200426306 玖、發明說明： 【發明所屬之技術領域】 本發明是關於具備將排氣對象空間進行排氣到預定的 真空度之泵機構部與用以驅動該泵機構部的電動馬達部之 真空泵的控制裝置。 【先前技術】 習知已知有對用以進行晶圓（基板）的成膜處理等的製 程反應室（process chamber)(處理室）倂設真空隔絕室（1〇&(3-1 〇 c k c h a m b e r)之型式的半導體製造裝置（例如參照專利文獻 1)。 在此裝置中，在製程反應室與半導體製造裝置的外部 之間的晶圓交換係經由此真空隔絕室來進行。在真空隔絕 室，用以使該反應室成爲預定的真空度之真空泵係經由開 關閥而被連接。此開關閥係作成可藉由來自外部的操作等 而壓力地斷絕真空隔絕室與真空泵的構造。 在前述晶圓交換時的真空隔絕室與製程反應室之間的 晶圓的往來係在真空隔絕室與半導體製造裝置的外部被壓 力地遮斷且藉由真空泵設定爲預定的真空度之狀態下進 行。另一方面，在真空隔絕室與半導體製造裝置的外部之 間的晶圓的往來係在真空隔絕室與製程反應室被壓力地遮 斷且返回到大氣壓的狀態下進行。 而且’正當在真空隔絕室與半導體製造裝置的外部之 間的晶圓交換作業進行中，藉由在真空隔絕室與被壓力地， 遮斷的製程反應室進行成膜處理等，以謀求半導體製造中 的作業效率的提高。 200426306 當再度將在大氣壓狀態下的真空隔絕室減壓到預定的 真空度時，藉由令開關閥由閉狀態成爲開狀態，使真空隔 絕室與真空泵連通而進行排氣。此時，對於在真空泵被驅 動的狀態下開關閥由閉狀態被切換成開狀態的情形，由於 真空泵內由前述的預定的真空度急遽地升壓到大氣壓，使 真空泵的壓力負荷（與排氣有關的壓力負荷）急增。真空泵 的驅動源使用電動馬達的情形，在此真空泵中伴隨著前述 壓力負荷的急增，電動馬達的輸出轉矩（即真空泵的負荷轉 矩）會急增。 這種情形例如爲了避免起因於真空泵的負荷轉矩過大 使真空泵的構成構件破損等，可考慮使用控制裝置控制電 動馬達使真空泵的負荷轉矩不超過預定的上限値。此控制 樣態例如可舉第2(a)圖以及第2(b)圖的時間圖（time chart) 所示者。第2(a)圖中的線第91圖係顯示電動馬達使用同步 馬達型的無刷馬達（b r u s h 1 e s s m 〇 t 〇 r)的情形的驅動頻率。而 且，第2(b)圖中的線第92圖係顯示給同一電動馬達的供給 電流的電流値。此電流値與電動馬達的輸出轉矩即真空泵 的負荷轉矩的大小係互相關聯。 如此時間圖所示，若在時間點11中進行由前述開關閥 的閉狀態到開狀態的切換，則伴隨著根據此切換的真空泵 的壓力負荷的急增，給電動馬達的供給電流的電流値會急 增（即真空泵的負荷轉矩會急增）。 控制裝置若在時間點t2中判斷爲電動馬達的電流値達 預定的上限値i2，則由高速側（電動馬達的旋轉速度中的高 速側）的驅動頻率fmax朝低速側的驅動頻率fmin激減。由 200426306 於此驅動頻率的減少造成電動馬達的旋轉速度降低使真空 泵的壓力負荷的增加被抑制，伴隨於此使電動馬達的輸出 轉矩即真空泵的負荷轉矩不超過預定的上限値（對應供給 電流的上限値i2的轉矩的上限値）而被限制。 【專利文獻1】 日本特開平9-306972號公報（第3頁第1圖） 【發明內容】 但是在前述的控制樣態中，即使能避免起因於真空泵 的負荷轉矩過大之真空泵的構成構件的破損，在由開關閥 的閉狀態到開狀態的切換時負荷轉矩的急增（急遽的上升） 也會發生。此時，在上升的開始時間點11的前後，負荷轉 矩的增加速度產生大的差，即負荷轉矩的增加速度的急遽 的上升變動發生’並且該增加速度大的狀態係持續到電動 馬達的電流値達預定的上限値i 2爲止。即在前述的控制樣 態中，即使能避免真空泵的負荷轉矩過大，也會有因負荷 轉矩的增加速度的急遽的上升變動，或在此上升變動後前 述增加速度大的狀態持續造成真空泵的構成構件受到大的 衝擊之虞。此點成爲前述構成構件到達破壞的原因。 因此，爲了避免前述構成構件的破壞，可考慮應使該 構成構件堅牢的補強等，但如此會有與真空泵的大型化或 重量化有關的情況不佳。 本發明的目的爲提供不招致伴隨著真空泵的補強之大 型化或重量化，可提高前述真空泵的耐久性之真空泵的控 制裝置。 爲了解決上述問題，申請專利範圍第1項所述之真空 200426306 泵的控制裝置係當前述真空泵的每單位時間的負荷轉矩增 加量急遽地上升變動時，進行降低電動馬達部的旋轉速度 之減速控制。 例如在真空泵爲作動狀態時對排氣對象空間導λ外 氣’對於該空間的壓力急上升的情形，伴隨著真空泵的壓 力負荷（與排氣有關的壓力負荷）的增加，電動馬達部中的 輸出轉矩（即真空泵的負荷轉矩）顯示上升傾向。此情形真 空泵的每單位時間的負荷轉矩增加量（真空泵的負荷轉矩 的增加速度）例如由約略爲零的狀態上升變動到超過某大 小的狀態，即有真空栗的每單位時間的負荷轉矩增加量急 遽地上升變動。 本發明的控制裝置係當真空泵的每單位時間的負荷轉 矩增加量急遽地上升變動時，進行降低電動馬達部的旋轉 速度之減速控制。據此，可減小例如因在前述的負荷轉矩 的上升時真空泵的每單位時間的負荷轉矩增加量的急遽的 上升變動，或在此上升變動後真空泵的每單位時間的負荷 轉矩增加量大的狀態持續造成真空泵的構成構件受到的衝 擊。因此，例如爲了提高耐衝擊性也無須補強真空泵的構 成構件，可防止伴隨於此補強的真空泵的大型化或重量 化。 申請專利範圍第2項係在申請專利範圍第1項中根據 給電動馬達部的供給電流値算出前述真空泵的負荷轉矩。 如果依照此發明，爲了檢測真空泵的負荷轉矩，無須 特別配設轉矩感測器等。因此，可有助於成本降低或構造 的簡單化。 200426306 申請專利範圍第3項係在申請專利範圍第1項或第2 項中每一預定時間重複監視前述真空泵的每單位時間的負 荷轉矩增加量。而且，即使在判斷爲真空泵的每單位時間 的負荷轉矩增加量急遽地上升變動後也能繼續進行此監 視。 如果依照此發明，即使在前述減速控制開始後也能依 照真空泵的每單位時間的負荷轉矩增加量的變動適切地控 制電動馬達部的旋轉速度。200426306 (1) Description of the invention: [Technical field to which the invention belongs] The present invention relates to a vacuum pump having a pump mechanism section for exhausting an exhaust target space to a predetermined vacuum degree and an electric motor section for driving the pump mechanism section. Control device. [Prior art] It is known to provide a vacuum isolation chamber (1〇 & (3-1 〇ckchamber) for a process chamber (processing chamber) for performing a film formation process of a wafer (substrate) and the like. ) (See, for example, Patent Document 1). In this device, the wafer exchange system between the process reaction chamber and the outside of the semiconductor manufacturing apparatus is performed through this vacuum isolation chamber. In the vacuum isolation chamber, The vacuum pump for connecting the reaction chamber to a predetermined degree of vacuum is connected via an on-off valve. The on-off valve is configured to be able to pressure-separate the vacuum isolation chamber and the vacuum pump by an operation from the outside, etc. The wafer exchange between the vacuum isolation chamber and the process reaction chamber during the exchange is performed while the vacuum isolation chamber and the outside of the semiconductor manufacturing apparatus are pressure-blocked and set to a predetermined vacuum degree by a vacuum pump. Another On the other hand, the wafer exchange between the vacuum isolation chamber and the outside of the semiconductor manufacturing apparatus is pressure-blocked and returned between the vacuum isolation chamber and the process reaction chamber. It is carried out under atmospheric pressure. Furthermore, during the wafer exchange operation between the vacuum isolation chamber and the outside of the semiconductor manufacturing apparatus, film formation is performed in the vacuum isolation chamber and the pressure-blocked process reaction chamber. Processing, etc., in order to improve the operating efficiency in semiconductor manufacturing. 200426306 When the vacuum isolation chamber under atmospheric pressure is decompressed to a predetermined vacuum degree again, the on-off valve is turned from the closed state to the open state to isolate the vacuum. The chamber communicates with the vacuum pump for exhausting. At this time, in the case where the on-off valve is switched from the closed state to the open state while the vacuum pump is being driven, the inside of the vacuum pump is rapidly increased to the atmospheric pressure from the aforementioned predetermined vacuum degree. The pressure load of the vacuum pump (pressure load related to exhaust gas) is increased sharply. In the case where an electric motor is used as the driving source of the vacuum pump, the output torque of the electric motor (that is, the vacuum pump ’s Load torque) will increase sharply. This situation, for example, to avoid overload torque caused by the vacuum pump It is considered to use a control device to control the electric motor so that the load torque of the vacuum pump does not exceed a predetermined upper limit, such as the damage of the constituent components of the air pump. This control mode can be illustrated in Figures 2 (a) and 2 (b), for example. Shown in the time chart. Line 91 in Figure 2 (a) shows the driving frequency when the electric motor uses a brushless motor of the synchronous motor type (brush 1 essm 〇t 〇r). The line 92 in Figure 2 (b) shows the current 値 of the current supplied to the same electric motor. This current 値 is related to the output torque of the electric motor, that is, the load torque of the vacuum pump. This time As shown in the figure, if the switching from the closed state to the open state of the on-off valve is performed at time point 11, with the sudden increase in the pressure load of the vacuum pump according to this switching, the current of the current supplied to the electric motor will be urgent. Increase (that is, the load torque of the vacuum pump will increase sharply). When the control device determines that the electric current of the electric motor reaches a predetermined upper limit 値 i2 at time point t2, the driving frequency fmax from the high-speed side (high-speed side among the rotation speeds of the electric motor) decreases toward the low-speed side drive frequency fmin. The reduction of the driving frequency caused by the reduction of the driving frequency of 200426306 reduces the increase in the pressure load of the vacuum pump. With this, the output torque of the electric motor, that is, the load torque of the vacuum pump does not exceed a predetermined upper limit 値 (corresponding to the supply The upper limit of the current (i2 the upper limit of the torque 値) is limited. [Patent Document 1] Japanese Patent Application Laid-Open No. 9-306972 (Page 3, Figure 1) [Summary of the Invention] However, in the aforementioned control mode, even a constituent member of a vacuum pump that causes excessive load torque of the vacuum pump can be avoided In the case of damage, a sudden increase in load torque (a sharp rise) also occurs when switching from the closed state to the open state of the on-off valve. At this time, before and after the start time 11 of the rise, a large difference occurs in the increase speed of the load torque, that is, a sharp increase in the increase speed of the load torque occurs, and the state of the increase speed continues to the electric motor The current 値 reaches a predetermined upper limit 値 i 2. That is, in the aforementioned control mode, even if the load torque of the vacuum pump can be prevented from being excessively large, there will be a sudden increase in the speed due to the increase in the load torque, or the state of the increase in the speed will continue to cause the vacuum pump after this increase and change. There is a risk that the constituent members of the device will be greatly impacted. This point is the cause of the destruction of the aforementioned constituent members. Therefore, in order to avoid damage to the aforementioned constituent members, it may be considered that the constituent members should be stiffened and reinforced. However, this may be unfavorable in connection with an increase in size or weight of the vacuum pump. An object of the present invention is to provide a control device for a vacuum pump capable of improving the durability of the vacuum pump without incurring an increase in size or weight of the vacuum pump. In order to solve the above-mentioned problem, the control device of the vacuum 200426306 pump described in the first item of the patent application scope is to reduce the rotation speed of the electric motor when the increase in the load torque per unit time of the vacuum pump rises rapidly. control. For example, when the vacuum pump is in an operating state, the lambda outside air is conducted to the outside space. The pressure of the space suddenly rises. As the pressure load of the vacuum pump (the pressure load related to exhaust gas) increases, the The output torque (ie, the load torque of the vacuum pump) shows an upward trend. In this case, the increase in the load torque per unit time of the vacuum pump (the increase speed of the load torque of the vacuum pump), for example, rises from a state of approximately zero to a state exceeding a certain size, that is, the load per unit time of the vacuum pump is changed. The amount of moment increase sharply increased. The control device of the present invention performs deceleration control for reducing the rotation speed of the electric motor unit when the load torque increase amount per unit time of the vacuum pump rises sharply and fluctuates. This makes it possible to reduce, for example, a sudden increase in the increase in load torque per unit time of the vacuum pump during the aforementioned increase in load torque, or an increase in the load torque per unit time of the vacuum pump after the increase in fluctuation. The large amount of state continues to cause shocks to the constituent members of the vacuum pump. Therefore, for example, it is not necessary to reinforce the constituent members of the vacuum pump in order to improve the impact resistance, and it is possible to prevent the increase in size and weight of the vacuum pump accompanying the reinforcement. Item 2 of the scope of patent application refers to the calculation of the load torque of the vacuum pump based on the current supplied to the electric motor unit in the scope of the first scope of patent application. According to this invention, in order to detect the load torque of the vacuum pump, it is not necessary to provide a torque sensor or the like. Therefore, it can contribute to cost reduction or simplification of the structure. 200426306 Item 3 of the scope of patent application refers to repeatedly monitoring the increase in load torque per unit time of the aforementioned vacuum pump every predetermined time in item 1 or 2 of the scope of patent application. This monitoring can be continued even after it is determined that the amount of increase in load torque per unit time of the vacuum pump has increased sharply. According to this invention, even after the aforementioned deceleration control is started, the rotation speed of the electric motor section can be appropriately controlled in accordance with the variation in the load torque increase amount per unit time of the vacuum pump.
申請專利範圍第4項係在申請專利範圍第1項至第3 項中任一項中當前述真空泵的每單位時間的負荷轉矩增加 量比預定値還大時，判斷爲真空泵的每單位時間的負荷轉 矩增加量急遽地上升變動，進行前述減速控制。Item 4 of the scope of patent application is in any of the items 1 to 3 of the scope of patent application. When the increase in load torque per unit time of the aforementioned vacuum pump is greater than a predetermined value, it is judged to be per unit time of the vacuum pump. The increase amount of the load torque increases sharply, and the aforementioned deceleration control is performed.
如果依照此發明，比較例如根據預定的時間點中的真 空泵的每單位時間的負荷轉矩增加量與前述預定的時間點 在另外的預定的時間點的前述負荷轉矩增加量的差’進行 減速控制的樣態，可省略用以算出前述差的處理。即可減 輕控制裝置中的處理負擔。 申請專利範圍第5項係在申請專利範圍第1項至第3 項中任一項中當前述真空泵的每單位時間的負荷轉矩增加 量的變化率比預定値還大時，判斷爲真空泵的每單位時間 的負荷轉矩增加量急遽地上升變動，進行前述減速控制。 如果依照此發明，比較例如根據真空泵的每單位時間 的負荷轉矩增加量進行減速控制的樣態，針對真空泵的每 單位時間的負荷轉矩增加量，在預定時間之間有多少變化 可更正確地被把握。此外，次處所謂的[真空泵的每單位時 -10- 200426306 間的負何轉矩增加量的變化率]係顯示真空泵的每單位時 間的負荷轉矩增加量在每一單位時間變化多少。 申請專利範圍第6項係在申請專利範圍第4項或第5 項中進行應使前述真空泵的每單位時間的負荷轉矩增加量 朝預定的目標値降低的前述減速控制。 如果依照此發明，使真空泵的每單位時間的負荷轉矩 增加量朝預定的目標値接近或一致而控制。藉由此控制， 可謀求在真空栗的負荷轉矩的上升時每單位時間的負荷轉 矩增加量的降低。 申請專利範圍第7項係在申請專利範圍第5項中進行 應使前述真空泵的每單位時間的負荷轉矩增加量的變化率 朝預定的目標値降低的前述減速控制。 如果依照此發明，使真空泵的每單位時間的負荷轉矩 增加量的變化率朝預定的目標値接近或一致而控制。因 此’可減小真空泵的構成構件所受的衝擊之中起因於真空 泵的每單位時間的負荷轉矩增加量的變化率的衝擊。 申請專利範圔第8項係在申請專利範圍第1項至第7 項中任一項中進行電動馬達部的控制使前述真空泵的負荷 轉矩不超過預定的上限値。 如果依照此發明，因作用於真空泵的負荷轉矩的最大 値被限制，故可避免因過大的負荷轉矩造成的真空泵的構 成構件的變形或破損等。 申請專利範圍第9項係在申請專利範圍第1項至第8 項中任一項中以同步馬達型或感應馬達型的無刷馬達構成 前述電動馬達部。 -11 - 200426306 如果依照此發明，與附電刷（brush)馬達比較，可容易 使電動馬達部成爲耐久性高者。而且，不管作用於真空泵 的負荷轉矩的大小，藉由調節供給電流的驅動頻率可調節 電動馬達部的旋轉速度。此情形藉由給電動馬達部的供給 電流的驅動頻率在電動馬達部的旋轉速度的低速側被變更 (即減少），使電動馬達的旋轉速度下降，伴隨於此，真空 泵中的壓力負荷降低，真空泵的負荷轉矩的增加速度可被 降低。 申請專利範圍第1 0項係在申請專利範圍第1項至第9 項中任一項中前述真空泵係在半導體製造裝置中以倂設於 製程反應室的真空隔絕室爲排氣對象空間。 真空隔絕室由於是成爲在包圍例如半導體製造裝置的 大氣壓空間與製程反應室之間往來工件（work)時的中繼點 之反應室，故真空隔絕室有頻繁地進行由預定的真空度昇 壓到大氣壓的傾向。即在進行真空隔絕室的排氣的真空泵 中，伴隨著其壓力負荷（與排氣有關的壓力負荷）的急增之According to this invention, for example, the speed reduction is performed based on the difference between the load torque increase amount per unit time of the vacuum pump at a predetermined time point and the aforementioned load torque increase amount at another predetermined time point at the predetermined time point. In the aspect of control, the processing for calculating the aforementioned difference can be omitted. This reduces the processing load on the control unit. Item 5 of the scope of patent application is in any of the items 1 to 3 of the scope of patent application. When the change rate of the load torque increase per unit time of the aforementioned vacuum pump is greater than the predetermined value, it is determined that the The load torque increase amount per unit time sharply rises and fluctuates, and the aforementioned deceleration control is performed. According to this invention, for example, it is more accurate to compare how the deceleration control is performed based on the increase in load torque per unit time of the vacuum pump with respect to the increase in load torque per unit time of the vacuum pump between predetermined times. The ground is grasped. In addition, the so-called [change rate of negative torque increase amount per unit hour of vacuum pump -10- 200426306] shows how much the load torque increase amount per unit time of the vacuum pump changes per unit time. Item 6 of the scope of patent application is the aforementioned deceleration control in which the increase in load torque per unit time of the aforementioned vacuum pump is lowered toward a predetermined target 在 in item 4 or 5 of the scope of patent application. According to this invention, the increase in the load torque per unit time of the vacuum pump is controlled to be close to or consistent with a predetermined target value. With this control, when the load torque of the vacuum pump increases, the load torque increase per unit time can be reduced. Item 7 of the scope of patent application is the aforementioned deceleration control in which the rate of change of the load torque increase per unit time of the aforementioned vacuum pump is decreased toward a predetermined target 値 in item 5 of the scope of patent application. According to this invention, the change rate of the load torque increase amount per unit time of the vacuum pump is controlled to be close to or consistent with a predetermined target value. Therefore, it is possible to reduce the impact due to the change rate of the load torque increase amount per unit time among the impacts to the constituent members of the vacuum pump. Item No. 8 of the patent application is controlled by the electric motor unit in any one of the items No. 1 to No. 7 of the patent application scope so that the load torque of the vacuum pump does not exceed a predetermined upper limit. According to this invention, since the maximum torque 的 of the load torque acting on the vacuum pump is limited, it is possible to avoid deformation or damage of the constituent members of the vacuum pump due to excessive load torque. Item 9 of the scope of patent application is that the electric motor section is constituted by a brushless motor of a synchronous motor type or an induction motor type in any of the items 1 to 8 of the patent application scope. -11-200426306 According to this invention, compared with a brush motor, it is easy to make the electric motor unit a high durability. Furthermore, regardless of the magnitude of the load torque acting on the vacuum pump, the rotation speed of the electric motor section can be adjusted by adjusting the driving frequency of the supplied current. In this case, the driving frequency of the electric current supplied to the electric motor unit is changed (ie, reduced) on the low speed side of the rotation speed of the electric motor unit, so that the rotation speed of the electric motor is reduced. As a result, the pressure load in the vacuum pump is reduced. The increase speed of the load torque of the vacuum pump can be reduced. Item 10 of the scope of patent application refers to the aforementioned vacuum pump in any one of the scope of claims 1 to 9 of the scope of patent application. In the semiconductor manufacturing device, a vacuum isolation chamber provided in a process reaction chamber is used as an exhaust target space. The vacuum isolation chamber is a reaction chamber that serves as a relay point between work atmospheres between the atmospheric pressure space surrounding the semiconductor manufacturing device and the process reaction chamber. Therefore, the vacuum isolation chamber is frequently boosted by a predetermined degree of vacuum. Tend to atmospheric pressure. That is, in the vacuum pump for exhausting the vacuum isolation chamber, the pressure load (the pressure load related to the exhaust gas) has increased sharply.
負荷轉矩的急增可頻繁地發生。因此，在這種樣態中具體 化申請專利範圍第1項至第9項中任一項的發明，謀求真 空泵的耐久性的提高特別有效。 【實施方式】 以下針對使用於半導體製造裝置中的真空隔絕室的排 氣用的真空泵的實施形態來說明本發明。 如第1圖所示，在半導體製造裝置11中製程反應室12 係倂設於真空隔絕室1 3。在製程反應室1 2中進行例如對晶 圓的真空蒸鍍處理或濺鍍（sputtering)處理等的成膜處理。 -12- 200426306 這些處理係使用未圖示的排氣手段在使製程反應室1 2成 爲預定的真空度後進行。 在半導體製造裝置11的外部空間（大氣壓空間）與製程 反應室1 2之間的晶圓交換係經由真空隔絕室1 3來進行。 即在兩反應室1 2、1 3之間設置有用以進行前述晶圓交換中 的晶圓的往來之路徑，在此路徑的途中配設有可壓力地斷 絕兩反應室12、13間的閘閥（gate valve) 14。再者在半導體 製造裝置11於真空隔絕室13與半導體製造裝置11的外部 空間之間設置有用以進行前述晶圓交換中的晶圓的往來之 路徑，在此路徑的途中配設有可壓力地斷絕真空隔絕室1 3 與前述外部空間的閘閥1 5。 在半導體製造裝置11經由排氣路徑16連接有真空泵 20。真空泵20係以真空隔絕室1 3作爲排氣對象空間。在 排氣路徑1 6的途中配設有藉由來自外部的操作等可壓力 地斷絕真空隔絕室1 3與真空泵20的開關閥1 7。 而且，真空隔絕室1 3經由外氣導入路徑1 8與半導體 製造裝置1 1的外部空間連通。在外氣導入路徑1 8的途中 配設有藉由來自外部的操作等可壓力地斷絕真空隔絕室1 3 與前述外部空間的開關閥1 9。 真空泵20具備：進行真空隔絕室1 3的排氣到所需的預 定的真空度之該反應室1 3的排氣之泵機構部2 1，與驅動此 泵機構部21用的電動馬達部22。電動馬達部22係由同步 馬達型的無刷馬達具體上爲無刷DC馬達所構成，藉由來 自構成控制裝置的反相器3 0的供電而被驅動。電動馬達部 22藉由來自反相器30的供給電流中的驅動頻率（旋轉速度 -13- 200426306 指令値）被調節，使該旋轉速度被調節。 此外’在本實施形態中電動馬達部2 2藉由反相器3 0 以一定的電壓被驅動，並且給電動馬達部22的供給電流的 電流値（供給電流値）與電動馬達部22的輸出轉矩即真空泵 20的負荷轉矩的大小係互相關聯。 反相器30具備類似電腦的電子控制單元的ECU31以及 電流檢測器32。ECU31以及電流檢測器32構成馬達控制手 段。電流檢測器32檢測給電動馬達部22的供給電流的電 流値，將此檢測資訊提供給ECU3 1。電流檢測器3 2構成檢 測給電動馬達部2 2的供給電流的電流値之檢測手段。 ECU 3 1根據由電流檢測器3 2提供的檢測資訊調節給電動馬 達部22的供給電流中的驅動頻率。 ECU31根據來自電流檢測器32的檢測資訊（給電動馬 達部22的供給電流値）算出電動馬達部22的輸出轉矩即真 空泵20的負荷轉矩。再者，ECU31據此算出真空泵20的 每單位時間的負荷轉矩增加量（以後方便上稱此爲真空泵 20的負荷轉矩的增加速度）。ECU31係每一預定時間重複監 視真空泵20的負荷轉矩的增加速度。 而且，ECU31若判斷爲真空泵20的負荷轉矩的增加速 度比預定値還大，則判斷爲真空泵20的負荷轉矩的增加速 度發生急遽的上升變動。藉由此判斷，ECU31變更即減少 (減速控制）給應降低真空泵20的負荷轉矩的增加速度之電 動馬達部22的供給電流中的驅動頻率爲低速側（電動馬達 部2 2的旋轉速度中的低速側）。 ECU3 1即使在判斷爲真空栗20的負荷轉矩的增力口速度 -14- 200426306 急遽地上升變動後仍繼續進行真空泵20的負荷轉矩的 加速度的監視。更具體地說的話，本實施形態的ECU3 1 只要該ECU31在作動狀態就會繼續重複實行前述的監視 而且，E C U 3 1藉由前述的監視判斷爲真空泵2 0的負荷轉 的增加速度急遽地上升變動的情形進行前述減速控制， 且維持藉由此控制而減少的前述驅動頻率到判斷接著增 速度是否比預定値還大的時間（timing)爲止。 而且，ECU31在判斷爲真空泵20的負荷轉矩的增加 度急遽地上升變動的情形下，只要優先於該減速控制的 理（例如後述的應進行的調節處理使給電動馬達部22的 給電流値不超過上限値i2)不進行就重複實行前述減速 制。 其次，針對如前述構成的真空泵20的作用一邊參照 2(a)圖以及第2 (b)圖的時間圖，一邊說明。第2(a)圖中 線第5 1圖係顯示給電動馬達部22的供給電流中的驅動 率。而且，第22(b)中的線第52圖係顯示給電動馬達部 的供給電流値。 在製程反應室1 2與真空隔絕室1 3之間的晶圓的往 的作業係藉由真空泵20使真空隔絕室1 3與製程反應室 成爲相同的預定的真空度，並且在閘閥1 4被打開的狀態 進行。此時，閘閥1 5以及開關閥1 9成爲關閉的狀態。 而且，在真空隔絕室13與半導體製造裝置π的外 空間之間的晶圓的往來的作業係在閘閥1 4、1 5被關閉的 態下使開關閥1 9被打開，在真空隔絕室丨3成爲與前述 部空間一樣的壓力（大氣壓）的狀態下使閘閥1 5被打開而 增 係 〇 矩 並 加 速 處 供 控 第 的 頻 22 來 12 下 部 狀 外 進 -15- 200426306 行。此時，開關閥17被關閉。 而且，例如在將晶圓傳入真空隔絕室1 3後藉由真空泵 20使真空隔絕室13成爲預定的真空度時，在真空泵20即 電動馬達部22被驅動的狀態下開關閥1 7被打開，開始真 空隔絕室13的排氣。第2(a)圖以及第2 (b)圖中的時間點tl 係顯示開關閥1 7被打開的時間點，到此時間點爲止ECU3 1 以问速側（電動馬達部2 2的S疋轉速度中的局速側）的驅動頻 率fmax驅動電動馬達部22。 此外，在時間點11以前因開關閥1 7爲閉狀態，故真空 泵2 0的壓力負荷（與排氣有關的壓力負荷）大約爲零，給電 動馬達部22的供給電流在最小的電流値i 1推移。 在時間點11中若開關閥1 7被打開，則藉由大氣壓狀態 下的真空隔絕室1 3內的氣體急速被導入泵機構部2 1，真空 泵20的壓力負荷急增。伴隨於此，電動馬達部22的輸出 轉矩即真空泵20的負荷轉矩顯示上升傾向。即在圖2 (b) 中，顯示電流値由時間點11上升的傾向。此時，電流値的 增加速度即真空泵2 0的負荷轉矩的增加速度爲零（在時間 點11以前係在電流値i 1推移，故電流値的增加速度爲零）， 故上升變動到非零的增加速度。 ECU31根據來自電流檢測器的檢測資訊算出真空栗 20的負荷轉矩的增加速度，若判斷爲此增加速度比預定値 還大的話’判斷爲真空泵20的負荷轉矩的增加速度發生急 遽的上升變動。藉由此判斷，ECU31進行應使負荷轉矩的 增加速度朝預定的目標値（例如對應第2(b)圖所示的直線 6 1的負荷轉矩的增加速度）降低之電動馬達部22的旋轉速 -16- 200426306 度之減速控制。 此時ECU3 1藉由重複實行前述減速控制，使給電動馬 達部22的供給電流中的驅動頻率漸減。藉由此漸減處理， 電動馬達部2 2的旋轉速度慢慢地下降。即驅動頻率藉由 ECU31以時間點tl爲起點使其慢慢地由驅動頻率fmax減 少。 藉由此驅動頻率的減少使電動馬達部22的旋轉速度降 低。而且，由於此旋轉速度的降低，真空栗20的壓力負荷 的增加傾向被抑制，伴隨於此，真空泵2 0的負荷轉矩的增 加速度被降低。 而且，ECU3 1係調節驅動頻率使給電動馬達部22的供 給電流的電流値不超過上限値i 2。此調節處理係優先於前 述減速控制而進行。即ECU3 1若判斷爲電流値達預定的上 限値i2，則電動馬達部22的驅動頻率由在該時間點（在本 實施形態爲時間點13)的驅動頻率f 1朝低速側的驅動頻率 fmin激減。 由於根據此驅動頻率的激減之電動馬達部2 2的旋轉速 度的下降，電動馬達部22的輸出轉矩即真空泵20的負荷 轉矩其增加傾向被抑制，不超過對應上限値i2的上限轉矩 而被限制。而且，ECU31在電流値不超過上限値i2的範圔 爲了實現高效率的真空隔絕室1 3的排氣，盡可能增減調節 應維持高速的電動馬達部2 2的旋轉速度。 此外，前述上限値i2係爲了避免起因於電動馬達部22 的輸出轉矩即真空泵20的負荷轉矩過大，使真空泵20的 構成構件破損等而設定。 -17- 200426306 伴隨著藉由真空泵20使真空隔絕室1 3被減壓 泵20的壓力負荷減少的話，ECU31在電流値不超過 i 2的範圍應盡可能使電動馬達部2 2的旋轉速度爲S 驅動頻率fmax使驅動頻率增加（時間點11〜時間點 間）。此時在本實施形態中，儘管驅動頻率增加但伴 空泵20的壓力負荷減少使真空泵20的負荷轉矩（即/ 顯示減少傾向。 在本實施形態中可得到如以下的功效。 (1)、ECU31當真空泵20的負荷轉矩的增加速度 上升變動時，進行降低電動馬達部2 2的旋轉速度的 制。據此，可降低真空泵2 0的負荷轉矩的上升時的 度。因此’藉由真空泵20的負荷轉矩的增加速度的 上升變動，或在此上升變動後前述增加速度大的狀 續’可減小真空泵20的構成構件所受的衝擊。因此 爲了提高耐衝擊性也無須補強真空泵2 0的構成構付 隨於此補強的真空泵20的大型化或重量化被防止。 (2 )、E C U 3 1根據給電動馬達部2 2的供給電流値 空泵2 0的負荷轉矩。據此，爲了檢測真空泵2 〇的 矩無須特別配設轉矩感測器等。因此，可有助於成 或構造的簡單化。 (3)、ECU31係每一預定時間重複監視真空泵2〇 轉矩的增加速度，並且，即使在判斷爲真空泵2〇的 矩的增加速度急遽地上升變動後也能繼續進行此監 此’即使在前述減速控制開始後也能依照真空栗2 〇 轉矩的增加速度的變動適切地控制電動馬達部22 ，真空 上限値 :速，朝 t5之 隨著真 I流値） 急遽地 減速控 增加速 急遽的 態被繼 ，例如 ，使伴 算出真 負荷轉 本降低 的負荷 負荷轉 視。據 的負荷 的旋轉 -18- 200426306 速度。 (4) 、ECU31當真空泵20的負荷轉矩的增加速度比預定 値還大時判斷爲真空泵2 0的負荷轉矩的增加速度急遽地 上升變動，進行前述減速控制。據此，比較例如根據預定 的時間點中的真空泵20的負荷轉矩的增加速度與前述預 疋的時間點在另外的預定的時間點的IU述增加速度的差 (增加速度差），進行減速控制的樣態，可省略用以算出前 述的增加速度差的處理。即可減輕ECU3 1中的處理負擔。 在第2(b)圖的時間圖中，真空泵20的負荷轉矩的上升 開始時間點11以前中的負荷轉矩的增加速度的値因真空泵 20的壓力負荷（與排氣有關的壓力負荷）約略一定（約零）， 故成爲一定的値（零）。對於這種情形，例如藉由預先特定 時間點11以前中的真空泵20的負荷轉矩的增加速度的値 於零等的一定値’僅判斷負荷轉矩的增加速度是否比預定 値還大就能正確地判斷負荷轉矩的增加速度是否急遽地上 升變動。因此’此情形可不進行前述的增加速度差的算出 而正確地判斷真空泵20的負荷轉矩的增加速度是否急遽 地上升變動。 (5) 、ECU31進行應使真空泵20的負荷轉矩的增加速度 朝預定的目標値降低的前述減速控制。據此，使真空泵20 的負荷轉矩的增加速度朝預定的目標値接近或一致而控 制。藉由此控制，真空泵2 〇的負荷轉矩的上升時的增加速 度可比習知的增加速度還被降低。 (6) 、ECU31進行電動馬達部22的控制使真空泵20的 負荷轉矩不超過預定的上限値（對應供給電流的上限値i2 -19- 200426306 的負荷轉矩的上限値）。據此.，藉由ECU31因作用於真空 20的負荷轉矩的最大値被限制，故可避免因過大的負荷 矩造成的真空泵20的構成構件的變形或破損等。 (7)、藉由ECU31的前述減速控制係藉由變更給電 馬達部22的供給電流中的驅動頻率爲電動馬達部22的 轉速度中的低速側而進行。據此，藉由驅動頻率變更爲 速側使電動馬達部22的旋轉速度下降，伴隨於此，真空 20的壓力負荷下降。藉由此壓力負荷的下降，可實現真 泵2 0的負荷轉矩的增加速度的降低。 (8) 、以同步馬達型的無刷DC馬達構成電動馬達部22 據此’與附電刷馬達比較，可容易使電動馬達部22成爲 久性高者。而且，不管作用於真空泵20的負荷轉矩的 小，藉由調節供給電流的驅動頻率可調節電動馬達部22 旋轉速度。 (9) 、真空隔絕室13由於是成爲在包圍半導體製造裝 1 1的大氣壓空間與製程反應室1 2之間往來工件時的中 點之反應室，故真空隔絕室1 3有頻繁地進行由預定的真 度昇壓到大氣壓的傾向。即在進行真空隔絕室丨3的排氣 真空泵20中，伴隨著其壓力負荷的急增之負荷轉矩的急 可頻繁地發生。因此，在這種樣態中採用具有本實施形 的馬達控制手段之反相器30’謀求真空泵20的耐久性的 高特別有效。 此外，在不由本發明的旨趣脫離的範圍，例如以下 樣態也能實施。 〇在前述實施形態中，E C U 3 1係當判斷爲真空栗 泵 轉 動 旋 低 泵 空 耐 大 的 置 繼 空 的 增 態 提 的 -20- 20 200426306 的負荷轉矩的增加速度比預定値還大時’判斷爲真空泵20 的負荷轉矩的增加速度急遽地上升變動，進行降低電動馬 達部22的旋轉速度的減速控制而構成。取代此點，ECU3 1 針對真空泵2 0的負荷轉矩的增加速度，算出其變化率即每 單位時間的前述增加速度的變化量，當判斷爲此算出結果 比預定値還大時進行前述減速控制而構成也可以。據此， 即使在真空泵20的負荷轉矩的時間點11以前中的增加速 度不爲一定値的情形下，針對真空泵20的負荷轉矩的增加 速度也能正確地把握在預定的時間之間有多少的變化。 此情形ECU3 1例如算出在現在的時間點的負荷轉矩的 增加速度與距現在的時間點僅預定時間前的時間點的負荷 轉矩的增加速度的差。ECU3 1若判斷爲由在現在的時間點 的負荷轉矩的增加速度減去僅預定時間前的時間點的負荷 轉矩的增加速度的算出結果（增加速度差）比預定値還大， 則判斷爲真空泵20的負荷轉矩的增加速度發生急遽的上 升變動。藉由此判斷，ECU31進行應使真空泵20的負荷轉 矩的增加速度降低之前述減速控制。 〇真空泵20的負荷轉矩的增加速度無須控制成在由 藉由ECU31的驅動頻率的降低開始時（時間點ti)到電動馬 達部22的電流値達上限値i2的時間點爲止之間的全部中 線性增加的傾向。例如若來自時間點11的負荷轉矩的增加 速度比習知的負荷轉矩的增加速度還被降低的話，之後令 在電流値達上限値i 2爲止之間負荷轉矩的增加速度比習知 的負荷轉矩的增加速度還高速也可以。據此，例如可一邊 降低真空泵2 0的負荷轉矩的剛開始上升後的增加速度，一 -21- 200426306 邊使電流値達上限値i2爲止的時間比習知還短。 〇 ECU31係進行應使真空泵20的負荷轉矩的增加速 度的變化率（每單位時間的前述增加速度的變化量）朝預定 的目標値應降低之前述減速控制而構成也可以。此情形例 如令對應第3(b)圖所示的曲線62的負荷轉矩的增加速度的 變化率爲前述預定的目標値。此外，第3(a)圖係顯示此情 形中的電動馬達部22的驅動頻率的時間圖’第3(b)圖係顯 示電動馬達部22中的電流値的時間圖。順便一提’第3(a) 圖中的線第91圖與第2(a)圖一樣係顯示習知中的電動馬達 的驅動頻率，圖3(b)中的線第92圖與第2(b)圖一樣係顯示 習知中的電動馬達的電流値。 據此，使真空泵2 0的負荷轉矩的增加速度的變化率朝 預定的目標値接近或一致而控制。藉由此控制，真空泵20 的負荷轉矩的至少上升開始時間點的增加速度比習知的增 加速度還被降低。因此，可減小真空泵20的構成構件所受 的衝擊之中起因於真空泵20的負荷轉矩的增加速度的變 化率的衝擊。 〇在ECU31判斷爲前述增加速度急遽地上升變動後 (緊接著此判斷之後也可以，由此判斷的終了時間點經過預 定時間後的任一個均可）中途停止藉由ECU31的真空泵20 的負荷轉矩的增加速度的監視也可以。據此’例如比較只 要ECU3 1爲作動狀態就會繼續重複實行前述監視的情形， 可減輕與前述監視有關的ECU31的處理負擔。 此外此情形藉由ECU3 1使前述減速控制的重複次數 (減速控制被重複實行的次數）被限制也可以。據此，在真 -22- 200426306 空泵20的負荷轉矩的上升時可一邊減小真空泵20的構成 構件所受的衝擊，一邊例如藉由真空泵20的排氣效率佳、 高的旋轉速度快一點使電動馬達部22的旋轉速度回到原 點。 而且，例如用以對電動馬達部22的驅動頻率設定下 限，並且不超過此下限而驅動電動馬達部22的話，未必對 前述減速控制的重複次數設下限制也可以。 〇在電動馬達部22的驅動頻率的降低時，不使該驅 動頻率漸減，由驅動頻率fmax朝驅動頻率fmin激減也可 以。即使是此情形也能降低真空泵20的負荷轉矩的上升時 的增加速度。 〇對電動馬達部22的供給電流的上限値i2不設定也 可以。即真空泵20中的負荷轉矩的最大値的限制不進行也 可以。 〇例如不配設檢測真空泵20的負荷轉矩用的轉矩感 測器等’用以藉由電動馬達部2 2的供給電流値以外來把握 前述負荷轉矩也可以。 〇以無刷DC馬達以外的同步馬達型的無刷馬達構成 電動馬達部22也可以。此馬達例如有磁阻同步馬達或步進 馬達、電感器型同步馬達、永久磁鐵同步馬達、磁滯同步 馬達等。而且，以感應馬達型的無刷馬達構成電動馬達部 22也可以。以前述以外的無刷馬達構成也可以。而且以附 電刷馬達（例如DC馬達或父直流兩用馬達（universal motor) 等）構成也可以。 〇電動馬達部22爲藉由調節給該電動馬達部22的供 -23- 200426306 給電流中的電壓値可調節電動馬達部2 2的旋轉 式也可以。此情形前述電壓値相當於旋轉速度指 〇在前述實施形態中雖然令真空泵20爲真 1 3用但當作製程反應室1 2用也可以。而且，使用 製造裝置1 1以外也可以。 〇前述實施形態雖然以真空隔絕室1 3由在 態的狀態到開關閥1 7被打開的情形的電動馬達g 制爲對象，惟並未限定於此。例如在電動馬達部 時進行應降低真空泵20的負荷轉矩的增加速度 達部的減速控制也可以。而且，在本發明中不限 空泵 20的負荷轉矩的增加速度爲零的狀態開 時，也包含在由比零還大的增加速度朝更大的增 上升變動時，應降低負荷轉矩的增加速度之電動 的減速控制。 其次，針對可由前述實施形態把握的技術思 以下。 (1 )、每一預定時間重複監視前述真空泵的每 的負荷轉矩增加量，並且在判斷爲真空泵的每單 負荷轉矩增加量急遽地上升變動後中途停止此監 專利範圍第1項或第2項所述之真空泵的控制裝 (2 )、前述減速控制的重複次數被限制的技術 述之真空泵的控制裝置。 (3)、一種真空泵的控制方法，其特徵爲：在具 氣對象空間的排氣到所需的真空度之排氣的泵機 動該泵機構部用的電動馬達部的真空泵中，當前 的每單位時間的負荷轉矩增加量急遽地上升變動 降低電動馬達部的旋轉速度之減速控制。 速度的型 令値。 空隔絕室 於半導體 大氣壓狀 K 2 2的控 22的起動 之電動馬 於僅由真 始的上升 加速度的 馬達部2 2 想記載於 單位時間 位時間的 視之申請 置。 思想（1)所 備進行排 構部與驅 述真空泵 時，進行 -24 - 200426306 【發明的功效】 如以上所詳述的，如果依照申請專利範圍第1項至第 1 〇項中任一項所述之發明，不招致伴隨著真空泵的補強之 大型化或重量化，可提高前述真空泵的耐久性。 【圖式簡單說明】 第1圖是半導體製造裝置以及真空泵的槪略圖。 第2(a)圖是顯示電動馬達部中的驅動頻率的時間圖，（b) 是顯示電動馬達部中的電流値的時間圖。 第3圖是另外例子中的時間圖，（a)是顯不電動馬達部 中的驅動頻率的時間圖，（b)是顯示電動馬達部中的電流値 的時間圖。 【符號說明】 Π:半導體製造裝置 1 2 :製程反應室 1 3 :當作排氣對象空間的真空隔絕室 1 4、1 5 :閘閥 1 6 :排氣路徑 1 7、1 9 :開關閥 1 8 :外氣導入路徑 20:真空泵 2 1 :泵機構部 22:.電動馬達部Sudden increases in load torque can occur frequently. Therefore, in this aspect, the invention of any one of the first to the ninth scope of the patent application is embodied, and it is particularly effective to improve the durability of the vacuum pump. [Embodiment] The present invention will be described below with reference to an embodiment of a vacuum pump for exhausting a vacuum isolation chamber used in a semiconductor manufacturing apparatus. As shown in FIG. 1, in the semiconductor manufacturing apparatus 11, a process reaction chamber 12 is provided in a vacuum isolation chamber 13. In the process reaction chamber 12, for example, a film forming process such as a vacuum evaporation process or a sputtering process for a wafer is performed. -12- 200426306 These processes are performed after the process reaction chamber 12 is brought to a predetermined vacuum degree by using an exhaust means (not shown). The wafer exchange system between the external space (atmospheric pressure space) of the semiconductor manufacturing apparatus 11 and the process reaction chamber 12 is performed through the vacuum isolation chamber 13. That is, a path is provided between the two reaction chambers 1 2, 1 and 3 for carrying out the wafer exchange during the aforementioned wafer exchange, and a gate valve is provided in the middle of this path to pressurely cut off the two reaction chambers 12 and 13. (Gate valve) 14. Furthermore, a path is provided between the semiconductor manufacturing apparatus 11 between the vacuum isolation chamber 13 and the external space of the semiconductor manufacturing apparatus 11 for carrying out the wafer exchange during the aforementioned wafer exchange, and a pressure-resistant ground is arranged along the way. The vacuum isolation chamber 1 3 is disconnected from the gate valve 15 of the aforementioned external space. A vacuum pump 20 is connected to the semiconductor manufacturing apparatus 11 via an exhaust path 16. The vacuum pump 20 has a vacuum isolation chamber 1 3 as a space to be exhausted. On the way of the exhaust path 16 is provided an on-off valve 17 that can shut off the vacuum isolation chamber 13 and the vacuum pump 20 under pressure by an operation from the outside or the like. Further, the vacuum isolation chamber 13 communicates with the external space of the semiconductor manufacturing apparatus 11 via an external air introduction path 18. On the way of the outside air introduction path 18, there is provided an on-off valve 19 that can pressure-separate the vacuum isolation chamber 1 3 from the external space by an operation from the outside or the like. The vacuum pump 20 includes a pump mechanism section 21 for exhausting the vacuum isolation chamber 13 to a predetermined vacuum degree required for exhausting the reaction chamber 13 and an electric motor section 22 for driving the pump mechanism section 21. . The electric motor section 22 is composed of a brushless motor of a synchronous motor type, specifically a brushless DC motor, and is driven by power supplied from an inverter 30 constituting a control device. The electric motor section 22 is adjusted by the driving frequency (the rotation speed -13-200426306 command 値) in the supply current from the inverter 30 so that the rotation speed is adjusted. In addition, in this embodiment, the electric motor section 22 is driven at a constant voltage by the inverter 30, and the current 供给 (supply current 値) of the electric current supplied to the electric motor section 22 and the output of the electric motor section 22 The magnitude of the torque, that is, the load torque of the vacuum pump 20 is related to each other. The inverter 30 includes an ECU 31 and a current detector 32 similar to a computer-like electronic control unit. The ECU 31 and the current detector 32 constitute a motor control means. The current detector 32 detects the current supplied to the electric motor section 22 and supplies this detection information to the ECU 31. The current detector 32 constitutes a detection means for detecting a current 値 supplied to the electric motor section 22. The ECU 31 adjusts the driving frequency in the current supplied to the electric motor section 22 based on the detection information provided by the current detector 32. The ECU 31 calculates the output torque of the electric motor section 22, that is, the load torque of the vacuum pump 20, based on the detection information (current supplied to the electric motor section 22) from the current detector 32. In addition, the ECU 31 calculates the load torque increase amount per unit time of the vacuum pump 20 (hereinafter, this is referred to as the increase speed of the load torque of the vacuum pump 20 for convenience). The ECU 31 repeatedly monitors the increase rate of the load torque of the vacuum pump 20 every predetermined time. When the ECU 31 determines that the increase speed of the load torque of the vacuum pump 20 is greater than a predetermined value, the ECU 31 determines that the increase speed of the load torque of the vacuum pump 20 has a sudden increase. Based on this judgment, the ECU 31 is changed to reduce (decelerate control) the driving frequency in the supply current to the electric motor section 22 which is required to reduce the increase speed of the load torque of the vacuum pump 20. Low speed side). ECU3 1 continues to monitor the acceleration of the load torque of the vacuum pump 20 even after it is judged that the load torque boost speed of the vacuum pump 20 is increased rapidly. More specifically, the ECU 31 according to this embodiment will continue to perform the aforementioned monitoring as long as the ECU 31 is in the operating state. Furthermore, the ECU 31 judges that the increase in the load rotation speed of the vacuum pump 20 has increased sharply based on the aforementioned monitoring. In the case of fluctuation, the aforementioned deceleration control is performed, and the aforementioned driving frequency reduced by the control is maintained until it is determined whether the subsequent increase rate is greater than a predetermined timing. In addition, when the ECU 31 determines that the increase in the load torque of the vacuum pump 20 has rapidly increased and fluctuated, the ECU 31 has priority over the principle of the deceleration control (for example, the adjustment process to be performed as described later makes the electric current to the electric motor unit 22 The upper limit (i2) is not exceeded, and the aforementioned deceleration system is repeatedly performed without being performed. Next, the operation of the vacuum pump 20 configured as described above will be described with reference to the time chart of Fig. 2 (a) and Fig. 2 (b). Fig. 2 (a) shows the driving ratio of the electric current supplied to the electric motor section 22 in Fig. 51. The line 52 in line 22 (b) shows the supply current 値 to the electric motor section. The operation of the wafer between the process reaction chamber 12 and the vacuum isolation chamber 1 3 is performed by the vacuum pump 20 to make the vacuum isolation chamber 13 and the process reaction chamber the same predetermined degree of vacuum, and the gate valve 14 is The open state is performed. At this time, the gate valve 15 and the on-off valve 19 are closed. In addition, the operation of transferring wafers between the vacuum isolation chamber 13 and the outer space of the semiconductor manufacturing apparatus π is performed when the gate valves 14 and 15 are closed, and the on-off valve 19 is opened. In the vacuum isolation chamber 丨3 Under the same pressure (atmospheric pressure) as the above-mentioned part of the space, the gate valve 15 is opened to increase the torque by 0 moments and accelerates the frequency 22 to the control position. At this time, the on-off valve 17 is closed. When the vacuum isolation chamber 13 is brought to a predetermined degree of vacuum by the vacuum pump 20 after the wafer is introduced into the vacuum isolation chamber 13, for example, the on-off valve 17 is opened while the vacuum pump 20, that is, the electric motor unit 22 is driven. The exhaust of the vacuum isolation chamber 13 is started. The time point tl in FIG. 2 (a) and FIG. 2 (b) shows the time point when the on-off valve 17 is opened. Until this time point, the ECU3 1 is at the speed side (S 疋 of the electric motor section 2 2). The driving frequency fmax of the local speed side in the rotation speed drives the electric motor section 22. In addition, since the on-off valve 17 is closed before time point 11, the pressure load (pressure-related pressure load) of the vacuum pump 20 is approximately zero, and the current supplied to the electric motor portion 22 is at the minimum current 値 i 1 lapse. When the on-off valve 17 is opened at the time point 11, the gas in the vacuum isolation chamber 13 in the atmospheric pressure state is rapidly introduced into the pump mechanism section 21, and the pressure load of the vacuum pump 20 increases sharply. Along with this, the output torque of the electric motor section 22, that is, the load torque of the vacuum pump 20 shows an upward trend. That is, in FIG. 2 (b), the tendency that the current 値 rises from the time point 11 is shown. At this time, the increase rate of the current 即, that is, the load torque of the vacuum pump 20, is zero (before the time point 11 is at the current 値 i 1, the current 値 is increasing at a zero speed), so the rise fluctuation is not Zero increase speed. The ECU 31 calculates the increase speed of the load torque of the vacuum pump 20 based on the detection information from the current detector. If it is determined that the increase speed is greater than the predetermined value, it is determined that the increase speed of the load torque of the vacuum pump 20 has a sudden increase. . Based on this judgment, the ECU 31 reduces the increase rate of the load torque toward a predetermined target (for example, the increase rate of the load torque corresponding to the straight line 61 shown in FIG. 2 (b)). Deceleration control of rotation speed -16- 200426306 degrees. At this time, the ECU 31 repeatedly reduces the driving frequency of the current supplied to the electric motor 22 by repeatedly performing the aforementioned deceleration control. With this gradual reduction processing, the rotation speed of the electric motor section 22 gradually decreases. That is, the driving frequency is gradually decreased from the driving frequency fmax by the ECU 31 starting from the time point t1. As a result of this reduction in driving frequency, the rotation speed of the electric motor section 22 is reduced. In addition, due to the decrease in the rotation speed, the increase in pressure load of the vacuum pump 20 is suppressed, and the acceleration of the load torque of the vacuum pump 20 is reduced along with this. Further, the ECU 3 1 adjusts the driving frequency so that the current 値 of the supply current to the electric motor section 22 does not exceed the upper limit 2 i 2. This adjustment processing is performed in preference to the aforementioned deceleration control. That is, if the ECU 3 1 determines that the current 値 reaches a predetermined upper limit 値 i2, the driving frequency of the electric motor section 22 is changed from the driving frequency f 1 at this time point (time point 13 in the present embodiment) to the driving frequency fmin at the low speed side. Sharply reduced. Due to the decrease in the rotational speed of the electric motor section 22 according to the drastic reduction of the driving frequency, the increase in the output torque of the electric motor section 22, that is, the load torque of the vacuum pump 20, is suppressed, and does not exceed the upper limit torque corresponding to the upper limit 値 i2. And be restricted. In addition, the ECU 31 does not exceed the upper limit i2 in order to achieve a high-efficiency exhaust of the vacuum isolation chamber 13 and increase or decrease the adjustment as much as possible to maintain the high-speed rotation speed of the electric motor section 22. The upper limit 値 i2 is set to prevent the output torque of the electric motor unit 22, that is, the load torque of the vacuum pump 20 from being excessively large, and damage to the constituent members of the vacuum pump 20. -17- 200426306 As the pressure load of the vacuum isolation chamber 1 3 by the pressure reducing pump 20 is reduced by the vacuum pump 20, the ECU 31 should make the rotation speed of the electric motor unit 2 2 as far as possible in a range where the current 値 does not exceed i 2. S The driving frequency fmax increases the driving frequency (between time point 11 and time point). At this time, in the present embodiment, although the driving frequency is increased, the pressure load of the accompanying pump 20 is reduced, so that the load torque of the vacuum pump 20 (that is, / shows a decrease tendency). In this embodiment, the following effects can be obtained. (1) When the load torque of the vacuum pump 20 increases and the speed increases and fluctuates, the ECU 31 reduces the rotation speed of the electric motor section 22 to reduce the degree when the load torque of the vacuum pump 20 rises. The increase in speed of the increase in load torque of the vacuum pump 20, or the aforementioned increase in speed after the increase in fluctuation, can reduce the impact on the constituent members of the vacuum pump 20. Therefore, it is not necessary to reinforce it in order to improve the impact resistance. The structure of the vacuum pump 20 is prevented from increasing in size or weight due to the reinforcement of the vacuum pump 20. (2) The ECU 31 empties the load torque of the pump 20 according to the current supplied to the electric motor unit 22. Accordingly, in order to detect the moment of the vacuum pump 20, it is not necessary to provide a torque sensor or the like. Therefore, it can contribute to simplification of the construction or structure. (3) The ECU 31 repeatedly monitors the vacuum pump 2 every predetermined time. The torque increase speed can be continued even after it is judged that the increase speed of the vacuum pump's torque has increased sharply. Even after the aforementioned deceleration control is started, the torque of the vacuum pump can be increased. The increase in speed appropriately controls the electric motor unit 22, and the vacuum upper limit 値: speed, which is followed by true I at t5.) The state of rapid deceleration control and the increase in speed are continued. For example, the calculation of the true load is reduced. The load turned on. According to the speed of rotation of the load -18- 200426306. (4) When the increase speed of the load torque of the vacuum pump 20 is larger than a predetermined value, the ECU 31 determines that the increase speed of the load torque of the vacuum pump 20 has rapidly increased and fluctuated, and performs the aforementioned deceleration control. Accordingly, for example, the speed difference between the increase speed of the load torque of the vacuum pump 20 at a predetermined time point and the increase speed difference (increase speed difference) at another predetermined time point at the predetermined time point is compared, and deceleration is performed. For the control aspect, the processing for calculating the aforementioned increase speed difference can be omitted. This can reduce the processing load in the ECU 31. In the time chart of FIG. 2 (b), the pressure load (the pressure load related to the exhaust gas) of the vacuum pump 20 is increased due to the increase in the load torque at the speed at which the load torque of the vacuum pump 20 rises before 11 o'clock. It is almost constant (about zero), so it becomes constant (zero). In this case, for example, by a certain predetermined time point, the increase rate of the load torque of the vacuum pump 20 before the time point 11 is set to be “zero or less”. It is only necessary to determine whether the increase rate of the load torque is greater than a predetermined value. It is correctly judged whether the increase speed of the load torque rises sharply and fluctuates. Therefore, in this case, it is possible to accurately determine whether the increase speed of the load torque of the vacuum pump 20 has rapidly increased without performing the calculation of the increase speed difference. (5) The ECU 31 performs the aforementioned deceleration control to decrease the increase speed of the load torque of the vacuum pump 20 toward a predetermined target. Accordingly, the increase speed of the load torque of the vacuum pump 20 is controlled to be close to or consistent with a predetermined target value. With this control, the increase speed when the load torque of the vacuum pump 20 is increased can be lowered than the conventional increase speed. (6) The ECU 31 controls the electric motor unit 22 so that the load torque of the vacuum pump 20 does not exceed a predetermined upper limit 値 (corresponding to the upper limit of the supply current 値 i2 -19-200426306 upper limit of the load torque 値). According to this, since the maximum torque of the load torque acting on the vacuum 20 is limited by the ECU 31, deformation or damage of the constituent members of the vacuum pump 20 due to an excessive load moment can be avoided. (7) The aforementioned deceleration control by the ECU 31 is performed by changing the driving frequency in the supply current to the electric motor section 22 to the low-speed side of the rotation speed of the electric motor section 22. Accordingly, the rotation speed of the electric motor section 22 is reduced by changing the driving frequency to the speed side, and the pressure load of the vacuum 20 is reduced accordingly. As a result of this reduction in pressure load, it is possible to reduce the speed at which the load torque of the real pump 20 increases. (8) The electric motor section 22 is constituted by a brushless DC motor of a synchronous motor type. Accordingly, the electric motor section 22 can be made more durable than a brush motor. Furthermore, regardless of the small load torque acting on the vacuum pump 20, the rotation speed of the electric motor section 22 can be adjusted by adjusting the driving frequency of the supplied current. (9) Since the vacuum isolation chamber 13 is a reaction chamber which is a midpoint between the atmospheric pressure space surrounding the semiconductor manufacturing equipment 11 and the process reaction chamber 12 when the workpiece is passed between them, the vacuum isolation chamber 13 is frequently operated by The predetermined degree of truth tends to increase to atmospheric pressure. That is, in the vacuum pump 20 for exhausting the vacuum isolation chamber 3, the sudden increase of the load torque accompanying the sudden increase in the pressure load may frequently occur. Therefore, it is particularly effective to achieve high durability of the vacuum pump 20 by using the inverter 30 'having the motor control means of this embodiment in this aspect. In addition, in the range which does not deviate from the meaning of this invention, the following aspects can be implemented, for example. 〇 In the foregoing embodiment, the ECU 31 1 is determined to increase the load torque by -20-20 20 200426306 when the vacuum pump is turned and the pump is turned down. The load torque is increased faster than the predetermined value. At the time, it is determined that the increase speed of the load torque of the vacuum pump 20 is rapidly increased and fluctuated, and the deceleration control for reducing the rotation speed of the electric motor unit 22 is configured. Instead of this point, ECU3 1 calculates the rate of change of the load torque of the vacuum pump 20, that is, the change amount of the aforementioned increase speed per unit time. When it is determined that the calculation result is larger than the predetermined value, the aforementioned deceleration control is performed. The composition is also possible. Accordingly, even when the increase rate of the load torque of the vacuum pump 20 is not constant before time point 11, it is possible to accurately grasp that the increase rate of the load torque of the vacuum pump 20 is within a predetermined time. How much change. In this case, the ECU 31 calculates, for example, the difference between the increase rate of the load torque at the current time point and the increase rate of the load torque at a time point that is only a predetermined time before the current time point. ECU31 1 judges that the calculation result (increased speed difference) of the increase speed of the load torque at a point in time before the predetermined time is subtracted from the increase speed of the load torque at the present point in time (increase speed difference) is larger than the predetermined value, then judge The increase speed of the load torque of the vacuum pump 20 causes a sharp rise. Based on this judgment, the ECU 31 performs the aforementioned deceleration control to reduce the increase speed of the load torque of the vacuum pump 20. 〇 The increase speed of the load torque of the vacuum pump 20 does not need to be controlled to be all from the time when the reduction of the driving frequency by the ECU 31 starts (time point ti) to the time point when the electric current of the electric motor section 22 reaches the upper limit 値 i2. The tendency to increase linearly. For example, if the increase speed of the load torque from the time point 11 is still lower than the increase speed of the conventional load torque, then the increase speed of the load torque is higher than the conventional value until the current reaches the upper limit 値 i 2 The load torque can be increased at a high speed. According to this, for example, while increasing the speed immediately after the load torque of the vacuum pump 20 is started to rise, the time until the current 値 reaches the upper limit 値 i2 from -21 to 200426306 is shorter than conventional. 〇 The ECU 31 may be configured to perform the aforementioned deceleration control in which the rate of change in the increase speed of the load torque of the vacuum pump 20 (the amount of change in the aforementioned increase speed per unit time) toward a predetermined target should be reduced. In this case, for example, let the change rate of the increase rate of the load torque corresponding to the curve 62 shown in Fig. 3 (b) be the aforementioned predetermined target value. Fig. 3 (a) is a time chart showing the driving frequency of the electric motor section 22 in this case. Fig. 3 (b) is a time chart showing the current 値 in the electric motor section 22. Incidentally, the line 91 in FIG. 3 (a) shows the driving frequency of a conventional electric motor in the same manner as in FIG. 2 (a), and the line 92 and FIG. 2 in FIG. 3 (b) (b) The figure shows the current 値 of the conventional electric motor. Accordingly, the rate of change of the increase speed of the load torque of the vacuum pump 20 is controlled to be close to or consistent with a predetermined target value. With this control, the increase speed of at least the start point of the load torque of the vacuum pump 20 is reduced more than the conventional increase acceleration. Therefore, it is possible to reduce the impact of the rate of change of the increase rate of the load torque of the vacuum pump 20 among the impacts of the constituent members of the vacuum pump 20. 〇 After the ECU 31 judges that the increase speed has increased sharply (it can be followed immediately after this judgment, either after the predetermined time has passed after the predetermined time), the load transfer of the vacuum pump 20 by the ECU 31 is stopped halfway. Monitoring of the increase speed of the moment is also possible. According to this, for example, it is possible to reduce the processing load of the ECU 31 related to the monitoring by repeating the above-mentioned monitoring as long as the ECU 31 is in the active state. In this case, the number of repetitions of the aforementioned deceleration control (the number of times the deceleration control is repeatedly performed) may be limited by the ECU 31. According to this, when the load torque of the air pump 20 increases, the impact of the constituent members of the vacuum pump 20 can be reduced while the load torque of the air pump 20 is increased. For example, the vacuum pump 20 has good exhaust efficiency and high rotation speed. The rotation speed of the electric motor unit 22 is returned to the original point by one point. Furthermore, for example, if a lower limit is set for the driving frequency of the electric motor section 22 and the electric motor section 22 is driven without exceeding the lower limit, it is not necessary to set a limit on the number of repetitions of the aforementioned deceleration control. O When the driving frequency of the electric motor section 22 is reduced, the driving frequency may not be gradually decreased, but may be drastically decreased from the driving frequency fmax to the driving frequency fmin. Even in this case, the increase speed when the load torque of the vacuum pump 20 is increased can be reduced. O The upper limit 値 i2 of the supply current to the electric motor section 22 may not be set. That is, the maximum torque of the load torque in the vacuum pump 20 may not be limited. ○ For example, a torque sensor or the like for detecting the load torque of the vacuum pump 20 is not provided, and the load torque may be grasped by other than the current supplied by the electric motor section 22. 〇 The electric motor section 22 may be constituted by a brushless motor of a synchronous motor type other than the brushless DC motor. Examples of the motor include a reluctance synchronous motor or a stepping motor, an inductor synchronous motor, a permanent magnet synchronous motor, and a hysteresis synchronous motor. The electric motor section 22 may be constituted by an induction motor type brushless motor. A brushless motor configuration other than the above may be used. It can also be constructed with a brush motor (such as a DC motor or a universal DC motor). 〇 The electric motor section 22 may be a rotary type in which the electric motor section 22 can be adjusted by adjusting the voltage supplied to the electric motor section 22 -23- 200426306. In this case, the aforementioned voltage 値 is equivalent to the rotation speed index. In the foregoing embodiment, although the vacuum pump 20 is used as true 13, it may be used as a process reaction chamber 12. It is also possible to use other than the manufacturing apparatus 11. 〇 Although the foregoing embodiment is directed to the electric motor g made of the vacuum isolation chamber 13 from the on state to the state where the on-off valve 17 is opened, it is not limited to this. For example, in the electric motor section, the deceleration control of the speed increasing section, which should reduce the load torque of the vacuum pump 20, may be performed. Furthermore, in the present invention, when the increase speed of the load torque of the air pump 20 is zero, it is also included that the load torque should be reduced when the increase speed from the increase speed greater than zero to a larger increase and increase. Electric deceleration control for increasing speed. Next, consider the techniques that can be grasped by the aforementioned embodiments. (1) Repeatedly monitor the load torque increase amount of each of the aforementioned vacuum pumps every predetermined time, and stop it midway after determining that the torque increase amount of each single load of the vacuum pump has rapidly increased and changed. The vacuum pump control device (2) described in item 2 and the vacuum pump control device described in the technique in which the number of repetitions of the aforementioned deceleration control is limited. (3) A method for controlling a vacuum pump, which is characterized in that: a current pump of an electric motor unit for the pump mechanism unit is operated by a pump having an exhaust gas from a gas object space to a required degree of vacuum, and the current each The deceleration control that increases the amount of load torque per unit time rapidly increases and decreases the rotation speed of the electric motor unit. The speed is commanded. The empty isolation room is used to control the start of the electric motor of the semiconductor atmosphere K 2 2 and the motor unit 2 2 which only rises from the true acceleration. When carrying out the arranging part and driving the vacuum pump prepared under thought (1), perform -24-200426306 [Effect of the invention] As detailed above, if any one of the items 1 to 10 of the scope of the applied patent The invention described above does not cause an increase in size or weight of the vacuum pump, and can improve the durability of the vacuum pump. [Brief description of the drawings] FIG. 1 is a schematic diagram of a semiconductor manufacturing apparatus and a vacuum pump. FIG. 2 (a) is a time chart showing a driving frequency in the electric motor section, and (b) is a time chart showing a current 値 in the electric motor section. Fig. 3 is a timing chart in another example, (a) is a timing chart showing a driving frequency in the electric motor section, and (b) is a timing chart showing a current 値 in the electric motor section. [Description of symbols] Π: Semiconductor manufacturing device 1 2: Process reaction chamber 1 3: Vacuum isolation chamber 1 as an exhaust space 1 4, 15: Gate valve 1 6: Exhaust path 1 7, 19: On-off valve 1 8: Outside air introduction path 20: Vacuum pump 2 1: Pump mechanism section 22: Electric motor section
30:當作控制裝置的反相器 31: ECU 32:電流檢測器 i2:上限値 -25-30: Inverter as control device 31: ECU 32: Current detector i2: Upper limit 値 -25-