresist master disk, stamper intermediate body and optical recording medium
JP4972015B2 (en) 2008-03-10 2012-07-11 富士フイルム株式会社 Mold processing method and manufacturing method
TWI395219B (en) * 2008-11-06 2013-05-01 Fabrication method of microstructure
CN102270472B (en) * 2011-04-02 2013-11-27 河南凯瑞数码股份有限公司 Motherboard for blueray optical disc and manufacturing method for motherboard
CN102651224B (en) * 2012-03-23 2015-05-06 江西华文光电股份有限公司 Method for removing top chamfering of BD-R (Blue Dish-Ray) mother disc groove
CN103941548A (en) * 2014-04-28 2014-07-23 吴钟达 Photosensitive coating structure with light absorption layer and photolithographic technique using photosensitive coating structure

Citations (4)

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Publication number Priority date Publication date Assignee Title
EP0168179A1 (en) * 1984-06-12 1986-01-15 Plasmon Data Systems N.V. Improvements relating to photolithography
JPS63129542A (en) * 1986-11-20 1988-06-01 Canon Inc Optical information recording carrier and its production
US4861699A (en) * 1983-03-16 1989-08-29 U.S. Philips Corporation Method of making a master disk used in making optical readable information disks
EP0939399A2 (en) * 1998-02-27 1999-09-01 Sony Corporation Optical recording medium, and method of manufacturing same

Family Cites Families (18)

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NL219906A (en) * 1956-08-14
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US4102683A (en) * 1977-02-10 1978-07-25 Rca Corp. Nonreflecting photoresist process
US4289844A (en) * 1979-06-18 1981-09-15 Eastman Kodak Company Photopolymerizable compositions featuring novel co-initiators
US4609614A (en) * 1985-06-24 1986-09-02 Rca Corporation Process of using absorptive layer in optical lithography with overlying photoresist layer to form relief pattern on substrate
US5635267A (en) * 1992-09-17 1997-06-03 Matsushita Electric Industrial Co., Ltd. Optical information recording medium of phase change type having variably grooved tracks depending on their radial locations
CA2158915A1 (en) * 1994-09-30 1996-03-31 Dekai Loo Liquid photoimageable resist
JP3436843B2 (en) * 1996-04-25 2003-08-18 東京応化工業株式会社 Base material for lithography and resist material for lithography using the same
JP3105459B2 (en) * 1996-10-31 2000-10-30 東京応化工業株式会社 Positive photoresist composition and multilayer resist material using the same
KR100263878B1 (en) * 1997-09-30 2000-08-16 윤종용 Method of manufacturing master disk for making optical disk
JP2000305267A (en) * 1999-04-22 2000-11-02 Jsr Corp Photosensitive resin composition
JP4082537B2 (en) * 1999-04-28 2008-04-30 Ｔｄｋ株式会社 Optical processing solution, antireflection film forming method, pattern plating method, and thin film magnetic head manufacturing method
JP2003085829A (en) * 2001-09-06 2003-03-20 Tdk Corp Method of manufacturing stamper for optical information medium, master photoresist disk used for the same, stamper for optical information recording medium and optical information medium
TWI228718B (en) * 2001-11-05 2005-03-01 Tdk Corp Manufacturing method and device of mold plate for information medium
WO2003046904A1 (en) * 2001-11-30 2003-06-05 Tdk Corporation Information medium master manufacturing method, information medium stamper manufacturing method, information medium master manufacturing apparatus, and information medium stamper manufacturing apparatus
EP1460626A1 (en) * 2001-12-28 2004-09-22 TDK Corporation Method for manufacturing stamper for information medium manufacture, stamper, and photoresist original disk
TWI258142B (en) * 2002-01-08 2006-07-11 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the stamper spacer with template
TWI264717B (en) * 2002-01-08 2006-10-21 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the photoresist template

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861699A (en) * 1983-03-16 1989-08-29 U.S. Philips Corporation Method of making a master disk used in making optical readable information disks
EP0168179A1 (en) * 1984-06-12 1986-01-15 Plasmon Data Systems N.V. Improvements relating to photolithography
JPS63129542A (en) * 1986-11-20 1988-06-01 Canon Inc Optical information recording carrier and its production
EP0939399A2 (en) * 1998-02-27 1999-09-01 Sony Corporation Optical recording medium, and method of manufacturing same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 012, no. 388 (P - 771) 17 October 1988 (1988-10-17) *

Also Published As

Publication number Publication date
CN1238852C (en) 2006-01-25
JP2004519803A (en) 2004-07-02
CN1493077A (en) 2004-04-28
US20020160312A1 (en) 2002-10-31
TW565837B (en) 2003-12-11
EP1364367A2 (en) 2003-11-26
KR20030078085A (en) 2003-10-04
WO2002069336A2 (en) 2002-09-06

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