TW200510951A - Lithographic apparatus, device manufacturing method, and device manufactured thereby - Google Patents

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Info

Publication number
TW200510951A
TW200510951A TW093113725A TW93113725A TW200510951A TW 200510951 A TW200510951 A TW 200510951A TW 093113725 A TW093113725 A TW 093113725A TW 93113725 A TW93113725 A TW 93113725A TW 200510951 A TW200510951 A TW 200510951A
Authority
TW
Taiwan
Prior art keywords
collision
lithographic apparatus
protection apparatus
device manufacturing
manufactured
Prior art date
Application number
TW093113725A
Other languages
English (en)
Other versions
TWI259937B (en
Inventor
Der Meulen Frits Van
Hernes Jacobs
Martinus Arnoldus Henricus Terken
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200510951A publication Critical patent/TW200510951A/zh
Application granted granted Critical
Publication of TWI259937B publication Critical patent/TWI259937B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093113725A 2003-05-16 2004-05-14 Lithographic apparatus, device manufacturing method, and device manufactured thereby TWI259937B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03253057A EP1477852A1 (en) 2003-05-16 2003-05-16 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Publications (2)

Publication Number Publication Date
TW200510951A true TW200510951A (en) 2005-03-16
TWI259937B TWI259937B (en) 2006-08-11

Family

ID=33017016

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093113725A TWI259937B (en) 2003-05-16 2004-05-14 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Country Status (7)

Country Link
US (1) US7184121B2 (zh)
EP (2) EP1477852A1 (zh)
JP (1) JP4243219B2 (zh)
KR (1) KR100656583B1 (zh)
CN (1) CN100458567C (zh)
SG (1) SG115686A1 (zh)
TW (1) TWI259937B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI742115B (zh) * 2016-07-26 2021-10-11 南韓商Ａｐ系統股份有限公司 雷射處理裝置

Families Citing this family (23)

* Cited by examiner, † Cited by third party
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KR101162527B1 (ko) 2003-09-03 2012-07-09 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4840958B2 (ja) * 2003-10-21 2011-12-21 キヤノン株式会社 走査露光装置及びデバイス製造方法
US20050107909A1 (en) * 2003-11-14 2005-05-19 Siemens Technology-To-Business Center Llc Systems and methods for programming motion control
US20050065633A1 (en) * 2003-11-14 2005-03-24 Michael Wynblatt Systems and methods for relative control of load motion actuators
US20050107911A1 (en) * 2003-11-14 2005-05-19 Siemens Technology-To-Business Center Llc Systems and methods for controlling load motion actuators
US20070164234A1 (en) * 2004-01-15 2007-07-19 Nikon Corporation Exposure apparatus and device manufacturing method
WO2006057263A1 (ja) * 2004-11-25 2006-06-01 Nikon Corporation 移動体システム、露光装置及びデバイス製造方法
US7378025B2 (en) * 2005-02-22 2008-05-27 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US7330238B2 (en) 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
JP2006319242A (ja) * 2005-05-16 2006-11-24 Nikon Corp 露光装置
US7310132B2 (en) * 2006-03-17 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100905903B1 (ko) * 2007-10-09 2009-07-02 서울엔지니어링(주) Ｌｃｄ 검사장비의 스테이지 안전바
NL2002888A1 (nl) * 2008-06-12 2009-12-15 Asml Netherlands Bv Lithographic apparatus, composite material and manufacturing method.
NL2004401A (en) * 2009-04-15 2010-10-18 Asml Netherlands Bv Lithographic apparatus, positioning system, and positioning method.
US20110015861A1 (en) * 2009-07-14 2011-01-20 Vitaly Burkatovsky System for collision detection between objects
JP5304566B2 (ja) * 2009-09-16 2013-10-02 株式会社安川電機 フェールセーフ機構を備えた基盤搬送装置
WO2013160123A1 (en) * 2012-04-27 2013-10-31 Asml Netherlands B.V. Lithographic apparatus comprising an actuator, and method for protecting such actuator
CN103019045A (zh) * 2012-12-11 2013-04-03 清华大学 一种具有防撞功能的硅片台
US11114930B2 (en) * 2014-12-04 2021-09-07 Eddy Current Limited Partnership Eddy current brake configurations
CN105807575B (zh) * 2014-12-30 2017-08-25 上海微电子装备有限公司 一种硅片边缘保护装置
CN106842000B (zh) * 2017-03-31 2020-02-07 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 飞针测试机运动防撞机构
GB201712788D0 (en) 2017-08-09 2017-09-20 Oxford Instr Nanotechnology Tools Ltd Collision avoidance for electron microscopy
CN110908250A (zh) * 2019-12-16 2020-03-24 华虹半导体(无锡)有限公司 投影光刻系统的积分棒和刀口狭缝的防摩擦装置和方法

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US5040431A (en) * 1988-01-22 1991-08-20 Canon Kabushiki Kaisha Movement guiding mechanism
JPH022104A (ja) 1988-06-15 1990-01-08 Canon Inc マスク保持装置
JPH02192112A (ja) * 1989-01-20 1990-07-27 Canon Inc 露光装置
JP2001110699A (ja) * 1999-10-05 2001-04-20 Canon Inc ステージ装置および該ステージ装置を用いた露光装置
EP1107067B1 (en) 1999-12-01 2006-12-27 ASML Netherlands B.V. Positioning apparatus and lithographic apparatus comprising the same
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
EP1111469B1 (en) * 1999-12-21 2007-10-17 ASML Netherlands B.V. Lithographic apparatus with a balanced positioning system
EP1111471B1 (en) 1999-12-21 2005-11-23 ASML Netherlands B.V. Lithographic projection apparatus with collision preventing device
TWI223734B (en) * 1999-12-21 2004-11-11 Asml Netherlands Bv Crash prevention in positioning apparatus for use in lithographic projection apparatus
EP1111472B1 (en) * 1999-12-22 2007-03-07 ASML Netherlands B.V. Lithographic apparatus with a position detection system
US6538720B2 (en) * 2001-02-28 2003-03-25 Silicon Valley Group, Inc. Lithographic tool with dual isolation system and method for configuring the same
JPWO2003015139A1 (ja) 2001-08-08 2004-12-02 株式会社ニコン ステージシステム及び露光装置、並びにデバイス製造方法
SG107660A1 (en) 2002-06-13 2004-12-29 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI742115B (zh) * 2016-07-26 2021-10-11 南韓商Ａｐ系統股份有限公司 雷射處理裝置

Also Published As

Publication number Publication date
TWI259937B (en) 2006-08-11
EP1477858B1 (en) 2015-07-01
KR20040099151A (ko) 2004-11-26
CN100458567C (zh) 2009-02-04
KR100656583B1 (ko) 2006-12-11
SG115686A1 (en) 2005-10-28
US20050007574A1 (en) 2005-01-13
US7184121B2 (en) 2007-02-27
EP1477858A3 (en) 2005-06-22
JP2004343120A (ja) 2004-12-02
EP1477852A1 (en) 2004-11-17
JP4243219B2 (ja) 2009-03-25
CN1550911A (zh) 2004-12-01
EP1477858A2 (en) 2004-11-17

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