200424635 玖、發明說明： 【發明所屬之技術領域】 本發明關於在反射面上具有微細凹凸形狀的反射體的製 k方法’及液晶顯示裝置的製造方法。 【先前技術】 在移動電話或攜帶型遊戲機等的攜帶型電子設備中，由 於電池驅動時間對其使用情況有很大影響，故將可以抑制 消耗兒力的反射型液晶顯示裝置用做顯示部分。反射型液 晶顯示裝置，具備用以反射從其前面入射進來的外光的反 射腱，而其形態，則已知有將反射膜内置於構成液晶面板 的2塊基板之間的液晶顯示裝置，或在透過式的液晶面板的 冃面侧设置有具備半透過膜的反射體的液晶顯示裝置。 例如，在（專利文獻丨）中所記載的反射型液晶顯示裝置中 ，係以使光散射時的方向性不同的2種以上的區域構成用以 反射透過液晶層後的光的反射帶，而且，將上述各個區域 的最大尺寸作成為5 mm角以下，亦即，使擴散的方向性不 同的區域在1個像素內或以像素單位進行混合，以得到必要 的反射特性。 而使之具有如此的擴散反射特性的反射帶表面的凹凸構 。》成方法可以利用如上述（專利文獻1)或下述（專利文獻 2)等所记載般’可以使用由噴砂、腐蝕施行的刻蝕、光刻 等，對於薄膜基材則可以使用壓花加工等。 [專利文獻1] 特許第3019058號公報 86695 200424635 [專利文獻2] 特開平9_543 18號公報 【發明内容】 (發明要解決的課題） 但是，在以上述形成方法形成的具有微細凹凸形狀的反 射帶中，存在著極難將其反射特性控制為所希望的狀態的 問題。這是因為如欲將各向異性或非對稱性賦予反射帶的 反射、擴散特性，則必須滿意地控制上述凹凸形狀，但如 果使用上述的方法’儘管將隨機特性賦予凹凸部分的分佈 容易，但是，凹凸部分卻只能是各向同性的形狀。 此外，為要控制反射擴散特性，雖然亦可以個別地控制 上述反射帶的凹凸形狀，但是，卻存在著加工前置時間延 長或成品率降低以及由這些結果所產生的造價大幅增加等 的問題。 本發明既是為解決上述課題而發明者，目的在於提供以 高效率且成品率良好地製造具備隨機凹凸形狀的反射體的 方法。 此外，本發明的目的還在於提供可以應用於液晶顯示裝 置反射層的形成的微細凹凸形狀的形成方法。 (具體解決方式） 為了實現上述目的，本發明採用以下的構成。 本發明的反射體的製造方法，其特徵在於：具有如下工 序：在製造具備有機膜及在該有機膜上形成的金屬反射膜 ，且在上述有機膜的表面上連續地形成有多數凹部或凸部 86695 200424635 的反射體時，使用在大致圓柱狀的母模基材的表面上形成 有微細凹凸形狀的母模，一邊將該母模推壓到複製樹脂膜 上，一邊使之旋轉以將母模的表面形狀複製到上述複製樹 脂膜上。 上述構成的製造方法，係一種適合於在可以將微細的凹 凸形狀賦予使光反射的金屬反射膜以使反射光進行散射， 防止特定方向的反射光亮度突出地變高，同時，還可以在 寬廣角度範圍内得到高亮度的反射體的製造的製造方法。 若採用如此的製造方法，在由樹脂材料等構成的有機膜的 表面的微細凹凸形狀的形成中，即可以利用在大致圓柱狀 的母模基材的表面上形成有微細的凹凸形狀的母模。亦即 ，採用一邊在複製樹脂膜上推壓上述母模一邊進行轉動的 方法，即可效率良好地將母模的微細凹凸形狀複製到複製 樹脂膜上，而得到使用將該複製樹脂膜做為有機膜、或者 將複製樹脂膜做為複製模具以在有機膜上形成微細凹凸形 狀等的方法，而在表面上形成有微細凹凸形狀的有機膜。 由於上述母模大致係圓柱狀，故加壓力係加於大致圓柱狀 的接觸面上’所以與對平板面加壓的情況下比較，實質上 增高，不僅可以提高加工精度，而且，壓力在母模的旋轉 方向上對複製樹脂膜的長度沒有限制，在使用大型的基板 的反射體的製造中可以極其容易地應用，可以極其良好的 效率進行反射體微細凹凸形狀的形成。 其次，在本發明的反射體的製造方法中，可以在採用的 已複製上上述母模的微細凹凸形狀的上述複製樹脂膜的面 86695 200424635 上形成上述金屬反射膜的方法製造反射體。 上述構成的製造方法，是將先前上述的複製樹脂膜照原 狀不變地用做有機膜以構成反射體的方法。若採用該製造 方法’即可以少的工序數，在具備與上述母模的表面凹凸 互逆的形狀的微細凹凸形狀的有機膜上製作金屬反射膜。 其次，本發明的反射體的製造方法，也可以作成為具有 下述工序的構成·在已複製上上述母模的微細凹凸形狀的 複製樹脂膜上形成金屬膜的工序；藉由以上述金屬膜為電 極的鎳電鑄製造鎳版的工序；將已複製到上述鎳版上的微 細凹凸形狀複製到有機膜上的工序。 在上逑構成的製造方法中，以已形成了母模的微細凹凸 形狀的複製樹脂膜為原模，藉由鎳電鑄製作鎳版，用該鎳 版進灯有機膜的加工。因此，可以製作在有機膜表面上形 成有凹凸與上述母模互逆的形狀的反射體。若以該製造方 法，由於可以採用從大致為圓柱狀的母模製作大型的鎳版 的万法進行有機膜的加工，故特別是具有可以提高在有機 膜的表面上形成微細凹凸形狀的工序的製造效率的優點。 其次，本發明的反射體的製造方法，可構成為具有如下 的工序·_在已複製有上述母模的微細凹凸形狀的複製樹脂 膜上形成金屬膜的工序；藉由以上述金屬膜為電極的鎳電 麵製造鎳版的工序；以上述鎳版為電極進行鎳電鑄，在上 逑鎳版上的金屬膜上形成鎳膜的工序；從上述金屬膜上剝 離上述鎳膜的工序；將已複製到上述鎳膜上的微細凹凸: 狀複製到有機膜上的工序。 / 86695 匕上述構成的製造方法，是一種藉由從母模製作的 =製作鎳版’再次進行以該鎳版為原模的鎳電轉，二 /、備凹凸與母模互逆的微細凹 行編的加工的製造方法。因此“=進 ^可以形成具有與母模大致同—微細凹凸形狀的的有機 挺’故易於將所製作的反射體的反射特性反饋給母模，因 而可以表勿且迅速地應對反射特性的變更。 、 其次’本發明的製造方法，也可構成為具有如下的工序 :在已複製有上述母模的微細凹凸形狀的複製樹脂膜上形 =金屬膜的工序；藉由以上述金屬膜為電極的鎳電轉製造 錄版的工序，以上述鎳版為電極進行鎳電鑄，在上述鎳版 上的金屬膜上形成鎳膜的工序；從上述金屬膜上剥離上述 鎳fe的工序；藉由將緩衝構件配設於上述鎳膜的背面側， 以該緩衝構件為内側而將上述鎳膜捲繞於大致圓柱狀的基 體圓周面上，而製作滾版的工序；在將上述滚版推壓到有 機膜上，同時使之旋轉以將上述鎳膜外面的微細凹凸形狀 複‘到上述有機膜表面上的工序。 上述構成的製造方法，是一種使用將具有與母模互逆的 凹凸的微細凹凸形狀的鎳膜捲繞成大致圓柱狀而製作的滾 版’進行有機膜的加工的製造方法。因此，若採用本製造 方法’即可以得到具備與母模的表面大致同一的微細凹凸 形狀的反射體。根據本製造方法，由於即便是不將板狀的 鎳版推壓到有機膜上複製形狀的情況下，另外準備用以進 行版及有機膜之間的剝離的工序，有機膜的加工及有機膜 86695 -10- 2版之間的剥離亦可以與滾版的旋轉一起進行，故可以極 /、艮好的效率進行向有機膜上複製的形狀複製的工序。 、外I上述構成下，由於在鎳膜與大致圓柱狀的基體 <間設置有缓衝構件’故在進行有機膜的加巧，因易於 _對有機膜的加壓力’使加工變得容易起來，同時，還 二、：效地防止因過壓而使鎳膜或有機膜破損，因而可以 ”見來版的長聲命化及要製作的有機膜的成品率的提高。 其次’在本發明的反射體的製造方法中’上述母模的微 細凹凸形狀，較佳為連續地排列在内面上包含球面的一部 分的多個凹部的形狀。 知用上逑構成，即可以提供使入射到反射體上的光廣角 地進行反射，可在較廣的角度範圍内得到高反射亮度的反 射體。 其次，本發明的液晶顯示裝置，其特徵在於··在製造具 有在相對地配置的上基板及下基板間挾持有液晶層，且在 上逑下基板的液晶侧的面具備反射層的液晶顯示裝置時， 藉由先前上述的本發明的反射體的製造方法，在下基板上 形成上述反射層。 若根據該液晶顯示裝置的製造方法，由於適用先前上述 的反射體的製造方法，故可以效率極其良好地進行反射層 的形成’同時，對反射體的反射特性的變更的母模的表面 形狀的變更易容易，可以容易地製造具有各種反射特性的 液晶顯示裝置。 【實施方式】 86695 -11 - 200424635 以下，參照圖式說明本發明的實施方式。 (反射體的製造方法） 首先，對可以本發明的反射體的製造方法製作的反射體 進行說明。圖1係顯示本發明的反射體構成的一個例子的部 分立體圖，圖2A是在圖1所示的反射體上形成的凹部的平面 構成圖，圖2B是沿著圖2A所示的G-G線的剖面構成圖。 圖1所示的反射體10的構成為具備：A14Ag等的高反射率 的至屬反射膜12，及用於將規定的表面形狀賦予該金屬反 射膜12的由聚丙烯樹脂材料等構成的有機膜〗丨。在該有機 膜π的表面上，設置有多個凹部13，用在該凹部13上形成 的金屬反射膜12得到反射性。 圖2A及圖2B所示的凹部13的内面，含有本身為半徑各不 相同的2個球面的一部分的第i曲面13a及第2曲面〗3b，這些 曲面1 3 a、13b的中心〇1、〇2，都被配置在凹部丨3的最深點 Ο的法線上，第1曲面13a被作成為以⑴為中心的半徑為^^ 的球面的一部分，第2曲面13b則被作成為以〇2為中心的半 徑為R2的球面的一部分。因此，在圖2A所示的平面圖中， 在在凹邵13的取深點〇處通過’與g_g線垂直相交的直線η 附近’大致劃分開第1曲面13a及第2曲面13b。 圖3的曲線圖係顯示，以30度的入射角從圖2的右側向具 有上述構成的反射體10照射光，以對於反射面的正反射方 向的30度為中心，在土30度的範圍（〇度到6〇度，〇度相當於 液晶面板20的法線方向）的受光角内擺動測定反射體1〇的 反射率（％)的結果。 86695 -12- 200424635 如該圖所示，若採用具備上述構成的反射體1 〇，由於由 半徑比較小的球面構成的第2曲面13b的傾斜角的絕對值比 較大，故因反射光廣角地散射而可以在約15度到50度的廣 受光角範圍内得到高的反射率。此外，藉由由半徑比較大 的球面構成的第1曲面13a的反射，產生在特定方向比上述 第2曲面1 3 b還窄的範圍内散射的反射，故全體反射率為比 起正反射方向的30度，較小的角度處成為最大，在該峰值 附近的反射率也增高。其結果是，由於向反射體1〇入射並 被反射的光的峰值，比起正反射方向會更向接近反射體1〇 的法線方向處移動，故可以提高反射體1〇的正面的反射亮 度因此，例如若將本實施方式的反射體1 〇應用於液晶顯 π裝置的反射層，則可以提高液晶顯示裝置的正面方向的 反射亮度，因而可以提高液晶顯示裝置在觀察者方向上的 亮度。 、以下芩妝圖式，對製造上述構成的反射體的方法 進行說明。 圖4的立體構成圖顯示在本實施方式的製造方法中，用以 形成反射體的凹凸形狀的母模，圖5的剖面構成圖顯示使用 圖4所不的母模製作滾 ^ J 斤圖6頰不以圖5的工序製作 的滾版的剖面構造，圖7 一 〇 乂把構成圖頭示以圖6所示的滾 版形成反射體的凹凸形狀的工序。 首先’圖4所示的母模]5，σ —甘门 、 疋在其周面的加工區域1 6上具 有已形成了多個微細的凹部 $钿、立μ u 4旳圓枉狀的構件，由鉛 或銅！銅、錫、不銹鋼等構成。在, 、在该母杈1 5的周面上形 86695 -13 - 200424635 成的凹部的形狀，是與圖1所示的凹部1 3大致同樣的形狀， 該周面的形狀相當於圖1所示的有機膜11的表面形狀。其次 ，如圖5 A所示，將圖4所示母模1 5的表面形狀複製到複製樹 脂膜17上。在該工序中，母模15係在下侧進給輥子19與根 據需要而設的上侧進給輕子2 0之間，與這些輥子1 9、2 0車由 平行垂直地排列。此外，在母模1 5與下侧進給輥子丨9之間 ，係可使已在表面上塗敷有本身為被加工物的複製樹脂膜 1 7的基板1 8通過，且設置有用以使母模丨5及下側進給輥子 1 9彼此無滑動地轉動的機構。在上述基板丨8的進給方向上 游側’設置有在基板1 8上塗敷形成複製樹脂膜丨7的樹脂供 給邯分22，在母模1 5之下游侧的基板丨8的上方配設紫外線 照射邵分24。另外，在使用母模丨^進行加壓加工中，為了 調整複製樹脂膜17的黏度或硬度，也可以在樹脂供給部分 22與母模15之間的基板18的上方，設置輔助的紫外線照射 裝置。 上逑基板1 8，可以使用玻璃基板或塑膠基板、樹脂薄膜 基板等。此外，藉由樹脂供給部分22在基板18上塗敷形成 的複製樹脂膜1 7，在本實施方式中雖然使用的是紫外線硬 化樹脂，但是，也可以使用熱硬化樹脂，在該情況下，只 要將紫外線照射部分24變成為加熱燈泡等的熱源即可，上 述進給輥子19、20是為了使母模15進行旋轉而不會在基板 18上滑動而設置者，其只要不造成母模15的缝隙或複製樹 脂膜17的破損，不論何種材質的輥子都可以。 在上逑構成的圖5A所示的工序中，在採用使進給輥子19 86695 -14 - 200424635 、20旋轉的方法使母模15旋轉的狀態下，在母模15與下侧 進給泰ΰ子19之間插入基板1 §，邊使基板1 g向圖示的右方移 動’邊將基板18上的複製樹脂膜丨7推壓到母模丨5的表面上 以便將母模15的表面形狀複製到複製樹脂膜17上，在複製 樹脂膜17表面上形成凹凸面25。複製樹脂膜17係採用邊使 基板1 8向圖示右方方向移動，邊用樹脂供給部分u依次塗 敷樹脂材料的方法形成，在進行以母模15實施的形狀加工 4页，必要時可進行由紫外線照射裝置實施的預備硬化， 在由母模15實施的加工後，則進行由紫外線照射部分以實 施的最終硬化以保持其表面形狀。藉由以上的工序，即會 得到在複製樹脂膜17表面上形成與母模15的凹凸互逆的凹 凸面25的樹脂版26。 其次，如圖5B所示，在以圖5A所示工序得到的樹脂版％ 的凹凸面25上，形成金屬膜27。接著，藉由將金屬膜則 做電極的電解電鍍形成鎳膜28(鎳電鑄）。上述金屬膜27,較 佳為作成為鍍金膜，歸因㈣成這些金屬㈣，即可以容易 地進行金屬膜27與鎳膜28之間的剝離而不會在鎳膜28上產 生破損。 ，可將金 30微米到 上述金屬膜27及鎳膜28的膜厚，沒有特別限定 屬腠27作成為5 nm到50 nm左右，將鎳膜“作成為 200微米左右。 ~ 〜…丄少成鲽膜2 8 剥離這些金屬的薄膜及樹脂版26後，即可得輸在 側形成有與母模15表面大致同一的凹凸形狀的鎳㈣ 86695 -15 - 著鎳膜28的凹凸形狀的金屬膜27的鎳版30。 其次，如圖5C所示，在上述工序中得到的鎳版3〇的金屬 月吴27上’藉由鎳電鑄形成鎳膜31。在形成該鎳膜31之際， 可以使用與圖5B所示的鎳膜28同樣的形成方法。此外，鎳 月吴31的膜厚，並無特別限定，可以作成為30微米到200微米 。接著，從金屬膜27上剝離上述工序形成的鎳膜31，即得 到具有與母模1 5的表面凹凸互逆的表面形狀的鎳版。該金 屬膜27與鎳膜31之間的剝離，係利用各薄膜的熱膨脹係數 差的方法進行。因此，對於金屬膜27以使用熱膨脹係數小 的金等，即可以更為容易地進行金屬膜27與鎳膜3丨之間的 剝離。 其次’如圖5D所示，將由橡膠等的彈性體構成的緩衝構 件32黏貼到以上述工序製得到的鎳版（鎳膜31)的凹凸面相 反侧的面上。然後，如圖6所示，採用使緩衝構件32朝向内 侧地卷到圓柱狀的基體34上的方法，即可以得到具有與母 模1 5互逆的凹凸的表面形狀的滾版3 5。 然後，如圖7所示，於由玻璃或塑膠等構成的產品基板37 的被加工區域38上，塗敷紫外線硬化樹脂或熱硬化樹脂以 形成有機膜，接著，藉由邊使用上述的工序製作的滚版3 5 旋轉邊將其推壓到被加工區域3 8上的方式，將滾版3 5的鎳 膜^ 1的表面形狀複製到上述被加工區域3 §的有機膜表面上 。接著’採用藉由紫外線照射或加熱使加工後的有機膜硬 化，在有機膜表面上形成A1或Ag等的高反射率的金屬反射 膜的方法，即可以得到圖1所示的本實施方式的反射體。 86695 -16 - 此外，在本實施方式的反射體的製造方法中，在有機膜 的加工中使用的滾版35及被加工區域38，係組合為使得滾 版35的加工面（鎳膜31表面的已形成凹凸形狀的區域）35a的 寬度W1比被加工區域38的寬度W2更寬，滚版35的圓周比被 加工區域38的長度L更長。此係因在圖6所示的滾版35的圓 同上會產生與緩衝構件3 2 —起將圖5 D所示的鍊膜3 1捲繞 成滾筒狀的接缝，以及鎳膜31的寬度是有限的緣故。亦即 ，因為在圖7所示的工序中，必須作成為使上述滾版35的接 缝不通過被加工區域38上，此外，還必須作成為使得加工 區域35a的I度方向的端部也不會達到被加工區域％上的 緣故。 在本實施方式的製造方法中，圖7所示的被加工區域38 ，既可以1個反射體的有機膜構成，也可以構成為含有多個 反射體的有機膜。此外，如圖8所示，亦可以為使用將具有 比滾版35的寬度W1還小的寬度W2的多個被加工區域38a 排列形成的產品基板37A，對各個被加工區域38八進行使用 滾版35的加工。即，只要可以使滾版31旋轉丨周進行加工的 區域面積，與被加工區域38、38A的面積成為上述的關係， 則形成於被加工區域38、38八内的有機膜的分區或產品基板 37、37A的尺寸等即無任何限制。 此外，在上述說明中，雖然說明了製作與母模15凹凸互 逆的滾版35，而在產品基板37的有機膜上形成與母模1 $大 致同一形狀的凹凸的情況，但本發明的製造方法，在進行 產品基板37的加工時，可以採用種種的形態。例如，可使 86695 -17- 200424635 用母模15直接進行產品基板37的有機膜的加工，在該情況 下，即可以製造具有與圖1及圖2所示的反射體10之凹凸互 逆::表面形狀的反射體。再者，也可以在保持在基板上的 狀怨下’推壓到有機膜上進行產品基板37的加工而不使錄 膜3 1變成為滚版3 ^沾 & 版35的形怨。此外，在同樣的加工中亦可以 使用鎳膜28。 乂 (母模的製造方法） 其次，對圖4所示的母模15的製造方法進行說明。圖9的 工序圖顯示用以製作圖4所示母模15的母模製造裝置的— 個實施方式。該圖所示的母模製造裝置40，其主要部分具 備圓柱狀母模基材41、配置在母模基材41的上方而用以將 凹狀的壓痕壓刻母模基材41的表面上的壓痕器47，上述母 模基材41係藉由通過卡合部分料而連接到其—侧端面（圖 不左侧端面）上的基材驅動部分45，可圍繞著其軸而自由轉 動。此外，上述壓痕器驅動部分（壓痕器驅動裝置）48係作Z 為由滑動器56所支持而可在上述母模基材41的長度方向㈤ 示左右方向）上自由移動，由壓痕器驅動部分48及滑動器％ 構成用以加工基材41的加工頭。上述母模基材4丨，可以使 用鉛或黃銅、錫、不銹鋼等的比較容易進行塑性加工的金 屬材料的基材。 " 卡合邵分44係連接到基材驅動部分45上，且嵌合固定上 述母模基材41的一端侧，而使得可藉由上述基材驅動部分 45使母模基材41旋轉。此外，上述基材驅動部分45則可以 零點幾微米到數百微米的間距控制母模基材41的軸周圍的 86695 -18 - 200424635 位且。因此’基材驅動八 ^ $刀45中係使用伺服馬達或步進馬 達寺的可以控制微小旋轉量的驅動裝置。 、此外，上料«材41係用以保持軸周g 度的裝置，例如由輕子‘签紐 辅助支持裝15Q·支持。該 輔助支持裝置50被構成為# | p Α ^ < 為在母挺基材41的軸方向上可以移 動。此外’辅助支接癸班 、这 + 士、 持衣且50，返可以兼備在母模基材41的 方向上進行鬲度的微調整的功能。200424635 (1) Description of the invention: [Technical field to which the invention belongs] The present invention relates to a method for manufacturing a reflector having a fine uneven shape on a reflective surface 'and a method for manufacturing a liquid crystal display device. [Prior Art] In portable electronic devices such as mobile phones or portable game consoles, since the battery driving time greatly affects their use, a reflective liquid crystal display device capable of suppressing child power is used as a display portion. . A reflective liquid crystal display device includes a reflective tendon for reflecting external light incident from the front of the liquid crystal display device. As its form, a liquid crystal display device having a reflective film built in between two substrates constituting a liquid crystal panel is known, or A liquid crystal display device including a reflector having a semi-transmissive film is provided on the front side of the transmissive liquid crystal panel. For example, in the reflective liquid crystal display device described in (Patent Document 丨), two or more types of regions having different directivity when light is scattered constitute a reflection band for reflecting light after passing through the liquid crystal layer, and , The maximum size of each of the above regions is set to be 5 mm or less, that is, the regions with different directions of diffusion are mixed in one pixel or in units of pixels to obtain the necessary reflection characteristics. The uneven structure on the surface of the reflection band that has such diffuse reflection characteristics. The formation method can be used as described in the above (Patent Document 1) or the following (Patent Document 2), etc. 'Etching by sandblasting, etching, photolithography, etc. can be used, and embossing can be used for thin film substrates. Processing, etc. [Patent Document 1] Japanese Patent No. 3019058 86695 200424635 [Patent Document 2] JP-A 9-543 18 [Summary of the Invention] (Problems to be Solved by the Invention) However, a reflective tape having a fine uneven shape formed by the above-mentioned forming method However, there is a problem that it is extremely difficult to control the reflection characteristics to a desired state. This is because if it is desired to impart anisotropy or asymmetry to the reflection and diffusion characteristics of the reflection band, the above-mentioned uneven shape must be satisfactorily controlled. However, if the above-mentioned method is used, although it is easy to provide random characteristics to the uneven portion distribution, However, the uneven portion can only be an isotropic shape. In addition, in order to control the reflection and diffusion characteristics, although the unevenness of the above-mentioned reflection band can be individually controlled, there are problems in that the processing lead time is prolonged or the yield is reduced, and the production cost caused by these results is greatly increased. The present invention has been invented in order to solve the above-mentioned problems, and an object thereof is to provide a method for producing a reflector having a random uneven shape with high efficiency and good yield. Another object of the present invention is to provide a method for forming a fine uneven shape that can be applied to the formation of a reflective layer of a liquid crystal display device. (Specific Solution) In order to achieve the above object, the present invention adopts the following configuration. The method for producing a reflector according to the present invention includes the steps of manufacturing an organic film and a metal reflective film formed on the organic film, and continuously forming a plurality of recesses or protrusions on a surface of the organic film. 86695 200424635 reflector, a master mold having a fine concave-convex shape formed on the surface of a substantially cylindrical master mold substrate is used, while the master mold is pressed against the replication resin film, the master mold is rotated to rotate the master mold. The surface shape of the mold was reproduced on the above-mentioned replication resin film. The manufacturing method of the above structure is suitable for providing a fine reflective surface with a metal reflective film that reflects light to scatter the reflected light and prevent the reflected light from being raised in a specific direction from increasing in brightness. A manufacturing method for manufacturing a reflector having a high brightness within an angular range. According to such a manufacturing method, in forming a fine uneven shape on the surface of an organic film made of a resin material or the like, a master mold having a fine uneven shape on the surface of a substantially cylindrical master mold base material can be used. . In other words, by using the method of rotating the master mold while pressing the master mold on the replica resin film, the fine concave-convex shape of the master mold can be efficiently replicated on the replica resin film, and the replica resin film can be used as An organic film, or a method of using a replication resin film as a replication mold to form a fine uneven shape on the organic film, etc., and a fine uneven organic film is formed on the surface. Since the above-mentioned master mold is substantially cylindrical, the pressing force is applied to the substantially cylindrical contact surface. Therefore, compared with the case where the flat surface is pressurized, it is substantially higher, which can not only improve the processing accuracy, but also the pressure on the master. There is no limitation on the length of the replication resin film in the rotation direction of the mold, and it can be extremely easily applied to the production of a reflector using a large substrate, and the formation of the fine uneven shape of the reflector can be performed with extremely good efficiency. Next, in the method for manufacturing a reflector of the present invention, the reflector can be manufactured by forming the metal reflective film on the surface 86695 200424635 of the replicated resin film on which the fine concave-convex shape of the master mold has been copied. The manufacturing method of the above-mentioned structure is a method of using the above-mentioned replication resin film as an organic film as it is to form a reflector. According to this manufacturing method, a metal reflective film can be produced on an organic film having a fine concave-convex shape having a shape that is inverse to the surface unevenness of the master mold in a small number of steps. Next, the method for producing a reflector of the present invention may be configured to have the following steps: a step of forming a metal film on a finely concave-convex replica resin film on which the master mold has been copied; A step of manufacturing a nickel plate for nickel electroforming of an electrode; a step of copying a fine uneven shape copied on the nickel plate onto an organic film. In the manufacturing method of the upper structure, a replica film having a fine concave-convex shape on which a master mold has been formed is used as a master mold, a nickel plate is produced by nickel electroforming, and the nickel plate is used to process an organic film. Therefore, it is possible to produce a reflector having an uneven shape formed on the surface of the organic film, and a shape in which the above-mentioned master mold is reversed. According to this manufacturing method, since an organic film can be processed by a method for producing a large-sized nickel plate from a substantially cylindrical master mold, it has a step of forming a fine uneven shape on the surface of the organic film in particular. Advantages of manufacturing efficiency. Next, the method for manufacturing a reflector of the present invention may be constituted as follows: a step of forming a metal film on a finely concave-convex replica resin film on which the master mold has been copied; and using the metal film as an electrode A step of manufacturing a nickel plate from a nickel electrical surface; a step of electroforming nickel using the nickel plate as an electrode to form a nickel film on a metal film on the nickel plate; a step of peeling the nickel film from the metal film; The fine unevenness that has been copied onto the nickel film: a step of copying it onto an organic film. / 86695 The manufacturing method of the above structure is a method of making a nickel plate from a master mold = making a nickel plate again to perform nickel electrorotation with the nickel plate as the original mold. Manufacturing method of knitting. Therefore, "= 进 ^ can form organic tumblers with a shape that is approximately the same as that of the master mold-it is easy to feed back the reflection characteristics of the produced reflector to the master mold, so it is possible to quickly and effectively respond to changes in reflection characteristics. Secondly, the manufacturing method of the present invention may be configured to have the following steps: a step of forming a metal film on a replicated resin film on which the fine concave-convex shape of the master mold has been copied; and using the metal film as an electrode The process of producing a recording plate by nickel electrotransformation, the step of electroforming nickel using the nickel plate as an electrode, forming a nickel film on a metal film on the nickel plate; a step of peeling the nickel fe from the metal film; The buffer member is disposed on the back side of the nickel film, and the nickel film is wound around the substantially cylindrical substrate peripheral surface with the buffer member as the inner side to produce a roll plate. The roll plate is pressed to The organic film is rotated at the same time to restore the fine uneven shape on the surface of the nickel film to the surface of the organic film. The manufacturing method of the above structure is a method using Roller plate made by rolling a nickel film with a fine concave-convex shape with a concave-convex concave-convex shape of the master mold into a substantially cylindrical shape, and a method for manufacturing an organic film. Therefore, if this manufacturing method is used, Reflectors with fine uneven shapes on substantially the same surface. According to this manufacturing method, even if the plate-shaped nickel plate is not pushed onto the organic film to reproduce the shape, it is additionally prepared to carry out the separation between the plate and the organic film. The peeling process, the processing of the organic film, and the peeling of the organic film 86695 -10- 2 plates can also be performed together with the rotation of the roll plate, so the shape copied to the organic film can be copied with great efficiency. In the above-mentioned structure, since a buffer member is provided between the nickel film and the substantially cylindrical substrate < the organic film is being processed, and it is easy to apply pressure to the organic film to make processing difficult. It is easy to get up, and at the same time, it can also effectively prevent the nickel film or organic film from being damaged due to overpressure, so it can be seen that the coming version is prolonged and the yield of the organic film to be produced is improved. Next, "in the method of manufacturing a reflector of the present invention," the fine uneven shape of the master mold is preferably a shape in which a plurality of concave portions including a spherical portion on the inner surface are continuously arranged. It is known that the upper structure can provide a wide-angle reflection of the light incident on the reflector, and can obtain a reflector with high reflection brightness over a wide range of angles. Next, the liquid crystal display device of the present invention is characterized by producing a liquid crystal display having a liquid crystal layer between an upper substrate and a lower substrate that are oppositely disposed, and a reflective layer provided on a liquid crystal side surface of the upper substrate. In the device, the above-mentioned reflective layer is formed on the lower substrate by the method for manufacturing the reflector of the present invention described above. According to the method for manufacturing a liquid crystal display device, since the above-mentioned method for manufacturing a reflector is applied, the formation of a reflective layer can be performed extremely efficiently. At the same time, the shape of the surface of the mother mold that changes the reflection characteristics of the reflector can be improved. The change is easy, and a liquid crystal display device having various reflection characteristics can be easily manufactured. [Embodiment] 86695 -11-200424635 Hereinafter, an embodiment of the present invention will be described with reference to the drawings. (Manufacturing method of reflector) First, the reflector which can be manufactured by the manufacturing method of the reflector of this invention is demonstrated. FIG. 1 is a partial perspective view showing an example of the structure of a reflector of the present invention. FIG. 2A is a plan view of a concave portion formed on the reflector shown in FIG. 1, and FIG. 2B is a view taken along a line GG shown in FIG. 2A Sectional composition diagram. The structure of the reflector 10 shown in FIG. 1 includes an organic reflective film 12 having a high reflectance such as A14Ag, and an organic material made of a polypropylene resin material or the like for imparting a predetermined surface shape to the metallic reflective film 12. Film〗 丨. A plurality of recessed portions 13 are provided on the surface of the organic film?, And reflectivity is obtained by the metal reflection film 12 formed on the recessed portions 13. The inner surface of the recessed portion 13 shown in FIG. 2A and FIG. 2B includes an i-th curved surface 13a and a second curved surface 3b which are part of two spherical surfaces with different radii, and the centers of these curved surfaces 1 3a, 13b. 〇2, are arranged on the normal of the deepest point 0 of the recess 丨 3, the first curved surface 13a is made as a part of a spherical surface with a radius of ^^ centered on ⑴, and the second curved surface 13b is made as 〇2 The center is a part of a sphere with a radius of R2. Therefore, in the plan view shown in FIG. 2A, the first curved surface 13a and the second curved surface 13b are roughly divided at the depth point 0 of the recess 13 through the vicinity of a straight line η perpendicular to the g_g line. The graph of FIG. 3 shows that the reflector 10 having the above-mentioned structure is irradiated with light from the right side of FIG. 2 at an incident angle of 30 degrees, and is centered at 30 degrees in the direction of regular reflection with respect to the reflecting surface in a range of 30 degrees (0 degree to 60 degree, 0 degree corresponds to the normal direction of the liquid crystal panel 20). The result of measuring the reflectance (%) of the reflector 10 within the light receiving angle. 86695 -12- 200424635 As shown in the figure, if the reflector 1 with the above-mentioned structure is used, the absolute value of the inclination angle of the second curved surface 13b composed of a spherical surface with a relatively small radius is relatively large. Scattering can obtain a high reflectance in a wide range of light receiving angles of about 15 to 50 degrees. In addition, the reflection of the first curved surface 13a composed of a spherical surface with a relatively large radius produces reflections scattered in a specific direction in a narrower range than the second curved surface 1 3b, so the overall reflectance is higher than the direction of regular reflection. 30 degrees, maximum at smaller angles, and the reflectance near this peak also increases. As a result, since the peak value of the light incident on the reflector 10 and reflected is moved closer to the normal direction of the reflector 10 than the normal reflection direction, the reflection of the front face of the reflector 10 can be improved. Brightness. For example, if the reflector 10 of this embodiment is applied to a reflective layer of a liquid crystal display device, the reflection brightness of the front direction of the liquid crystal display device can be increased, and thus the brightness of the liquid crystal display device in the direction of the observer can be increased. . A method for manufacturing the reflector having the above-mentioned configuration will be described below with a makeup pattern. FIG. 4 is a three-dimensional structural diagram showing a female mold for forming a concave-convex shape of a reflector in the manufacturing method of the present embodiment, and a cross-sectional structural diagram of FIG. 5 shows a roll made using the female mold shown in FIG. 4. The cheek does not have a cross-sectional structure of the roll plate produced in the step of FIG. 5, and FIG. 7 shows the process of forming the uneven shape of the reflector with the roll plate shown in FIG. First, 'master model shown in FIG. 4] 5, σ-Ganmen, 疋 has a plurality of fine recesses $ 钿, standing μ u 4 旳 round 枉 -shaped members in the processing area 16 of the peripheral surface , Made of lead or copper! Made of copper, tin, stainless steel, etc. The shape of the recess formed by the shape of 86695 -13-200424635 on the peripheral surface of the female branch 15 is substantially the same as that of the recess 13 shown in FIG. 1, and the shape of the peripheral surface is equivalent to that shown in FIG. 1. The surface shape of the organic film 11 is shown. Next, as shown in Fig. 5A, the surface shape of the master mold 15 shown in Fig. 4 is copied onto the replication resin film 17. In this step, the master mold 15 is arranged between the lower feed roller 19 and the upper feed lepto 20 as required, and these rollers 19 and 20 are aligned vertically and in parallel. In addition, between the master mold 15 and the lower feed roller 丨 9, a substrate 18 having a surface on which a replica resin film 17 which is itself a workpiece is coated can be passed, and it is provided to make the master A mechanism in which the die 5 and the lower feed roller 19 are rotated without sliding each other. On the upstream side of the substrate 8 in the feeding direction, a resin supply material 22 coated on the substrate 18 to form a replica resin film 7 is provided, and ultraviolet rays are arranged above the substrate 8 on the downstream side of the master mold 15 Irradiate Shao Fen 24. In addition, in the pressure processing using the master mold, in order to adjust the viscosity or hardness of the replication resin film 17, an auxiliary ultraviolet irradiation device may be provided above the substrate 18 between the resin supply portion 22 and the master mold 15. . As the upper substrate 18, a glass substrate, a plastic substrate, a resin film substrate, or the like can be used. In addition, the replication resin film 17 coated on the substrate 18 by the resin supply portion 22 is a UV curing resin in this embodiment, but a thermosetting resin may also be used. In this case, the The ultraviolet irradiation portion 24 may be a heat source such as a heating bulb. The above-mentioned feed rollers 19 and 20 are provided to rotate the master mold 15 without sliding on the substrate 18, as long as it does not cause a gap in the master mold 15 It is also possible to reproduce the damage of the resin film 17 by any roller. In the step shown in FIG. 5A constituted by the upper die, the master die 15 is rotated by feeding the rollers 19 86695 -14-200424635, 20 in a state where the master die 15 and the lower side are fed. Insert the substrate 1 between the children 19 §, while moving the substrate 1 g to the right in the figure, while pushing the replica resin film 丨 7 on the substrate 18 onto the surface of the master mold 5 to push the surface of the master mold 15 The shape is transferred to the transfer resin film 17, and an uneven surface 25 is formed on the surface of the transfer resin film 17. The copy resin film 17 is formed by applying a resin material to the resin supply portion u while sequentially moving the substrate 18 to the right direction as shown in the figure, and processing 4 pages in the shape performed by the master mold 15 if necessary. The preliminary hardening by the ultraviolet irradiation device is performed, and after the processing by the master mold 15, the final hardening by the ultraviolet irradiation portion is performed to maintain the surface shape. Through the above steps, a resin plate 26 is formed on the surface of the copy resin film 17 in which concave and convex surfaces 25 of the master mold 15 are opposite to each other. Next, as shown in FIG. 5B, a metal film 27 is formed on the uneven surface 25 of the resin plate% obtained in the step shown in FIG. 5A. Next, a nickel film 28 (nickel electroforming) is formed by electrolytic plating using a metal film as an electrode. The above-mentioned metal film 27 is preferably used as a gold-plated film. Due to the formation of these metal particles, the metal film 27 and the nickel film 28 can be easily peeled off without causing damage to the nickel film 28. The thickness of the metal film 27 and the nickel film 28 can be 30 micrometers of gold, and the metal film 27 is not particularly limited to 5 nm to 50 nm. The nickel film is "200 micrometers. ~ ~ ... 丄 少 成鲽 Film 2 8 After peeling the thin film of these metals and resin plate 26, you can get nickel with an uneven shape that is approximately the same as the surface of the master mold 15 母 86695 -15-Uneven metal film with nickel film 28 Nickel plate 30 of 27. Next, as shown in FIG. 5C, on the metal plate 27 of the nickel plate 30 obtained in the above step, a nickel film 31 was formed by nickel electroforming. When the nickel film 31 was formed, The same formation method as the nickel film 28 shown in FIG. 5B can be used. In addition, the thickness of the nickel film 31 is not particularly limited, and it can be 30 μm to 200 μm. Next, the above steps are peeled from the metal film 27. The formed nickel film 31 is a nickel plate having a surface shape that is opposite to the surface unevenness of the master mold 15. The peeling between the metal film 27 and the nickel film 31 is performed by using a method in which the thermal expansion coefficient of each film is different. Therefore, for the metal film 27, gold or the like having a small thermal expansion coefficient is used, that is, Peeling between the metal film 27 and the nickel film 3 丨 can be performed more easily. Next, as shown in FIG. 5D, the buffer member 32 made of an elastomer such as rubber is adhered to the nickel plate (nickel obtained by the above-mentioned process). Film 31) on the opposite side of the uneven surface. Then, as shown in FIG. 6, the cushion member 32 is rolled onto the cylindrical base 34 toward the inside, so that it has a reciprocity with the master mold 15. 3, 5. The uneven surface shape of the roll 3. 5. Then, as shown in FIG. 7, an ultraviolet curing resin or a thermosetting resin is coated on the processed region 38 of a product substrate 37 made of glass or plastic to form an organic film. Next, the surface shape of the nickel film ^ 1 of the roll plate 3 5 is copied to the above-mentioned processed surface by rotating the roll plate 3 5 produced by the above process while pushing it onto the processed area 38. Area 3 § on the surface of the organic film. Then, using a method of hardening the processed organic film by ultraviolet irradiation or heating, and forming a highly reflective metal reflective film such as A1 or Ag on the surface of the organic film, it can be obtained The present embodiment shown in FIG. 1 86695 -16-In the method for manufacturing a reflector according to this embodiment, the roll 35 and the area to be processed 38 used in the processing of the organic film are combined to form the processed surface of the roll 35 (The area on the surface of the nickel film 31 where the uneven shape has been formed) The width W1 of 35a is wider than the width W2 of the processed area 38, and the circumference of the roll 35 is longer than the length L of the processed area 38. This is because FIG. The circle of the illustrated roll plate 35 is the same as that described above, and the buffer film 3 2 is rolled together with the cushion film 3 1 shown in FIG. 5 D into a roll-shaped seam, and the width of the nickel film 31 is limited. That is, in the step shown in FIG. 7, it is necessary to prevent the seam of the roll 35 from passing through the processed region 38, and it is necessary to prevent the end portion in the I-degree direction of the processed region 35 a from being processed. Will reach the reason of the processed area%. In the manufacturing method of the present embodiment, the processed region 38 shown in FIG. 7 may be configured as an organic film of a single reflector, or may be configured as an organic film including a plurality of reflectors. In addition, as shown in FIG. 8, a product substrate 37A in which a plurality of processed regions 38a having a width W2 smaller than the width W1 of the roll plate 35 are arranged may be used, and each processed region 38a may be rolled. Processing of version 35. That is, as long as the area of the area where the platen 31 can be rotated and processed and the areas of the areas to be processed 38 and 38A have the above-mentioned relationship, the organic film partitions or product substrates formed in the areas to be processed 38 and 38 are formed. There are no restrictions on the size of 37 and 37A. In addition, in the above description, although the case where the roll plate 35 which is opposite to the unevenness of the master mold 15 is produced, and the unevenness of the shape substantially the same as that of the master mold 1 is formed on the organic film of the product substrate 37, The manufacturing method can take various forms when processing the product substrate 37. For example, 86695 -17- 200424635 can be used to directly process the organic film of the product substrate 37 with the master mold 15. In this case, it is possible to manufacture the concave-convex with the reflector 10 shown in FIGS. 1 and 2: : Surface-shaped reflector. Furthermore, the product substrate 37 can be processed while being pressed on the organic film while being held on the substrate, without changing the recording film 31 to a roll-to-roll version. In addition, the nickel film 28 may be used in the same processing. (Manufacturing method of master mold) Next, a manufacturing method of the master mold 15 shown in FIG. 4 is demonstrated. The process chart of FIG. 9 shows one embodiment of a master mold manufacturing apparatus for manufacturing the master mold 15 shown in FIG. 4. The master mold manufacturing apparatus 40 shown in the figure is mainly provided with a cylindrical master mold base 41 and is arranged above the master mold base 41 to emboss the surface of the master mold base 41 with a concave indentation. Indenter 47 on the above, the above-mentioned master mold substrate 41 is connected to the substrate driving portion 45 on the side end surface (the left end surface in the figure) through the engaging portion of the material, and can be freely wound around its axis. Turn. In addition, the indenter driving section (indenter driving device) 48 is supported by the slider 56 as Z, and can move freely in the length direction of the master substrate 41 (shown in the left-right direction), and is controlled by the indentation. The driver driving portion 48 and the slider% constitute a processing head for processing the substrate 41. As the base material for the master mold 4 丨, a base material made of a metal material, such as lead, brass, tin, stainless steel, which can be plastically processed relatively easily, can be used. " The engaging element 44 is connected to the substrate driving portion 45, and one end side of the master mold substrate 41 is fitted and fixed, so that the master mold substrate 41 can be rotated by the substrate driving portion 45. In addition, the substrate driving section 45 can control the position of 86695 -18-200424635 around the axis of the master substrate 41 at a pitch of a few tenths to hundreds of microns. Therefore, the ‘base material driving blade’ 45 uses a servo motor or a stepping motor that can control a small amount of rotation. In addition, the material «Material 41» is used to maintain the g circumference of the shaft. For example, it is supported by a lepton ‘sign button auxiliary support device 15Q ·. This auxiliary support device 50 is configured so that it can be moved in the axial direction of the mother substrate 41. In addition, the auxiliary support is 50 °, and it also has the function of fine adjustment of the angle in the direction of the master substrate 41.
痕斋4 7係如上上械，^ 士从丄、A 被作成為可藉由壓痕器驅動部分 48在母模基材41的直徑方向上自由移動，朝向前端部（圖示 下万側)係被形成為前端細尖，前端47a被加工成壓刻到母 換基材4丨上的，壓痕的形狀。亦即，在製作用以製造具有圖2 所不的形狀的凹邵13的圖“勺反射體1〇的母模的情況下，需 在壓痕器47的前端部47a上形成與圖2所示的凹部13凹凸互 逆的形狀。圖1G的剖面構成圖係顯示製作用以形成具有圖2 :斤示形狀之凹部13之反射體的母模15時合適的壓痕器前端 邯47a的形狀。該圖所示的壓痕器47，係例示其前端部“a 的構成為包括構成半徑各不相同的向外侧凸出的球面的一 部分的第！曲面47A及第2曲面47B。亦即，被作成為使圖2 所不凹部13的第1曲面13a的内面及圖1〇所示第}曲面47A的Mark Zhai 4 7 is the same as above, ^ Shi Cong and A are made to move freely in the diameter direction of the master mold base 41 by the indenter drive portion 48, and face the front end (the lower side in the figure) The front end is formed with a thin tip, and the front end 47a is processed into an indentation shape embossed on the mother substrate 4 丨. That is, in the case of producing a master mold "spoon reflector 10" having a shape of concave 13 shown in Fig. 2, the front end portion 47a of the indenter 47 needs to be formed on the front end portion 47a of the indenter 47. The concave and convex shape of the concave portion 13 shown in FIG. 1G is a cross-sectional structure diagram showing the shape of a suitable indenter front end 47a when a female mold 15 for forming a reflector having the concave portion 13 of FIG. 2 is formed. The indenter 47 shown in this figure illustrates the structure of the front end portion "a" including a part of a spherical surface protruding outward with a different radius! The curved surface 47A and the second curved surface 47B. That is, the inner surface of the first curved surface 13a of the recessed portion 13 shown in FIG. 2 and the first curved surface 47A shown in FIG.
卜面大致一致的形狀，使第2曲面i3b的内面與第2曲面47B 外面大致一致的形狀。 另外，上述前端部的形狀，可根據所要製作的反射體的 凹部（或凸部）的形狀進行適當變更。壓痕器47可以使用在例 如不銹鋼制的本體的頂端上設置被加工成所希形狀的金剛 ^6695 -19 - 200424635 石的壓痕斋，也可以使用超硬鋼、陶瓷、鎢等。該壓痕器 47的前端’可以根據母模基材叫材質適當進行 選擇。 壓痕器驅動部分48係只要是可在上下方向上驅動上述壓 痕斋47以進行母模基材4丨的加工的驅動裝置，即可毫無問 題地使用，較佳的例子例如可為螺線管或〔麼電元件)等。 在圖9中，加工頭移動裝置57係沿著母模基材“的軸方向 可移動地支持著加工頭（壓痕器驅動部分48及滑動器56)， 此外，運可以與直徑方向定位控制裝置55卡合，而進行加 工頭的基材41的直徑方向的位置控制。而且，粮由加工頭 移動裝置57可以幾微米到數百微米的間距於母模基材4ι的 轴方向移動加工頭。 要使用具備以上構成的母模製造裝置4〇進行母模基材4工 的加工，首先，如圖9所示，須將圓柱狀的母模基材4丨載置 到輥子等的輔助支持裝置50上，同時須固定到卡合部分44 上。此外，使由滑動器56所支持的壓痕器驅動部分48及壓 痕器47移動至上述母模基材41的中心軸上方的初始位置（例 如，母模基材41的右端部）。上述母模基材41係選擇形成有 凹部42的區域的基材軸方向的長度w比複製樹脂膜17的寬 度還大的基材。此外，母模基材41的直徑，雖無特別限制 ，但是，如果基#41的直徑過小，由於藉由壓痕器47壓刻 的被加工面的曲率變大，則會有加工精度降低的可能性， 故從實用上而言較佳為至少要作成為丨〇 mm φ左右以上。 其次，使壓痕器驅動部分48動作以使壓痕器47向圖示下 86695 -20 - 200424635 万移動，藉由壓痕器的前端47a在母模基材41表面上形成凹 # 42。然後’使壓痕器47向上方移動與母模基材4 1離開間 ^ ’接著’使基材驅動部分45動作旋轉驅動母模基材41使 之恰好轉動規定的間距。此外，還要使已連接到加工頭移 動衣置5 7上的直徑方向定位控制裝置5 5動作，使滑動器$ 6 (以及壓痕益47)在母模基材41的軸方向上恰好移動規定的 ^如上述地元成了母模基材41及壓痕器4 7的移動後 ，即與上述同樣地使壓痕器驅動部分48動作，進行由壓痕 态47進行的凹邵42向母模基材4丨的表面上的壓刻。 然後，依序反復進行上述的工序，如圖9所示，在母模基 材41的表面上大致螺旋狀地不斷形成凹部42。藉由該工序 ，即可以在母模基；^41表面的區域上形成具有規定範圍的 間距及深度的多個凹部42，即可以得到具有圖4所示般的加 工區域1 6的母模1 5。 以上逑母模製造裝置40製作的母模15，如圖9所示，由於 大致螺旋狀地連續地形成有凹部42，故是一種在母模基材 41的圓周方向上沒有接缝的母模，在使用該母模^的形狀 稷製中，若為母模15的旋轉方向，則具有可以連續地進行 加工的優點。因此’在可以反復重復性良好地形成微細凹 凸形狀的同時，還可以加大可用!次的加工進行處理的被加 工物的面#，效率極纟良好地進行反射體表面的微細凹凸 形狀的形成。此外，即便是在要製作上逑反射體的製造中 使用的圖6所π滾版35的情況下，由於在母模15上沒有接缝 ，故即便是有必要加大滾版35的直徑，亦可以採用加大由 86695 -21 - 200424635 母模1 5進行的複製樹脂膜17的加工長度的方法容易地進行 應對。 此外’若採用使用上述母模製造裝置4〇的製造方法，由 於採用僅適當變更壓痕器47的前端部47a的形狀的方法，即 可以在母模基材41的周面上形成任意的形狀的凹部42，故 可以極其谷易地應對要用圖5到圖7所示的製造工序製作的 反射體的反射面形狀的變更。因此，可以大幅度地縮短伴 隨著反射體的設計變更所產生的前置時間，可以效率良好 地進行具備最佳表面形狀的反射體的製造。 此外，在將圖1所示的反射體丨〇作為例如液晶顯示裝置的 反射層的情況下，為了避免反射體1〇反射面的凹部13的排 列圖形，及液晶顯示裝置的圖形形狀（例如，像素電極或濾 色片、黑色矩陣的圖形）干涉而產生水波紋（M〇ire)條紋，即 必須與上述液晶顯示裝置的圖形形狀一致地變更反射輯1〇 的凹°的排列圖形。以往，為了防止如此的水波紋條紋 ，對每一種液晶顯示裝置都要準備不同模 射體的有機膜的加：，但若制以上料模製造裝置4〇製 作的母模15及使用其反射體的製造方法，則可以使用同一 母模Η或滾版35,製作已採取了水波紋對策的反射體1〇。 以下，參照圖11對該製造方法進行說明。 ΜΑ及圖11Β，，係用以說明在本實施方式的製造方法中 ::更在有機膜上形成的凹凸形狀的排列圖形時的製造工 序說明圖，其顯示以母模】$ 邛筷1 5及來版」5加工在產品基板37上 排列形成的有機膜38a的工序。.另外f 斤另外雖然圖示及說明省略 86695 -22- 200424635 ，但圖11所示工序以外的工序，則以圖5及圖6、圖9所示的 反射體及母模的製造方法為準。 右採用本實施方式的製造方法，在製造反射體的凹凸排 列圖形相異的反射體（或液晶顯示裝置）時，例如某一產品中 ，如圖11A所示，在與產品基板3ι7的長邊平行的方向上，邊 對有機膜38a進行推壓邊使母模15或滾版35轉動以進行加 工，在加工其他種類的產品基板37的情況下，則如圖丨j B 所示，採用使母模15或滾版35的軸例如恰好旋轉角度0， 而使母模15及滾版35在對產品基板37的一方傾斜的方向上 轉動以進行加工的方法，即可以極其容易地得到凹凸形狀 的排列圖形不同的有機膜38a。若採用如此的製造方法，則 在多種反射體（液晶顯示裝置）中，即可以採取水波紋對策而 幾乎不會變更製造工序，因而可以效率極其良好地進行反 射體的製造。 (液晶顯7F裝置） 圖1 2的JL體構成圖顯示將本發明的反射體應用於液晶顯 示裝置的反射層的例子，圖13係圖12所示液晶顯示裝置的 部分剖面構成圖。 本實施方式的液晶顯示裝置，如圖12及圖13所示，其構 成為具備前光源（照明裝置）11 〇、配置在其背面側（圖示下面 側）上的反射型的液晶面板120。 前光源110，如圖12所示，其構成為具備··大致平板狀的 透明的導光板112 ;沿著其側面丨12a配置的中間導光體i i 3 ;配設在該中間導光體11 3的單側的端面部分上的發光元件 -23 - 86695 200424635 115 ;將上述中間導光體1Π、發光元件Π5及導光板112的 侧端邵分覆蓋起來之方式，而從中間導光體1丨3侧開始被覆 的遮光性殼體119。亦即，將上述發光元件U5及中間導光 肢113 ^作莉光源11 〇的光源’將導光板112的侧端面112 a當 作導光板的入光面。此外，如圖12所示，在導光板112的外 面側（圖不上面侧）上，排列形成多個棱鏡溝丨丨4，使之在對 於配設有上中間導光體113的入光面112以頃斜的方向上延 伸。 液晶面板120的構成為具備相對配置的上基板12丨及下基 板122 ’在圖12中以虛線表示的矩形形狀的區域12〇D係作為 液晶面板120的顯示區域，在顯示區域12〇D内實際上矩陣狀 地排列形成有液晶面板的像素。 上述構成的液晶顯示裝置，將導光板丨〗2配置在液晶面板 120的顯示區域120D上，而可以透過該導光板112觀看液晶 面板120的顯示。此外，在得不到外部光的陰暗處，則使發 光兀件115點亮，通過中間導光體113從導光板112的入光面 11 2a將该光導入到導光板内部，從導光板112的圖示下面 112b朝向液晶面板12〇射出，對液晶面板12〇進行照明。 岫光源110的導光板112係一種配置在液晶面板12〇的顯 示區域上，而使從發光元件115射出的光射到液晶面板12〇 上的平板狀構件，其係由透明的聚丙烯樹脂等構成。如圖 13的局部剖面圖所示，導光板112的圖示上面（與液晶面板 1 20相反i、；{白勺面）’係形成為形成有彼此平行而俯視為條 帶狀之剖視為楔子狀的棱鏡溝丨14的反射面丨12c， 86695 -24 - 200424635 (與液晶面板120相對的面）則係作為射出用以照明液晶面板 120的照明光的射出面112b。上述棱鏡溝114係以對反射面 112c的基準面N傾斜地形成的一對斜面部分構成。這些斜面 部分中的一方被作成為平緩斜面部分丨14a。另一方則被作 成為傾斜角度比該平缓斜面部分丨丨4a陡的陡急斜面部分 114b。該平緩斜面部分114&係藉由使導光板112的光傳播方 向的長度越短則傾斜角度越大，而上述長度越長則傾斜角 度則越小，而提高前光源110的亮度的均一性。然後，使在 導光板112的内部從圖示右侧向左侧傳播的光，藉由反射面 112c的陡急斜面部分i14b向射出面1121)側反射，朝向被配 置在導光板112的背面一侧上的液晶面板丨2〇射出。 液晶面板120係可進行彩色顯示的反射型的被動矩陣型 液晶面板，如圖13所示，其構成為在相對配置的上基板121 及下基板122之間，挾持有液晶層123，在上基板121的内面 侧，具備在圖示左右方向上延伸的俯視為長方形的多個透 明電極126a及在該透明電極12以上形成的定向膜12讣，在 下基板122的内面侧，依次形成有反射層125、濾色片層129 、多個俯視長方形的透明電極128&及定向膜128b。 上基板121的透明電極126&及下基板122的透明電極128& ，皆被形成為平面形狀為長方形，而排列成俯視為條帶狀 。此外’被配置為使得透明電極126a的延伸方向與透明電 極128a的延伸方向俯視時成彼此垂直相交。因此，在1個透 明電極126a及1個透明電極128a交叉的位置上形成液晶面 板120的1個點，與每一個點對應地配置後述的3色（紅、綠 86695 -25 - 、藍）的滤色片中的1色濾色片。此外，發出及（紅）、G(綠) 、B(藍）色光的3個點構成液晶面板120的1個像素。 /慮巴片層12 9係構成為將紅、綠、藍各個滤色片1 2 9 r、 129G、129B周期性地排列，各個濾色片分別在對應的透明 電極12 8 a的下側形成，對每一個像素皆配置一組濾色片 12 9R、129G、129B。因此，採用驅動控制與每一個濾色片 12 9 R、1 2 9 G、12 9 B對應的電極的方法，即可以控制像素的 顯示色。 其次，在圖13所示的下基板122的内面側形成的反射層 125，具有圖1的立體構成圖所示般的構成，如圖1所示，其 構成為具備：A1或Ag等的高反射率的金屬反射膜12，及用 以賦予該金屬反射膜12規定的表面形狀的由聚丙烯樹脂材 料等得成的有機H吴11。在该有機I旲11的表面上設置有多個 凹邵13，藉由在該凹部13上形成的金屬反射膜12可獲得規 定的反射性。因此，本實施方式的液晶顯示裝置的反射層 125的凹部1 3，由於具有圖2所示的形狀，具有圖3所示的反 射特性，故可在廣角度範圍内進行高亮度的反射顯示，同 時，由於反射亮度的峰值，向面板法線方向移動得比正反 射方向更多，故可以提高通常液晶顯示裝置的觀察者所位 於的面板正面方向的亮度，可得到實質上明亮的顯示。 在本實施方式的液晶面板120中具備的有機膜11，可以本 發明的反射體製造方法製作，可藉由上述的反射體製造方 法容易且重複性良好地製造。此外，若採用本發明的反射 體製造方法，由於可以任意地變更反射面的凹凸形狀的排 86695 -26 - 200424635 列方向’故藉由應用上述製造方法，即便是在電極丨26a、 128a或濾色片層129的間距發生了變更的情況下，亦可以極 其容易地變更反射層125的凹凸排列的圖形，可以有效地防 止水波紋條紋的發生。 在以上的說明中，雖然係以應用於被動矩陣型的反射型 液晶頜π裝置為例，但是，本發明的反射體的製造方法及 液晶頌π裝置的製造方法，對反射型或半透過式的液晶顯 π裝置亦可適用，此外，在主動矩陣型的液晶顯示裝置中 亦可以適用。若適用於主動矩陣型液晶顯示裝置中，則可 以減低基板造價，非常有效。 發明之效果 如以上的詳細說明，本發明的反射體的製造方法，在製 造具備有機膜及在該有機膜上形成的金屬反射膜，而在上 述有機膜的表面上連續地形成有多數的凹部或凸部的反射 體時，係採用在大致圓柱狀母模基材的表面上形成有微細 的凹凸形狀的母模，而邊將該母模推壓到複製樹脂膜上， 邊使之旋轉以將母模的表面形狀複製到上述複製樹脂膜上 的工序的構成，因此藉由在複製樹脂膜上邊推壓上述母模 邊使4轉動，可效率良好地將母模的微細凹凸形狀複製到 腹製樹脂膜上。可將該複製樹脂膜作為有機膜而構成反射 體，或者亦可以將複製樹脂膜做為複製模使用，而於有機 膜上形級細凹凸形狀等的方《，形成在纟面上具有微細 凹凸形狀时制，而製作反㈣。此外，由於上述母模 大致為圓柱狀，故複製樹脂膜的長度在母模的旋轉方向上 86695 -27- 200424635 沒有限制，可極其容易地應用於使用大型基板的反射體的 製造中，可效率良好地進行反射體的微細凹凸形狀的形成。 其/人’本發明的液晶顯示裝置的製造方法，在製造具有 在相對地配置的上基板及下基板之間，挾持有液晶層，在 上述下基板的内面侧具備反射層的液晶顯示裝置時，藉由 本發明的反射體的製造方法，在上述下基板上形成上述反 射層的方法，即可以重複性良好地效率極其好地形成具有 優良反射特性的反射層，因而可以高製造效率製造液晶顯 示裝置。 【圖式簡單說明】 圖1係頭本發明的反射體的構成的一例的部分立體圖。 圖2 A係形成於圖1所示反射體上的凹部的平面構成圖，圖 2B係沿著圖2A所示G-G線的剖面構成圖。 圖3係顯示以30度的入射角從圖2的右側向圖}所示的反 射體10照射光，以對於反射面的正反射方向的3〇度為中心 ’在±30度的範圍（〇度到60度，〇度相當於液晶面板2〇的法 線方向）的受光角内擺動測定反射體10的反射率（％)的結果 圖。 圖4係顯示在本實施方式的製造方法中，用以形成反射體 的凹凸形狀的母模的立體構成圖。 圖5 A-5D係顯示使用圖4所示的母模製作滾版的工序的剖 面構成圖。 圖6係顯示以圖5的工序製作的滾版的剖面構造。 圖7係顯示以圖6所示的滾版形成反射體的凹凸形狀的工 86695 -28 - 200424635 序的立體構成圖。 圖8係顯示本實施方式的製造方法的有機膜的加工工序 的另一例的立體構成圖。 圖9係顯示用以製作圖4所示母模15的母模製造裝置的一 實施方式的工序圖。 圖1 0係顯示圖9所示母模製造共士 gs 士 邙筷衣^衣且中具備的壓痕器前端 形狀的一例的剖面構成圖。 圖11A及11B係用以說明在本實施方式的製造方法中，變 更在有機膜上形成的凹凸形狀的排列圖形的時的製造工序 說明圖。 圖12係顯示將本發明的反射體應用於液晶顯示裝置的反 射層的例的JL體構成圖。 圖13係圖12所示液晶顯示裝置的部分剖面構成圖。 【圖式代表符號說明】 1 〇…反射體，11...有機膜；12…金屬反射膜；1 3 ·.凹部，· 13a...弟1曲面，13b...第2曲面；15...母模；16...加工區域； 17…複製樹脂爿旲，18…基板；2 0…液晶面板；2 2 ..，樹脂供给 部分；24.·.紫外線照射部分；25...凹凸面；26..·樹脂版；27 金屬膜；28…鎳膜；30·..鎳版；Μ.·.鎳膜；32.,·缓衝構件； 34.··基體；35..·滾版；35a…加工面；37…產品基板；38 被加工區域；38a...有機膜；38A·..被加工區域；4〇 母膜 製造裝置；41…母模基材；42 ...凹邵；44 ...卡合部分；45 基材驅動部分；47...壓痕器；47a...前端；々了八…第}曲面； 47B…第2曲面；48...壓痕器驅動裝置；50·..辅助支持裝置 86695 -29- 200424635 加工頭移 ;112b·.. ...鏡溝； 發光元件 氧；121... 明電極； ;129...濾 ;55 ...直徑方向定位控制裝置；56...滑動器；57 ... 動裝置；Π0.,·前光線；112…導光板；…侧面 射出面；112c...反射面；113...中間導光體；114 114a·..平緩斜面部；U4b...陡急斜面部分；115... ;119·..遮光性殼體；12〇…液晶面板；120D…區i 上基板；122…下基板；125…反射層；126a...透 126b...定向膜；128a...透明電極；128b...定向膜 色片層；129R、129G、129B…濾色片。 86695 -30 -The shape of the substantially flat surface is such that the inner surface of the second curved surface i3b is substantially the same as the outer surface of the second curved surface 47B. The shape of the tip portion can be appropriately changed according to the shape of the concave portion (or convex portion) of the reflector to be produced. The indenter 47 can be used, for example, a diamond indentation provided on the top end of a body made of stainless steel and processed into a desired shape ^ 6695 -19-200424635 stone. Superhard steel, ceramics, tungsten, etc. can also be used. The front end 'of the indenter 47 can be appropriately selected according to the material of the base material of the master mold. The indenter driving section 48 is a driving device capable of driving the indentation module 47 in the up-down direction to process the master mold substrate 4 and it can be used without any problem. A preferable example is, for example, a screw. Wire tube or (electrical component) and so on. In FIG. 9, the processing head moving device 57 supports the processing head (the indenter driving portion 48 and the slider 56) so as to be movable along the axis direction of the base material of the master mold. In addition, the positioning head can control the diameter direction. The device 55 is engaged to control the position of the substrate 41 in the radial direction of the processing head. In addition, the processing head moving device 57 can move the processing head in the axial direction of the master substrate by a distance of several micrometers to hundreds of micrometers. To use a master mold manufacturing apparatus 40 having the above structure to process a master mold substrate, first, as shown in FIG. 9, a cylindrical master mold substrate 4 must be placed on an auxiliary support such as a roller. At the same time, the device 50 must be fixed to the engaging portion 44. In addition, the indenter driving portion 48 and the indenter 47 supported by the slider 56 are moved to the initial position above the central axis of the master mold substrate 41 (For example, the right end portion of the master substrate 41.) The master substrate 41 is a substrate in which the length w in the substrate axis direction of the region where the recessed portion 42 is formed is larger than the width of the replication resin film 17. In addition, The diameter of the master substrate 41 is not particularly limited However, if the diameter of the base # 41 is too small, since the curvature of the machined surface engraved by the indenter 47 becomes large, there is a possibility that the processing accuracy will be lowered. Therefore, it is preferably at least practically necessary. It is more than about Ø mm mm. Secondly, the indenter driving part 48 is operated to move the indenter 47 to 86,695-20-24,243.5 million as shown in the figure, and the front end 47a of the indenter is placed on the base material of the master mold. 41cavity 42 is formed on the surface. Then, 'the indenter 47 is moved upward and the master substrate 4 1 leaves the space ^' Next 'The substrate driving part 45 is operated to rotate and drive the master substrate 41 to rotate exactly. In addition, the diameter-direction positioning control device 5 5 which is connected to the processing head moving clothes 5 7 must be operated to make the slider $ 6 (and the indentation benefit 47) in the axial direction of the master substrate 41 If the above-mentioned ground element has been moved as described above, after the base element 41 and the indenter 47 are moved, the indenter driving portion 48 is operated in the same manner as described above, and the indentation by the indentation state 47 is performed. The embossing on the surface of the master substrate 4 is 42. Then, it is repeated in order. As shown in FIG. 9, the recessed portion 42 is continuously formed in a spiral shape on the surface of the master substrate 41 as shown in FIG. 9. With this step, a predetermined range can be formed on the surface of the master substrate; A plurality of recesses 42 having a pitch and a depth of one can obtain a master mold 15 having a processing area 16 as shown in Fig. 4. The master mold 15 manufactured by the above master mold manufacturing apparatus 40 is shown in Fig. 9, because The recessed portion 42 is formed continuously in a substantially spiral shape. Therefore, it is a master mold having no seams in the circumferential direction of the master substrate 41. In the shape molding using this master mold, if the master mold 15 is rotated, Direction, it has the advantage that it can be processed continuously. Therefore, while the fine uneven shape can be formed repeatedly and with good repeatability, the surface # of the object to be processed which can be processed by multiple times can be increased, and the efficiency is extremely high. Formation of the fine uneven | corrugated shape on the surface of a reflector is performed favorably. In addition, even in the case where the π roll plate 35 shown in FIG. 6 to be used in the manufacture of the upper reflector is used, since there is no seam in the master mold 15, it is necessary to increase the diameter of the roll plate 35, It is also possible to easily cope with the method of increasing the processing length of the replica resin film 17 by the master molds 86695 -21-200424635. In addition, if the manufacturing method using the above-mentioned master mold manufacturing apparatus 40 is adopted, since only the shape of the front end portion 47a of the indenter 47 is appropriately changed, an arbitrary shape can be formed on the peripheral surface of the master substrate 41 The recessed portion 42 can easily respond to changes in the shape of the reflecting surface of the reflector to be manufactured by the manufacturing process shown in FIGS. 5 to 7. Therefore, the lead time due to the design change of the reflector can be greatly reduced, and the reflector having an optimal surface shape can be efficiently manufactured. In addition, when the reflector shown in FIG. 1 is used as, for example, a reflective layer of a liquid crystal display device, in order to avoid the arrangement pattern of the recesses 13 on the reflective surface of the reflector 10 and the shape of the liquid crystal display device (for example, The pixel electrode, the color filter, and the pattern of the black matrix) interfere with each other to generate moire stripes, that is, it is necessary to change the concave pattern of the reflection series 10 in accordance with the shape of the liquid crystal display device. In the past, in order to prevent such water ripples, an organic film of a different mold body must be prepared for each type of liquid crystal display device. However, if the master mold 15 manufactured by the above-mentioned mold manufacturing apparatus 40 and the reflector are used, In the manufacturing method, the same master mold Η or roll plate 35 can be used to produce a reflector 10 that has been subjected to water ripple countermeasures. Hereinafter, this manufacturing method will be described with reference to FIG. 11. ΜA and FIG. 11B are explanatory diagrams for explaining the manufacturing process in the case of the pattern of uneven shapes formed on the organic film in the manufacturing method of the present embodiment. "Coming soon" 5 is a step of processing the organic film 38a formed on the product substrate 37 in an array. In addition, although the illustration and explanation are omitted 86695 -22- 200424635, the steps other than those shown in FIG. 11 are subject to the method of manufacturing the reflector and the master shown in FIG. 5, FIG. 6, and FIG. 9. . On the right, when the manufacturing method of this embodiment is used, when manufacturing a reflector (or a liquid crystal display device) having a concave-convex arrangement pattern of a reflector, for example, in a certain product, as shown in FIG. In a parallel direction, while pressing the organic film 38a, the master 15 or the roll 35 is rotated for processing. In the case of processing other types of product substrates 37, as shown in FIG. The axis of the master mold 15 or the roll plate 35 is, for example, exactly rotated at an angle of 0, and the master mold 15 and the roll plate 35 are rotated in a direction inclined to one side of the product substrate 37 to perform processing. The organic film 38a has a different arrangement pattern. If such a manufacturing method is adopted, it is possible to take countermeasures against water ripples in a variety of reflectors (liquid crystal display devices) and hardly change the manufacturing process, so that the reflector can be manufactured extremely efficiently. (Liquid Crystal Display 7F Device) FIG. 12 shows an example of a JL body structure in which the reflector of the present invention is applied to a reflective layer of a liquid crystal display device. FIG. 13 is a partial cross-sectional structure view of the liquid crystal display device shown in FIG. The liquid crystal display device of the present embodiment is, as shown in Figs. 12 and 13, configured as a reflective liquid crystal panel 120 including a front light source (lighting device) 11 and disposed on a rear surface side (lower side in the figure). The front light source 110, as shown in FIG. 12, is configured to include a substantially flat transparent light guide plate 112; an intermediate light guide ii 3 arranged along its side surface 12a; and disposed on the intermediate light guide 11 The light-emitting element on the one-sided end face of 3-23-86695 200424635 115; the method of covering the side ends of the intermediate light guide 1Π, the light-emitting element Π5, and the light guide plate 112 from the middle light guide 1 The light-shielding case 119 covering 3 sides is covered. That is, the light-emitting element U5 and the intermediate light guide limb 113 are used as the light source of the Li light source 110, and the side end surface 112a of the light guide plate 112 is used as the light incident surface of the light guide plate. In addition, as shown in FIG. 12, a plurality of prism grooves are arranged on the outer side (not upper side of the figure) of the light guide plate 112 so as to face the light incident surface on which the upper middle light guide 113 is arranged. 112 extends in an oblique direction. The liquid crystal panel 120 is configured to include an upper substrate 12 and a lower substrate 122 that are oppositely arranged. The rectangular region 120D shown by a dotted line in FIG. 12 is a display region of the liquid crystal panel 120, and the display region 120D is within the display region 120D. In practice, the pixels on which the liquid crystal panel is formed are arranged in a matrix. In the liquid crystal display device having the above configuration, the light guide plate 2 is arranged on the display area 120D of the liquid crystal panel 120, and the display of the liquid crystal panel 120 can be viewed through the light guide plate 112. In addition, in a dark place where no external light can be obtained, the light-emitting element 115 is turned on, and the light is introduced into the light guide plate from the light incident surface 11 2a of the light guide plate 112 through the intermediate light guide 113, and from the light guide plate 112. The bottom surface 112b shown in the figure is emitted toward the liquid crystal panel 120, and the liquid crystal panel 120 is illuminated. The light guide plate 112 of the chirped light source 110 is a flat plate-shaped member that is disposed on the display area of the liquid crystal panel 120 and allows light emitted from the light emitting element 115 to be incident on the liquid crystal panel 120. The light guide plate 112 is made of transparent polypropylene resin or the like. Make up. As shown in the partial cross-sectional view of FIG. 13, the illustrated upper surface of the light guide plate 112 (opposite to the liquid crystal panel 120); {{}} {{}} is formed as a cross-section that is parallel to each other and has a stripe shape in plan view. The wedge-shaped prism groove 14's reflecting surface 12c, 86695 -24-200424635 (the surface opposite to the liquid crystal panel 120) serves as an emitting surface 112b for emitting illumination light for illuminating the liquid crystal panel 120. The prism groove 114 is constituted by a pair of inclined surface portions formed obliquely to the reference surface N of the reflecting surface 112c. One of these bevel portions is referred to as a gentle bevel portion 14a. The other side is formed as a steep slope portion 114b having a steeper inclination angle than the gentle slope portion 4a. The gentle slope portion 114 & improves the uniformity of the brightness of the front light source 110 by making the length of the light propagation direction of the light guide plate 112 shorter as the tilt angle increases, and the longer the length, the smaller the tilt angle. Then, the light propagating inside the light guide plate 112 from the right side to the left side of the illustration is reflected toward the exit surface 1121) side by the steep slope portion i14b of the reflection surface 112c, and is directed toward the rear side of the light guide plate 112. The upper LCD panel is emitted. The liquid crystal panel 120 is a reflective passive matrix liquid crystal panel capable of performing color display. As shown in FIG. 13, the liquid crystal panel 120 is configured to hold a liquid crystal layer 123 between an upper substrate 121 and a lower substrate 122 which are oppositely disposed. The inner surface side of 121 includes a plurality of rectangular transparent electrodes 126 a extending in the left-right direction as shown in the plan view, and an alignment film 12 ′ formed on the transparent electrode 12 or more. A reflective layer 125 is sequentially formed on the inner surface side of the lower substrate 122. , A color filter layer 129, a plurality of rectangular transparent electrodes 128 & The transparent electrodes 126 & of the upper substrate 121 and the transparent electrodes 128 & of the lower substrate 122 are both formed in a rectangular shape in a planar shape and arranged in a strip shape in a plan view. Further, it is arranged such that the extending direction of the transparent electrode 126a and the extending direction of the transparent electrode 128a intersect at right angles to each other in a plan view. Therefore, one point of the liquid crystal panel 120 is formed at a position where one transparent electrode 126a and one transparent electrode 128a intersect, and the three colors (red, green 86695 -25-, blue) described later are arranged corresponding to each point. One color filter among the color filters. In addition, three dots emitting light of (red), G (green), and B (blue) colors constitute one pixel of the liquid crystal panel 120. The erba sheet layer 12 9 is configured to periodically arrange the red, green, and blue color filters 1 2 9 r, 129G, and 129B, and each color filter is formed under the corresponding transparent electrode 12 8 a. For each pixel, a set of color filters 12 9R, 129G, 129B is arranged. Therefore, the method of driving and controlling the electrodes corresponding to each of the color filters 12 9 R, 1 2 9 G, and 12 9 B can control the display color of the pixel. Next, the reflective layer 125 formed on the inner surface side of the lower substrate 122 shown in FIG. 13 has a structure as shown in the three-dimensional structure diagram of FIG. 1. As shown in FIG. 1, the structure is provided with a height such as A1 or Ag. A metal reflective film 12 having a reflectance, and an organic H Ng 11 made of a polypropylene resin material or the like for giving the metal reflective film 12 a predetermined surface shape. A plurality of recesses 13 are provided on the surface of the organic I11, and a predetermined reflectivity can be obtained by the metal reflection film 12 formed on the recesses 13. Therefore, since the concave portions 13 of the reflective layer 125 of the liquid crystal display device of this embodiment have the shape shown in FIG. 2 and the reflection characteristics shown in FIG. 3, high-brightness reflective display can be performed in a wide angle range. At the same time, since the peak value of the reflection brightness moves more toward the panel normal direction than the specular reflection direction, the brightness in the front direction of the panel where an observer of a liquid crystal display device is usually located can be increased, and a substantially bright display can be obtained. The organic film 11 provided in the liquid crystal panel 120 of this embodiment can be produced by the reflector manufacturing method of the present invention, and can be easily and reproducibly manufactured by the above-mentioned reflector manufacturing method. In addition, if the reflector manufacturing method of the present invention is used, since the row-and-row direction of the concave-convex shape of the reflecting surface can be changed arbitrarily 86695 -26-200424635, the above-mentioned manufacturing method can be applied, even in the electrode 26a, 128a or filter When the pitch of the color sheet layer 129 is changed, the pattern of the concave-convex arrangement of the reflective layer 125 can be changed very easily, and the occurrence of water ripple stripes can be effectively prevented. In the above description, although the reflection type liquid crystal jaw device applied to the passive matrix type is taken as an example, the method for manufacturing the reflector and the method for manufacturing the liquid crystal device according to the present invention are reflective or transflective devices. The liquid crystal display device of the present invention can also be applied, and also can be applied to an active matrix type liquid crystal display device. If it is applied to an active matrix type liquid crystal display device, the cost of the substrate can be reduced, which is very effective. Effects of the Invention As described in detail above, the method for manufacturing a reflector of the present invention includes an organic film and a metal reflective film formed on the organic film, and a plurality of recesses are continuously formed on the surface of the organic film. In the case of a reflector of a convex portion, a mother mold having a fine concave-convex shape formed on the surface of a substantially cylindrical mother mold base is used, and the mother mold is pressed against a replication resin film while being rotated to The structure of the step of copying the surface shape of the master mold onto the copy resin film. Therefore, by pushing the master mold on the copy resin film and turning 4, the fine uneven shape of the master mold can be efficiently copied to the belly. Made of resin film. The replication resin film can be used as an organic film to form a reflector, or the replication resin film can be used as a replication mold. On the organic film, a square shape such as fine unevenness can be formed with fine unevenness on the surface. The shape is seasonal, and the countermeasures are made. In addition, since the above-mentioned master mold is substantially cylindrical, the length of the replication resin film is not limited in the rotation direction of the master mold. 86695 -27- 200424635, it is extremely easy to apply to the manufacture of reflectors using large substrates, and it is efficient Formation of the fine uneven | corrugated shape of a reflector is performed favorably. The method of manufacturing a liquid crystal display device of the present invention is to produce a liquid crystal display device having a liquid crystal layer between an upper substrate and a lower substrate that are oppositely disposed, and a reflective layer provided on the inner surface side of the lower substrate. With the method for manufacturing the reflector of the present invention, the method for forming the reflective layer on the lower substrate can form a reflective layer with excellent reflection characteristics with excellent repeatability and efficiency, so that a liquid crystal display can be manufactured with high manufacturing efficiency. Device. [Brief Description of the Drawings] FIG. 1 is a partial perspective view showing an example of the structure of a reflector of the present invention. FIG. 2 is a plan configuration view of a recessed portion formed on the reflector shown in FIG. 1, and FIG. 2B is a cross-sectional configuration view taken along a line G-G shown in FIG. 2A. FIG. 3 shows that the reflector 10 is irradiated with light at an angle of 30 degrees from the right side of FIG. 2 toward the reflector 10 shown in FIG. The result is a result of measuring the reflectance (%) of the reflector 10 by swinging within a light-receiving angle of 60 degrees and 0 degrees (equivalent to the normal direction of the liquid crystal panel 20). Fig. 4 is a perspective view showing a three-dimensional configuration of a female mold for forming a concave-convex shape of a reflector in the manufacturing method of the present embodiment. Fig. 5 A-5D is a cross-sectional configuration diagram showing a step of manufacturing a roll-out using the master shown in Fig. 4; FIG. 6 shows a cross-sectional structure of a roll plate produced in the step of FIG. 5. FIG. 7 is a perspective structural view showing a procedure 86695 -28-200424635 for forming a concave-convex shape of a reflector by the rolling plate shown in FIG. 6. Fig. 8 is a perspective configuration diagram showing another example of the processing steps of the organic film in the manufacturing method of the present embodiment. Fig. 9 is a process diagram showing an embodiment of a master mold manufacturing apparatus for manufacturing the master mold 15 shown in Fig. 4. FIG. 10 is a cross-sectional configuration diagram showing an example of the shape of the tip of an indenter provided in the master mold shown in FIG. 11A and 11B are explanatory diagrams for explaining a manufacturing process when an array pattern of uneven shapes formed on an organic film is changed in the manufacturing method of the present embodiment. Fig. 12 is a JL body configuration diagram showing an example in which the reflector of the present invention is applied to a reflective layer of a liquid crystal display device. 13 is a partial cross-sectional configuration diagram of the liquid crystal display device shown in FIG. 12. [Explanation of Symbols of Drawings] 1 0 ... reflector, 11 ... organic film; 12 ... metal reflective film; 1 3 ... recess, 13a ... 1 curved surface, 13b ... second curved surface; 15 ... Master mold; 16 ... Processing area; 17 ... Resin resin 爿 旲, 18 ... Substrate; 20 ... Liquid crystal panel; 2 2 ... Resin supply section; 24 .. Ultraviolet irradiation section; 25 .. Concavo-convex surface; 26 .. resin plate; 27 metal film; 28 ... nickel film; 30 .. nickel plate; M .. nickel film; 32. buffer member; 34. base body; 35. . · Rolling plate; 35a ... processed surface; 37 ... product substrate; 38 processed area; 38a ... organic film; 38A ... processed area; 40 mother film manufacturing equipment; 41 ... master mold substrate; 42 ... Concave part; 44 ... Engagement part; 45 Substrate driving part; 47 ... Indenter; 47a ... Front end; Eighth ... th surface; 47B ... Second surface; 48. .. Indenter driving device; 50 .. Auxiliary support device 86695 -29- 200424635 Processing head movement; 112b .. ... mirror groove; light-emitting element oxygen; 121 ... bright electrode; 129 ... Filter; 55 ... diameter positioning control device; 56 ... slider; 57 ... moving device; Π0., · Front light; 112 ... Light guide plate; ... side exit surface; 112c ... reflection surface; 113 ... intermediate light guide body; 114 114a ... smooth sloping surface; U4b ... steep sloping surface; 115 ...; 119 ... Light-shielding housing; 12 ° ... LCD panel; 120D ... Area i upper substrate; 122 ... lower substrate; 125 ... reflective layer; 126a ... transparent 126b ... orientation film; 128a ... transparent electrode; 128b ... .Orientation film color layer; 129R, 129G, 129B ... color filter. 86695 -30-