TW200502262A - Curing resin composition and its uses - Google Patents

Curing resin composition and its uses

Info

Publication number
TW200502262A
TW200502262A TW093106345A TW93106345A TW200502262A TW 200502262 A TW200502262 A TW 200502262A TW 093106345 A TW093106345 A TW 093106345A TW 93106345 A TW93106345 A TW 93106345A TW 200502262 A TW200502262 A TW 200502262A
Authority
TW
Taiwan
Prior art keywords
resin composition
curing resin
component
curing
polymer
Prior art date
Application number
TW093106345A
Other languages
Chinese (zh)
Other versions
TWI282796B (en
Inventor
Tomomasa Kaneko
Kenichi Ueda
Original Assignee
Nippon Catalytic Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Catalytic Chem Ind filed Critical Nippon Catalytic Chem Ind
Publication of TW200502262A publication Critical patent/TW200502262A/en
Application granted granted Critical
Publication of TWI282796B publication Critical patent/TWI282796B/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63H—TOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
    • A63H1/00—Tops
    • A63H1/28—Musical tops
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63H—TOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
    • A63H1/00—Tops
    • A63H1/20—Tops with figure-like features; with movable objects, especially figures

Abstract

There is disclosed a curing resin composition which can form a coating film that is extremely excellent not only in the heat resistance but also in the transparency. The curing resin composition is a curing resin composition which comprises a polymer component (A) and a curing component (B), wherein the curing component (B) includes at least one selected from among compounds (b1) having a radically polymerizable double bond and compounds (b2) having an epoxy group, with the curing resin composition being characterized in that the polymer component (A) is a polymer (a) which is formed by polymerizing a monomer component including a specific ether dimer as an essential component.
TW093106345A 2003-03-28 2004-03-10 Curing resin composition and its uses TWI282796B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003092597A JP4142973B2 (en) 2003-03-28 2003-03-28 Curable resin composition and use thereof

Publications (2)

Publication Number Publication Date
TW200502262A true TW200502262A (en) 2005-01-16
TWI282796B TWI282796B (en) 2007-06-21

Family

ID=33405641

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093106345A TWI282796B (en) 2003-03-28 2004-03-10 Curing resin composition and its uses

Country Status (4)

Country Link
JP (1) JP4142973B2 (en)
KR (1) KR100685229B1 (en)
CN (1) CN1269921C (en)
TW (1) TWI282796B (en)

Families Citing this family (36)

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Publication number Priority date Publication date Assignee Title
TWI387777B (en) * 2006-04-06 2013-03-01 Nippon Catalytic Chem Ind Optical film and manufacturing method for same
JP2008056867A (en) * 2006-09-04 2008-03-13 The Inctec Inc Pigment dispersion and colored photosensitive composition
EP1975702B1 (en) * 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
JP4296225B2 (en) * 2007-07-18 2009-07-15 株式会社日本触媒 New polymer
JP5187492B2 (en) * 2007-11-22 2013-04-24 Ｊｓｒ株式会社 Curable resin composition, protective film and method for forming protective film
JP2009244619A (en) * 2008-03-31 2009-10-22 Fujifilm Corp Color filter and method of manufacturing the same, and liquid crystal display device
JP5201066B2 (en) * 2008-06-19 2013-06-05 Ｊｓｒ株式会社 Radiation sensitive resin composition for forming protective film of touch panel and method for forming the same
JP5617177B2 (en) * 2009-03-27 2014-11-05 東洋インキＳｃホールディングス株式会社 Coloring composition for color filter and color filter
JP5701576B2 (en) 2009-11-20 2015-04-15 富士フイルム株式会社 Dispersion composition, photosensitive resin composition, and solid-state imaging device
JP2012003225A (en) 2010-01-27 2012-01-05 Fujifilm Corp Polymerizable composition for solder resist and method for forming solder resist pattern
JP5617329B2 (en) * 2010-04-28 2014-11-05 東洋インキＳｃホールディングス株式会社 Photosensitive resin composition and insulating film for touch panel
US8152863B2 (en) 2010-06-01 2012-04-10 Fujifilm Corporation Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device
JP5615123B2 (en) * 2010-10-12 2014-10-29 株式会社日本触媒 Polymer and its use
JP5191553B2 (en) * 2011-02-17 2013-05-08 富士フイルム株式会社 Colored radiation-sensitive composition, method for producing color filter, color filter, and solid-state imaging device
JP5679860B2 (en) * 2011-02-23 2015-03-04 富士フイルム株式会社 Colored radiation-sensitive composition, color filter, method for producing the color filter, and solid-state imaging device
JP5417364B2 (en) 2011-03-08 2014-02-12 富士フイルム株式会社 Curable composition for solid-state imaging device, photosensitive layer, permanent pattern, wafer level lens, solid-state imaging device, and pattern forming method using the same
KR101622990B1 (en) 2011-09-14 2016-05-20 후지필름 가부시키가이샤 Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor
JP5976523B2 (en) 2011-12-28 2016-08-23 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP5922013B2 (en) 2011-12-28 2016-05-24 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP2013167786A (en) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp Curable resin composition for organic insulating film, cured material, tft active matrix substrate, and liquid-crystal display
JP5934664B2 (en) 2012-03-19 2016-06-15 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
JP5775479B2 (en) 2012-03-21 2015-09-09 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
SG11201504237XA (en) * 2012-11-29 2015-07-30 Fujifilm Corp Composition, infrared transmission filter and method for manufacturing the same and infrared sensor
CN104854486A (en) 2012-11-30 2015-08-19 富士胶片株式会社 Curable resin composition, and image-sensor-chip production method and image sensor chip using same
CN104823083A (en) 2012-11-30 2015-08-05 富士胶片株式会社 Curable resin composition, and image-sensor-chip production method and image sensor chip using same
JP6170673B2 (en) 2012-12-27 2017-07-26 富士フイルム株式会社 Composition for color filter, infrared transmission filter, method for producing the same, and infrared sensor
WO2014104136A1 (en) 2012-12-28 2014-07-03 富士フイルム株式会社 Curable resin composition for forming infrared-reflecting film, infrared-reflecting film and manufacturing method therefor, infrared cut-off filter, and solid-state imaging element using same
JP6166050B2 (en) * 2013-02-01 2017-07-19 株式会社日本触媒 Ether dimer composition and polymer
JP6062876B2 (en) * 2013-02-28 2017-01-18 富士フイルム株式会社 Composition for forming transparent resin layer, transparent resin layer, solid-state imaging device and optoelectronic device
JP6097128B2 (en) 2013-04-12 2017-03-15 富士フイルム株式会社 Far infrared light shielding layer forming composition
JP6177204B2 (en) * 2013-09-02 2017-08-09 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． Photosensitive resin composition, color filter using the same, and liquid crystal display device
JP6162084B2 (en) 2013-09-06 2017-07-12 富士フイルム株式会社 Colored composition, cured film, color filter, method for producing color filter, solid-state imaging device, image display device, polymer, xanthene dye
KR101917406B1 (en) * 2014-03-21 2018-11-09 동우 화인켐 주식회사 Photosensitive resin composition, color filter with high color reproducing and liquid crystal display device using the same
WO2017141935A1 (en) * 2016-02-15 2017-08-24 岡本化学工業株式会社 Composition optical three-dimensional molding
JP6475783B2 (en) * 2017-06-22 2019-02-27 株式会社日本触媒 Ether dimer composition and polymer
CN114269556A (en) 2019-08-29 2022-04-01 富士胶片株式会社 Composition, film, near-infrared cut filter, pattern formation method, laminate, solid-state imaging element, infrared sensor, image display device, camera module, and compound

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100263906B1 (en) * 1998-06-02 2000-09-01 윤종용 Photosensitive polymer having backbone of cyclic structure and resist composition comprising the same
KR100281903B1 (en) 1998-12-24 2001-03-02 윤종용 Photosensitive polymer having a cyclic structure of the backbone and a resist composition comprising the same

Also Published As

Publication number Publication date
TWI282796B (en) 2007-06-21
CN1542067A (en) 2004-11-03
CN1269921C (en) 2006-08-16
JP2004300204A (en) 2004-10-28
KR20040084825A (en) 2004-10-06
JP4142973B2 (en) 2008-09-03
KR100685229B1 (en) 2007-02-22

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