TW200515211A - Method for producing a library - Google Patents

Method for producing a library

Info

Publication number
TW200515211A
TW200515211A TW093117542A TW93117542A TW200515211A TW 200515211 A TW200515211 A TW 200515211A TW 093117542 A TW093117542 A TW 093117542A TW 93117542 A TW93117542 A TW 93117542A TW 200515211 A TW200515211 A TW 200515211A
Authority
TW
Taiwan
Prior art keywords
periodic pattern
producing
conditions
reflection light
library
Prior art date
Application number
TW093117542A
Other languages
English (en)
Inventor
Koichi Sentoku
Hideki Ina
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200515211A publication Critical patent/TW200515211A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW093117542A 2003-06-17 2004-06-17 Method for producing a library TW200515211A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003172628A JP2005009941A (ja) 2003-06-17 2003-06-17 ライブラリ作成方法

Publications (1)

Publication Number Publication Date
TW200515211A true TW200515211A (en) 2005-05-01

Family

ID=33549478

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093117542A TW200515211A (en) 2003-06-17 2004-06-17 Method for producing a library

Country Status (4)

Country Link
US (1) US7123414B2 (zh)
JP (1) JP2005009941A (zh)
KR (1) KR100627783B1 (zh)
TW (1) TW200515211A (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7555395B2 (en) * 2006-09-26 2009-06-30 Tokyo Electron Limited Methods and apparatus for using an optically tunable soft mask to create a profile library
US7763404B2 (en) * 2006-09-26 2010-07-27 Tokyo Electron Limited Methods and apparatus for changing the optical properties of resists
US7545520B2 (en) * 2006-11-15 2009-06-09 Asml Netherlands B.V. System and method for CD determination using an alignment sensor of a lithographic apparatus
US7701577B2 (en) * 2007-02-21 2010-04-20 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP4834706B2 (ja) * 2008-09-22 2011-12-14 株式会社東芝 構造検査方法
FR2945348B1 (fr) * 2009-05-07 2011-05-13 Thales Sa Procede d'identification d'une scene a partir d'images polarisees multi longueurs d'onde
JP5450275B2 (ja) * 2010-06-14 2014-03-26 株式会社東芝 パターン寸法算出方法およびパターン寸法算出プログラム
US8381140B2 (en) * 2011-02-11 2013-02-19 Tokyo Electron Limited Wide process range library for metrology
JP6316069B2 (ja) * 2014-04-04 2018-04-25 株式会社日立ハイテクノロジーズ 三次元形状変化検出方法、及び三次元形状加工装置
EP3480659A1 (en) * 2017-11-01 2019-05-08 ASML Netherlands B.V. Estimation of data in metrology
JP7129356B2 (ja) * 2019-02-13 2022-09-01 キオクシア株式会社 測定方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3630852B2 (ja) 1995-05-16 2005-03-23 キヤノン株式会社 パターン形成状態検出装置及びそれを用いた投影露光装置
JP3618907B2 (ja) 1996-07-05 2005-02-09 キヤノン株式会社 パターン形成状態検出装置、及びこれを用いた投影露光装置
JPH11211422A (ja) 1998-01-27 1999-08-06 Nikon Corp 線幅測定装置及び方法
JPH11211421A (ja) 1998-01-27 1999-08-06 Nikon Corp 線幅測定装置及び方法
IL130874A (en) * 1999-07-09 2002-12-01 Nova Measuring Instr Ltd System and method for measuring pattern structures
US6900892B2 (en) * 2000-12-19 2005-05-31 Kla-Tencor Technologies Corporation Parametric profiling using optical spectroscopic systems

Also Published As

Publication number Publication date
JP2005009941A (ja) 2005-01-13
KR20040111091A (ko) 2004-12-31
US20050004778A1 (en) 2005-01-06
US7123414B2 (en) 2006-10-17
KR100627783B1 (ko) 2006-09-25

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