TW200428162A - Exposure method for exposure device - Google Patents

Abstract

An exposure method for an exposure device has a good integrated accuracy of a substrate and a photomask and a short process time in performing exposure to a substrate rapidly. The invented method uses a substrate integrated with an integration mark and a patterned photomask having a photomask mark, and performs exposure in a state where the photomask is tightly connected to the substrate. The invented method comprises: using the photomask mark as a basis to obtain a point MA where the diagonal lines of half region of the photomask intersect, and a point MB where the diagonal lines of the whole region of the photomask intersect; using the integration mark as a basis to obtain a point WA where the diagonal lines of half of the region of the substrate intersect, and a point WB where the diagonal lines of the whole region of the substrate intersect; performing a comparison process of comparing the MB point of the photomask mark with the WB point of the integration mark; performing a determination process of determining whether the WB point of the integration mark relative to the MB point of the photomask mark is within a tolerance range; and irradiating the exposure light on the whole substrate when the determined result from the determination process falls within the tolerance range.

Description

200428162

[Technical field to which the invention belongs] The present invention relates to an exposure method for a printed electrophotographic mask, particularly an exposure method of an exposure device based on light work. [Prior art] Substrates such as circuit boards, liquid crystal substrates, etc. Traditionally, when manufacturing a printed circuit board, an exposure device is used to integrate a photomask provided with a circuit pattern and a substrate, and then the two are irradiated with exposure light, and the circuit pattern is burned on the substrate. Such an exposure device includes a base on which a substrate is placed, a photomask having a predetermined pattern for exposing the substrate on the base and located on the top of the base, an integrated moving device for integrally moving the photomask or the substrate, and the photomask and the substrate. An optical system consisting of an exposed light source and a mirror. In addition, the substrate and the photomask are divided into arbitrary areas (for example, four areas). The entire integration of the substrate is performed first, and then the integration of each area is performed. The exposure operation is performed sequentially from the area where the integration is completed, and this action is repeated. This exposure method is known (for example, refer to Patent Document 1). Then, when the whole of the plurality of patterns is exposed, the individual barycenter positions of the areas to be exposed and the entire barycenter positions are measured, and based on the measurement data, corrections are made based on the individual reference position information of the multiple areas. Based on the revised data, a method of exposing individual patterns is proposed (for example, refer to Patent Document 2). Patent Document 1 Japanese Patent Application Laid-Open No. 1 1-1 9 4 5 0 7 (paragraph ο 〇 11 ～ 0 〇 i 4, FIG. 3

ZUU42 ^ 162 Five Invention Descriptions (2) Patent Document No. 2000-1223〇3 The problem to be solved by the invention (Wang Wen) However, the integration of the patent and the substrate is described in the patent. The initial integration from the completion of integration :; arbitrary; the domain is properly adjusted in sequence, the entire exposure of the entire substrate: in the state m divided into four regions, three integration processes must be performed, ", the region performs 2: In the beginning, it was passed through the mask and the substrate of the substrate !; Γ: between. It is necessary to integrate the individual areas: the entire substrate is described in Patent Document 2; the difference will become larger. The position of the center of gravity and the second: Middle 'Because it is the number of exposures f to be measured, based on the individual ΓΐΞ settings of the multiple areas: the measurement data is based on the exposure of the individual exposed patterns, which requires Japanese p 卩' It is estimated that if the printed substrate is exposed, it will be used in close contact with the substrate and the first place is generally used. It is difficult to directly expose the pattern of the cover. [Summary of the Invention] One of the above exposure equipment The purpose of placing the mounting brackets, i 4 is to provide if 2 '11 with a photomask to solve the problem from a substrate with high accuracy and short manufacturing process: the segment can quickly expose the entire substrate. Means, the eye-spine method for exposing and developing the present invention integrates a plurality of ^ clothes sets for the front opening ^, a substrate, and a

2036-6293-PF (N2) .ptd Page 7 200428162 V. Description of the invention (3)

A photomask with a predetermined pattern and a photomask provided to align with the above-mentioned integrated mark, and in a state where the photomask is in close contact with the substrate, includes the following processes: Based on the photomask mark, the above is obtained The process of dividing points by which the diagonal lines of one and a half areas of the mask intersect with each other, and the dividing points of the diagonal lines of the entire mask of the parent by the dividing point BM; based on the above integration mark, the The process of dividing points WA in which the diagonals of half of the areas cross each other, and the process of dividing points ㈣ in which the diagonal lines of the entire substrate cross each other; comparing the points MB of the mask mark with the eight points WB of the integration mark Comparison process; by the result of the above comparison process (the female knife judges whether the point WB of the integration mark with respect to the eight-point MB of the mask mark within the mask mark is within the allowable range); When it is not in the range of Guxu, the exposed light is irradiated to the above-mentioned wide manufacturing process (the first scope of the patent application).

In this exposure method, based on the mask mark, the point-by-point MA of half of the mask and the point-by-point of the entire mask are obtained. Above = the integration mark is used as the basis to determine the point-by-half of the substrate. Point WA, = and the whole point of the substrate by the sub-point WB, (the process of performing the integration operation according to the mask mark and the above integration, or after the sub-points WA, WB are obtained | Enter) and display the mask Comparing the interval between the sub-points M β and the sub-point WB of the integrated mark of the substrate, the entire substrate is exposed to light when it is within the allowable range, so the entire substrate can be exposed with high accuracy. + The exposure method of the exposure device of the present invention includes, in the above-mentioned determination process, when it is judged that the point-by-point WB of the integrated mark with respect to the above-mentioned mask BM is outside the allowable range, it is relative to the above-mentioned mask mark. ^ 'Heart's press

2036-6293-PF (N2) .ptd Page 8 200428162 V. Explanation of the invention (4) The second comparison process according to the sub-point WA compared to the integration mark by the sub-point MA; borrow = ^, the second comparison process to judge the above integration The marked sub-SWA phase 'is based on whether the sub-point MA marked on the above mask is in a permissible standard process; in the above-mentioned second judgment process, it is judged whether it is within a permissible range ^ 2 light :) a process of irradiating the -half area of the substrate (patent application) In this exposure method, the point-by-point WB with respect to the integration mark of the mask is within the permissible range 2. The judgement point MB is compared with the point-by-point outer diameter of the integration mark with respect to the point mark MA. Expose half the area of the substrate, because A is a highly accurate exposure in the half area within the allowable range. For one of the integrated substrates, the exposure process of the exposure device of the present invention includes when determining the entire person ^ Recording method: In the second judgment mask mark, the point-by-point MA is allowed to be equal to the point-by-point WA relative to the above-mentioned discharge process (item 3 of the scope of patent application). In this exposure method, the substrate is discharged. Photomask枳 'Comparison of the points between the points, integration ^ 9 Integration of the points and the substrate by the points will not become a high-quality ginger. In a good condition, due to the exhaustion of the [embodiment] #degree difference of invalid exposure. The following' The embodiment of the present invention will be described with reference to the drawings. * ^ The actuality of the exposure method of Pei Zhi The present invention is a substrate with integrated marks for positioning of an exposure device, and a combination of a plurality of mask marks with a predetermined pattern. The ", ^ Yuan car" which is opposite to the integration δ is closely attached to the substrate in the photomask.

ΙΒΗΙ 2036-6293-PF (N2) .ptd Page 9 200428162 V. Description of the invention ^ ^ _: Expose in a sad state. First, for the exposure device that is the basis of the exposure method, in the referenced drawing, the first drawing shows the month of the exposure department. Plan of bit. Fig. 2 is a diagram of the entire exposure device: the main part of the exposure device. Fig. 2 is a schematic diagram showing a mask mark of a photomask. The body diagram. The pattern diagram of the arrangement marked 3a. The fourth diagram is the exposure device diagram; the integration of the substrate is shown in Figs. 1 and 2. The exposure device i includes: 2 images. The photomask 4 on the base of the substrate 3 exposed on the predetermined circuit m, and the photomask 4 is provided with a table 13 for holding the photomask on the substrate 3 (moving mechanism 5⑸, 5C). The pushed photomask 4 is irradiated with light and the substrate 3 is used for the table / table body ^ from the held ^ ^ ^ ^ ^:: The photo device 8 of the shape ^ is controlled by the photo device 8 ^: Controllers such as the alignment of the substrate 3 and the photomask 4), and interrupting the irradiation of the predetermined beam on the substrate 3, Fig. 30 (refer to Fig. 4). Shutters without light rays The mechanism base 2, as shown in FIG. 4, makes the substrate 3 and the photomask 4 close by being circularly moved, and on the first day, it is moved up and down on the base 2, inside the base 2: Not shown: 2 The substrate 3 is fixed with a mechanism. Therefore, the 'substrate 3 is adsorbed on the base 2 system: the suction holes (not shown) are sucked by a pump, etc., and the number of' two = 2 'is carried out. Cause Air acting on the hole

There are three 7ΛΓ abutments 3 that can be set in the X direction and can be adjusted in the X direction.

200428162 V. Description of the invention (6) '" ~ * ---- a " ~~~ ---- = direction, platform 21 integrated with movement, and flat mouth 2 which can integrate movement in Θ direction, also Integration of the substrate 3 and the photomask 4 is performed. The substrate 3 is made of, for example, polyester, polyurethane, epoxy, or the like.

P brush circuit board or liquid crystal substrate. On the edge portion of the surface of the substrate 3, as shown in FIG. 1 of the flute Q .. b, for example, a plurality of integrated marks W (W1 to W6) formed by O-shaped P or round holes are arranged left and right symmetrically (here For six). When this is called "integration mark w, it is collectively called integration mark). 24 of 24. The light-transmitting glass held by the light-shaped mask holder 14 is a predetermined circuit pattern not shown in the cut shape Λ as shown in FIG. There are provided a plurality of (this mark wm ~ W6) H = the 0-shaped mark is integrated by the substrate 3 (also, the entire mask mark M (M1 ~ M6) is called the σ-day mark system mask mark). A cake application pushing mechanism 5 on each side of the mask holder 14 includes a pushing portion arranged on the adjacent sides of the 5A, 5B.% = 5A, 5B, and the driven portion 16, arranged on the opposite side of the pushing portion. In the pushing part 5A, 5B, 5C, the mechanism 5 (5A, 5B, 5C), can be 16. This is caused by appropriately driving the pushing direction (the photomask holder 14 on the left side of the paper in the first figure in the X direction) or the clockwise direction. Or and 2 :: Move in the direction of Θ on the top and bottom of the paper as shown in Figure 1. The vertical direction of the flying vertical axis is shown in Figure 2. The optical system includes ultraviolet rays that irradiate a predetermined wavelength.

2036-6293-PF (N2) .ptd Page 11 200428162 V. Description of the invention (7): Discharge Jiang lamp: 的 and light f 'composed of an elliptical reflector arranged behind the discharge lamp. Plane 7B, 7C and concave mirror 7D reflecting toward a predetermined direction, with 5 舨 evil ",,, f1. F Iyer lens 7E disposed at a predetermined position in the light path of light source 6. Therefore, a flat mirror The light of 7A, 7B, 7C and the concave surface passes through the flyer lens 7E and the substrate 3. Furthermore, on the right side of the light; the reticle 4 is irradiated in parallel in the industry, and the state of light irradiation is good. In the exposure camera I, 8 sets of 4 CCD cameras are fixed on the front end of the wrist that can be moved horizontally. In addition, the second port is thicker than the w direction in the figure to the tiger direction, and the camera 8 provides a mutual distance. Betty is input into the memory part (not shown) of the memory, etc. As shown in Fig. 4, the shutter mechanism 30 is installed near the mask to keep crying 14 'and has a block from the concave seed' and a mouth opening. 14 to keep the shielding plate 32 in and out freely: hold = ;, the shielding plate 32 that emits light and Zeng Lin ^ 第 5ΛΛ = '控The agency 9 includes two data input sections 24, data net 25, 1 material comparison section 26, judgment section ", and exposure signal production. Moreover, it has input devices with keyboard and mouse, etc., (Cathode-Ray Tube) and LCD daylight The control machine made up of crying faces can also be used. To the material input unit 24 ', each of the materials marked with the photographic seal W and the mask mark M is input. The integration of the photo is not necessary. The mask stalk of the photo mask 4 that is input in sequence = ~ ^ is based on the photoelectric conversion of the position information of the photographic device. ^ The integration marks W1 ~ W6 are placed in the shell material. The movement data of the distance of β new movement. 8 sets of decent clothes

V. Description of the invention (8) The data calculation unit 25 takes the position relationship of the combined mark W from the memory shown in the figure. Each input data calculation mask mark M and the calculated position data are stored in the unloaded material at the same time> Zhen Yi Bu 2 5 ， from the capital + bucket # Λ 都 Q / data through the performance tube to turn right — Each specific and specific M:: ί that is integrated by M f Beco input unit 24 and the distance data between mask marks with a mask is used to calculate the integration in the diagonal direction of the ridge or the other side Mark 1 mark: and the mark W of the integrated mark W located in the diagonal direction of the entire substrate 3. Similarly, the data difference section 25 calculates the diagonal angle in the one or half of the mask 4 The sub-points μα of the mask mark μ in the direction, and the sub-points of the mask marks located diagonally in the entire area of the reticle 4, and the above-mentioned sub-points WA, WB, ΜA, and MB are stored as position data. Pictured memory. Comparison of data ° 卩 2 6 Compare the consistency of the mask material M at the individual positions of the integration mark w, and use the points MA and Mβ of the mask mark as the reference value, and correspond to the data corresponding to the reference value. The integration marks of the points by MA and MB were compared by the points of WA and WB. The judging unit 27 judges whether the mask mark M and the integration mark w are within a permissible range with respect to a reference value stored in a memory (not shown) in advance, and also judges the sub-point wb of the entire substrate 3 and the photomask 4 The sub-point MB, or sub-point MA, WB is within or outside the allowable range with respect to the reference value stored in advance in a memory not shown. Then, if the judgment section 27 judges that the mask mark μ and the integration mark w are allowed,

2036-6293-PF (N2) .ptd P.13 5 "Explanation of the invention (9) outside the range" then turn out — ^, enter by the mask pushing mechanism 5 ^ 'transmit the signal to the mask pushing mechanism 5 and thin, If the judging section 27 Hungary t Λ industry. Within the range, the judgment is made with respect to the mask mark M and the integration mark W within the allowable # MB, the WB within the allowable range of two points MB, and the point-by-point leopard, and the signals for exposure are provided by the points. In this case, the exposure signal generating unit 28 rounds out g :: 27 judged by the exposure signal generation unit WB out of the allowable range, compared with the judgment by the points MB and the judgment by the points', and the signals by the points MA, the two points MA, and the points, When the position of the wheel area is within the range of noon as shown in FIG. 4, the position of the wheel area is shielded, and at the same time, the structure 30 is actuated and the exposure is not performed. The irradiation light from the light source 6 is irradiated, and then the 'determination unit 27' judges that the substrate 3 is output from the substrate, a conveyance device such as a machine within an allowable range, when it is judged that it is outside the point Ma. σ 2 is conveyed through an unillustrated process. Next, a description will be given of the flow of an oblique exposure method according to FIG. 6 and other drawings. -Ten pairs of exposure apparatus of the present invention First, as shown in FIG. 2, the substrate 3 is moved into the base 2 of the exposure apparatus i by removing the first device; the conveyer or the like is transported in the adsorption state T 'to make the base The stage 2 moves up, and vacuum-sealed in a state where the substrate 3 of the base 2 is oriented. Make the soil plate 3 and the photomask 4 "" The second cover: when making vacuum tight contact with the substrate 3, as shown in Fig. 1, each of the shirts I is moved from the retracted position to the photomask ^ ^ This will be about the mask mark. And the integration and integration mark please /, positive. &Amp; 屺 W position information entered 2036-6293-PF (N2) .ptd page 14 200428162 V. Description of the invention (10) to Goods input section 2 4 (refer to FIG. 5) ^, since the mask marks ~ W 6 of the photo mask 4 enter the mask marks M 2, M 4, the light M 6 and the mask mark M 1 of the data input section. As shown in Figure 3, Figure 5 and Figure 6 from M1 to M6 and the integrated marking of substrate 3, 1 2 4 'Mask mark of mask 4% 1, 2 mask marks M4, M5, light Mask marks M5 to M6, mask marks M2 and M5: ^ ... 二 = dry selection? ^ ^ ^-Μ Mask ^ " The distance between Μ3 and Μ4 'is entered as a lean material. Data input unit 24. η 2: Integration marks W1 and W2 of the substrate 3, integration marks W2 and W4, 3 private records between W4 and W5, integration marks W5 and ff6, records W1 and W6, whole person 々Wo 虹 日 日 ⑼ Μ and Yukou Know Li, # & I. In private, the distance between the integrated marks W3 and W4 is input to the data input unit 24 as the distance data. (S 1) — ^ Then, the distance data input to the data input unit 24 is used to predict The different part 25 plays different mask marks M2 and M4. F, M3, M5 are the mask marks, knife μ4, and the distance between the farthest positions of the whole mask 4, and the points between the points of " t 2; M6. MB. At the same time, in the data calculation department 25, the private points W2, W4, W3, W5 are divided by the point WA, and the integration mark w 丨, W4, which is the furthest from the entire substrate 3, is integrated. The point-by-point WB between W3 and W6, and the point-and-point MA and Mβ data calculation unit 25. (S2) I have thought about it by moving the substrate 3 and the photomask 4 placed on the base 2 Of the integration mechanism of the promotion mechanism 5 (5A, 5B, 5C), the whole cooperation =: mask mark and integration mark (s 3). ', Then' (the next point of the mask in the calculation department 2 5) The information of the sub-point WB of the information board is used to make the integration move in the integration operation ^

2036-6293-PF (N2) .ptd 200428162

The comparison is made in the shell material comparison section 26 (comparison process) 5. The description of the invention (i) The data of the mask mark M (S4). The result of the comparison is determined in the judgment section 27 ^ ^ ^ > — (judgment process, S5), if the photomask is within the allowable range ^ 卓 * 圮 mb and the integration mark WB are within the predetermined range (YES) Since the entire substrate 3 can be irradiated with the exposure light: == a signal from the judgment unit 27, the exposure light is irradiated to the entire substrate 3 by the exposure signal generation unit 28 (%). Wang + Fan w — Aspect 'If the judgment of step S5 falls within the allowable range (N0), the mask mark of the calculation section 25 is classified by the sub-point data and the integrated mark is known as the knife point. WA Feed is provided by the shell material comparison section. 26 for comparison (second comparison process, S7). The result of the comparison is judged by the judging section 27 (the second judging process, S8 is right within a predetermined allowable range (YES), because the area WA of the substrate 3 can be exposed, and by the signal from the judging section 27, When the exposure signal generating section 28 generates the exposure signal, the shutter plate 2 of the shutter mechanism 30 is actuated to cover other non-exposed areas, and only the area a shown in the figure is exposed (S9). If judged in step S8 Outside the predetermined allowable range (No), the unexposed substrate 3 is discharged (S1 0). When the exposure is performed, the imaging device is retracted to avoid interference. As described above, the substrate 3 is first divided into two For each area, calculate the integration marks WA, W4, and integration marks 0 and W5 in the diagonal direction of the area A on one side, and then use the entire substrate 3 as the target. Similarly, calculate the separation points WB and the photomask. According to the comparison of the sub-points MA and MB, and then the exposure is performed, a highly accurate exposure can be obtained.

2036-6293-PF (N2) .ptd Page 16 200428162 V. Explanation of the invention (12) In addition, the present invention does a whole exposure of the substrate 3 due to a small number of processes, while improving production efficiency, even if only exposure should be performed Half of the area A of the substrate 3 is exposed only at the points WA corresponding to the photomask, and the substrate material can be effectively used. Advantageous Effects of the Invention The present invention first divides the substrate 3 into two regions, and calculates the point-by-point WA between the integration marks located in the diagonal direction of the area A on one side, and then calculates the point-by-point WB similarly for the entire substrate. The exposure of the reticle according to the sub-matrix MA and MB can obtain a highly accurate exposure. The present invention can expose the entire substrate with a small number of processes. At the same time that the production efficiency is improved, even if only half of the substrate A that should be exposed is exposed, the exposure is performed because the sub-point WA is consistent with the photomask, and the substrate can be effectively used. material.

Page 17 200428162 Brief Description of Drawings Fig. 1 is a plan view of a main part of an exposure apparatus according to an embodiment of the present invention. Fig. 2 is a perspective view of the entire exposure apparatus according to an embodiment of the present invention. Fig. 3a is a schematic diagram showing the arrangement of the mask marks. Fig. 3b is a schematic diagram showing the arrangement of integrated marks on the substrate. FIG. 4 is a side view of an exposure apparatus according to an embodiment of the present invention. FIG. 5 is a system configuration diagram of the exposure apparatus of the present invention. Fig. 6 is a flowchart showing an embodiment of an exposure method of the exposure apparatus of the present invention. DESCRIPTION OF SYMBOLS 1 ~ exposure device; 2 ~ base; 3 ~ substrate; 4 ~ photomask; 5 ~ photomask pushing device; 5A, 5B, 5C ~ pushing part;

2036-6293-PF (N2) .ptd Page 18 200428162 Schematic description of 1 6 ~ follower; 20 ~ X direction integrated mobile platform; 21 ~ y direction integrated mobile platform; 22 ~ 0 direction integration Mobile platform; 2 4 ~ data input unit; 2 5 ~ data calculation unit; 2 6 ~ data comparison unit; 2 7 ~ judgment unit; 2 8 ~ exposure signal generation unit; 3 0 ~ shutter mechanism; 3 1 ~ hold 3 2 ~ shielding plate; Μ (Ml ~ M6) ~ mask mark; MA ~ by sub-point (by sub-point in the half area of the mask), MB ~ by sub-point (by sub-point in the half area of the mask); W (W1 ~ W6) ~ integrated mark; WA ~ by points (by points in the half area of the substrate), WB ~ by points (by points in the half area of the substrate).

2036-6293-PF (N2) .ptd Page 19

Claims (1)

200428162 6. Scope of patent application 1. A kind of integrated marking mask mark and stating that the shape of the substrate intersects each other with the above-mentioned diagonal lines and each other with the above-mentioned diagonal lines and each other and compares the above WB by the above For the above-mentioned light process; and irradiating on the above line 2. As stated in the method, it is more judged to compare the sub-point MB with the sub-point ΜA compared with the substrate of the upper exposure device by the upper W Α to set a predetermined map In the current state, the exposure mask is marked as a cross-pressed point-by-point MB. The integration mark is a cross-pressed as a point-by-point WB mask mark. The comparison process is described by the comparison process. The following processes are included: the above integration mark is within the allowable range, the above integration mark is described, the second comparison is the mask mark exposure method, and a photomask having a plurality of positioning and having a case for alignment with the above integration mark is integrated. Adhering to the glazing includes the following processes: Basically, to find the half-point MA of the half of the mask, and the diagonal system of the entire mask. Based on the process of obtaining the sub-area WA of one half of the substrate and the diagonal of the entire substrate; judging the sub-point ^ B of the integration mark by the sub-point MB and the sub-point by the integration mark ^ B The judgment of whether B is within the allowable range is a process of light exposure when the allowable range is within the allowable range. A second comparison process of the exposure point of the exposure device described in the first item when the point-by-point WB is out of the mask mark, and the point-by-point point WA of the mask mark is compared; the process determines the above Whether the point-by-point MA of the integration mark is within the permissible range. Page 20 200428162 6. Scope of patent application 2. Judgment process; When the second judgment process judgement is within the allowable range, the process of irradiating the exposed light to a half area of the substrate. 3. The exposure method of the exposure device according to item 2 of the scope of patent application, wherein in the second judgment process, it is included when judging the point by point WA of the integrated mark relative to the point by point M A of the mask mark is When it is within the allowable range, the above-mentioned substrate discharge process is performed. 2036-6293-PF (N2) .ptd Page 21