TW200510958A - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
TW200510958A
TW200510958A TW093117224A TW93117224A TW200510958A TW 200510958 A TW200510958 A TW 200510958A TW 093117224 A TW093117224 A TW 093117224A TW 93117224 A TW93117224 A TW 93117224A TW 200510958 A TW200510958 A TW 200510958A
Authority
TW
Taiwan
Prior art keywords
device manufacturing
lithographic apparatus
substrate
target portion
movable part
Prior art date
Application number
TW093117224A
Other languages
English (en)
Other versions
TWI284253B (en
Inventor
Evert Hendrik Jan Draaijer
Martinus Agnes Willem Cuijpers
Menno Fien
Marcus Joseph Elisabeth Godfried Breukers
Martijn Houkes
Donkelaar Edwin Teunis Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200510958A publication Critical patent/TW200510958A/zh
Application granted granted Critical
Publication of TWI284253B publication Critical patent/TWI284253B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093117224A 2003-07-01 2004-06-15 Lithographic apparatus and device manufacturing method TWI284253B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077048 2003-07-01

Publications (2)

Publication Number Publication Date
TW200510958A true TW200510958A (en) 2005-03-16
TWI284253B TWI284253B (en) 2007-07-21

Family

ID=34042899

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093117224A TWI284253B (en) 2003-07-01 2004-06-15 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (1) US7148950B2 (zh)
JP (1) JP4084780B2 (zh)
KR (1) KR100609108B1 (zh)
CN (1) CN100487581C (zh)
SG (1) SG138458A1 (zh)
TW (1) TWI284253B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4488822B2 (ja) * 2004-07-27 2010-06-23 株式会社東芝 露光用マスクの製造方法、露光装置、半導体装置の製造方法およびマスクブランクス製品
US7227614B2 (en) * 2004-11-12 2007-06-05 Asml Netherlands B.V. Measurement method, device manufacturing method and lithographic apparatus
US7492441B2 (en) * 2005-12-22 2009-02-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method incorporating a pressure shield
CN100593469C (zh) * 2007-02-12 2010-03-10 深圳市大族激光科技股份有限公司 模块化曝光系统
US7969550B2 (en) * 2007-04-19 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2008168A (en) * 2011-02-25 2012-08-28 Asml Netherlands Bv Method of calculating model parameters of a substrate, a lithographic apparatus and an apparatus for controlling lithographic processing by a lithographic apparatus.
CN107290932B (zh) * 2016-03-30 2020-04-10 上海微电子装备（集团）股份有限公司 运动台测量系统、方法以及运动台

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
US5296891A (en) 1990-05-02 1994-03-22 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Illumination device
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
DE69322983T2 (de) * 1992-02-21 1999-07-15 Canon Kk System zum Steuern von Trägerplatten
JP3217522B2 (ja) * 1992-03-02 2001-10-09 キヤノン株式会社 精密位置決め装置
EP0824722B1 (en) 1996-03-06 2001-07-25 Asm Lithography B.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
DE69735016T2 (de) 1996-12-24 2006-08-17 Asml Netherlands B.V. Lithographisches Gerät mit zwei Objekthaltern
AU2048097A (en) 1997-01-29 1998-08-18 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
DE69829614T2 (de) 1997-03-10 2006-03-09 Asml Netherlands B.V. Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
EP1186959B1 (en) * 2000-09-07 2009-06-17 ASML Netherlands B.V. Method for calibrating a lithographic projection apparatus

Also Published As

Publication number Publication date
US7148950B2 (en) 2006-12-12
JP4084780B2 (ja) 2008-04-30
CN100487581C (zh) 2009-05-13
KR100609108B1 (ko) 2006-08-08
SG138458A1 (en) 2008-01-28
TWI284253B (en) 2007-07-21
CN1577104A (zh) 2005-02-09
KR20050004049A (ko) 2005-01-12
US20050012912A1 (en) 2005-01-20
JP2005045227A (ja) 2005-02-17

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees