TW200506511A - Liquid crystal display unit and its manufacturing method - Google Patents
Liquid crystal display unit and its manufacturing methodInfo
- Publication number
- TW200506511A TW200506511A TW093109963A TW93109963A TW200506511A TW 200506511 A TW200506511 A TW 200506511A TW 093109963 A TW093109963 A TW 093109963A TW 93109963 A TW93109963 A TW 93109963A TW 200506511 A TW200506511 A TW 200506511A
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid crystal
- crystal display
- technique
- forming
- display unit
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 6
- 239000004973 liquid crystal related substance Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 abstract 6
- 238000007687 exposure technique Methods 0.000 abstract 2
- 230000001590 oxidative effect Effects 0.000 abstract 1
Landscapes
- Liquid Crystal (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003182107A JP2005019664A (ja) | 2003-06-26 | 2003-06-26 | 液晶表示装置とその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200506511A true TW200506511A (en) | 2005-02-16 |
| TWI300873B TWI300873B (enExample) | 2008-09-11 |
Family
ID=34182581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093109963A TW200506511A (en) | 2003-06-26 | 2004-04-09 | Liquid crystal display unit and its manufacturing method |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2005019664A (enExample) |
| TW (1) | TW200506511A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5342731B2 (ja) * | 2005-03-25 | 2013-11-13 | エーユー オプトロニクス コーポレイション | 液晶表示装置とその製造方法 |
| CN101283388B (zh) | 2005-10-05 | 2011-04-13 | 出光兴产株式会社 | Tft基板及tft基板的制造方法 |
| WO2007063966A1 (ja) | 2005-12-02 | 2007-06-07 | Idemitsu Kosan Co., Ltd. | Tft基板及びtft基板の製造方法 |
| KR20080108223A (ko) | 2006-01-31 | 2008-12-12 | 이데미쓰 고산 가부시키가이샤 | Tft 기판, 반사형 tft 기판 및 이들의 제조 방법 |
| JP2007212699A (ja) | 2006-02-09 | 2007-08-23 | Idemitsu Kosan Co Ltd | 反射型tft基板及び反射型tft基板の製造方法 |
| WO2008136505A1 (ja) | 2007-05-08 | 2008-11-13 | Idemitsu Kosan Co., Ltd. | 半導体デバイス及び薄膜トランジスタ、並びに、それらの製造方法 |
| TWI508282B (zh) * | 2008-08-08 | 2015-11-11 | Semiconductor Energy Lab | 半導體裝置及其製造方法 |
| US8461630B2 (en) * | 2010-12-01 | 2013-06-11 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
-
2003
- 2003-06-26 JP JP2003182107A patent/JP2005019664A/ja active Pending
-
2004
- 2004-04-09 TW TW093109963A patent/TW200506511A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TWI300873B (enExample) | 2008-09-11 |
| JP2005019664A (ja) | 2005-01-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |