TWI282796B - Curing resin composition and its uses - Google Patents

Curing resin composition and its uses Download PDF

Info

Publication number
TWI282796B
TWI282796B TW093106345A TW93106345A TWI282796B TW I282796 B TWI282796 B TW I282796B TW 093106345 A TW093106345 A TW 093106345A TW 93106345 A TW93106345 A TW 93106345A TW I282796 B TWI282796 B TW I282796B
Authority
TW
Taiwan
Prior art keywords
polymer
resin composition
curable resin
component
compound
Prior art date
Application number
TW093106345A
Other languages
Chinese (zh)
Other versions
TW200502262A (en
Inventor
Tomomasa Kaneko
Kenichi Ueda
Original Assignee
Nippon Catalytic Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Catalytic Chem Ind filed Critical Nippon Catalytic Chem Ind
Publication of TW200502262A publication Critical patent/TW200502262A/en
Application granted granted Critical
Publication of TWI282796B publication Critical patent/TWI282796B/en

Links

Classifications

    • AHUMAN NECESSITIES
    • A63SPORTS; GAMES; AMUSEMENTS
    • A63HTOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
    • A63H1/00Tops
    • A63H1/28Musical tops
    • AHUMAN NECESSITIES
    • A63SPORTS; GAMES; AMUSEMENTS
    • A63HTOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
    • A63H1/00Tops
    • A63H1/20Tops with figure-like features; with movable objects, especially figures

Abstract

There is disclosed a curing resin composition which can form a coating film that is extremely excellent not only in the heat resistance but also in the transparency. The curing resin composition is a curing resin composition which comprises a polymer component (A) and a curing component (B), wherein the curing component (B) includes at least one selected from among compounds (b1) having a radically polymerizable double bond and compounds (b2) having an epoxy group, with the curing resin composition being characterized in that the polymer component (A) is a polymer (a) which is formed by polymerizing a monomer component including a specific ether dimer as an essential component.

Description

1282796 (1) 玖、發明說明 【發明所屬之技術領域】 本發明爲關於新穎的硬化性樹脂組成物及其用途。 【先前技術】 自以往,耐熱性優良的硬化性樹脂組成物例如已提案 令含有2- (羥烷基)丙烯酸酯之單體成分,予以聚合、 內酯環化而成之含有含內酯環之聚合物與硬化成分的樹脂 組成物(例如,參照專利文獻1 )、和令含有馬來醯亞胺 之單體成分予以聚合而成之含有聚合物和硬化成分的樹脂 組成物(例如,參照專利文獻2、3 )等。 〔專利文獻1〕 特開2002-3 03 975號公報 〔專利文獻2〕 特開平04_ 1 3 0 1 2 8號公報 〔專利文獻3〕 特開平1 0-3 1 3 08號公報 【發明內容】 〔發明之揭示〕 〔發明所欲解決之課題〕 但是,前者之含有來自2 -(羥烷基)丙烯酸酯之聚 合物的樹脂組成物,於取得聚合物時之聚合性低且殘存/ 單體有變多之傾向,更且於內酯環化時發生水和乙醇’古夂 此些殘存單體或水和乙醇對硬化性和硬化膜之物性造$ $ 良影響。並且,含內酯環聚合物的內酯環於鹼下易開環’ 例如應用於鹼性顯像型之光阻材料等之用途時’根據,顯{象 -4 - 1282796 (2) 條件亦具有硬化部分缺落且圖案形狀變差之問題。又,後 者之含有來自馬來醯亞胺之聚合物的樹脂組成物’因爲馬 來醯亞胺系聚合物爲含有氮原子,故聚合物著色成黃色〜 黃褐色,具有硬化膜之透明性爲不充分的問題。此透明性 之問題在硬化膜之膜厚爲厚之情況中特別顯著,並且,若 施以加熱處理則更加著色。 於是,本發明所欲解決之問題爲在於提供可形成耐熱 性及透明性均極爲優良之塗膜的硬化性樹脂組成物、及使 用該硬化性樹脂組成物的彩色濾光片和顯示裝置。 〔解決課題之手段〕 本發明者爲了解決上述課題,進行致力檢討。其結果 ,發現含有令2 -(羥烷基)丙烯酸酯之醚二聚物的特定 構造化合物聚合而成之聚合物及硬化成分的樹脂組成物, 可一舉解決前述課題,並且完成本發明。 即,本發明之硬化性樹脂組成物爲含有聚合物成分( A)、與具有自由基聚合性雙鍵之化合物(bl)及具有環 氧基之化合物(b2)所選出之至少一者所構成之硬化成分 (B )的硬化性樹脂組成物,該聚合物成分(A )爲令下 述一般式(1 ) OR1 OR2 (式(1)中,R1及R2分別獨立表示氫原子或亦可具有取 -5- 1282796 (3) 代基之碳數1〜25個的羥基) 所示之化合物做爲必須之單體成分聚合而成的聚合物(a )〇 本發明之彩色濾光片其特徵爲於基板上設置硬化樹脂 層所形成的彩色濾光片中,做爲該硬化樹脂層的樹脂組成 物爲前述本發明之硬化性樹脂組成物。 本發明之顯示裝置其特徵爲使用於基板上設置硬化樹 脂層所形成之彩色濾光片的顯示裝置中,做爲該硬化樹脂 層之樹脂組成物爲前述本發明之硬化性樹脂組成物。 〔發明之效果〕 本發明之硬化性樹脂組成物可形成耐熱性及透明性均 極爲優良的塗膜,例如,適合使用於光阻材料、各種塗層 劑、塗料等之用途。又,若根據本發明,則可提供無圖案 缺損和顯像殘渣之良好品質的彩色濾光片。又’若根據本 發明,則可提供亮度及色純度高,不會產生顏色不勻等之 良好顯示品質的顯示裝置。 〔實施發明之最佳形態〕 本發明之硬化性樹脂組成物爲含有令下述一般式(11282796 (1) Description of the Invention [Technical Field of the Invention] The present invention relates to a novel curable resin composition and use thereof. [Prior Art] Conventionally, a curable resin composition having excellent heat resistance has been proposed to contain a monomer component containing 2-(hydroxyalkyl) acrylate, to be polymerized, and to contain a lactone ring by cyclization of a lactone. A resin composition containing a polymer and a curing component (for example, refer to Patent Document 1) and a resin composition containing a polymer and a curing component obtained by polymerizing a monomer component containing maleimide (for example, reference) Patent Documents 2, 3) and the like. [Patent Document 1] Japanese Unexamined Patent Application Publication No. Publication No. Publication No. JP-A------- [Disclosure of the Invention] [Problems to be Solved by the Invention] However, the former resin composition containing a polymer derived from 2-(hydroxyalkyl)acrylate has low polymerizability and residual/monomer when the polymer is obtained. There is a tendency to become more and more, and more water and ethanol occur in the cyclization of lactones. These residual monomers or water and ethanol have a good influence on the physical properties of the hardenable and hardened films. Further, when the lactone ring containing a lactone ring polymer is easily opened under a base, for example, when it is used for an alkali-developing type of photoresist material, etc., according to the condition, it is also known as the condition of -4 - 1282796 (2) There is a problem that the hardened portion is missing and the shape of the pattern is deteriorated. Further, the latter contains a resin composition derived from a polymer of maleimide. Since the maleimide-based polymer contains a nitrogen atom, the polymer is colored yellow to yellowish brown, and the transparency of the cured film is Insufficient problem. This problem of transparency is particularly remarkable in the case where the film thickness of the cured film is thick, and is more colored if subjected to heat treatment. Thus, the problem to be solved by the present invention is to provide a curable resin composition which can form a coating film which is excellent in heat resistance and transparency, and a color filter and a display device using the curable resin composition. [Means for Solving the Problems] The present inventors conducted an effort to review the above problems. As a result, it has been found that a resin composition containing a polymer obtained by polymerizing a specific structural compound of an ether dimer of 2-(hydroxyalkyl) acrylate and a curing component can solve the above problems and complete the present invention. That is, the curable resin composition of the present invention is composed of at least one selected from the group consisting of a polymer component (A), a compound having a radical polymerizable double bond (bl), and a compound having an epoxy group (b2). The curable resin composition of the hardening component (B), wherein the polymer component (A) is represented by the following general formula (1): OR1 OR2 (in the formula (1), R1 and R2 each independently represent a hydrogen atom or may have A polymer obtained by polymerizing a compound represented by a monomer component having a carbon number of from 1 to 25, which is a hydroxyl group of from 1 to 25,282 (3) and having a carbon number of (a), which is characterized by the color filter of the present invention. In the color filter formed by providing a cured resin layer on a substrate, the resin composition as the cured resin layer is the curable resin composition of the present invention. In the display device of the present invention, a display device using a color filter formed by providing a hardened resin layer on a substrate is used. The resin composition of the cured resin layer is the curable resin composition of the present invention. [Effects of the Invention] The curable resin composition of the present invention can form a coating film which is excellent in heat resistance and transparency, and is suitable, for example, for use in a photoresist material, various coating agents, paints and the like. Further, according to the present invention, it is possible to provide a color filter having no good quality of pattern defects and development residues. Further, according to the present invention, it is possible to provide a display device which has high brightness and color purity and which does not cause good display quality such as color unevenness. [Best Mode for Carrying Out the Invention] The curable resin composition of the present invention contains the following general formula (1)

OR2 ⑴ -6 - 1282796 (4) (式(1 )中,R1及R2分別獨立表示氫原子或亦可具有取 代基之碳數1〜2 5個的羥基) 所示之化合物(以下亦稱爲「醚二聚物」)做爲必須之單 體成分聚合而成的聚合物(a )爲必須成分的聚合物成分 (A )。藉此’本發明之硬化性樹脂組成物可形成耐熱性 及透明性均極爲優良的硬化塗膜。推測其係因聚合時該醚 二聚物爲進行環化反應,於來自醚二聚物之構成單位中形 成四氫吡喃環構造。 以下,說明前述聚合物(a )。 表示前述醚二聚物之前述一般式(1)中,R1及R2所 示之亦可具有取代基之碳數1〜2 5個的羥基並無特別限制 ,可列舉例如,甲基、乙基、正丙基、異丙基、正丁基、 異丁基、第三丁基、第三戊基、硬脂基、月桂基、2 —乙 基己基等之直鏈狀或分支狀烷基;苯基等之芳基;環己基 、第三丁基環己基、二環戊二烯基、三環癸基、異冰片基 、金剛烷基、2 -甲基一 2 -金剛烷基等之脂環式基,1 一 甲氧乙基、1 -乙氧乙基等之經烷氧基所取代的烷基;爷 基等之經芳基所取代的烷基等。其中特別以甲基、乙基、 環己基、苄基等之難經酸和熱而脫離的一級或二級碳取代 基,就耐熱性而言爲佳。還有,R1及R2可爲同種之取代基 ,或爲相異的取代基亦可。 前述醚二聚物的具體例可列舉例如二甲基—2,2 -〜 〔羥基雙(亞甲基)〕雙一 2 —丙酸酯、二乙基一 2,2一 一〔羥基雙(亞甲基)〕雙一 2 —丙酸酯、二(正丙基) -7- 1282796 (5) 一 2,2 / — 〔羥基雙(亞甲基)〕雙—2 —丙酸酯、二( 異丙基)一 2,2 / — 〔羥基雙(亞甲基)〕雙一 2—丙酸 酯、二(正丁基)一2,2/ —〔羥基雙(亞甲基)〕雙一 2 -丙酸酯、二(異丁基)一 2,-〔羥基雙(亞甲基 )〕雙一 2 —丙酸酯、二(第三丁基)一 2,—〔羥基 雙(亞甲基)〕雙一 2 —丙酸酯、二(第三戊基)一 2, 2 / -〔羥基雙(亞甲基)〕雙一 2 -丙酸酯、二(硬脂基 )一 2,2> — 〔羥基雙(亞甲基)〕雙一 2 —丙酸酯、二 (月桂基)一 2,2/ —〔羥基雙(亞甲基)〕雙一2 —丙 酸酯、二(2 —乙基己基)一 2,2/ —〔羥基雙(亞甲基 )〕雙一 2 —丙酸酯、二(1—甲氧乙基)一 2,2 / — 〔羥 基雙(亞甲基)〕雙一 2 —丙酸酯、二(1 一乙氧乙基)一 2,2 / —〔羥基雙(亞甲基)〕雙一 2-丙酸酯、二苄基 —2,2 / —〔羥基雙(亞甲基)〕雙一 2 —丙酸酯、二苯 基—2,2 / —〔羥基雙(亞甲基)〕雙一 2 —丙酸酯、二 環己基一 2,2 / —〔羥基雙(亞甲基)〕雙一 2 —丙酸酯 、二(第三丁基環己基)一 2,2 / —〔羥基雙(亞甲基) 〕雙—2 —丙酸酯、二(二環戊二烯基)一 2,2^ —〔羥 基雙(亞甲基)〕雙一 2 —丙酸酯、二(三環癸基)一 2, 2 / -〔羥基雙(亞甲基)〕雙一 2 —丙酸酯、二(異冰片 基)一 2,2 / —〔羥基雙(亞甲基)〕雙一 2—丙酸酯、 二金剛烷基一 2,2 / —〔羥基雙(亞甲基)〕雙一 2—丙 酸酯、二(2 —甲基一 2-金剛烷基)一 2,2 / —〔羥基雙 (亞甲基)〕雙一 2 —丙酸酯等。其中亦特別以二甲基一 2 -8- 1282796 (6) ,2〃 —〔羥基雙(亞甲基)〕雙一2 —丙酸酯、二乙基— 2,2 / 一〔羥基雙(亞甲基)〕雙—2—丙酸酯、二環己 基一 2, 2〃 一 〔羥基雙(亞甲基)〕雙一 2 一丙酸酯、二 — 2,— 〔羥基雙(亞甲基)〕雙一 2—丙酸酯爲 佳。此些醚二聚物可僅爲一種’或爲二種以上亦可。 取得前述聚合物(a)時之單體成分中之前述醚二聚 物的比例放無特別限制,於全單體成分中爲2〜6 0重量% ,較佳爲5〜55重量%,更佳爲5〜50重量%。醚二聚物之 份量若過多’則聚合時’難取得低分子量之物質、或者恐 易凝膠化,另一方面,若過少,則恐透明性和耐熱性等之 塗膜性能不夠充分。 前述聚合物(a)以具有酸基之聚合物爲佳。藉此, 所得之硬化性樹脂組成物爲酸基與環氧基反應生成酯鍵並 且利用此酯鍵進行交聯反應(以下簡稱爲「酸環氧硬化」 )的硬化性樹脂組成物、或者令未硬化部經鹼性顯像液予 以顯像的組成物。前述酸基並無特別限制,可列舉例如羧 基、酚性羥基、羧酸酐基等。此些酸基可僅爲一種、或可 爲二種以上。 於前述聚合物(a )導入酸基上,例如,將具有酸基 之單體及聚合後可賦予酸基之單體(以下亦稱爲「用以導 A酸基的單體」)所選出之至少一種,做爲單體成分進行 聚合即可。還有,將聚合後可賦予酸基之單體做爲單體成 分導入酸基之情形中,於聚合後必須例如後述般賦予酸基 之處理。 -9- 1282796 (7) 前述具有酸基之單體可列舉例如(甲基)丙烯酸和衣 康酸等之具有竣基的單體、N-羥苯基馬來亞胺#之具 有酚性羥基的單體、馬來酸酐和衣康酸酐等之具有羧酸酐 基的單體等,其中特別以(甲基)丙烯酸爲佳。前述聚合 後可賦予酸基的單體可列舉例如(甲基)丙烯酸2 -羥乙 酯等之具有羥基的單體、(甲基)丙烯酸縮水甘油酯等之 具有環氧基的單體、2-異氰酸酯(甲基)丙烯酸乙酯等 之具有異氰酸酸基的單體等。用以導入此些酸基的單體可 僅爲一種,且亦可爲二種以上。 取得前述聚合物(a)時之單體成分亦含有前述用以 導入酸基的單體時,其含有比例並無特別限制,全單體成 分中以5〜70重量%,較佳爲1〇〜6〇重量%。 前述聚合物(a )以具有自由基聚合性雙鍵之聚合物 爲佳。藉此’前述聚合物成爲後述之具有自由基聚 合性雙鍵的化合物(b i ),亦兼具成爲硬化成分(B )。 於前述聚合物(a )中導入自由基聚合性雙鍵上,例 如’將聚合後可賦予自由基聚合性雙鍵的單體(以下亦稱 爲「用以導入自由基聚合性雙鍵的單體」),做爲單體成 分進行聚合後,進行如後述之賦予自由基聚合性雙鍵的處 理即可。 則述聚合後可賦予自由基聚合性雙鍵的單體可列舉例 如(甲基)丙嫌酸、衣康酸等之具有殘基的單體;馬來酸 野、衣康酸酐等之具有竣酸酐基的單體;(甲基)丙條酸 縮水甘油醋、(甲基)丙嫌酸3,4 -環氧環己基甲醋、鄰 •10- 1282796 (8) 一(或間 、或封一)乙細基节基縮水甘油釀寺之具有ί哀 氧基的單體等。此些用以導入自由基聚合性雙鍵的單體可 僅爲一種,且亦可爲二種以上。 取得前述聚合物(a )時之單體成分亦含有前述用以 導入自由基聚合性雙鍵的單體時,其含有比例並無特別限 制,全單體成分中以5〜70重量%,較佳爲1〇〜60重量% 〇 前述聚合物(a)以具有環氧基之聚合物爲佳。藉此 ,前述聚合物(a )成爲後述之具有環氧基的化合物(b2 )’亦兼具成爲硬化成分(B)。 於前述聚合物(a )中導入環氧基上,例如,將具有 環氧基之單體(以下亦稱爲「用以導入環氧基的單體」) ,做爲單體成分進行聚合即可。 前述具有環氧基的單體可列舉例如(甲基)丙烯酸縮 水甘油脂、(甲基)丙稀酸3,4一環氧環己基甲酯、鄰一 (或間-、或對-)乙烯基苄基縮水甘油醚等。此些用以 導入環氧基的單體可僅爲一種,且亦可爲二種以上。 取得前述聚合物(a )時之單體成分亦含有前述用以 導入環氧基的單體時,其含有比例並無特別限制,全單體 成分中以5〜70重量%,較佳爲10〜60重量%。 取得前述聚合物(a )時之單體成分,除了令必須成 分之前述醚二聚物、與用以導入前述酸基的單體、用以導 入自由基聚合性雙鍵的單體、用以導入環氧基的單體以外 ,視需要,亦可含有其他可共聚的單體。 -11 - 1282796 (9) 前述其他可共聚的單體可列舉例如(甲基)丙烯酸甲 醋、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲 基)丙儲酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙 ;唏酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸 2 一乙基己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸 ¥酯' (甲基)丙烯酸異冰片酯、(甲基)丙烯酸二環戊 醋、(甲基)丙烯酸2—羥乙酯等之(甲基)丙烯酸酯類 ;苯乙條、乙烯基甲苯、α —甲基苯乙烯等之芳香族乙烯 基化合物;Ν -苯基馬來醯亞胺、Ν 一環己基馬來醯亞胺 等之Ν-取代馬來醯亞胺類;丁二烯、異戊二烯等之丁二 稀或經取代丁二烯化合物;乙烯、丙烯、氯乙烯、丙烯腈 等之乙稀或經取代乙烯化合物;醋酸乙烯酯等之乙烯酯類 等。其中亦以(甲基)丙烯酸甲酯、(甲基)丙烯酸環己 醋、(甲基)丙烯酸苄酯、(甲基)丙烯酸異冰片酯、( 甲基)丙烯酸二環戊酯、苯乙烯爲透明性良好,且難損害 耐熱性故爲佳。此些可共聚的其他單體可僅使用一種且亦 可倂用二種以上。 取得則述聚合物(a)時之單體成分亦含有前述可共 聚的其他單體時,其含有比例並無特別限制,以95重量% 以下爲佳,且以8 5重量%以下爲佳。 前述聚合物(a )爲經由至少令前述醚二聚物做爲必 須的前述單體成分進行聚合,則可輕易取得。此時,與聚 合同時進行醚二聚物的環化反應並且形成四氫吡喃環構造 -12 - 1282796 (10) 前述單體成分之聚合反應的方法並無特別 用先前公知的各種聚合方法,但特別以溶液聚 還有,聚合溫度和聚合濃度(聚合濃度=〔單 重量/ (單體成分的全重量+溶劑重量)〕〉 據所使用單體成分之種類和比率、目標聚合物 異,但較佳爲聚合溫度40〜150。(:、聚合濃度5 佳爲聚合溫度60〜130 °C、聚合濃度10〜40%。 前述單體成分聚合中使用溶劑時,使用通 合反應所用之溶劑即可。具體而言,可列舉例 、二鳄烷、乙二醇二甲醚、二甘醇二甲醚等之 、甲基乙基酮、甲基異丁基酮、環己酮等之酮 酯、醋酸丁酯、丙二醇單甲醚醋酸酯、3 —甲 酯等之酯類;甲醇、乙醇、異丙醇、正丁醇、 醚、丙二醇單甲醚等之醇類;甲苯、二甲苯、 香族烴類;氯仿;二甲基亞硕等。此些溶劑可 且亦可倂用二種以上。 前述溶劑特別以對於生成之聚合物(a ) ,且聚合液之黏度變低的溶劑,根據所使用單 類和比例選擇爲佳。於含有醚二聚物之單體成 ,醚二聚物之一部分未被環化聚合並引起交聯 反應之醚二聚物量若超過一定量,則視情況導 分子量和凝膠化。醚二聚物之交聯志於聚合液 則愈易引起,故經由適當選擇聚合液之黏度變 則可抑制醚二聚物的交聯反應並且防止高分子 限制,可採 合法爲佳。 體成分的全 c 1 0 〇 )爲根 之分子量而 〜50%,更 常自由基聚 如四氫呋喃 醚類;丙酮 類;醋酸乙 氧丁基醋酸 乙二醇單甲 乙苯等之芳 僅使用一種 的溶解力強 體成分的種 分的聚合中 反應,交聯 致異常的高 之黏度愈高 化的溶劑, 量和凝膠化 -13- 1282796 (11) 。例如,於取得具有前述酸基之單體做爲單體成分之具有 酸基的聚合物時,例如,若將二甘醇和二甲醚等之醚類、 異丙醇等之醇類使用於前述溶劑之一部分或全部,則可令 聚合液低黏度化。還有,聚合時所用之溶劑以前述基準選 擇,且最終欲取得與該聚合時所用之溶劑不同溶劑溶液型 式的聚合物(a )時,使用前述基準所選擇之溶劑與最終 所欲取得溶液所需要之溶劑的混合溶液進行聚合後,將前 述基準所選取溶劑蒸除即可。例如,聚合時使用異丙醇等 之醇類和醚類做爲溶劑,且於最終欲令聚合物(a )以丙 二醇單甲醚醋酸酯等之酯類溶液型式時,例如,使用丙二 醇單甲醚醋酸酯與異丙醇之混合溶劑進行聚合後,將異丙 醇蒸除,作成丙二醇單甲醚醋酸酯溶液。 聚合前述單體成分時,視需要,亦可添加通常所用的 聚合引發劑。聚合引發劑並無特別限定,可列舉例如氫過 氧化枯烯、氫過氧化二異丙基苯、過氧化二第三丁基、過 氧化月桂醯、過氧化苯甲醯、第三丁基過氧基異丙基碳酸 酯、第三戊基過氧基- 2-乙基己酸酯、第三丁基過氧基 一 2 -乙基己酸酯等之有機過氧化物;2,2 / —偶氮雙( 異丁腈)、1,1 / —偶氮雙(環己烷乙腈)、2,2 / —偶 氮雙(2,4 —二甲基戊腈)、2,2>-偶氮雙(2 —甲基 丙酸二甲酯)等之偶氮化合物等。此些聚合引發劑可僅使 用一種且倂用二種以上亦可。還有,聚合引發劑之使用量 可根據所用單體之組合,反應條件、目標聚合物之分子量 等而適當設定,並無特別限定,但就未凝膠化且取得重量 -14- 1282796 (12) 平均分子量爲數千〜數萬之聚合物方面而言,則相對於全 單體成分,以0.1〜15重量%,較佳爲0.5〜10重量%。 聚合前述單體成分時,爲了調整分子量,視需要,亦 可添加通常所用的鏈移動劑。鏈移動劑可列舉例如正十二 烷基硫醇、氫硫基醋酸、氫硫基醋酸甲酯、3 -氫硫基丙 酸、3 -氫硫基丙酸甲酯等之硫醇系鏈移動劑、α 一甲基 苯乙烯二聚物等,較佳爲鏈移動效果高,可減低殘存單體 ,且取得亦容易的正十二院基硫醇、氫硫基醋酸、3 -氫 硫基丙酸爲佳。使用鏈移動劑時,其使用量可根據所用單 體之組合、反應條件、目標聚合物之分子量等而適當設定 即可,並無特別限定,但就未凝膠化且取得重量平均分子 量爲數千〜數萬之聚合物方面而言,則相對於全單體成分 以0.1〜15重量%,較佳爲0.5〜10重量%。 於前述聚合反應中,雖然認爲醚二聚物的環化反應爲 同時進行,但此時的醚二聚物環化率並非必要爲1 〇〇莫耳 %。 取得前述聚合物(a )時,使用賦予前述酸基之單體 做爲單體成分,且於藉此導入酸基時,於聚合後必須進行 賦予酸基的處理。用以賦予酸基的處理爲根據所用之可賦 予酸基的單體種類而異,例如,於使用(甲基)丙烯酸2 -羥乙酯般之具有羥基的單體時,例如附加琥珀酸酐、四 氫酞酸酐、馬來酸酐等之酸酐即可。於使用(甲基)丙烯 酸縮水甘油酯等之具有環氧基的單體時’例如附加N -甲 胺基苯甲酸、N -甲胺基苯酚等之具有胺基和酸基的化合 -15- 1282796 (13) 物,或者,例如對附加(甲基)丙烯酸等酸之後所生成的 經基’例如,附加號拍酸酐、四氫酞酸酐、馬來酸酐等之 酸酐即可,於使用2-異氰酸酯(甲基)丙烯酸乙酯等之 具有異氰酸酯基的單體時,例如附加2 -羥基丁酸等之具 有羥基和酸基的化合物即可。 取得前述聚合物(a )時,使用可賦予前述自由基聚 合性雙鍵之單體做爲單體成分,且於藉此導入自由基聚合 性雙鍵時,於聚合後必須進行賦予自由基聚合性雙鍵的處 理。用以賦予自由基聚合性雙鍵的處理爲根據所用之可賦 予自由基聚合性雙鍵之單體種類而異,例如,於使用(甲 基)丙烯酸和衣康酸等之具有羧基的單體時,附加(甲基 )丙烯酸縮水甘油酯、(甲基)丙烯酸3,4 一環氧環己基 甲醋、鄰一(或間-、或對-)乙烯基苄基縮水甘油醚等 之具有環氧基和自由基聚合性雙鍵的化合物即可,於使用 馬來酸酐和衣康酸酐等之具有羧酸酐基的單體時,附加( 甲基)丙烯酸2 -羥乙酯等之具有羥基和自由基聚合性雙 鍵的化合物即可,於使用(甲基)丙烯酸縮水甘油酯、.( 甲基)丙烯酸3,4 一環氧環己基甲酯、鄰—(或間一、或 對-)乙嫌基卡基縮水甘油醚等之具有環氧基的單體時, 附加(甲基)丙烯酸等之具有酸基和自由基聚合性雙鍵的 化合物即可。 前述聚合物(a )之重量平均分子量並無特別限制, 較佳爲2000〜200000,更佳爲5000〜100000。重量平均分 子量超過200000時,變成過高黏度且難形成塗膜,另一方 1282796 (14) 面,若未滿2 Ο Ο Ο,則具有難以充分表現耐熱性的傾向。 前述聚合物(a )爲具有酸基之情形中,酸値較佳爲 30 〜500 mgKOH/g,更佳爲 50 〜400 mgKOH/g。聚合物 (a )的酸値未滿30 mgKOH / g時,難以適用於鹼性顯像 ,超過5 00 mgKOH/g時,則變成過高黏度且有難以形成 塗膜的傾向。 本發明之硬化性樹脂組成物其聚合物成分(A )必須 以前述聚合物(a ),且除了前述聚合物(a )以外,例如 ,亦可含有(甲基)丙烯酸系樹脂、苯乙烯系樹脂、丁二 烯系樹脂等通常使用於硬化性樹脂組成物的先前公知聚合 物。還有,於亦含有前述聚合物(a )以外之聚合物時, 聚合物成分(A)中所佔之前述聚合物(a)的含量爲5 0重 量%以上爲佳。 本發明之硬化性樹脂組成物爲以具有自由基聚合性雙 鍵之化合物(bl )及具有環氧基之化合物(b2 )中選出至 少一者所構成的硬化成分(B )做爲必須成分。藉此,本 發明之硬化性樹脂組成物可表現良好的硬化性。詳言之, 前述硬化成分(B)爲含有具自由基聚合性雙鍵之化合物 (b 1 )時,本發明的硬化性樹脂組成物爲經由自由基聚合 而硬化,於前述硬化成分(B)爲含有具環氧基之化合物 (b 2 )時,本發明的硬化性樹脂組成物爲經由自由基聚合 或酸-環氧硬化而硬化。 前述具有自由基聚合性雙鍵的化合物(b i )爲低聚物 和單體,低聚物可列舉例如不飽和酯、環氧丙烯酸酯、胺 -17- 1282796 (15) 基甲酸乙酯丙烯酸酯、聚酯丙烯酸酯、側鏈具有雙鍵的丙 稀酸系聚合物等,單體可列舉例如苯乙烯、α 一甲基苯乙 烯、α —氯基苯乙烯、乙烯基甲苯、二乙烯基苯、酞酸二 稀丙酯、膦酸二烯丙基苯酯等之芳香族乙烯基系單體;醋 酸乙烯酯、己二酸乙烯酯等之乙烯酯單體;(甲基)丙烯 酸甲酯、(甲基)丙烯酸2 —羥甲酯、(2 —氧基一 1,3 — 二噚茂烷一 4一基)一(甲基)丙烯酸甲酯等之(甲基) 丙烯酸酯系單體;(二)乙二醇二(甲基)丙烯酸酯、丙 二醇二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯 酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇二( 甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四 醇四(甲基)丙烯酸酯、二季戊四醇二(甲基)丙烯酸酯 、二季戊四醇三(甲基)丙烯酸酯、二季戊四醇四(甲基 )丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四 醇六(甲基)丙烯酸酯、三(羥乙基)異氰脲酸酯之三( 甲基)丙烯酸酯等之多官能(甲基)丙烯酸酯;三烯丙基 氰脲酸酯;對環氧樹脂附加(甲基)丙烯酸的環氧(甲基 )丙烯酸酯類等。 本發明之硬化性樹脂組成物中之前述具有自由基聚合 性雙鍵之化合物(b 1 )的含有比例,相對於前述聚合物成 分(A)較佳爲5〜1 000重量%,更佳爲1〇〜600重量%。 具有前述環氧基的化合物(b2 )可列舉例如雙酚A型 環氧樹脂(市售品例如爲「Epicoat 8 2 8」、n Epicoat 1001」、「Epicoat 1002」、「Epicoat 1 0 0 4」,以上爲油 1282796 (17) 少一者做爲聚合引發劑(c )爲佳。詳言之,含有自由基 引發劑(c 1 )做爲聚合引發劑時,本發明之硬化性樹脂組 成物爲例如經由照射紫外線等之光能量,則可作成經由自 由基聚合而光硬化者(將該形態視爲形態(i ))。此時 ,特別於前述聚合物(a )爲具有酸基之聚合物時,本發 明之硬化性樹脂組成物可做鹼性顯像型負型光阻材料,例 如適合使用於彩色濾光片和光導波路的製作等。另一方面 ,含有熱自由基發生劑(c2 )做爲聚合引發劑(c )時, 本發明之硬化性樹脂組成物爲經由賦予熱能量,則可作成 經由自由基聚合而熱硬化者(將該形態視爲形態(ii )) 。於形態(i )、形態(Π )中,亦可分別使用光自由基引 發劑(c 1 )和熱自由基引發劑(C2 )二者做爲聚合引發劑 。還有,前述硬化成分(B)爲具有自由基聚合性雙鍵之 化合物(b 1 )時,且亦不含有前述聚合引發劑(c )時, 本發明之硬化性樹脂組成物均可經由賦予X射線、電子射 線等之高能量放射線能量、和熱能,進行自由基聚合而硬 化者(將該形態視爲形態(iii))。 前述光自由基引發劑(c 1 )可列舉例如苯偶姻、苯偶 姻甲醚、苯偶姻乙醚等之苯偶姻與其烷醚類;乙醯苯、2 ,2—二甲氧基一 2 —苯基乙醯苯、1,1 一二氯基乙醯苯等 之乙醯苯類;2 —甲基蒽醌、2 —戊基蒽醌、2 —第三丁基 蒽醌、1 —氯基蒽醌等之蒽醌類;2,4 一二甲基噻吨酮、2 ’ 4 一二異丙基噻吨酮、2—氯基噻吨酮等之噻吨酮類;乙 醯苯二甲基縮酮、苄基二甲基縮酮等之縮酮類;二苯酮等 -20- 1282796 (18) 之二苯酮類;2—甲基一 1 一〔4一(甲硫基)苯基)一 2 — 嗎琳基一丙院一 1—嗣和2—卡基一 2—二甲胺基一 1 一 (4 一嗎啉苯基)一 丁酮一 1 ;醯基氧化膦類;咕吨酮類。 本發明之硬化性樹脂組成物爲含有前述自由基引發劑 (c 1 )時,其含有比例相對於聚合物成分(A )與硬化成 分(B)之合計量,較佳爲0.1〜50重量%,更佳爲0.5〜 3 〇重量%。 前述熱自由基引發劑(c2 )可列舉例如氫過氧化枯烯 、過氧化二異丙基苯、過氧化二第三丁基、過氧化月桂基 、過氧化苯甲醯、第三丁基過氧基異丙基碳酸酯、第三丁 基過氧基一 2—乙基己酸酯、第三戊基過氧基一 2 —乙基己 酸酯等之有機過氧化物、2,2 / -偶氮雙(異丁腈)、1 ,1 / 一偶氮雙(環己烷乙腈)、2,2 / —偶氮雙(2,4 〜二甲基戊腈)、2,2/ —偶氮雙(2—甲基丙酸二甲酯 )等之偶氮化合物等。 本發明之硬化性樹脂組成物爲含有前述熱自由基引發 劑(c2 )時,其含有比例爲相對於聚合物成分(A )與硬 化成分(B)之合計量,較佳爲0.1〜50重量%,更佳爲 〇·5〜30重量%。 於本發明之硬化性樹脂組成物中,前述硬化成分(B )爲具有環氧基之化合物(b2 )時,再含有光產酸劑(c3 )及熱產酸劑(c4)所選出之至少一者做爲聚合引發劑( e )爲佳。詳言之,於含有光產酸劑(c3 )做爲聚合引發 劑(c )時,本發明之硬化性樹脂組成物爲例如經由照射 -21 - 1282796 (21) 己酮等之酮類;醋酸乙酯、醋酸丁酯、丙二醇單甲醚醋酸 酯、3 -甲氧丁基醋酸酯等之酯類;甲醇、乙醇、異丙醇 、正丁醇、乙二醇單甲醚、丙二醇單甲醚等之醇類;甲苯 、二甲苯、乙基苯等之芳香族烴類;氯仿、二甲基亞硕等 。還有,溶劑之含量爲根據使用樹脂組成物時之最適黏度 而適當設定即可。 本發明之硬化性樹脂組成物除了前述聚合物成分(A )、前述硬化成分(B)、前述聚合引發劑(C)、前述 溶劑以外,在不損害本發明效果之範圍下,例如亦可含有 氫氧化鋁、滑石、黏土、硫酸鉬等之充塡材料、染料、顏 料、消泡劑、偶合劑、勻塗劑、增感劑、脫模劑、滑劑、 可塑劑、抗氧化劑、紫外線吸收劑、難燃劑、抑聚劑、增 黏劑、分散劑等公知之添加劑。 本發明之硬化性樹脂組成物可經由令必須成分之前述 聚合物成分(A)及前述硬化成分(B)(但,如前述般 ,前述聚合物(a )爲兼具做爲硬化成分(B )時,必須成 分變成僅爲聚合物成分(A))、與視需要含有前述聚合 引發劑(C )和前述溶劑和其他添加物均勻混合則可調製 〇 本發明之硬化性樹脂組成物爲透明性,耐熱性優良, 例如,可使用於光阻材料、各種塗層劑、塗料等之用途, 特別,聚合物(a )爲具有酸基時,適合使用做爲製作彩 色濾光片和光導波路等之鹼性顯像型的負型光阻材料等。 更且’永口物(a )爲經由其構造中的四氫吼喃構造而亦 -24- 1282796 (22) 具有良好的顏料分散性,故適合使用於彩色濾光片用著色 硬化性樹脂組成物。 本發明之彩色濾光片爲於基板上設置硬化樹脂層之彩 色濾光片中,做爲前述硬化樹脂層的樹脂組成物爲前述本 發明之硬化性樹脂組成物。前述所謂之濾光片爲指令影像 彩色化所必要之於透明基板上具有至少三原色的微細像素 及將其區隔之黑色矩陣的光學濾光片,三原色一般爲使用 紅(R )、綠(G )、藍(B )。構成彩色濾光片的構材具 體而言爲三原色(RGB )像素、樹脂黑色矩陣、保護膜、 柱狀間隔件,而本發明之彩色濾光片若爲構成該濾光片之 各構材的至少一者,爲令前述硬化性樹脂組成物硬化形成 者即可。 於本發明之彩色濾光片中,做爲三原色(RGB )像素 及樹脂黑色矩陣的硬化樹脂層爲以前述形態(i ) 、 ( iv )中,聚合物(a )爲具有酸基之聚合物時的硬化性樹脂 組成物所形成爲佳,且做爲保護膜及柱狀間隔件的硬化樹 脂層爲以前述形態(i) 、(iii) 、(iv) 、(vi)中,聚 合物(a )爲具有酸基之聚合物時的硬化性樹脂組成物所 形成爲佳。又,形成RGB像素時的硬化性樹脂組成物爲包 含紅、綠、藍各三原色之顏料,且形成樹脂黑色矩陣時之 硬化性樹脂組成物爲包含黑色之顏料,且形成保護膜或柱 狀間隔件時之硬化性樹脂組成物亦可不含有顏料。還有, 於含有顏料之情形中,含有分散劑亦爲佳。 本發明之彩色濾光片例如可如下處理製作。 -25- 1282796 (23) 1 )令含有顏料之硬化性樹脂組 爲無鹼玻璃、透明塑料等之透明基板 網棒、流塗器、棒塗層、輥塗器、噴 裝置予以塗佈、乾燥,製作塗膜。 120C '較佳爲60°C〜10〇°c之溫度下 較佳以3 0秒〜1 0分鐘,常壓或真空下 〇 2 )其後,將根據所欲圖案形狀 圖案化薄膜),於上述塗膜上以接觸 放置,照射光線,令其硬化。此處, 亦意指紫外線、X射線、電子射線等 線爲最佳。紫外線源一般以高壓水銀 3 )光照射後,以溶劑、水、驗 。其中,以鹼性水溶液對於環境之負 的顯像故爲佳。鹼性成分以氫氧化餌 等爲佳。驗之濃度以0.01〜5重量% %爲較佳,且以〇. 1〜1重量%爲最佳 範圍,則恐令前述硬化性樹脂組成物 若過高,則溶解力過高且顯像性惡化 液中,亦可添加界面活性劑。 首先,使用含有黑色顏料之硬化 述1 )〜3 )之步驟,於基板上形成樹 其次,令硬化性樹脂組成物之彥 )、綠(G )、藍(B ),且重複上 成物,於玻璃,較佳 上,以自旋器、金屬 霧器等之公知的塗佈 乾燥條件爲於室溫〜 ,以1 0秒〜6 0分鐘, 加熱乾燥之方法爲佳 設置開口部的光罩( ί狀態或非接觸狀態下 光線不僅指可見光’ 之放射線,但以紫外 燈爲適於使用。 性水溶液等進行顯像 <荷少且可進行高感度 1、氫氧化鈉、碳酸鈉 爲佳,以0.05〜3重量 。鹼濃度若低於上述 丨的溶解性不足,相反 ,。更且,於鹼性水溶 ,性樹脂組成物進行上 脂黑色矩陣。 匡料依序改變成紅(R 述1 )〜3 )之步驟, -26- 1282796 (24) 形成R、G、B之像素,製作RGB像素。 其次,於保護基板上所形成的RGB像素和提高表面平 滑性之目的下,視需要,形成保護膜。 更且,於前述彩色濾光片爲液晶顯示裝置用彩色濾光 片時,形成柱狀間隔件爲佳。柱狀間隔件可經由對欲形成 間隔件之面上,將硬化性樹脂組成物塗佈成所欲間隔件高 度的厚度,且經過上述1 )〜3 )之步驟則可製作。 製作彩色濾光片時,於各構材作成時,於顯像後加熱 (後烘烤)再進行硬化,且於殘存溶劑時將其完全除去爲 佳。後烘烤時之溫度以120〜3 00 °C爲佳,且以150〜2 5 0°C 爲更佳,以1 8 0〜2 3 0 °C爲最佳。後烘烤溫度若局於上述, 則像素著色,且恐因熱分解損害塗膜的平滑性,相反若低 ,則硬化之進行少,恐令塗膜強度降低。後烘烤可於各構 材形成中之顯像後進行,且亦可於形成全部構材後進行。 本發明之顯示裝置爲於使用基板上設置硬化樹脂層之 彩色濾光片的顯示裝置中,做爲前述硬化樹脂層的樹脂組 成物爲前述本發明的硬化性樹脂組成物。本發明之顯示裝 置的具體例較佳可列舉液晶顯示裝置,但並非限定於此, 例如亦可使用有機EL的顯示裝置等。以下,說明液晶顯 示裝置之情況。 前述液晶顯示裝置爲將設置前述彩色濾光片及視需要 之I TO電極、配向膜的彩色濾光片基板,與視需要設置配 向膜、ITO電極、驅動元件之對向基板之間,以液晶間隔 件保持一定間隔,並於該間隔內封入液晶物質,且經由電 -27- 1282796 (25) 氣信號改變液晶之配向,令光穿透率可變且裝入顯示彩色 之液晶顯示面板的液晶顯示裝置。液晶之動作型式、驅動 方式可使用公知方式,其中以T F T方式就顯示品質、回應 速度等方面而言爲佳。 前述液晶間隔件可使用公知的微粒子間隔件’使用感 光性樹脂的柱狀間隔件等,但以使用本發明之硬化性樹脂 組成物所形成的柱狀間隔件爲適當。 於前述彩色濾光片基板及對向基板上,設置各液晶的 動作型式,具有根據驅動方式配向的配向膜、及視需要之 微細突起(肋部),且以聚醯亞胺的配向膜爲適於使用。 又,肋部除了聚醯亞胺以外,亦可使用本發明的硬化性樹 脂組成物。更且,於彩色濾光片基板及對向基板的外側, 必須配置各液晶的動作型式、對應驅動方式的偏向膜、光 學補償薄膜。 【實施方式】 〔實施例〕 以下,根據實施例,更加具體說明本發明,但本發明 不被其所限定。還有,以下,只要無特別指明,則「份」 爲表75「重重份」、「%」爲表不「重量%」。 各合成例、比較合成例中之分析爲如下進行。 (重量平均分子量) 使用凝膠滲透層析測定裝置(「Shodex GPC System 1282796 (26) 一 2 1 Η」昭和電工製),換算成聚苯乙烯予以測定。 (聚合物溶液中的聚合物濃度) 將聚合物溶液1克中加入丙酮4克且溶解之溶液’於常 溫下令其自然乾燥,再減壓乾燥5小時(160°C / 5 mmHg )後,於乾燥器內放冷,測定重量。由重量減少量’算出 聚合物溶液的不揮發成分,將其視爲聚合物濃度。 (酸値) 於聚合物溶液0.5〜1克中,加入丙酮80毫升及水1〇毫 升且攪拌均勻令其溶解,並以0.1莫耳/升之KOH水溶液 做爲滴定液,且使用自動滴定裝置(「COM — 5 5 5」平沼 產業製)予以滴定,測定溶液的酸値。由溶液的酸値和聚 合物濃度,算出聚合物的酸値。 (合成例1 ) 準備附有冷卻管之可分離式燒瓶做爲反應槽,另一方 面’準備將二甲基2,2/ —〔羥基雙(亞甲基)〕雙一 2 一丙酸酯(以下稱爲「MD」)40份、甲基丙烯酸(以下 稱爲「MAA」)40份、甲基丙烯酸甲酯(以下稱爲r MMA」)120份、第三丁基過氧基—2—乙基己酸酯(日 本油脂製「Derbutyl 0」;以下稱爲「Ρ Β Ο」)4份、两二 醇單甲醚醋酸酯(以下稱爲「PGMEA」)4〇份充分攪泮 混合者做爲單體滴下槽,並且準備將正十二烷硫醇(以下 -29- 1282796 (33) 份,且就其原樣以1 l〇°C反應9小時。其後,力p入DMDG 1 2 8份且冷卻至室溫’取得濃度爲3 0 %的聚合物溶液。聚 合物之重量平均分子量爲17000’酸値爲70mgKOH/g。 (合成例1 〇 ) 準備附有冷卻管之可分離式燒瓶做爲反應槽,且於該 反應槽中,裝入PGMEA 467份、MD 40份、GMA 80份、 ΜΑ A 32 份、St 30 份、MMA 18 份、二甲基 2,—偶氮 雙(2,4 一二甲基戊腈)(和光純藥工業製「V — 65」; 以下稱爲「V — 65」)20份、氮氣更換後,充分攪拌混合 ,其後,一邊攪拌一邊以油浴加熱令反應槽溫度升溫至70 °C爲止。於此溫度保持3小時後,冷卻至室溫爲止,取得 濃度爲30%的聚合物溶液。聚合物之重量平均分子量爲 21000、酸値爲 104mgKOH/g。 (比較合成例1 ) 除了令MD變更成N-苯基馬來醯亞胺(以下稱爲「 PMI」)以外,同合成例1處理,取得濃度爲30%的聚合 物溶液。聚合物之重量平均分子量爲13000、酸値爲2 m g Κ Ο H / g 〇 (比較合成例2 ) 除了令MD變更成PMI、pbo之份量變更成2份、n — DM之份量變更成4份以外,同合成例2處理,取得濃度爲 -36- 1282796 (34) 30%的聚合物溶液。聚合物之重量平均分子量爲18000。 (比較合成例3 ) 除了令MD變更成PMI、PBO之份量變更成2份、n -D Μ之份量變更成4份以外,同合成例3處理,取得濃度爲 30%的聚合物溶液。聚合物之重量平均分子量爲1800〇、 酸値爲 104 mgKOH/ g。 (比較合成例4 ) 除了令MD變更成α 一 (羥甲基)丙烯酸甲酯(以下 稱爲「ΜΗΜΑ」)、ΡΒΟ之份量變更成2份、n— DM之份量 變更成4份以外,同合成例3處理,取得聚合物溶液。但 ,於內酯環化時生成水及甲醇,且因殘存單體變多,使得 所得聚合物溶液之濃度爲25 %。聚合物之重量平均分子量 爲 17000、酸値爲 85 mgKOH / g。 (比較合成例5 ) 除了令MD 40份變更成BzMA 80份、MMA之份量變更 成88份、PBO之份量變更成2份、η - DM之份量變更成4份 以外,同合成例3處理,取得濃度爲3 0 %的聚合物溶液 。聚合物之重量平均分子量爲20000、酸値爲1〇5 mgKOH / g 0 <實施例1 一 1 (形態(i )) > -37- 1282796 (35) 令合成例1所得之聚合物溶液l 0份、二季戊四醇五丙 烯酸酯(以下稱爲「DPPA」)3份、光自由基引發劑(「 Ivugacure 907」Ciba Geigy公司製;以下稱爲「Irg 907」 )0.09份、PGMEA 5份均勻攪拌混合,取得硬化性樹脂組 成物。 將所得之硬化性樹脂組成物,使用旋塗器於無鹼玻璃 上塗佈成乾燥後之厚度爲2 // m,且以熱板於8 0 °C乾燥5分 鐘後,使用超高壓水銀燈以照射量爲200 mJ/ cm2般照射 紫外線’取得試驗片A,且使用該試驗片A以下述方法評 估光硬化性。另一方面,令前述試驗片A再以熱板於20 〇 °C下加熱1小時取得試驗片b,且使用所得之試驗片B以下 述方法評價透明性及耐熱性。結果示於表1。 (光硬化性) 令試驗片A於室溫之四氫呋喃中浸漬1分鐘時之塗膜 狀態以目視觀察,並以下列基準判定。 〇 :塗膜無剝落、X塗膜察見剝落 (透明性) 使用分光光度計(「UV— 3100」島津製)測定波長 38()〜800 nm中的穿透率(% )。 (耐熱性) 使用觸針式表面粗度計(「Dektak IIA」日本真空技 1282796 (36) 術製)測定試驗片B的膜厚。其後,將該試驗片B以熱板 於2 5 0 °C下加熱1小時,冷卻至室溫後再度測定膜厚。其後 · ,算出加熱所造成之膜厚減少率(% ) 。 · <實施例1 一 2 (形態(iv)) > 令合成例2所得之聚合物溶液10份、光產酸劑(「SP —170」旭電化製;以下稱爲「SP— 170」)0.09份、偏苯 三酸酐〇 · 6份均勻攪拌混合,取得硬化性樹脂組成物。 · 使用所得之硬化性樹脂組成物,同實施例1 - 1處理 ,評價光硬化性、透明性及耐熱性。結果示於表1。 <實施例1 一 3 (形態(vi)) > 令合成例3所得之聚合物溶液1 0份、甲苯酚酚醛淸漆 型環氧樹脂(「EOCN — 103S」日本化藥製,以下稱爲「 EOCN - 103S」)3份、偏苯三酸酐0.3份、PGMEA 5份均 勻攪拌混合,取得硬化性樹脂組成物。 φ 將所得之硬化性樹脂組成物,使用旋塗器於無鹼玻璃 上塗佈成乾燥後之厚度爲2 // m,且以熱板於8 (TC乾燥5分 鐘後,再以熱板於2 0 0 °C加熱1小時取得試驗片B。使用所 · 得之試驗片B,同實施例1 - 1處理,評價透明性及耐熱 性。結果示於表1。 <比較例1 一 1 (形態(i )) > 令比較合成例1所得之聚合物溶液]〇份、DPP A 3份、 -39- 1282796 (37)OR2 (1) -6 - 1282796 (4) (In the formula (1), R1 and R2 each independently represent a hydrogen atom or a hydroxyl group having 1 to 25 carbon atoms which may have a substituent) (hereinafter also referred to as a compound) The "ether dimer" is a polymer component (A) in which the polymer (a) polymerized as an essential monomer component is an essential component. Thus, the curable resin composition of the present invention can form a cured coating film which is extremely excellent in heat resistance and transparency. It is presumed that the ether dimer is subjected to a cyclization reaction during polymerization, and a tetrahydropyran ring structure is formed in a constituent unit derived from an ether dimer. Hereinafter, the above polymer (a) will be described. In the above general formula (1), the hydroxyl group represented by R1 and R2 and having a carbon number of 1 to 25, which is a substituent, is not particularly limited, and examples thereof include a methyl group and an ethyl group. a linear or branched alkyl group such as n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-amyl, stearyl, lauryl or 2-ethylhexyl; An aryl group such as a phenyl group; a cyclohexyl group, a tert-butylcyclohexyl group, a dicyclopentadienyl group, a tricyclodecanyl group, an isobornyl group, an adamantyl group, a 2-methyl-2-alkanyl group or the like a cyclic group, an alkyl group substituted by an alkoxy group such as 1-methoxyethyl or 1-ethoxyethyl; an alkyl group substituted by an aryl group such as a aryl group; and the like. Among them, a primary or secondary carbon substituent which is particularly liberated by a hard acid such as a methyl group, an ethyl group, a cyclohexyl group or a benzyl group and a heat is preferred in terms of heat resistance. Further, R1 and R2 may be the same substituent or may be a different substituent. Specific examples of the ether dimer include, for example, dimethyl-2,2-~[hydroxybis(methylene)]bis-2-propanate, diethyl-2,2-one [hydroxyl double ( Methylene)] bis-2-propionate, di(n-propyl)-7- 1282796 (5) a 2,2 / - [hydroxy bis(methylene)] bis-2-propionate, two (Isopropyl)-2,2 / - [hydroxy bis(methylene)] bis-2-propionate, di(n-butyl)-2,2/-[hydroxybis(methylene)] a 2-propionate, di(isobutyl)-2,-[hydroxybis(methylene)]bis-2-propanate, di(t-butyl)-2,-hydroxyl (sub Methyl)] bis-2-propionate, bis(t-pentyl)-2,2/-[hydroxybis(methylene)]bis-2-propionate, bis(stearyl)-2 , 2> — [hydroxy bis(methylene)] bis-2-propionate, bis(lauryl)-2,2/-[hydroxybis(methylene)]bis-2-propionate, (2-ethylhexyl)-2,2/-[hydroxybis(methylene)]bis-2-propionate, (1-methoxyethyl)- 2,2 / - [hydroxy bis(methylene)] bis- 2 -propionate, bis(1 -ethoxyethyl)-2,2 / -[hydroxy bis ( Methylene)] bis- 2-propionate, dibenzyl-2,2/-[hydroxybis(methylene)]bis-2-propanate, diphenyl-2,2/-[hydroxyl Bis(methylene)] bis-2-propionate, dicyclohexyl-2,2/-[hydroxybis(methylene)]bis-2-propanate, di(t-butylcyclohexyl) a 2,2 / -[hydroxybis(methylene)]bis-2-propionate, bis(dicyclopentadienyl)-2,2^-[hydroxybis(methylene)]bis-2 - propionate, bis(tricyclodecyl)-2,2/-[hydroxybis(methylene)]bis-2-propionate, bis(isobornyl)-2,2/-[hydroxyl double (methylene)] bis-2-propionate, diamantyl-2,2/-[hydroxybis(methylene)]bis-2-propionate, bis(2-methyl-2- Adamantyl)-2,2 / - [hydroxy bis(methylene)] bis-2-propionate. Among them, dimethyl- 2-8-8282796 (6), 2〃-[hydroxybis(methylene)]bis-2-propanate, diethyl-2,2/[hydroxyl double ( Methylene)] bis-2-propionate, dicyclohexyl-2, 2〃-[hydroxybis(methylene)]bis-2-propionate, bis-2,-hydroxyl (sub. Base)] double one 2-propionate is preferred. These ether dimers may be used alone or in combination of two or more. The ratio of the ether dimer in the monomer component when the polymer (a) is obtained is not particularly limited, and is 2 to 60% by weight, preferably 5 to 55% by weight, based on the total monomer component. Good is 5 to 50% by weight. When the amount of the ether dimer is too large, it is difficult to obtain a substance having a low molecular weight during polymerization, or it may be gelled. On the other hand, if the amount is too small, the film properties such as transparency and heat resistance are insufficient. The aforementioned polymer (a) is preferably a polymer having an acid group. In this way, the curable resin composition obtained is a curable resin composition in which an acid group reacts with an epoxy group to form an ester bond, and a cross-linking reaction (hereinafter simply referred to as "acid epoxy hardening") is carried out by using the ester bond, or A composition in which an uncured portion is imaged by an alkaline developing solution. The acid group is not particularly limited, and examples thereof include a carboxyl group, a phenolic hydroxyl group, and a carboxylic anhydride group. These acid groups may be one type or two or more types. When the polymer (a) is introduced into an acid group, for example, a monomer having an acid group and a monomer capable of imparting an acid group after polymerization (hereinafter also referred to as "a monomer for introducing an acid group") are selected. At least one of them can be polymerized as a monomer component. Further, in the case where a monomer capable of imparting an acid group after polymerization is introduced into an acid group as a monomer component, it is necessary to impart an acid group treatment as described later after the polymerization. -9- 1282796 (7) The monomer having an acid group may, for example, be a monomer having a mercapto group such as (meth)acrylic acid or itaconic acid, or a phenolic hydroxyl group of N-hydroxyphenylmaleimide#. A monomer having a carboxylic anhydride group, such as a monomer, maleic anhydride, and itaconic anhydride, and the like, particularly preferably (meth)acrylic acid. Examples of the monomer which can impart an acid group after the polymerization include a monomer having a hydroxyl group such as 2-hydroxyethyl (meth)acrylate, a monomer having an epoxy group such as glycidyl (meth)acrylate, and 2 a monomer having an isocyanic acid group such as an isocyanate (ethyl) acrylate or the like. The monomers for introducing such acid groups may be one type or two or more types. When the monomer component in the case where the polymer (a) is obtained also contains the monomer for introducing an acid group, the content ratio thereof is not particularly limited, and the total monomer component is 5 to 70% by weight, preferably 1 Å. ~6〇% by weight. The polymer (a) is preferably a polymer having a radical polymerizable double bond. The above-mentioned polymer is a compound (b i ) having a radically polymerizable double bond which will be described later, and also serves as a hardening component (B). Into the polymer (a), a radical polymerizable double bond is introduced, for example, a monomer which can impart a radical polymerizable double bond after polymerization (hereinafter also referred to as "a single sheet for introducing a radical polymerizable double bond" After the polymerization is carried out as a monomer component, the treatment for imparting a radical polymerizable double bond as described later may be carried out. The monomer which can impart a radically polymerizable double bond after the polymerization may, for example, be a monomer having a residue such as (meth)acrylic acid or itaconic acid; or the like; maleic acid, itaconic anhydride or the like; Anhydride group-based monomer; (methyl) propylene glycol glycidol vinegar, (meth) propylene acid 3,4-epoxycyclohexyl methacrylate, o. 10 - 1282796 (8) one (or between, or a) A fine base group of glycidol-brewed monomers and the like. These monomers for introducing a radically polymerizable double bond may be used alone or in combination of two or more. When the monomer component obtained when the polymer (a) is obtained also contains the monomer for introducing a radical polymerizable double bond, the content ratio thereof is not particularly limited, and the total monomer component is 5 to 70% by weight. It is preferably from 1 to 60% by weight. The polymer (a) is preferably a polymer having an epoxy group. Thereby, the polymer (a) is a hardening component (B) which is a compound (b2)' having an epoxy group to be described later. When the epoxy group is introduced into the polymer (a), for example, a monomer having an epoxy group (hereinafter also referred to as "a monomer for introducing an epoxy group") is polymerized as a monomer component. can. The monomer having an epoxy group may, for example, be glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, ortho- (or meta-, or p-)ethylene. Glycidyl glycidyl ether and the like. These monomers for introducing an epoxy group may be used alone or in combination of two or more. When the monomer component in the case where the polymer (a) is obtained also contains the monomer for introducing an epoxy group, the content ratio thereof is not particularly limited, and the total monomer component is 5 to 70% by weight, preferably 10 ~60% by weight. The monomer component in the case of obtaining the polymer (a), except for the ether dimer of the essential component, the monomer for introducing the acid group, and the monomer for introducing a radical polymerizable double bond, In addition to the monomer to which the epoxy group is introduced, other copolymerizable monomers may be contained as needed. -11 - 1282796 (9) Examples of the other copolymerizable monomer include, for example, methyl methacrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, and (methyl) propylene storage acid. Propyl ester, n-butyl (meth)acrylate, (meth)propene; isobutyl phthalate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, (methyl) (meth) acrylate such as cyclohexyl acrylate, (meth) acrylate, etc., isobornyl (meth)acrylate, dicyclopentanyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate An aromatic vinyl compound such as phenethylbenzene, vinyl toluene or α-methylstyrene; Ν-phenylmaleimide, Ν-cyclohexylmaleimide, etc. - substituted for mala Imines; butadiene or substituted butadiene compounds of butadiene, isoprene, etc.; ethylene or propylene, acrylonitrile, etc. ethylene or substituted ethylene compounds; vinyl acetate, etc. Esters and the like. Among them, methyl (meth)acrylate, cyclohexanic acid (meth)acrylate, benzyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentanyl (meth)acrylate, styrene are also used. It is good in transparency and it is difficult to impair heat resistance. These other copolymerizable monomers may be used alone or in combination of two or more. When the monomer component in the case where the polymer (a) is contained also contains the other monomer which can be copolymerized, the content ratio thereof is not particularly limited, and is preferably 95% by weight or less, and more preferably 85 % by weight or less. The polymer (a) can be easily obtained by polymerizing the above-mentioned monomer component which is at least necessary for the ether dimer. At this time, the method of performing the cyclization reaction of the ether dimer simultaneously with the polymerization and forming the tetrahydropyran ring structure-12-1282796 (10) the polymerization reaction of the above monomer components does not particularly use various previously known polymerization methods. However, in particular, solution polymerization, polymerization temperature and polymerization concentration (polymerization concentration = [single weight / (total weight of monomer component + solvent weight)] > depending on the type and ratio of monomer components used, target polymer, Preferably, the polymerization temperature is 40 to 150. (: The polymerization concentration is preferably 5 to a polymerization temperature of 60 to 130 ° C, and the polymerization concentration is 10 to 40%. When a solvent is used for the polymerization of the monomer component, a solvent for the reaction is used. Specifically, examples thereof include a ketone such as methyl ethyl ketone, methyl isobutyl ketone or cyclohexanone, such as dicrosane, ethylene glycol dimethyl ether or diglyme. Esters such as ester, butyl acetate, propylene glycol monomethyl ether acetate, 3-methyl ester; alcohols such as methanol, ethanol, isopropanol, n-butanol, ether, propylene glycol monomethyl ether; toluene, xylene, Aromatic hydrocarbons; chloroform; dimethyl azulene, etc. These solvents Further, it is also possible to use two or more kinds of the above-mentioned solvents, and it is preferable that the solvent which is formed with respect to the produced polymer (a) and the viscosity of the polymerization liquid is low, depending on the type and ratio used. When the monomer is formed, a part of the ether dimer is not cyclized and the amount of the ether dimer which causes the crosslinking reaction exceeds a certain amount, and the molecular weight and gelation are as appropriate. The crosslinking of the ether dimer is intended to be polymerized. The liquid is more likely to be caused, so that by appropriately selecting the viscosity of the polymerization liquid, the crosslinking reaction of the ether dimer can be suppressed and the polymer restriction can be prevented, and the law can be adopted. The whole c 1 0 〇) of the body composition is the root. Molecular weight and ~50%, more often free radicals such as tetrahydrofuran ether; acetone; acetic acid ethoxybutyl acetate ethylene glycol monomethyl ethylbenzene and other aromatics using only one kind of solvating strong body component of the polymerization reaction , cross-linking, an abnormally high viscosity, a higher solvent, amount and gelation - 13 to 1282796 (11). For example, a polymerization having an acid group is obtained by using a monomer having the aforementioned acid group as a monomer component. When, for example, if two When an ether such as glycol or dimethyl ether or an alcohol such as isopropyl alcohol is used in part or all of the solvent, the polymerization solution can be made to have a low viscosity. Further, the solvent used in the polymerization is selected based on the above criteria, and finally When the polymer (a) having a different solvent solution type from the solvent used in the polymerization is obtained, the above-mentioned standard is selected after polymerization using a mixed solution of the solvent selected in the above-mentioned standard and the solvent required for the final solution to be obtained. The solvent may be distilled off. For example, an alcohol or an ether such as isopropyl alcohol is used as a solvent in the polymerization, and when the polymer (a) is finally selected from an ester solution such as propylene glycol monomethyl ether acetate, For example, after polymerization is carried out using a mixed solvent of propylene glycol monomethyl ether acetate and isopropyl alcohol, isopropyl alcohol is distilled off to prepare a propylene glycol monomethyl ether acetate solution. When the monomer component is polymerized, a polymerization initiator which is usually used may be added as needed. The polymerization initiator is not particularly limited, and examples thereof include cumene hydroperoxide, diisopropylbenzene hydroperoxide, dibutyl butyl peroxide, lauric acid peroxide, benzammonium peroxide, and t-butyl peroxide. Organic peroxides such as oxyisopropyl carbonate, third amyl peroxy-2-ethylhexanoate, and tert-butylperoxy-2-ethylhexanoate; 2, 2 / —Azobis(isobutyronitrile), 1,1/-azobis(cyclohexaneacetonitrile), 2,2/-azobis(2,4-dimethylvaleronitrile), 2,2>- An azo compound such as azobis(dimethyl 2-methylpropionate) or the like. These polymerization initiators may be used alone or in combination of two or more. Further, the amount of the polymerization initiator to be used can be appropriately determined depending on the combination of the monomers to be used, the reaction conditions, the molecular weight of the target polymer, and the like, and is not particularly limited, but is not gelled and has a weight of -14 to 1282796 (12). The polymer having an average molecular weight of from several thousands to several tens of thousands is from 0.1 to 15% by weight, preferably from 0.5 to 10% by weight, based on the total monomer component. When the monomer component is polymerized, a chain shifting agent which is usually used may be added in order to adjust the molecular weight. Examples of the chain shifting agent include mercaptan chain movement such as n-dodecyl mercaptan, mercaptoacetic acid, methyl mercaptoacetate, 3-hydrothiopropionic acid, and methyl 3-hydrothiopropionate. Agent, α-methyl styrene dimer, etc., preferably having a high chain shifting effect, can reduce residual monomers, and is also easy to obtain a positive 12-base thiol, thiol-acetic acid, 3-hydrogenthio group Propionic acid is preferred. When a chain shifting agent is used, the amount of the monomer to be used may be appropriately determined depending on the combination of the monomers to be used, the reaction conditions, the molecular weight of the target polymer, and the like, and is not particularly limited. However, the amount of the weight-average molecular weight is not gelled. In terms of the polymer of from 1,000 to tens of thousands, it is 0.1 to 15% by weight, preferably 0.5 to 10% by weight based on the total monomer component. In the above polymerization reaction, although the cyclization reaction of the ether dimer is considered to proceed simultaneously, the cyclization rate of the ether dimer at this time is not necessarily 1% by mole. When the polymer (a) is obtained, a monomer which imparts the acid group is used as a monomer component, and when an acid group is introduced thereby, it is necessary to carry out a treatment for imparting an acid group after the polymerization. The treatment for imparting an acid group varies depending on the kind of the monomer which can impart an acid group, for example, when a monomer having a hydroxyl group like 2-hydroxyethyl (meth)acrylate is used, for example, succinic anhydride is added, An acid anhydride such as tetrahydrophthalic anhydride or maleic anhydride may be used. When an epoxy group-containing monomer such as glycidyl (meth)acrylate is used, for example, a compound having an amine group and an acid group such as N-methylaminobenzoic acid or N-methylaminophenol is added. 1282796 (13) Alternatively, for example, an acid anhydride formed by adding an acid such as (meth)acrylic acid, for example, an acid anhydride such as an acid anhydride, tetrahydrophthalic anhydride or maleic anhydride may be used. When a monomer having an isocyanate group such as ethyl isocyanate (meth) acrylate is added, for example, a compound having a hydroxyl group and an acid group such as 2-hydroxybutyric acid may be added. When the polymer (a) is obtained, a monomer which can impart the radical polymerizable double bond is used as a monomer component, and when a radical polymerizable double bond is introduced, it is necessary to impart a radical polymerization after polymerization. The treatment of sexual double bonds. The treatment for imparting a radically polymerizable double bond varies depending on the type of the monomer which can impart a radically polymerizable double bond, and for example, a monomer having a carboxyl group such as (meth)acrylic acid or itaconic acid is used. In the case of adding glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethacrylate (meth)acrylate, ortho- or m-, or p-vinylvinyl glycidyl ether, etc. The compound having an oxy group and a radically polymerizable double bond may have a hydroxyl group such as 2-hydroxyethyl (meth)acrylate when a monomer having a carboxylic anhydride group such as maleic anhydride or itaconic anhydride is used. A compound having a radically polymerizable double bond may be, for example, glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, ortho- (or meta-, or p-) When a monomer having an epoxy group such as a carbaryl ether or a glycidyl ether is added, a compound having an acid group and a radical polymerizable double bond such as (meth)acrylic acid may be added. The weight average molecular weight of the polymer (a) is not particularly limited, and is preferably from 2,000 to 200,000, more preferably from 5,000 to 100,000. When the weight average molecular weight exceeds 200,000, it becomes too high viscosity and it is difficult to form a coating film, and the other side 1282796 (14) surface, if it is less than 2 Ο Ο Ο, it is difficult to sufficiently express heat resistance. In the case where the polymer (a) has an acid group, the acid hydrazine is preferably from 30 to 500 mgKOH/g, more preferably from 50 to 400 mgKOH/g. When the acid enthalpy of the polymer (a) is less than 30 mgKOH/g, it is difficult to apply to alkaline development, and when it exceeds 50,000 mgKOH/g, it tends to be too high in viscosity and it is difficult to form a coating film. The curable resin composition of the present invention may contain the polymer component (A) as the polymer (a), and may contain, in addition to the polymer (a), a (meth)acrylic resin or a styrene system. A resin or a butadiene-based resin is generally used for a conventionally known polymer of a curable resin composition. Further, when the polymer other than the polymer (a) is contained, the content of the polymer (a) in the polymer component (A) is preferably 50% by weight or more. The curable resin composition of the present invention contains, as an essential component, a hardening component (B) composed of at least one of a compound (b1) having a radical polymerizable double bond and a compound (b2) having an epoxy group. Thereby, the curable resin composition of the present invention can exhibit good curability. In particular, when the hardening component (B) is a compound (b 1 ) containing a radically polymerizable double bond, the curable resin composition of the present invention is cured by radical polymerization, and the hardening component (B) When the compound (b 2 ) having an epoxy group is contained, the curable resin composition of the present invention is cured by radical polymerization or acid-epoxy curing. The above compound (bi) having a radical polymerizable double bond is an oligomer and a monomer, and examples of the oligomer include, for example, an unsaturated ester, an epoxy acrylate, and an amine -17-1282796 (15) urethane acrylate. , a polyester acrylate, an acrylic polymer having a double bond in a side chain, and the like, and examples of the monomer include styrene, α-methyl styrene, α-chlorostyrene, vinyl toluene, and divinyl benzene. An aromatic vinyl monomer such as diisopropyl phthalate or diallyl phenyl phosphonate; a vinyl ester monomer such as vinyl acetate or vinyl adipate; methyl (meth)acrylate; a (meth) acrylate monomer such as 2-methylol (meth)acrylate or (2-oxy-1,3-dioxadecyl-4-yl)methyl (meth)acrylate; (2) Ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, trimethylolpropane di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol Di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol Alcohol tetra(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, two a polyfunctional (meth) acrylate such as pentaerythritol hexa(meth) acrylate or tris(hydroxyethyl)isocyanurate tris(meth) acrylate; triallyl cyanurate; The epoxy resin is added with an epoxy (meth) acrylate of (meth)acrylic acid or the like. The content ratio of the compound (b 1 ) having a radical polymerizable double bond in the curable resin composition of the present invention is preferably from 5 to 1,000% by weight, more preferably from 5% to 1,000% by weight, based on the polymer component (A). 1〇~600% by weight. Examples of the compound (b2) having the epoxy group include a bisphenol A type epoxy resin (commercial products such as "Epicoat 8 2 8", n Epicoat 1001", "Epicoat 1002", and "Epicoat 1 0 0 4". The above is the oil 1282796 (17). The lesser one is the polymerization initiator (c). In particular, when the radical initiator (c 1 ) is contained as a polymerization initiator, the curable resin composition of the present invention For example, by irradiating light energy such as ultraviolet rays, it is possible to form a photocuring by radical polymerization (this form is regarded as the form (i)). In this case, in particular, the polymer (a) is an acid group-containing polymerization. In the case of the material, the curable resin composition of the present invention can be used as an alkali-developing negative-type photoresist material, and is suitable, for example, for use in the production of color filters and optical waveguides, etc. On the other hand, it contains a thermal radical generating agent ( When the polymerization initiator (c) is used as the polymerization initiator (c), the curable resin composition of the present invention can be thermally cured by radical polymerization by imparting thermal energy (this form is regarded as the form (ii)). Form (i), form (Π), can also be divided The photoradical initiator (c 1 ) and the thermal radical initiator (C2 ) are not used as a polymerization initiator. Further, the hardening component (B) is a compound having a radical polymerizable double bond (b 1 ) When the polymerization initiator (c) is not contained, the curable resin composition of the present invention can be cured by radical polymerization by imparting high-energy radiation energy and thermal energy such as X-rays and electron beams. (This form is regarded as the form (iii)). The photoradical initiator (c 1 ) may, for example, be a benzoin such as benzoin, benzoin methyl ether or benzoin ethyl ether, or an alkyl ether thereof; Anthraquinone, 2,2-dimethoxy-2-phenylethenzene, 1,1,dichloroethenzene, etc.; 2-methylindole, 2-pentylhydrazine , 2 - tert-butyl hydrazine, 1-chloro hydrazine, etc.; 2,4 dimethyl thioxanthone, 2 ' 4 isopropyl thioxanthone, 2-chlorothiophene a thioxanthone such as ketone; a ketal such as acetophenone ketal or benzyl dimethyl ketal; a benzophenone such as benzophenone, etc. -20- 1282796 (18); Methyl-l-[4-(methylthio)phenyl)- 2 - cylinyl-propyl- 1 - fluorene and 2-carbyl 2- dimethylamino- 1 - (tetramorphine benzene) Base) butyl ketone-1; fluorenyl phosphine oxide; xanthone ketone. When the curable resin composition of the present invention contains the radical initiator (c 1 ), the content thereof is preferably 0.1 to 50% by weight based on the total amount of the polymer component (A) and the hardening component (B). More preferably, it is 0.5 to 3 〇 by weight. The thermal radical initiator (c2) may, for example, be cumene hydroperoxide, diisopropylbenzene peroxide, dibutylbutyl peroxide, lauryl peroxide, benzammonium peroxide or t-butyl peroxide. Organic peroxides such as oxyisopropyl carbonate, tert-butylperoxy-2-ethylhexanoate, and third amyl peroxy-2-ethylhexanoate, 2, 2 / - azobis(isobutyronitrile), 1,1/-azobis(cyclohexaneacetonitrile), 2,2/-azobis(2,4~dimethylvaleronitrile), 2,2/ An azo compound such as azobis(dimethyl 2-methylpropionate) or the like. When the curable resin composition of the present invention contains the thermal radical initiator (c2), the content thereof is a total amount of the polymer component (A) and the hardening component (B), preferably 0.1 to 50% by weight. %, more preferably 〇·5~30% by weight. In the curable resin composition of the present invention, when the curing component (B) is a compound (b2) having an epoxy group, it further contains at least a photoacid generator (c3) and a thermal acid generator (c4). One is preferably used as a polymerization initiator (e). In particular, when the photoacid generator (c3) is contained as the polymerization initiator (c), the curable resin composition of the present invention is, for example, a ketone which is irradiated with -21,282,796 (21) hexanone or the like; Esters of ethyl ester, butyl acetate, propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, etc.; methanol, ethanol, isopropanol, n-butanol, ethylene glycol monomethyl ether, propylene glycol monomethyl ether Alcohols such as alcohols; aromatic hydrocarbons such as toluene, xylene, and ethylbenzene; chloroform, dimethyl sulfene, and the like. Further, the content of the solvent may be appropriately set depending on the optimum viscosity when the resin composition is used. In addition to the polymer component (A), the curing component (B), the polymerization initiator (C), and the solvent, the curable resin composition of the present invention may contain, for example, a range that does not impair the effects of the present invention. Filling materials such as aluminum hydroxide, talc, clay, molybdenum sulfate, dyes, pigments, defoamers, coupling agents, leveling agents, sensitizers, mold release agents, slip agents, plasticizers, antioxidants, ultraviolet absorption A known additive such as a solvent, a flame retardant, a polymerization inhibitor, a tackifier or a dispersant. The curable resin composition of the present invention can pass the polymer component (A) and the hardening component (B) which are essential components (however, as described above, the polymer (a) serves as a hardening component (B). When the component is changed to only the polymer component (A)), and if necessary, the polymerization initiator (C) and the solvent and other additives are uniformly mixed, the curable resin composition of the present invention can be prepared to be transparent. It is excellent in heat resistance, for example, it can be used for photoresist materials, various coating agents, paints, etc. In particular, when the polymer (a) has an acid group, it is suitable for use as a color filter and an optical waveguide. Such as alkaline development type negative photoresist materials. Moreover, 'Yongkou (a) is a tetrahydrofuran structure in its structure, and also -24- 1282796 (22) has good pigment dispersibility, so it is suitable for use in color filter with colored curable resin. Things. The color filter of the present invention is a color filter in which a cured resin layer is provided on a substrate, and the resin composition as the cured resin layer is the curable resin composition of the present invention. The so-called filter is a micro-pixel having at least three primary colors on the transparent substrate and an optical filter for dividing the black matrix on the transparent substrate, and the three primary colors are generally red (R) and green (G). ), blue (B). The constituent members constituting the color filter are specifically three primary color (RGB) pixels, a resin black matrix, a protective film, and a columnar spacer, and the color filter of the present invention is a member constituting the filter. At least one of them may be formed by hardening the curable resin composition. In the color filter of the present invention, the hardened resin layer as the three primary color (RGB) pixels and the resin black matrix is the polymer having the acid group in the above forms (i) and (iv) The curable resin composition at the time is preferably formed, and the hardened resin layer as the protective film and the columnar spacer is the polymer in the above forms (i), (iii), (iv), (vi) a) It is preferable to form a curable resin composition in the case of a polymer having an acid group. Further, the curable resin composition in the case of forming RGB pixels is a pigment containing three primary colors of red, green, and blue, and the curable resin composition in the case of forming a resin black matrix is a pigment containing black, and a protective film or columnar spacer is formed. The curable resin composition at the time of the case may not contain a pigment. Further, in the case of containing a pigment, it is also preferable to contain a dispersing agent. The color filter of the present invention can be produced, for example, as follows. -25- 1282796 (23) 1 ) The curable resin group containing the pigment is coated, dried, and dried by a transparent substrate net rod, a flow coater, a bar coat, a roll coater, or a spray device such as an alkali-free glass or a transparent plastic. , making a coating film. 120C' is preferably at a temperature of 60 ° C to 10 ° ° C for preferably 30 seconds to 10 minutes, under normal pressure or under vacuum 〇 2) thereafter, the film is patterned according to the desired pattern shape, The above coating film is placed in contact, and the light is irradiated to harden it. Here, it also means that the ultraviolet rays, X-rays, and electron beams are optimal. The ultraviolet source is generally irradiated with high-pressure mercury 3), and the solvent, water, and test are used. Among them, it is preferred that the alkaline aqueous solution is negative for the environment. The alkaline component is preferably a hydroxide bait or the like. The concentration is preferably 0.01 to 5% by weight, and preferably 1 to 1% by weight, if the curable resin composition is too high, the solubility is too high and development is high. A surfactant may also be added to the deterioration solution. First, using the step of hardening the black pigments 1) to 3), the tree is formed on the substrate, and the hardening resin composition is formed, green (G), blue (B), and the composition is repeated. In the glass, preferably, a known coating drying condition of a spinner, a metal mister or the like is at room temperature~, for 10 seconds to 60 minutes, and the method of heating and drying is preferably a mask provided with an opening portion. (In the ί state or non-contact state, the light is not only the visible light, but the ultraviolet light is suitable for use. <Low load and high sensitivity 1. Sodium hydroxide and sodium carbonate are preferred, and 0.05 to 3 parts by weight. If the alkali concentration is lower than the solubility of the above hydrazine, the opposite is true. Further, in the alkaline water-soluble, the resin composition is subjected to a fat black matrix. The step of changing the material into red (R described 1) to 3), -26- 1282796 (24) forms pixels of R, G, and B, and creates RGB pixels. Next, a protective film is formed as needed to protect the RGB pixels formed on the substrate and to improve the smoothness of the surface. Further, when the color filter is a color filter for a liquid crystal display device, it is preferable to form a columnar spacer. The columnar spacer can be produced by applying the curable resin composition to the thickness of the desired spacer to the surface on which the spacer is to be formed, and by the above steps 1) to 3). When a color filter is produced, it is heated (post-baking) after development, and then cured, and it is preferably removed completely when the solvent is left. The temperature at the time of post-baking is preferably 120 to 300 ° C, and more preferably 150 to 250 ° C, and most preferably 180 to 230 ° C. When the post-baking temperature is as described above, the pixels are colored, and the smoothness of the coating film may be impaired by thermal decomposition. On the other hand, if the temperature is low, the progress of hardening is small, and the coating film strength is lowered. The post-baking can be carried out after development in the formation of each of the members, and can also be carried out after forming all the members. In the display device of the present invention, in the display device using the color filter in which the cured resin layer is provided on the substrate, the resin composition as the cured resin layer is the curable resin composition of the present invention. A specific example of the display device of the present invention is preferably a liquid crystal display device. However, the present invention is not limited thereto. For example, an organic EL display device or the like can be used. Hereinafter, the case of the liquid crystal display device will be described. The liquid crystal display device is a color filter substrate in which the color filter and the optional I TO electrode and the alignment film are provided, and an alignment film, an ITO electrode, and a counter substrate of the driving element are provided as needed, and liquid crystal is used. The spacers are kept at a certain interval, and the liquid crystal material is sealed in the interval, and the alignment of the liquid crystal is changed via the electric -27- 1282796 (25) gas signal, so that the light transmittance is variable and the liquid crystal is loaded into the liquid crystal display panel displaying the color. Display device. A well-known method can be used for the action type and the driving method of the liquid crystal, and it is preferable in terms of display quality and response speed in the T F T mode. In the liquid crystal spacer, a columnar spacer of a photosensitive resin or the like can be used, but a columnar spacer formed using the curable resin composition of the present invention is suitable. An operation pattern of each liquid crystal is provided on the color filter substrate and the counter substrate, and has an alignment film that is aligned according to a driving method, and fine protrusions (ribs) as needed, and an alignment film of polyimine is Suitable for use. Further, the rib portion may be a curable resin composition of the present invention in addition to polyimine. Further, on the outer side of the color filter substrate and the counter substrate, it is necessary to arrange an operation pattern of each liquid crystal, a deflection film corresponding to the driving method, and an optical compensation film. [Embodiment] [Embodiment] Hereinafter, the present invention will be more specifically described based on examples, but the present invention is not limited thereto. In addition, as long as there is no special specification, "parts" are "partial weights" in Table 75, and "%" is not "% by weight". The analysis in each of the synthesis examples and the comparative synthesis examples was carried out as follows. (Weight average molecular weight) The gel permeation chromatography measuring apparatus ("Shodex GPC System 1282796 (26) - 1 1 Η") manufactured by Showa Denko Co., Ltd. was used, and it measured by the polystyrene. (Polymer concentration in the polymer solution) 1 g of the polymer solution was added to 4 g of acetone and the dissolved solution was allowed to dry naturally at normal temperature, and then dried under reduced pressure for 5 hours (160 ° C / 5 mmHg). The inside of the dryer was allowed to cool and the weight was measured. The nonvolatile content of the polymer solution was calculated from the weight reduction amount, and this was regarded as the polymer concentration. (sour acid) In 0.5 to 1 gram of the polymer solution, 80 ml of acetone and 1 ml of water were added and stirred to dissolve them, and a 0.1 mol/liter KOH aqueous solution was used as a titration solution, and an automatic titration device was used. ("COM — 5 5 5" Hirauma Industrial System) was titrated and the acid enthalpy of the solution was measured. The acid enthalpy of the polymer was calculated from the acid enthalpy and polymer concentrations of the solution. (Synthesis Example 1) A separable flask equipped with a cooling tube was prepared as a reaction tank, and on the other hand, 'prepared to prepare dimethyl 2,2/-[hydroxybis(methylene)]bis-2-propionate 40 parts (hereinafter referred to as "MD"), 40 parts of methacrylic acid (hereinafter referred to as "MAA"), 120 parts of methyl methacrylate (hereinafter referred to as r MMA), and t-butylperoxy-2 -ethylhexanoate ("Derbutyl 0" manufactured by Nippon Oil & Fats Co., Ltd.; hereinafter referred to as "Ρ Β Ο") 4 parts, 2 diol monomethyl ether acetate (hereinafter referred to as "PGMEA") 4 parts thoroughly mixed As a monomer dropping tank, and preparing n-dodecyl mercaptan (hereinafter -29-1282796 (33) parts, and reacting as it is at 1 l ° ° C for 9 hours. Thereafter, force p into DMDG 1 2 8 parts and cooled to room temperature' to obtain a polymer solution having a concentration of 30%. The weight average molecular weight of the polymer was 17000' and the acid strontium was 70 mgKOH/g. (Synthesis Example 1 〇) Preparation for separation with a cooling tube The flask was used as a reaction tank, and 467 parts of PGMEA, 40 parts of MD, 80 parts of GMA, 32 parts of ΜΑA, 30 parts of St, 18 parts of MMA, and dimethyl were placed in the reaction tank. Base 2, azobis(2,4-dimethyl pentyl nitrile) ("V-65" manufactured by Wako Pure Chemical Industries, Ltd.; hereinafter referred to as "V-65") 20 parts, and after nitrogen replacement, stir well and mix. Thereafter, the temperature of the reaction vessel was raised to 70 ° C by heating in an oil bath while stirring, and the temperature was maintained at this temperature for 3 hours, and then cooled to room temperature to obtain a polymer solution having a concentration of 30%. The molecular weight was 21,000, and the acidity was 104 mgKOH/g. (Comparative Synthesis Example 1) The reaction was carried out in the same manner as in Synthesis Example 1 except that the MD was changed to N-phenylmaleimide (hereinafter referred to as "PMI"). 30% polymer solution. The weight average molecular weight of the polymer is 13,000, and the acid hydrazine is 2 mg Κ Ο H / g 〇 (Comparative Synthesis Example 2) except that the amount of MD is changed to PMI, and the amount of pbo is changed to 2 parts, n — The amount of DM was changed to 4 parts, and treated with Synthesis Example 2 to obtain a polymer solution having a concentration of -36 to 1282796 (34) 30%. The weight average molecular weight of the polymer was 18,000. (Comparative Synthesis Example 3) Except for MD Change the amount of PMI and PBO to 2 parts, and change the amount of n-D to 4 parts. The polymer solution having a concentration of 30% was obtained by the same treatment as in Synthesis Example 3. The weight average molecular weight of the polymer was 1,800 Å, and the acid cerium was 104 mgKOH/g. (Comparative Synthesis Example 4) In addition to changing MD to α-(hydroxyl) Methyl methacrylate (hereinafter referred to as "ΜΗΜΑ"), the amount of hydrazine was changed to 2 parts, and the amount of n-DM was changed to 4 parts, and treated in the same manner as in Synthesis Example 3 to obtain a polymer solution. However, water and methanol were formed during the cyclization of the lactone, and the concentration of the obtained polymer solution was 25% due to the increase in residual monomers. The polymer had a weight average molecular weight of 17,000 and a acid hydrate of 85 mgKOH / g. (Comparative Synthesis Example 5) The same as in Synthesis Example 3, except that 40 parts of MD was changed to 80 parts of BzMA, the amount of MMA was changed to 88 parts, the amount of PBO was changed to 2 parts, and the amount of η-DM was changed to 4 parts. A polymer solution having a concentration of 30% was obtained. The weight average molecular weight of the polymer is 20,000, and the acid hydrazine is 1 〇 5 mg KOH / g 0 <Example 1 - 1 (Form (i)) > -37- 1282796 (35) 10 parts of the polymer solution obtained in Synthesis Example 1 and dipentaerythritol pentaacrylate (hereinafter referred to as "DPPA") 3 parts 0.09 parts of a photoradical initiator ("Ivugacure 907" manufactured by Ciba Geigy Co., Ltd.; hereinafter referred to as "Irg 907") and 5 parts of PGMEA were uniformly stirred and mixed to obtain a curable resin composition. The obtained curable resin composition was applied to an alkali-free glass using a spin coater to have a thickness of 2 // m after drying, and dried at 80 ° C for 5 minutes on a hot plate, and then an ultrahigh pressure mercury lamp was used. The test piece A was obtained by irradiating ultraviolet rays with an irradiation amount of 200 mJ/cm2, and the photocurability was evaluated by the following method using the test piece A. On the other hand, the test piece A was further heated by a hot plate at 20 ° C for 1 hour to obtain a test piece b, and the obtained test piece B was used to evaluate transparency and heat resistance. The results are shown in Table 1. (Photohardenability) The state of the coating film when the test piece A was immersed in tetrahydrofuran at room temperature for 1 minute was visually observed and judged on the following basis. 〇: The coating film is not peeled off, and the X film is peeled off (transparency) The transmittance (%) in the wavelength of 38 () to 800 nm is measured using a spectrophotometer ("UV-3100" Shimadzu). (Heat resistance) The film thickness of the test piece B was measured using a stylus type surface roughness meter ("Dektak IIA", Japan Vacuum Technology 1282796 (36)). Thereafter, the test piece B was heated at 250 ° C for 1 hour with a hot plate, and after cooling to room temperature, the film thickness was measured again. Thereafter, the film thickness reduction rate (%) due to heating was calculated. · <Example 1 2 (Form (iv)) > 10 parts of the polymer solution obtained in Synthesis Example 2 and a photoacid generator ("SP-170" Asahi Chemical Co., Ltd.; hereinafter referred to as "SP-170") 0.09 parts, trimellitic anhydride 〇·6 parts were uniformly stirred and mixed to obtain a curable resin composition. Using the obtained curable resin composition, it was treated in the same manner as in Example 1-1 to evaluate photocurability, transparency, and heat resistance. The results are shown in Table 1. <Example 1 - 3 (Form (vi)) > 10 parts of the polymer solution obtained in Synthesis Example 3, cresol novolac lacquer type epoxy resin ("EOCN - 103S" manufactured by Nippon Kayaku Co., Ltd., hereinafter referred to as 3 parts of "EOCN-103S"), 0.3 parts of trimellitic anhydride, and 5 parts of PGMEA were uniformly stirred and mixed to obtain a curable resin composition. φ The obtained curable resin composition was coated on an alkali-free glass using a spin coater to a thickness of 2 // m after drying, and dried on a hot plate at 8 (TC for 5 minutes, and then hot plated) The test piece B was obtained by heating at 200 ° C for 1 hour, and the test piece B obtained was treated in the same manner as in Example 1-1 to evaluate the transparency and heat resistance. The results are shown in Table 1. <Comparative Example 1 - 1 (Form (i)) > Compare the polymer solution obtained in Synthesis Example 1 with aliquots, DPP A 3 parts, -39-1282796 (37)

Irg 907 0.09份、PGMEA 5份均勻攪拌混合,取得硬化性 · 樹脂組成物。 . 使用所得之硬化性樹脂組成物,同實施例1 - 1處理 _ ,評價光硬化性、透明性及耐熱性。結果示於表1。 &lt;比較例1 一 2 (形態(iv)) &gt; 令比較合成例2所得之聚合物溶液1 〇份、SP - 1 70 0.09份、偏苯三酸酐0.6份均勻攪拌混合,取得硬化性樹 φ 脂組成物。 使用所得之硬化性樹脂組成物,同實施例1 - 1處理 ,評價光硬化性、透明性及耐熱性。結果示於表1。 &lt;比較例1 一 3 (形態(W)) &gt; 令比較合成例3所得之聚合物溶液1〇份、EOCN— 103 S 3份、偏苯三酸酐0.3份、PGMEA 5份均勻攪拌混合,取得 硬化性樹脂組成物。 φ 使用所得之硬化性樹脂組成物,同實施例1 - 3處理 ,評價透明性及耐熱性。結果示於表1。 -40- 1282796 (38) 表1 實施例 1-1 實施例 1-2 實施例 1-3 比較例 1-1 比較例 1-2 比較例 1-3 光硬化性 〇 〇 一 〇 〇 一 ___·--- 透明性 97%以上 97%以上 97%以上 90%以上 90%以上 90%以上 耐熱性 1%以下 1%以下 1%以下 1°/。以下 1%以下 1%以下 &lt;實施例2 — 1〜2 — 2、比較例2 — 1〜2 — 2 &gt; 令表2所示配合比(數値爲以重量份表示)之各成分 均勻攪拌混合,取得硬化性樹脂組成物。 將所得之硬化性樹脂組成物,使用1 // m的濾紙過濾 後,使用旋塗器於無鹼玻璃板上塗佈成乾燥後之厚度爲2 // m,且以熱板於8(TC乾燥5分鐘。其後,透過具有10 // m間隔之線/空間部分的光罩,以超高壓水銀燈於照射 量爲100 mJ/ cm2下照射紫外線。其次,將未照射部分以 0.05%氫氧化鉀水溶液予以溶解除去,並以純水洗滌1分 鐘,取得試驗片A,使用該試驗片A以下述方法評價圖案 性。另一方面,將前述試驗片A,以熱板於20(TC加熱1小 時取得試驗片B,使用所得之試驗片B以下述方法評價硬 化塗膜部分之透明性及耐熱性。結果示於表2。 (圖案性) 以光學顯微鏡觀察試驗片A,並以下列基準判定。 〇:紫外線照射部(殘存圖案)之形狀良好且於未照 -41 - 1282796 (39) 射部未察見殘渣 X :紫外線照射部(殘存圖案)有缺陷和剝落,於未 照射部察見殘渣 (透明性) 使用分光光度計,(「UV — 3100」島津製)測定波 長380〜800 nm中的穿透率(%)。 (耐熱性) 使用觸針式表面粗度計(「Dektak IIA」日本真空技 術製)測定試驗片B的膜厚。其後’將該試驗片B以熱板 於25 0 °C中加熱1小時,冷卻至室溫後再度測定膜厚。其後 ,算出加熱所造成之膜厚減少率(% ) ° -42 - 1282796 (41) 表3 實施例3-1 實施例3-2 實施例3-3 所用之聚合物 溶液 合成例4 合成例7 合成例8 著色樹脂組成 物之種類 R G B K R G B K R G B K 配 聚合物溶液 10 10 10 10 10 10 10 10 10 10 10 10 合 比 二季戊四醇 六丙烯酸酯 3 3 3 3 3 3 3 3 3 3 3 3 紅顏料分散 液 20 — — — 20 — — — 20 — — — 綠顏料分散 液 — 17 — — — 17 — — — 17 — — 藍顏料分散 液 — — 25 — — — 25 — — — 25 — 碳黑分散液 — 一 一 20 一 — 一 20 — 一 — 20 Irg 907 2 2 2 2 2 2 2 2 2 2 2 2 PGMEA 40 43 35 40 40 43 35 40 40 43 35 400.09 parts of Irg 907 and 5 parts of PGMEA were uniformly stirred and mixed to obtain a curable resin composition. Using the obtained curable resin composition, the film was treated in the same manner as in Example 1-1 to evaluate photocurability, transparency, and heat resistance. The results are shown in Table 1. &lt;Comparative Example 1 - 2 (Form (iv)) &gt; The polymer solution obtained in Comparative Synthesis Example 2, 1 part by weight, SP - 1 70 0.09 part, and 0.6 parts of trimellitic anhydride were uniformly stirred and mixed to obtain a hardenable tree φ lipid composition. Things. The obtained curable resin composition was treated in the same manner as in Example 1-1 to evaluate photocurability, transparency, and heat resistance. The results are shown in Table 1. &lt;Comparative Example 1 - 3 (Form (W)) &gt; 1 part of the polymer solution obtained in Comparative Synthesis Example 3, 3 parts of EOCN-103S, 0.3 parts of trimellitic anhydride, and 5 parts of PGMEA were uniformly stirred and mixed to obtain curability. Resin composition. φ The obtained curable resin composition was treated in the same manner as in Example 1-3 to evaluate transparency and heat resistance. The results are shown in Table 1. -40- 1282796 (38) Table 1 Example 1-1 Example 1-2 Example 1-3 Comparative Example 1-1 Comparative Example 1-2 Comparative Example 1-3 Photocuring 〇〇一〇〇一___ ·--- Transparency 97% or more 97% or more 97% or more 90% or more 90% or more 90% or more Heat resistance 1% or less 1% or less 1% or less 1°/. 1% or less and 1% or less of the following <Example 2 - 1 to 2 - 2, Comparative Example 2 - 1 to 2 - 2 &gt; The composition ratio shown in Table 2 (the number is expressed in parts by weight) is uniform The mixture was stirred and mixed to obtain a curable resin composition. The obtained curable resin composition was filtered through a filter paper of 1 // m, and then coated on an alkali-free glass plate using a spin coater to have a thickness of 2 // m after drying, and a hot plate at 8 (TC). After drying for 5 minutes, ultraviolet rays were irradiated with an ultrahigh pressure mercury lamp at an irradiation dose of 100 mJ/cm2 through a mask having a line/space portion of 10 // m intervals. Secondly, the unirradiated portion was 0.05% hydroxide. The potassium aqueous solution was dissolved and removed, and washed with pure water for 1 minute to obtain a test piece A, and the pattern was evaluated by the following method using the test piece A. On the other hand, the test piece A was heated at 20 (TC heating 1). In the test piece B, the test piece B was obtained in the following manner, and the transparency and heat resistance of the portion of the cured coating film were evaluated by the following method. The results are shown in Table 2. (Pattern) The test piece A was observed under an optical microscope and judged by the following criteria. 〇: The shape of the ultraviolet ray irradiation part (residual pattern) is good and is not observed -41 - 1282796 (39) The residue is not observed in the shot part X: The ultraviolet ray irradiation part (residual pattern) is defective and peeled off, and is observed in the unirradiated part. Residue (transparency) using spectroscopic The transmittance (%) at a wavelength of 380 to 800 nm is measured by a photometer ("UV-3100"). (Heat resistance) Measured using a stylus type surface roughness meter ("Dektak IIA" manufactured by Nippon Vacuum Technology Co., Ltd.) The film thickness of the test piece B. Then, the test piece B was heated at 25 ° C for 1 hour on a hot plate, and after cooling to room temperature, the film thickness was measured again. Thereafter, the film thickness reduction rate by heating was calculated. (%) ° -42 - 1282796 (41) Table 3 Example 3-1 Example 3-2 Example 3-3 Polymer solution used Synthesis Example 4 Synthesis Example 7 Synthesis Example 8 Kind of colored resin composition RGBKRGBKRGBK Polymer solution 10 10 10 10 10 10 10 10 10 10 10 10 Mixing dipentaerythritol hexaacrylate 3 3 3 3 3 3 3 3 3 3 3 3 3 Red pigment dispersion 20 — — — 20 — — — 20 — — — Green Pigment Dispersion — 17 — — 17 — — — 17 — — Blue Pigment Dispersion — 25 — — — 25 — — — 25 — Carbon Black Dispersion — One Twenty One One — One 20 — One — 20 Irg 907 2 2 2 2 2 2 2 2 2 2 2 2 PGMEA 40 43 35 40 40 43 35 40 40 43 35 40

-44- 1282796 (42)-44- 1282796 (42)

表4 比較例3-1 比較例3-2 所用之聚合物溶液 比較合成例3 比較合成例5 著色 種類 ,樹脂組成物之 R G B K R G B K 配 合 比 聚合物溶液 10 10 10 10 10 10 10 10 二季戊四醇六 丙烯酸酯 3 3 3 3 3 3 3 3 紅顏料分散液 20 — — — 20 — — — 綠顏料分散液 一 17 一 — 一 17 一 — 藍顏料分散液 一 一 25 一 — 一 25 — 碳黑分散液 — 一 一 20 —— —一 一 20 Irg 907 2 2 2 2 2 2 2 2 PGMEA 40 43 35 40 40 43 35 40Table 4 Comparative Example 3-1 Comparative Example 3-2 Polymer solution used Comparative Synthesis Example 3 Comparative Synthesis Example 5 Coloring type, RGBKRGBK composition of the resin composition Polymer solution 10 10 10 10 10 10 10 10 Dipentaerythritol hexaacrylic acid Ester 3 3 3 3 3 3 3 3 Red Pigment Dispersion 20 — — — 20 — — — Green Pigment Dispersion One 17 One — One 17 One — Blue Pigment Dispersion One Percent One 25 One — One 25 — Carbon Black Dispersion— One to one 20 - one to one 20 Irg 907 2 2 2 2 2 2 2 2 PGMEA 40 43 35 40 40 43 35 40

-45- 1282796 (44) 壓水銀燈於照射量爲3 00 mj/ cm2下照射紫外線。其次, 將未照射部分以0 · 0 5 %氫氧化鉀水溶液予以溶解除去,並 以純水洗滌1分鐘,取得試驗片C,使用該試驗片C以下述 方法評價圖案性。另一方面,將前述試驗片C,以熱板於 2〇〇°C加熱1小時取得試驗片D,使用所得之試驗片D以下 述方法評價硬化塗膜部分之OD値。結果示於表5。 (圖案性) 以光學顯微鏡觀察試驗片C,並以下列基準判定。 〇 :紫外線照射部(殘存圖案)之形狀良好且於未照 射部未察見殘渣 X :紫外線照射部(殘存圖案)有缺陷和剝落,於未 照射部察見殘渣 (〇D値) 使用分光光度計測定5 5 0 n m中的〇 D値。 1282796 (45)-45- 1282796 (44) The mercury lamp is irradiated with ultraviolet light at an exposure of 300 mj/cm2. Then, the unirradiated portion was dissolved and removed in a 0. 05% potassium hydroxide aqueous solution, and washed with pure water for 1 minute to obtain a test piece C, and the test piece C was used to evaluate the pattern property by the following method. On the other hand, the test piece C was heated at 2 ° C for 1 hour on a hot plate to obtain a test piece D, and the obtained test piece D was used to evaluate the OD 硬化 of the cured coating film portion by the following method. The results are shown in Table 5. (Pattern) The test piece C was observed with an optical microscope and judged on the following basis. 〇: The shape of the ultraviolet ray irradiation part (residual pattern) is good, and the residue is not observed in the unirradiated part. X: The ultraviolet ray irradiation part (residual pattern) is defective and peeled off, and the residue is observed in the unirradiated part (〇D値). Spectrophotometry is used. The 〇D値 in 550 nm was measured. 1282796 (45)

表5 實施例3-1 實施例3-2 實施例3-3 R G B K R G B K R G B K 圖案; 丨生 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 色 度 Y 26 63 21 27 64 23 27 65 23 / X 0.58 0.31 0.14 0.58 0.31 0.14 0.58 0.31 0.14 y 0.33 0.55 0.16 0.33 0.55 0.16 0.33 0.55 0.16 0D値 3.2 3.3 3.4 貫施例3- t 匕較例3-2 R G B K R G B K 圖案 丨生 〇 X 〇 X 〇 〇 〇 X 色 度 Y 24 59 19 / 25 60 18 / X 0.58 0.31 0.14 0.58 0.31 0.14 y 0.33 0.55 0.16 0.33 0.55 0.16 0D値 3.0 3.1Table 5 Example 3-1 Example 3-2 Example 3-3 RGBKRGBKRGBK pattern; 〇〇〇〇〇〇〇〇〇〇〇〇 〇〇〇〇〇〇〇〇〇〇〇〇 Y Y 26 63 21 27 64 23 27 65 23 / X 0.58 0.31 0.14 0.58 0.31 0.14 0.58 0.31 0.14 y 0.33 0.55 0.16 0.33 0.55 0.16 0.33 0.55 0.16 0D値3.2 3.3 3.4 Example 3 - t 匕 Comparative example 3-2 RGBKRGBK pattern generation 〇X 〇X 〇〇〇X chromaticity Y 24 59 19 / 25 60 18 / X 0.58 0.31 0.14 0.58 0.31 0.14 y 0.33 0.55 0.16 0.33 0.55 0.16 0D値3.0 3.1

-48- 1282796 (46) 〈實施例4 — 1〜4— 6、比較例4 — 1〜4— 2&gt; 令表6所示配合比(數値爲以重量份表示)之各成分 均勻攪拌混合,取得硬化性樹脂組成物。 將所得之硬化性樹脂組成物,使用1 V m的濾紙過濾 後,使用旋塗器於無驗玻璃板上塗佈成乾燥後之厚度爲2 // m,且以熱板於8 0 °C乾燥5分鐘。其後,透過具有1 〇 // m間隔之線/空間部分的光罩,以超高壓水銀燈於照射 量爲100 mJ/ cm2下照射紫外線。其次,將未照射部分以 0.05 %氫氧化鉀水溶液予以溶解除去,並以純水洗滌}分 鐘,取得試驗片A,使用該試驗片A以下述方法評價圖案 性。另一方面,將前述試驗片A,以熱板於2 0 0 °C加熱1小 時取得試驗片B,使用所得之試驗片B以下述方法評價硬 化塗膜部分之透明性、表面硬度、耐藥品性、耐熱變色性 及耐熱平坦性。結果示於表6。 還有,對於實施例4 - 6未進行紫外線照射及圖案性之 評價,於80 °C乾燥5分鐘後,接著,以熱板於20 0 °C加熱1 小時取得試驗片B,且使用所得之試驗片B以下述方法評 價硬化塗膜部分之透明性、表面硬度、耐藥品性、耐熱變 色性及耐熱平坦性。 (圖案性) 以光學顯微鏡觀察試驗片B,並以下列基準判定。 〇:紫外線照射部(殘存圖案)之形狀良好且於未照 射部未察見殘渣 -49- 1282796 (47) x :紫外線照射部(殘存圖案)有缺陷和剝落’於朱 照射部察見殘渣 (透明性) 使用分光光度計,(「U V — 3 1 0 0」島津製)測定波 長3 8 0〜8 00 nm中的穿透率(%)。 (表面硬度) 根據JI S K - 5 4 0 〇之鉛筆刮引試驗測定表面硬度。 (耐藥品性) 將試驗片B浸漬於3 〇 °C之N -甲基吡咯烷酮中,逝以 熱板於200°C乾燥30分鐘後,依據JIS K— 5400之方格驂帶 法進行附著性試驗,並以殘存之方格數/ 1 〇〇予以評價。 (耐熱變色性) 將試驗片B以熱板於250 °C加熱處理1小時後’使用分 光光度計(「UV— 3100」島津製)測定波長400〜800 nm 中的穿透率(%)。其次,由加熱處理前之穿透率(以透 明性評價所測定之穿透率)與加熱處理後測定所得之穿透 率,依據下式算出穿透率的減少率,並依下列基準評價。 穿透率之減少率(%) =〔(加熱處理前之穿透率、 加熱處理後之穿透率)/加熱處理前之穿透率〕xl 00 〇:減少率未滿1 % -50- 1282796 (48) χ :減少率爲1 %以上 (耐熱平坦性) 將試驗片以熱板於250 °C加熱1小時後,使用觸針式表 面粗度計(「Dektak IIA」日本真空技術製)測定硬化塗 膜之表面粗度Ra値(A )。-48- 1282796 (46) <Example 4 - 1 to 4-6, Comparative Example 4 - 1 to 4 - 2> The components of the mixing ratio shown in Table 6 (indicated by parts by weight) were uniformly stirred and mixed. A curable resin composition was obtained. The obtained curable resin composition was filtered through a filter paper of 1 V m, and then coated on a non-glass plate using a spin coater to have a thickness of 2 // m after drying, and a hot plate at 80 ° C. Dry for 5 minutes. Thereafter, the ultraviolet ray was irradiated with an ultrahigh pressure mercury lamp at an irradiation dose of 100 mJ/cm2 through a mask having a line/space portion of 1 〇 // m interval. Next, the unirradiated portion was dissolved and removed with a 0.05% aqueous potassium hydroxide solution, and washed with pure water for 1 minute to obtain a test piece A, and the test piece A was used to evaluate the pattern property by the following method. On the other hand, the test piece A was heated at 200 ° C for 1 hour with a hot plate to obtain a test piece B, and the obtained test piece B was used to evaluate the transparency, surface hardness, and drug resistance of the cured coating film portion by the following method. Properties, heat discoloration and heat resistance flatness. The results are shown in Table 6. Further, in Example 4-6, ultraviolet irradiation and patterning were not evaluated, and after drying at 80 ° C for 5 minutes, the test piece B was obtained by heating at 20 ° C for 1 hour on a hot plate, and the obtained sample was obtained. The test piece B was evaluated for transparency, surface hardness, chemical resistance, heat discoloration resistance, and heat resistance flatness of the cured coating film portion by the following method. (Pattern) The test piece B was observed with an optical microscope and judged on the following basis. 〇: The shape of the ultraviolet ray irradiation part (residual pattern) is good and the residue is not observed in the unirradiated part -49- 1282796 (47) x : The ultraviolet ray irradiation part (residual pattern) is defective and peeled off. Transparency) The transmittance (%) at a wavelength of 380 to 800 nm was measured using a spectrophotometer ("UV - 3 1 0 0" Shimadzu system). (Surface hardness) The surface hardness was measured in accordance with the pencil scraping test of JI S K - 5 4 0 〇. (Chemical resistance) The test piece B was immersed in N-methylpyrrolidone at 3 ° C, and dried for 30 minutes at 200 ° C on a hot plate, and then adhered according to the jigging method of JIS K-5400. Test and evaluate with the number of remaining squares / 1 〇〇. (Heat-resistant discoloration property) After the test piece B was heat-treated at 250 ° C for 1 hour on a hot plate, the transmittance (%) at a wavelength of 400 to 800 nm was measured using a spectrophotometer ("UV-3100" manufactured by Shimadzu Corporation). Next, the transmittance before the heat treatment (the transmittance measured by the transparency evaluation) and the transmittance after the heat treatment were measured, and the rate of decrease in the transmittance was calculated according to the following formula and evaluated according to the following criteria. Rate of decrease of penetration rate (%) = [(penetration rate before heat treatment, penetration rate after heat treatment) / penetration rate before heat treatment] xl 00 〇: reduction rate less than 1% -50- 1282796 (48) χ : Reduction rate of 1% or more (heat resistance flatness) After heating the test piece to a hot plate at 250 °C for 1 hour, a stylus type surface roughness meter ("Dektak IIA" manufactured by Nippon Vacuum Technology Co., Ltd.) was used. The surface roughness Ra 値 (A ) of the cured coating film was measured.

-51 - 1282796 (50) &lt;實施例5、比較例5 &gt; 令表7所不配合比(數値爲以重量份表示)之各 均勻攪拌混合,取得硬化性樹脂組成物。 將所得之硬化性樹脂組成物,使用1 // m的濾紙 後,使用旋塗器於無鹼玻璃板上塗佈成乾燥後之厚虔 // m,且以熱板於8 0 °C乾燥5分鐘。其後,透過具有1; // m四方形之開口部的光罩,以超高壓水銀燈於照射 100 mJ/ cm2下照射紫外線。其次,將未照射部分以 %氫氧化鉀水溶液予以溶解除去,並以純水洗滌1分 ,以熱板於200 t加熱1小時,形成間隔件圖案。其後 用裝置平面壓針的微小壓縮試驗機,以負荷荷重0.27 sec、室溫下,測定間隔件部的破壞荷重(gf )。結 於表7。 成分 過濾 [爲5 里厨 0.05 鐘後 ,使 gf / 果示 -53- (51) 1282796 表7 實施例5 比較例5 所用之聚合物溶液 合成例1 0 比較合成例5 聚合物溶液 10 10 二季戊四醇六丙烯酸 3 3 酯 配合比 EOCN-103S — 3 偏苯三酸酐 0.2 0.2 Irg 907 0.09 0.09 PGMEA 5 10 破壞荷重 .「gf」 13 10-51 - 1282796 (50) &lt;Example 5, Comparative Example 5 &gt; Each of the mixing ratios (the number is expressed by parts by weight) in Table 7 was uniformly stirred and mixed to obtain a curable resin composition. The obtained curable resin composition was applied to a non-alkali glass plate by a spin coater to a thickness of 虔//m after drying, and dried at 80 ° C with a hot plate. 5 minutes. Thereafter, the ultraviolet ray was irradiated with an ultrahigh pressure mercury lamp at an irradiation of 100 mJ/cm2 through a photomask having an opening of 1; Next, the unirradiated portion was dissolved and removed with a % potassium hydroxide aqueous solution, and washed with pure water for 1 minute, and heated on a hot plate at 200 t for 1 hour to form a spacer pattern. Thereafter, the breaking load (gf) of the spacer portion was measured at a load of 0.27 sec and a small compression tester using a flat presser of the apparatus. See Table 7. Ingredients filtration [5 liters after 0.05 minutes, make gf / fruit -53- (51) 1282796 Table 7 Example 5 Comparative Example 5 Polymer solution Synthesis Example 1 Comparative Synthesis Example 5 Polymer solution 10 10 II Pentaerythritol hexaacrylic acid 3 3 ester mixture ratio EOCN-103S - 3 trimellitic anhydride 0.2 0.2 Irg 907 0.09 0.09 PGMEA 5 10 destruction load. "gf" 13 10

&lt;實施例6 &gt;&lt;Example 6 &gt;

如下處理,製作彩色濾光片,及液晶顯示裝置,進行 評價。還有,製作彩色濾光片所使用之各硬化性樹脂組成 物爲如表8所示。 •54- 1282796 (52) 表8 實施例6 比較例6 黑色樹脂組成物 實施例3 - 3 比較例3-2 紅色樹脂組成物 實施例3-3 比較例3 - 2 綠色樹脂組成物 實施例3-3 比較例3 - 2 藍色樹脂組成物 實施例3 - 3 比較例3 - 2 保護膜用樹脂組成物 實施例4 - 3 比較例4 - 2 間隔件用樹脂組成物 實施例5 比較例5 (彩色濾光片之製作、評價) 首先,於3 00 mmx 4 00 mm、厚度1.1 mm之無鹼玻璃 基板上,將黑色硬化性樹脂組成物以旋塗法塗佈形成塗膜 ,並以8 0 °C進行5分鐘預烘烤。其後,使用超高壓水銀燈 爲光源之鄰近(proximity)曝光機以500 mJ/cm2之曝光 量,透咼指定之黑色矩陣用光罩進行定位曝光,並以鹼性 顯像液進行顯像,以純水洗淨後,以23 0 °C進行後烘烤3 0 分鐘,形成黑色矩陣(厚度1.2/zm)。 其次,於形成黑色矩陣之基板上以旋塗法塗佈紅色硬 化性樹脂組成物並形成塗膜,以80 °C進行5分鐘預烘烤。 其後,使用超高壓水銀燈做爲光源之鄰近曝光機以1 〇〇 mJ /cm2之曝光量,透過指定之像素用光罩進行定位曝光, 並以鹼性顯像液進行顯像,以純水洗淨後,以200 °C進行 後烘烤3 0分鐘,形成紅色像素圖案(厚度2 · 0 // m )。同 樣處理,使用綠色硬化性樹脂組成物形成綠色像素圖案, -55- 1282796 (53) 並且使用藍色硬化性樹脂組成物形成藍色像素圖案。 其次,於形成黑色矩陣和各色像素之基板上以旋塗法 塗佈保護膜用樹脂組成物並形成塗膜,以80 °C進行5分鐘 預烘烤。其後,使用超高壓水銀燈做爲光源之鄰近曝光機 以100 m〗/ cm2之曝光量,透過指定之保護膜用光罩進行 定位曝光,並以鹼性顯像液進行顯像,以純水洗淨後,以 200°C進行後烘烤30分鐘,形成保護膜(厚度1.5 // m )。 其次,於形成保護膜之基板上以旋塗法塗佈間隔件用 樹脂組成物並形成塗膜,以80 °C進行5分鐘預烘烤。其後 ,使用超高壓水銀燈做爲光源之鄰近曝光機以100 m】/cm 2之曝光量,透過指定之間隔件用光罩進行定位曝光,並 以鹼性顯像液進行顯像,以純水洗淨後,以220 °C進行後 烘烤30分鐘,形成間隔件(高度4.8 // m、底部12 // m X 12 // m正方)。 所製作之彩色濾光片以光學顯微鏡檢查時,並無圖案 缺損和顯像殘渣,且保護膜表面之平滑性亦良好。 (液晶顯示裝置之製作、評價) 如上述處理所製作之彩色濾光片上,以濺鍍法形成氧 化銦錫所構成的透明導電層(厚度0.1 5 // m ),更且,設 置聚醯亞胺配向層予以配向處理(摩擦)後,使用環氧樹 脂系密封劑與TFT排列基板貼合,並由密封部所設置之注 入口將TN型液晶封入彩色濾光片和TFT排列基板之間後, 將注入口密封,再貼合偏光板等之光學薄膜,製作TN方 -56- 1282796 (54) 式的液晶顯示裝置。 所製作之液晶顯示裝置爲亮度及色純度高,不會產生 顏色不勻等且取得良好的顯示品質。 &lt;比較例6 &gt; 除了令彩色濾光片製作中所使用的各硬化性樹脂組成 物變更成表8所示物質以外,同實施例6處理,製作彩色 濾光片及液晶顯示裝置,並且評價時,於彩色濾光片上, 察見圖案缺損和顯像殘渣,且液晶顯示裝置爲亮度及色純 度低,亦產生顏色不勻。 〔產業上之可利用性〕 本發明之硬化性樹脂組成物例如適合使用於光阻材料 、各種塗層劑、塗料等之用途。The color filter and the liquid crystal display device were produced and evaluated as follows. Further, each of the curable resin compositions used for producing the color filter was as shown in Table 8. • 54- 1282796 (52) Table 8 Example 6 Comparative Example 6 Black resin composition Example 3 - 3 Comparative Example 3-2 Red resin composition Example 3-3 Comparative Example 3 - 2 Green resin composition Example 3 -3 Comparative Example 3 - 2 Blue Resin Composition Example 3 - 3 Comparative Example 3 - 2 Resin Composition for Protective Film Example 4 - 3 Comparative Example 4 - 2 Resin Composition for Spacer Example 5 Comparative Example 5 (Production and evaluation of color filter) First, a black curable resin composition was applied by spin coating on a non-alkali glass substrate of 300 mm x 400 mm and a thickness of 1.1 mm to form a coating film. Pre-bake for 5 minutes at 0 °C. Thereafter, an ultrahigh pressure mercury lamp is used as a proximity exposure machine of the light source at a exposure amount of 500 mJ/cm 2 , and a predetermined black matrix is used for positioning exposure, and the image is developed with an alkaline developing solution. After washing with pure water, post-baking was carried out at 23 ° C for 30 minutes to form a black matrix (thickness 1.2/zm). Next, a red hard resin composition was applied by spin coating on a substrate on which a black matrix was formed, and a coating film was formed, and prebaked at 80 ° C for 5 minutes. Thereafter, using an ultra-high pressure mercury lamp as a light source as a light source, the exposure amount of 1 〇〇mJ /cm2 is used for positioning exposure through a designated pixel, and the image is developed with an alkaline developing solution to pure water. After washing, post-baking was performed at 200 ° C for 30 minutes to form a red pixel pattern (thickness 2 · 0 // m ). In the same manner, a green pixel pattern was formed using a green curable resin composition, -55-1282796 (53), and a blue pixel pattern was formed using the blue curable resin composition. Next, a resin composition for a protective film was applied by spin coating on a substrate on which a black matrix and respective color pixels were formed, and a coating film was formed, and prebaked at 80 ° C for 5 minutes. Thereafter, using an ultra-high pressure mercury lamp as a light source as a light source, the exposure amount of 100 m 〗 / cm 2 is used to perform positioning exposure through a mask of a designated protective film, and the image is developed with an alkaline developing solution to obtain pure water. After washing, post-baking was carried out at 200 ° C for 30 minutes to form a protective film (thickness 1.5 // m). Next, a resin composition for a spacer was applied by spin coating on a substrate on which a protective film was formed, and a coating film was formed, and prebaked at 80 ° C for 5 minutes. Thereafter, using an ultra-high pressure mercury lamp as a light source adjacent to the exposure machine at a exposure amount of 100 m]/cm 2 , positioning exposure is performed with a mask through a designated spacer, and imaging is performed with an alkaline developing solution to be pure After washing with water, post-baking at 220 °C for 30 minutes to form a spacer (height 4.8 // m, bottom 12 // m X 12 // m square). When the produced color filter was examined by an optical microscope, there was no pattern defect and development residue, and the smoothness of the surface of the protective film was also good. (Production and Evaluation of Liquid Crystal Display Device) A transparent conductive layer (thickness: 0.1 5 // m) composed of indium tin oxide was formed by sputtering on the color filter produced by the above-described process, and a polyfluorene was further provided. After the imine alignment layer is subjected to alignment treatment (friction), an epoxy resin-based encapsulant is bonded to the TFT alignment substrate, and a TN-type liquid crystal is sealed between the color filter and the TFT alignment substrate by an injection port provided in the sealing portion. Thereafter, the injection port was sealed, and an optical film such as a polarizing plate was attached to prepare a liquid crystal display device of the TN-56-1282796 (54) type. The liquid crystal display device produced has high brightness and color purity, and does not cause color unevenness and the like, and achieves good display quality. &lt;Comparative Example 6&gt; A color filter and a liquid crystal display device were produced in the same manner as in Example 6 except that each of the curable resin compositions used in the production of the color filter was changed to the material shown in Table 8 At the time of evaluation, pattern defects and development residues were observed on the color filter, and the liquid crystal display device was low in brightness and color purity, and also caused color unevenness. [Industrial Applicability] The curable resin composition of the present invention is suitably used for, for example, a photoresist material, various coating agents, paints, and the like.

-57--57-

Claims (1)

I28279§_ 年月El修(更)正木I 95. 1.20 拾、申請專利範圍 第93 1 0634 5號專利申請案 中文申請專利範圍修正本I28279§_ 年月El修(更)正木 I 95. 1.20 Pickup, Patent Application Scope 93 1 0634 Patent Application No. 5 Chinese Patent Application Revision 民國95年1月20日修正 1 · 一種硬化性樹脂組成物,其特徵爲含有聚合物成 分(A)、和具有自由基聚合性雙鍵之化合物(bl)及具 有環氧基之化合物(b2)所選出之至少一者所構成之硬化 成分(B )的硬化性樹脂組成物, 該聚合物成分(A)爲令下述一般式(1)Amendment January 1, 1995, 1st. 1. A curable resin composition characterized by containing a polymer component (A), a compound having a radical polymerizable double bond (bl), and a compound having an epoxy group (b2) a curable resin composition of the hardening component (B) composed of at least one selected, the polymer component (A) being the following general formula (1) (式(1)中,R1及R2分別獨立表示氫原子或亦可具有取 代基之碳數1〜25個的烴基) 所示化合物做爲必須之單體成分聚合而成的聚合物(a ) ,且滿足下述(i )或(ii )之任一條件, (i)該聚合物(a)爲具有酸基或環氧基之聚合物, 含有化合物(b 1 )作爲該硬化成份(B )時,其含有比例 係該聚合物份(A)的5〜1 000重量%,含有化合物(b2) 作爲該硬化成份(B )時,其含有比例係該聚合物成份( A )的5〜1 000重量% ; (ii)該聚合物(a)爲具有酸基或環氧基之聚合物 ,且該聚合物(a)爲由具有自由基聚合性雙鍵之化合物 (bl )及具有環氧基之化合物(b2 )所選出之至少1種, 1282796 亦兼爲硬化成份(B )。 2.如申請專利範圍第1項之硬化性樹脂組成物,其中 該聚合物(a)爲具有酸基之聚合物。 3·如申請專利範圍第1項之硬化性樹脂組成物,其中 該聚合物(a )亦爲由具有自由基聚合性雙鍵之化合物( b 1 )及具有環氧基之化合物(b2 )所選出之至少一種,亦 兼爲硬化成分(B)。 4. 如申請專利範圍第1項之硬化性樹脂組成物,其中 該硬化成分(B)爲具有自由基聚合性雙鍵之化合物(bl ),更且亦含有光自由基引發劑(cl)及熱自由基引發劑 (c2)所選出之至少一種做爲聚合引發劑(C)。 5. 如申請專利範圍第1項之硬化性樹脂組成物,其中 該硬化成分(B)爲具有環氧基之化合物(b2),更且亦 含有光產酸劑(c3 )及熱產酸劑(c4 )所選出之至少一種 做爲聚合引發劑(C )。 6. —種彩色濾光片,其特徵爲於基板上設置硬化樹 脂層之彩色濾光片中,做爲該硬化樹脂層之樹脂組成物爲 如申請專利範圍第1至5項中任一項之硬化性樹脂組成物。 7. —種顯示裝置’其特徵爲於使用基板上設置硬化 樹脂層之彩色濾光片的顯示裝置中’做爲該硬化樹脂層之 樹脂組成物爲如申請專利範圍第1至5項中任一項之硬化性 樹脂組成物。(In the formula (1), R1 and R2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.) The polymer is a polymer obtained by polymerizing the necessary monomer component (a). And satisfying any of the following conditions (i) or (ii), (i) the polymer (a) is a polymer having an acid group or an epoxy group, and the compound (b 1 ) is contained as the hardening component (B) When it is contained in a proportion of 5 to 1,000,000% by weight of the polymer component (A), and when the compound (b2) is contained as the hardening component (B), the ratio of the polymer component (A) is 5 to 5 1 000% by weight; (ii) the polymer (a) is a polymer having an acid group or an epoxy group, and the polymer (a) is a compound (b1) having a radical polymerizable double bond and having a ring At least one selected from the compound (b2) of the oxy group, and 1282796 also serves as the hardening component (B). 2. The curable resin composition of claim 1, wherein the polymer (a) is a polymer having an acid group. 3. The curable resin composition of claim 1, wherein the polymer (a) is also a compound (b1) having a radical polymerizable double bond and a compound (b2) having an epoxy group. At least one selected is also a hardening component (B). 4. The curable resin composition according to claim 1, wherein the hardening component (B) is a compound having a radical polymerizable double bond (bl), and further contains a photo radical initiator (cl) and At least one selected from the thermal radical initiator (c2) is used as a polymerization initiator (C). 5. The curable resin composition according to claim 1, wherein the hardening component (B) is an epoxy group-containing compound (b2), and further contains a photoacid generator (c3) and a thermal acid generator. (c4) at least one selected as a polymerization initiator (C). 6. A color filter characterized in that a color filter provided with a hardened resin layer on a substrate is used as a resin composition of the hardened resin layer as in any one of claims 1 to 5 of the patent application. A curable resin composition. 7. A display device which is characterized in that, in a display device using a color filter in which a hardened resin layer is provided on a substrate, a resin composition as the hardened resin layer is as claimed in claims 1 to 5 of the patent application. A curable resin composition.
TW093106345A 2003-03-28 2004-03-10 Curing resin composition and its uses TWI282796B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003092597A JP4142973B2 (en) 2003-03-28 2003-03-28 Curable resin composition and use thereof

Publications (2)

Publication Number Publication Date
TW200502262A TW200502262A (en) 2005-01-16
TWI282796B true TWI282796B (en) 2007-06-21

Family

ID=33405641

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093106345A TWI282796B (en) 2003-03-28 2004-03-10 Curing resin composition and its uses

Country Status (4)

Country Link
JP (1) JP4142973B2 (en)
KR (1) KR100685229B1 (en)
CN (1) CN1269921C (en)
TW (1) TWI282796B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI595313B (en) * 2012-11-29 2017-08-11 富士軟片股份有限公司 Composition, coloring layer, color filter, infrared ray transmitting filter and fabricating method thereof, and infrared ray sensor

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI387777B (en) * 2006-04-06 2013-03-01 Nippon Catalytic Chem Ind Optical film and manufacturing method for same
JP2008056867A (en) * 2006-09-04 2008-03-13 The Inctec Inc Pigment dispersion and colored photosensitive composition
EP1975702B1 (en) * 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
JP4296225B2 (en) * 2007-07-18 2009-07-15 株式会社日本触媒 New polymer
JP5187492B2 (en) * 2007-11-22 2013-04-24 Jsr株式会社 Curable resin composition, protective film and method for forming protective film
JP2009244619A (en) * 2008-03-31 2009-10-22 Fujifilm Corp Color filter and method of manufacturing the same, and liquid crystal display device
JP5201066B2 (en) * 2008-06-19 2013-06-05 Jsr株式会社 Radiation sensitive resin composition for forming protective film of touch panel and method for forming the same
JP5617177B2 (en) * 2009-03-27 2014-11-05 東洋インキScホールディングス株式会社 Coloring composition for color filter and color filter
JP5701576B2 (en) 2009-11-20 2015-04-15 富士フイルム株式会社 Dispersion composition, photosensitive resin composition, and solid-state imaging device
JP2012003225A (en) 2010-01-27 2012-01-05 Fujifilm Corp Polymerizable composition for solder resist and method for forming solder resist pattern
JP5617329B2 (en) * 2010-04-28 2014-11-05 東洋インキScホールディングス株式会社 Photosensitive resin composition and insulating film for touch panel
KR101882714B1 (en) 2010-06-01 2018-07-27 후지필름 가부시키가이샤 Pigment dispersion composition, red colered composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device
JP5615123B2 (en) * 2010-10-12 2014-10-29 株式会社日本触媒 Polymer and its use
JP5191553B2 (en) * 2011-02-17 2013-05-08 富士フイルム株式会社 Colored radiation-sensitive composition, method for producing color filter, color filter, and solid-state imaging device
JP5679860B2 (en) * 2011-02-23 2015-03-04 富士フイルム株式会社 Colored radiation-sensitive composition, color filter, method for producing the color filter, and solid-state imaging device
JP5417364B2 (en) 2011-03-08 2014-02-12 富士フイルム株式会社 Curable composition for solid-state imaging device, photosensitive layer, permanent pattern, wafer level lens, solid-state imaging device, and pattern forming method using the same
EP2715416B1 (en) 2011-09-14 2019-10-30 FUJIFILM Corporation Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor
JP5922013B2 (en) 2011-12-28 2016-05-24 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP5976523B2 (en) 2011-12-28 2016-08-23 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP2013167786A (en) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp Curable resin composition for organic insulating film, cured material, tft active matrix substrate, and liquid-crystal display
JP5934664B2 (en) 2012-03-19 2016-06-15 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
JP5775479B2 (en) 2012-03-21 2015-09-09 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
EP2927716A4 (en) 2012-11-30 2015-12-30 Fujifilm Corp Curable resin composition, and image-sensor-chip production method and image sensor chip using same
WO2014084289A1 (en) 2012-11-30 2014-06-05 富士フイルム株式会社 Curable resin composition, and image-sensor-chip production method and image sensor chip using same
JP6170673B2 (en) 2012-12-27 2017-07-26 富士フイルム株式会社 Composition for color filter, infrared transmission filter, method for producing the same, and infrared sensor
SG11201505047WA (en) 2012-12-28 2015-08-28 Fujifilm Corp Curable resin composition for forming infrared reflective film, infrared reflective film and manufacturing method thereof, infrared ray cutoff filter and solid-state imaging device using the same
JP6166050B2 (en) * 2013-02-01 2017-07-19 株式会社日本触媒 Ether dimer composition and polymer
JP6062876B2 (en) * 2013-02-28 2017-01-18 富士フイルム株式会社 Composition for forming transparent resin layer, transparent resin layer, solid-state imaging device and optoelectronic device
JP6097128B2 (en) 2013-04-12 2017-03-15 富士フイルム株式会社 Far infrared light shielding layer forming composition
JP6177204B2 (en) * 2013-09-02 2017-08-09 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. Photosensitive resin composition, color filter using the same, and liquid crystal display device
JP6162084B2 (en) 2013-09-06 2017-07-12 富士フイルム株式会社 Colored composition, cured film, color filter, method for producing color filter, solid-state imaging device, image display device, polymer, xanthene dye
KR101917406B1 (en) * 2014-03-21 2018-11-09 동우 화인켐 주식회사 Photosensitive resin composition, color filter with high color reproducing and liquid crystal display device using the same
EP3418313B1 (en) * 2016-02-15 2020-09-02 Okamoto Chemical Industry Co., Ltd Composition optical three-dimensional molding
JP6475783B2 (en) * 2017-06-22 2019-02-27 株式会社日本触媒 Ether dimer composition and polymer
JP7237166B2 (en) 2019-08-29 2023-03-10 富士フイルム株式会社 Composition, film, near-infrared cut filter, pattern forming method, laminate, solid-state imaging device, infrared sensor, image display device, camera module, and compound

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100263906B1 (en) * 1998-06-02 2000-09-01 윤종용 Photosensitive polymer having backbone of cyclic structure and resist composition comprising the same
KR100281903B1 (en) 1998-12-24 2001-03-02 윤종용 Photosensitive polymer having a cyclic structure of the backbone and a resist composition comprising the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI595313B (en) * 2012-11-29 2017-08-11 富士軟片股份有限公司 Composition, coloring layer, color filter, infrared ray transmitting filter and fabricating method thereof, and infrared ray sensor
US10025011B2 (en) 2012-11-29 2018-07-17 Fujifilm Corporation Composition, infrared transmission filter and method for manufacturing the same, and infrared sensor

Also Published As

Publication number Publication date
JP2004300204A (en) 2004-10-28
JP4142973B2 (en) 2008-09-03
CN1542067A (en) 2004-11-03
CN1269921C (en) 2006-08-16
KR20040084825A (en) 2004-10-06
KR100685229B1 (en) 2007-02-22
TW200502262A (en) 2005-01-16

Similar Documents

Publication Publication Date Title
TWI282796B (en) Curing resin composition and its uses
TWI588162B (en) (meth)acrylate-based polymer, composition comprising same and use thereof
TWI534161B (en) Copolymers, resin compositions and photosensitive comprising thereof, and color filters
TWI760534B (en) Photosensitive resin composition, and method for producing same, color filter, and method for producing same, and image display element
TWI511986B (en) Blocked isocyanate group-containing polymer, composition comprising same and use thereof
TWI510564B (en) Coloring composition for color filter, color filter, display element, and pigment dispersion for color filter
TW201439293A (en) Colored photosensitive resin composition suitable for both column spacer and black matrix
TWI430020B (en) Photosensitive resin composition
TWI653248B (en) Resin composition for color filter, method for producing same, and color filter
TW201316121A (en) Curable resin composition for photo spacer, column spacer and liquid crystal display
TW200937118A (en) Photosensitive resin composition with good stripper-resistance for color filter and color filter formed using the same
JP7240807B2 (en) Colored photosensitive resin composition and light-shielding spacer prepared therefrom
TWI643022B (en) Photosensitive resin composition for forming black column spacer, black column spacer and image display device
TWI251124B (en) Photosensitive resin composition, its use, lactone-ring-containing polymer, and production process thereof
JP6463658B2 (en) Curable resin composition and color filter
TW201437242A (en) Active energy beam-curable resin composition, colored spacer for display device and black matrix using the same
JP2008248142A (en) Curable resin composition
TWI791563B (en) Copolymer, polymer composition, photosensitive resin composition for color filter, color filter, image display element, and method for producing a color filter
JP2003222717A (en) Color filter and photosensitive resin composition therefor
JP2008248143A (en) Curable resin composition
KR20090098416A (en) Alkaline developing photosensitive binder and the method for processing thereof
TW201710780A (en) Coloring composition for color filter, color filter and image display element
JP2008248144A (en) Curable resin composition
WO2023119900A1 (en) Photosensitive resin composition and color filter
JP6872918B2 (en) Polymers and their uses