TW200507066A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200507066A
TW200507066A TW093120840A TW93120840A TW200507066A TW 200507066 A TW200507066 A TW 200507066A TW 093120840 A TW093120840 A TW 093120840A TW 93120840 A TW93120840 A TW 93120840A TW 200507066 A TW200507066 A TW 200507066A
Authority
TW
Taiwan
Prior art keywords
reticle
exposure apparatus
substrate
blind
movement
Prior art date
Application number
TW093120840A
Other languages
English (en)
Inventor
Takeshi Inoue
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200507066A publication Critical patent/TW200507066A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
TW093120840A 2003-07-25 2004-07-13 Exposure apparatus TW200507066A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003279926 2003-07-25

Publications (1)

Publication Number Publication Date
TW200507066A true TW200507066A (en) 2005-02-16

Family

ID=34100839

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093120840A TW200507066A (en) 2003-07-25 2004-07-13 Exposure apparatus

Country Status (3)

Country Link
JP (1) JPWO2005010961A1 (zh)
TW (1) TW200507066A (zh)
WO (1) WO2005010961A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102159996A (zh) * 2008-09-16 2011-08-17 卡尔蔡司Smt有限责任公司 用于半导体光刻的投射曝光设备中的振动衰减
TWI574305B (zh) * 2006-01-19 2017-03-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006120798A (ja) * 2004-10-20 2006-05-11 Canon Inc 露光装置
JP2006242282A (ja) * 2005-03-03 2006-09-14 Nsk Ltd 案内装置
JP5272584B2 (ja) * 2008-08-29 2013-08-28 株式会社ニコン 遮光ユニット、可変スリット装置、及び露光装置
JP5375057B2 (ja) * 2008-12-05 2013-12-25 株式会社ニコン ステージ装置、露光装置及びデバイス製造方法
JP5539293B2 (ja) * 2011-11-24 2014-07-02 キヤノン株式会社 露光装置、およびデバイス製造方法
CN107450271B (zh) * 2016-05-31 2019-10-25 上海微电子装备（集团）股份有限公司 光刻机刀口组、大视场光刻机和曝光方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56152237A (en) * 1980-04-25 1981-11-25 Hitachi Ltd Pattern detector
JP3266515B2 (ja) * 1996-08-02 2002-03-18 キヤノン株式会社 露光装置、デバイス製造方法およびステージ装置
WO1999025011A1 (fr) * 1997-11-12 1999-05-20 Nikon Corporation Appareil d'exposition par projection
JPH11329954A (ja) * 1998-05-20 1999-11-30 Canon Inc 走査型露光装置およびデバイス製造方法
JP4677151B2 (ja) * 2001-09-25 2011-04-27 キヤノン株式会社 露光装置及びデバイス製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI574305B (zh) * 2006-01-19 2017-03-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
CN102159996A (zh) * 2008-09-16 2011-08-17 卡尔蔡司Smt有限责任公司 用于半导体光刻的投射曝光设备中的振动衰减
CN102159996B (zh) * 2008-09-16 2014-12-10 卡尔蔡司Smt有限责任公司 用于半导体光刻的投射曝光设备中的振动衰减

Also Published As

Publication number Publication date
WO2005010961A1 (ja) 2005-02-03
JPWO2005010961A1 (ja) 2006-09-14

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