SG138458A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG138458A1
SG138458A1 SG200404071-3A SG2004040713A SG138458A1 SG 138458 A1 SG138458 A1 SG 138458A1 SG 2004040713 A SG2004040713 A SG 2004040713A SG 138458 A1 SG138458 A1 SG 138458A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
substrate
target portion
movable part
Prior art date
Application number
SG200404071-3A
Other languages
English (en)
Inventor
Evert Hendrik Jan Draaijer
Martinus Agnes Willem Cuijpers
Menno Fien
Marcus Joseph Elisabe Breukers
Martijn Houkes
Donkelaar Edwin Teunis Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG138458A1 publication Critical patent/SG138458A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200404071-3A 2003-07-01 2004-06-28 Lithographic apparatus and device manufacturing method SG138458A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077048 2003-07-01

Publications (1)

Publication Number Publication Date
SG138458A1 true SG138458A1 (en) 2008-01-28

Family

ID=34042899

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200404071-3A SG138458A1 (en) 2003-07-01 2004-06-28 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (1) US7148950B2 (zh)
JP (1) JP4084780B2 (zh)
KR (1) KR100609108B1 (zh)
CN (1) CN100487581C (zh)
SG (1) SG138458A1 (zh)
TW (1) TWI284253B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4488822B2 (ja) * 2004-07-27 2010-06-23 株式会社東芝 露光用マスクの製造方法、露光装置、半導体装置の製造方法およびマスクブランクス製品
US7227614B2 (en) * 2004-11-12 2007-06-05 Asml Netherlands B.V. Measurement method, device manufacturing method and lithographic apparatus
US7492441B2 (en) * 2005-12-22 2009-02-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method incorporating a pressure shield
CN100593469C (zh) * 2007-02-12 2010-03-10 深圳市大族激光科技股份有限公司 模块化曝光系统
US7969550B2 (en) * 2007-04-19 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2008168A (en) * 2011-02-25 2012-08-28 Asml Netherlands Bv Method of calculating model parameters of a substrate, a lithographic apparatus and an apparatus for controlling lithographic processing by a lithographic apparatus.
CN107290932B (zh) * 2016-03-30 2020-04-10 上海微电子装备（集团）股份有限公司 运动台测量系统、方法以及运动台

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0557100A1 (en) * 1992-02-21 1993-08-25 Canon Kabushiki Kaisha Stage driving system
EP1186959A2 (en) * 2000-09-07 2002-03-13 Asm Lithography B.V. Method for calibrating a lithographic projection apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
EP0527166B1 (de) 1990-05-02 1995-06-14 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP3217522B2 (ja) * 1992-03-02 2001-10-09 キヤノン株式会社 精密位置決め装置
EP0824722B1 (en) 1996-03-06 2001-07-25 Asm Lithography B.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
EP0890136B9 (en) 1996-12-24 2003-12-10 ASML Netherlands B.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
JP4126096B2 (ja) 1997-01-29 2008-07-30 マイクロニック レーザー システムズ アクチボラゲット 感光性被覆を有する基板上に集束レーザ放射により構造物を製作する方法と装置
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0557100A1 (en) * 1992-02-21 1993-08-25 Canon Kabushiki Kaisha Stage driving system
EP1186959A2 (en) * 2000-09-07 2002-03-13 Asm Lithography B.V. Method for calibrating a lithographic projection apparatus

Also Published As

Publication number Publication date
CN1577104A (zh) 2005-02-09
JP4084780B2 (ja) 2008-04-30
TWI284253B (en) 2007-07-21
KR100609108B1 (ko) 2006-08-08
US7148950B2 (en) 2006-12-12
KR20050004049A (ko) 2005-01-12
TW200510958A (en) 2005-03-16
US20050012912A1 (en) 2005-01-20
JP2005045227A (ja) 2005-02-17
CN100487581C (zh) 2009-05-13

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