TW200506521A - Photosensitive black-colored composition, and black matrix substrate and color filter, using the same - Google Patents

Photosensitive black-colored composition, and black matrix substrate and color filter, using the same

Info

Publication number
TW200506521A
TW200506521A TW093117595A TW93117595A TW200506521A TW 200506521 A TW200506521 A TW 200506521A TW 093117595 A TW093117595 A TW 093117595A TW 93117595 A TW93117595 A TW 93117595A TW 200506521 A TW200506521 A TW 200506521A
Authority
TW
Taiwan
Prior art keywords
black
color filter
matrix substrate
black matrix
colored composition
Prior art date
Application number
TW093117595A
Other languages
Chinese (zh)
Other versions
TWI287694B (en
Inventor
Hiroshi Sasaki
Kazunori Yamada
Koichi Minato
Takeshi Itoi
Mizuhiro Tani
Original Assignee
Toyo Ink Mfg Co
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co, Toppan Printing Co Ltd filed Critical Toyo Ink Mfg Co
Publication of TW200506521A publication Critical patent/TW200506521A/en
Application granted granted Critical
Publication of TWI287694B publication Critical patent/TWI287694B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)

Abstract

There is provided a photosensitive black-colored composition, in which carbon black with specific surface area of 50~200m2/g, pigment derivatives represented by the following formula (A) possessing alkali replacing groups with triazine rings, and ethylene unsaturated compounds are contained. Then there is provided a black matrix substrate with black matrix made from the black composition. And then there is provided a color filter made of filter segment including two colors at least but black. Formula (A): , (In the formula, Q represents organic pigment residual group.)
TW093117595A 2003-06-20 2004-06-18 Photosensitive black-colored composition, and black matrix substrate and color filter, using the same TWI287694B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003176274A JP4601267B2 (en) 2003-06-20 2003-06-20 Photosensitive black composition, black matrix substrate and color filter using the same

Publications (2)

Publication Number Publication Date
TW200506521A true TW200506521A (en) 2005-02-16
TWI287694B TWI287694B (en) 2007-10-01

Family

ID=34099206

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093117595A TWI287694B (en) 2003-06-20 2004-06-18 Photosensitive black-colored composition, and black matrix substrate and color filter, using the same

Country Status (4)

Country Link
JP (1) JP4601267B2 (en)
KR (1) KR101072425B1 (en)
CN (1) CN1329749C (en)
TW (1) TWI287694B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5489386B2 (en) * 2005-03-03 2014-05-14 富士フイルム株式会社 Photocurable composition for antireflection film of solid-state image sensor, antireflection film for solid-state image sensor using the same, method for producing anti-reflection film for solid-state image sensor, and solid-state image sensor
JP2006301101A (en) * 2005-04-18 2006-11-02 Fujifilm Electronic Materials Co Ltd Light-shielding/antireflection multilayer film, method for forming the same, solid-state imaging element having the same, and manufacturing method therefor
TWI332519B (en) * 2005-11-30 2010-11-01 Toyo Ink Mfg Co Black composition and process for manufacturing the same
JP5151126B2 (en) * 2005-11-30 2013-02-27 東洋インキＳｃホールディングス株式会社 Black composition and color filter using the same
JP4848936B2 (en) * 2006-01-27 2011-12-28 東洋インキＳｃホールディングス株式会社 Photosensitive black composition and color filter
JP5115046B2 (en) 2007-06-14 2013-01-09 東洋インキＳｃホールディングス株式会社 Photosensitive black composition and color filter
KR101032275B1 (en) * 2007-11-08 2011-05-06 주식회사 엘지화학 Colored dispersions, photoresist resin composition and black matrix
EP2296208B1 (en) * 2008-06-04 2017-05-10 Toyo Ink Mfg. Co., Ltd Composition for battery
JP5991040B2 (en) * 2012-06-22 2016-09-14 凸版印刷株式会社 Black photosensitive resin composition, black matrix and color filter
KR101907220B1 (en) * 2013-06-20 2018-10-11 동우 화인켐 주식회사 Photosensitive resin composition for black matrix, black matrix by the composition and display device including the black matrix
JP6217404B2 (en) * 2014-01-17 2017-10-25 東洋インキＳｃホールディングス株式会社 Black composition and black coating film

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60250052A (en) * 1984-05-28 1985-12-10 Mitsubishi Chem Ind Ltd Colorant for resin
JPH01247467A (en) * 1988-03-30 1989-10-03 Toyo Ink Mfg Co Ltd Pigment dispersant and pigment composition
JP2679851B2 (en) * 1989-11-10 1997-11-19 東洋インキ製造株式会社 Coloring composition for color filter
JPH07100764B2 (en) * 1990-07-03 1995-11-01 宇部興産株式会社 Black photocurable polymer composition and method for forming black photocurable film
JP3132314B2 (en) * 1994-06-03 2001-02-05 東洋インキ製造株式会社 Method for producing aqueous pigment dispersion
TW425484B (en) * 1995-04-28 2001-03-11 Toray Industries A resin black matrix for liquid crystal display device
JP3674086B2 (en) * 1995-07-03 2005-07-20 三菱化学株式会社 Black matrix for color filter and resist composition for black matrix
JP3268748B2 (en) * 1996-12-16 2002-03-25 大日精化工業株式会社 Pigment dispersant, pigment dispersion, pigment dispersion for color filter
JP3998304B2 (en) * 1997-02-28 2007-10-24 三菱化学株式会社 Color filter
JP2000292615A (en) * 1999-04-07 2000-10-20 Mitsubishi Chemicals Corp Color filter and liquid crystal display using it
JP2002287335A (en) * 2001-03-28 2002-10-03 Fuji Photo Film Co Ltd Method for forming planographic printing plate
KR20040030534A (en) * 2001-05-15 2004-04-09 쇼와 덴코 가부시키가이샤 Photosensitive coloring composition, color filter using the composition and method of producing the same
JP3878451B2 (en) * 2001-10-22 2007-02-07 富士フイルムホールディングス株式会社 Photosensitive resin transfer material, image forming method, color filter and manufacturing method thereof, photomask and manufacturing method thereof
KR100481014B1 (en) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 Photosensitive resin composition using photopolymer

Also Published As

Publication number Publication date
JP2005010604A (en) 2005-01-13
TWI287694B (en) 2007-10-01
CN1573369A (en) 2005-02-02
JP4601267B2 (en) 2010-12-22
CN1329749C (en) 2007-08-01
KR101072425B1 (en) 2011-10-11
KR20040110101A (en) 2004-12-29

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees